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From  Standard  MEMS  Processes  (MUMPs®)  to  Commercial  Success

Allen  Cowen  MUMPs  Program  Manager  

Allen.cowen@memscapinc.com  www.memscap.com  

MEPTEC  MEMS  Symposium  

2 May 16 MEPTEC MEMS Symposium

Overview

! MUMPs (MultiUser MEMS Processes) – Standardized MPW Processes and Examples

!  PolyMUMPs !  SOIMUMPs !  PiezoMUMPs ! MetalMUMPs

! Semicustom Process and Examples (MUMPsPlus) ! Outside  Vendor  Standardized  Processes ! Custom  MEMS  Fabrica8on  (Pros  and  Cons)  ! MEMSCAP Introduction  

3 May 16 MEPTEC MEMS Symposium

•  Bulk Micromachining – Deep RIE/RIE – Wet bulk micro-machining – VOA, 2x2, SOIMUMPs

•  Surface Micromachining – Poly-Silicon Processing (PolyMUMPs) – Adaptive Optics, Microphones

•  High aspect ratio thick metal plating – LIGA-like (MetalMUMPs) – Microrelay, Copper Cross Connect

MEMSCAP Fabrication Capabilities

4 May 16 MEPTEC MEMS Symposium

!  Started in December 1992 ◦  215 Process Runs to Date ◦  Hundreds of thousands of

devices shipped !  Worldwide Customer Base !  Supports ◦  Low volume foundry work ◦  Standard films, thicknesses on Si substrates ◦  Rapid Prototyping ◦  IP Generation ◦  Undergraduate (MEMS 101) and Graduate (Thesis) Level

5 May 16 MEPTEC MEMS Symposium

MUMPs®  Textbook  

•  Textbook  uses  MUMPs  as  the  example  MEMS  processes  

•  Author:  Joel  Kubby,  University  of  California  at  Santa  Cruz  "  Long  8me  MUMPs  user  even  prior  to  Academia  

6 May 16 MEPTEC MEMS Symposium

!  Regular Run Schedule !  12 scheduled MUMPs runs in 2016 (4 Poly, 4 SOI, 3 Piezo, 1 Metal)

!  Process flexibility !  PolyMUMPs (traditional) !  SOIMUMPs (Silicon-On-Insulator) !  MetalMUMPs (Electroplated Nickel) !  PiezoMUMPs (SOIMUMPs like, with additional Piezoelectric AlN layer) !  MUMPs-PLUS (semi-custom)

!  Web-based interface: www.memscap.com/products/MUMPS !  Reference and Support

!  Process files available for all platforms and CAD tools !  Element Libraries

! CaMEL (PolyMUMPs) ! SOIMUMPs and MetalMUMPs

!  PolyMUMPs Technical FAQ !  Microsoft Guide to PolyMUMPs !  Bibliography of MUMPs® published papers

! Google Scholar for more!

MUMPs® Summary

7 May 16 MEPTEC MEMS Symposium

PolyMUMPs®  Process  

"  Polysilicon  surface  micromachining  "  8  lithography  levels,    7  physical  layers  

"  3  Polysilicon  layers  "  1  Metal  layer  

"  ApplicaLons  "  Adap8ve  op8cs  "  Microphones  "  Sensors  and  Actuators  

Poly0 Poly1 Poly2 Metal

Nitride 1st Oxide 2nd Oxide

8 May 16 MEPTEC MEMS Symposium

PolyMUMPs®  Process  

"  Programmable  Elements  "  Springs,  Comb  drives  etc  "  Parameterized  layouts  

"  Correct  by  construcLon  "  Incorporates  design  rules  

"  Anchors  etc  correctly  drawn  "  Proven  to  work  

9 May 16 MEPTEC MEMS Symposium

PolyMUMPs®  Process  

"  Design  Rules  "  Allow  check  of  manufacturabiliy  

"  CAD  tools    "  Automa8c  checks  

"  Spacing,  Surround  

"  Structure  specific  checks  

10 May 16 MEPTEC MEMS Symposium

SOIMUMPs  Process  

"  Bulk  Micromachining  "  10  or  25um  structure  layer  (single  crystal  silicon)  

"  Double-­‐side  paVern/etch  "  2  Metal  layers    "  Deep  RIE/RIE  Processing  

"  ApplicaLons  "  VOA,  2x2  Op8cal  Switches  "  Mirror  arrays  "  Resonators,  Oscillators,  and  Gyroscopes  

"  Micro-­‐actuators  

VOA

11 May 16 MEPTEC MEMS Symposium

Bulk Si

10 µm Si 1 µm buried oxide

Not to scale

2000 Å thermal oxide

200 Å Cr, 1 µm Al 0.5 µm AlN

! SOI-Based, Bulk Micromachining with piezoelectric layer

!  0.5 µm Piezoelectric Aluminum Nitride !  AlN is a large band gap (6 eV) material

with a large resistivity !  Good temperature/humidity stability !  Higher signal-to-noise ratio

!  Applications –  Ultrasonic transmitters and receivers (MUTs). –  Frequency references. –  Temperature sensors (resonant frequency

changes with temperature) –  Force sensor –  Energy harvesters

PiezoMUMPs  Process  

12 May 16 MEPTEC MEMS Symposium

MetalMUMPs®  Process  

"  Thick  Metal  PlaLng  Process  "  10  lithography  layers  "  Thick  electroplated  Ni  (18-­‐22um)  "  Nitride,  Polysilicon,  and  thin  metal  structural  layers  

"  ApplicaLons  "  Microrelays  "  RF  Switches,  cross-­‐connect  switches  "  Magne8c  devices  

Courtesy of Zyvex Corporation

13 May 16 MEPTEC MEMS Symposium

Prototype to Production

14 May 16 MEPTEC MEMS Symposium

Seacoast  Science’s  PolyMUMPS  Sensors  

Upper and lower plates are polycrystalline silicon, polymer is filled through holes in the top plate to make the individual capacitors sensitive to chemicals. http://www.seacoastscience.com/Downloads/Seacoast_White_Paper.pdf

Individual chemicapacitor

15 May 16 MEPTEC MEMS Symposium

SeaPort  Mini  Gas  Chromatograph  for  Educa8on  

•  Single  chemicapacitor  readout  •  Separate,  analyze  and  idenLfy  compounds  •  For  volaLle  liquids  or  gas  samples  •  Uses  Seacoast’s  MCCD  detector  •  Current  design  sold  for  educaLonal  use  •  Distributed  by  Vernier  SoSware  and  

Technology  •  Used  by  students  right  out  of  the  box  •  1500  deployed  in  schools  

16 May 16 MEPTEC MEMS Symposium

Standard+Custom=MUMPs-PLUS!

!  Slight modification of one of the four MUMPs processes !  Extra layer, different thickness or

material !  Customer’s wafers are added to regular

MUMPs lot to take advantage of batch processing/pricing for unmodified process steps

!  Singulated, shipped at die level !  Quoted on a case-by-case basis

!  Examples !  Additional Patternable Nitride !  Thicker Poly or oxide !  Additional/Different Metal !  Backside Etch

PolyMUMPsPlus Std Layer Range(µm) Nitride 0.1-1.5

Poly0 0.1-3.0

Oxide1 0.3-5.0

Poly1 0.1-3.0

Oxide2 0.3-5.0

Poly2 0.1-3.0

Metal 0.05-1.0

17 May 16 MEPTEC MEMS Symposium

MUMPs-PLUS Capabilities

Std Layer Range(µm) Isolation Oxide 0.1 – 2.2

Oxide1 0.1 – 3.0

Nitride1 0.1 – 1.0

Poly 0.1 – 3.0

Nitride2 0.1 – 1.0

Oxide2 0.1 – 3.0

Anchor Metal 0.05 – 1.0

Nickel 1 – 30?

Sidewall Metal 0.1 – 5.0

MetalMUMPsPlus Std Layer Range(µm) Pad Metal 0.05 - 1.0

Silicon 3 - 100

Buried Oxide 0.5 – 4.0

Substrate 300 - 600

Blanket Metal 0.05 – 1.0

SOIMUMPsPlus

Std Layer Range(µm) AlN 0.5 - 10

Isolation Oxide 0.5 – 4.0

PiezoMUMPsPlus

Custom Layer/Processes

Oxide below Nitride

Nitride between Poly layers

Metals (Au, Cr, Pt, Cu, Ag, Ni)

CMP

18 May 16 MEPTEC MEMS Symposium

!  MEMSCAP MagSwitch

!  BMC Adaptive Optics

!  Silicon Microphones Deformable mirror

Electrostatically actuated

diaphragm Attachment post

Membrane mirror

Diced WLP wafer before P&P

19 May 16 MEPTEC MEMS Symposium

!  Used PolyMUMPs for cost-effective prototyping in early 90s

!  Design variations and iterations on each run validated target designs and encouraged further development

!  Vision Science ◦  Retinal Imaging ◦  Corneal Ablation

!  Laser Communication ◦  Point To Point Secure Communication ◦  Holographic Waveform Coding

!  Astronomy ◦  Extreme AO ◦  Terrestrial Planet Finder

!  Consistent Development program for MEMSCAP

Star

Planet

Visible Nulling Coronagraph for Terrestrial Planet Finder

Deformable mirror

Electrostatically actuated

diaphragm Attachment post

Membrane mirror

Images from Scanning Ophthalmoscopes

20 May 16 MEPTEC MEMS Symposium

Cheaper and Faster To Market

Process Type Proof of Principle Prototyping Pre-Production Production

Custom Process $$$$$$ $$$$$ $$$$$ $$$$

Standard Process $ $ $$$$ $$$

Custom Process 6-12 months 12 months 9 months

Standard Process 3 months 6-9 months 6 months

Standard Processes

! CAD tools for MEMS can be effective for standard processes

! Design Rules allow checks of manufacturability

! Allow simulation of designs before fab

! Many runs of same process ->statistical analysis

22 May 16 MEPTEC MEMS Symposium

!  MEMS  packaging  not  trivial  issue  !  Packaging  is  a  major  part  of  the  cost.    !  Generic  MEMS  packaging  nonexistent  

!  Each  system  is  a  custom  package  

!  Packaging  may  impact  system  performance  !  Viscous  damping  of  moving  parts  

!  Vacuum  packaging  may  be  desirable  

!  Failure  due  to  moisture    -­‐>  s8c8on  

!  Package  strain  on  piezoresis8ve  or  membrane  devices  

!  Thermal  impact  on  op8cal  systems  

Slides courtesy Simon Fraser University

23 May 16 MEPTEC MEMS Symposium

!  MEMS scanning micro-mirror !  Electrostatic actuation controls

movement along short axis !  Electromagnets control actuation

along the long axis. !  Precise alignment between bottom

stator and top rotor.

Maradin Ltd. Tel. +972 (4) 6273653 E-Mail: Info@maradin.co.il www.maradin.co.il

24 May 16 MEPTEC MEMS Symposium

Custom Products BU MEMSCAP, Inc.

Highly Experienced MEMS Foundry Over 20 years •  MCNC-Cronos-JDSU-

MEMSCAP

All major MEMS processes on

6” toolset 7000 ft2 of cleanroom

space 3000 ft2 of test space

Mature ISO Program

25 May 16 MEPTEC MEMS Symposium

•  Deposition –  Low Stress Nitride –  Low Stress Poly-Silicon –  Thermal and Low Temperature Oxides –  Phosphosilicate Glass (PSG) –  Anneals

•  Lithography –  Projection Alignment –  Contact Alignment –  Front/Back Alignment –  Wafer Bonding –  Photo-mask Layout and Fab

•  Post Processing –  Wafer Probe –  Dicing –  Die Bonding –  Wire Bonding –  CO2 and HF Release –  Pick / Place

MEMSCAP Process Capabilities •  Wafer Bonding

–  Silicon-Silicon, Silicon-Glass, Silicon-Metal Eutectic, Metal-Metal Eutectic

•  Etching –  Deep RIE – Silicon –  RIE – Poly-Silicon –  RIE – Dielectrics –  Wet – KOH, HF Vapor Phase

•  Metallization –  Evaporative – Lift-Off, Planetary Electroplating –  Sputter – DC, RF, RF-Biased

•  Metrology –  SEM Measurements and Analysis –  Film: Stress, Thickness, Resistivity –  Profilometry –  Interferometry –  Infrared Inspection –  Parametric In-Line Testing

26 May 16 MEPTEC MEMS Symposium

Product Development in U.S.

Lambda Router VOA MAG OXC

Pre-MEMSCAP

2x2 Switch

MEMSCAP Foundry

Mag Switch Endosure™ Deformable Mirrors

VOA