Nanotechnology to produce Light Emitting Diodes (LED) and Solar Cells

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Nanotechnology to produce Light Emitting Diodes (LED) and Solar

Cells

Nanotechnology to produce Light Emitting Diodes (LED) and Solar

Cells

Prof. Dr. M. Heuken, AIXTRON AG,

Fon: +49 (241) 8909-154, Fax: +49 (241) 8909-149, Email: M.Heuken@AIXTRON.com

RWTH Aachen, University of Technology , Templergraben 55,D-52074 Aachen, Germany

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ContentContent

�Motivation and Company Profile

�Some Nanotechnology � Light Emitting Diodes (LED),� High Efficient Solar Cells� OLED and Displays

�Conclusion

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High Brightness LED Market ForecastHigh Brightness LED Market Forecast

0

1.000

2.000

3.000

4.000

5.000

6.000

7.000

8.000

9.000

10.000

2008 2009 2010 2011 2012

Mar

ket S

ize

(US

D m

illio

n)

Signs / Displays Mobile Appliances

Signals Automotive

Illumination Electronic equip. / Other

17%

42%

1%

15%

9%

16%

33%

24%1%

13%

16%

13%

HB LED summary forecast by application 2008

2012

Source: Strategies Unlimited 2009; AIXTRON Estimates 2 009

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Compound Semiconductor, July,2003, (Nichia)

White LED with Phosphor ConverterWhite LED with Phosphor Converter

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(Processed, not diced)

MQW Based Blue and Green LEDMQW Based Blue and Green LED

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Illustration of the structure and key growth conditions for thegrowth of the demonstration LED structureIllustration of the structure and key growth conditions for thegrowth of the demonstration LED structure

� Temperatures were 530ºC, 1040ºC and 925ºC for the GaN nucleation layer, high temperature GaN layers and p-GaN respectively.

� The MQWs were grown using QW temperatures of ~740ºC for blue (470nm) and ~690ºC for green (535nm). In both cases the barriers were grown 120ºC above the QW temperature.

� The process was transferred from 2” to 3” by only adjusting temperatures to compensate for the increased wafer thickness and different thermal contact due to the increased wafer bow. No structural changes were introduced to achieve the uniformity presented.

Growth pressure

Sapphire ~560µm

(0.3deg off-cut from 0001)

4µm Undoped GaN

2µm GaN:Si(5x1018)

3x InGaN QWs (2.5nm) + GaN:Si(5x1017) QBs (12nm)

~25nm GaN Nucleation layer900mbar

400mbar

200mBar 140nm GaN:Mg 2x InGaN QWs (2.5nm)+ undoped GaN QBs (12nm)

10nm GaN:Mgheavily doped

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Gas Phase DepositionGas Phase Deposition

Material Engineering on an Atomic Scale

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Crius in the IC systemCrius in the IC system

� The Integrated Concept (IC) design offers a common platform for AIXTRON CRIUS® Close-Coupled-Showerhead and Planetary Reactor®systems. It is optimized for low CoOand features digital control and component standardization.

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Mean on-wafer σσσσ = 2.9nmWafer-to-wafer σσσσ = 1.4nm

No edge exclusion

12x3” CP Wavelength Uniformity Green LED12x3” CP Wavelength Uniformity Green LED

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13%

6%

64%

17%

Based on VLSI RESEARCH Inc. 2008

14%4%

20%

62%

Global MOCVD Market SharesGlobal MOCVD Market Shares

Veeco

Others

Nippon Sanso

AIXTRON

2007Total: $289m

2005Total: $156m

2006Total: $202m

10%2%

70%

18%

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Looking Forward: Future Energy SupplyLooking Forward: Future Energy SupplyPossible Scenario for Europe in 2050

solar power plants

Key-Technology: Highly efficient III-V concentrator cells…Key-Technology: Highly efficient III-V concentrator cells…

solar cells on every roof

Prim

ary

ener

gy u

se E

J/a

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Pow

er d

ensi

ty [W

/m²µ

m]

Multiple cell arrangement allowsbetter usage of full solar spectrum

Why III-V Concentrator Cells?Why III-V Concentrator Cells?

Theoretical limits of • Tandem cells 45.3%• Triple cells 51.2%• Quadruple cells 54.9%

nmnmBest values for •mono-Si: 24,7%•multi-Si: 20,3%•a-Si/µm-Si: 11,7%•CIGS: 18,4%•CdTe: 16,5%

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Why III-V Concentrator Cells?Why III-V Concentrator Cells?

Source:Takashi TomitaCorporate Executive DirectorSHARP CORPORATION

III-V Concentrator Cell Systems ideal for areas wit h high direct sun irradiation:

� Mediterranean Area � North Africa � South Australia � California

� Gulf Region

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- thin- light- flexible- bendable- full color- power efficient- high resolution- wide viewing angle

OLEDs create new display possibilitiesOLEDs create new display possibilities

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OLED end device technologies

� Samsung 31 inch� Samsung 31 inch

Sony 11 inch TV

Sony 11 inch TV

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Glass

ITO (transparent anode)

Hole transportation layer

Emitting layer

Electron transportation layerLiF

Aluminium (cathode)

Light

h+

e-

Amorphous solid – organic glass• frozen liquid / irregular packing• localized states (on one molecule)• weak interaction between molecules

N

NN

Ir

NN

N

NN

CH3

CH3

CH3

TPD

TAZ

Motivation and BasicsWhat is an OLED?Motivation and BasicsWhat is an OLED?

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400 x 400 mm²

Gen2

150 x 150 mm²

Gen1

Scaling to larger Mother GlassScaling to larger Mother Glass

* AIXTRON proprietary

100 x 100 mm²

R&D

Gen3.5650 x 730 mm²

Gen4920 x 730 mm²

Close Couple Showerhead (CCS) Technology*

Two dimensional scaling of process chamber

Process compatibility between Generations

No increase in source Temperature

Gen51300 x 1100 mm²

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ConclusionsConclusions

� Nanotechnology is part of many opto-electronicsystems

� AIXTRON builds systems for electronic and optoelectronic devices using Nanotechnology

� Nanotechnology in LED and solar represent a „green“ technology

� Future economic success based on R&D effort and new ideas

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6 inch LED wafer6 inch LED wafer

Thank You forYour Attention!Thank You for

Your Attention!

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