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The world leader in serving science
Paul VoelkerVertical Marketing Manager– Environmental & Industrial MarketsThermo Fisher Scientific, Sunnyvale, CA
Marc Plante, PhDSenior Applications ScientistThermo Fisher Scientific, Chelmsford, MA
Stewart FairlieStaff EngineerSeagate Technologies, Bloomington, MN
A Comparative Analysis of Semiconductor Electroplating Bath Additives by CVS and HPLC
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Agenda
• Overview — Plating Baths and HPLC• Determination of Accelerator and Suppressor by HPLC and
Charged Aerosol Detection• Sample Preparation, Calibration, Measurements
• Comparisons to CVS data
• Determination of Accelerator and Leveller by HPLC and Electrochemical Detection (ECD) • Coulometric Detection Mechanism and Design
• Calibration and Measurements
• Nickel Additives, Saccharin and Sodium Alkylsulfate • Gage Study Results• Conclusions
3
Electroplating Bath Workflows
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Electroplating for Electronic Packaging
• Modern Electroplating Issues• Circuit density is increasing
• Uniform plating processes improves product quality, yield, and performance
• High yields are desired to provide decent commercial profitability
• Current metrology (CVS) does not offer full quantitative informationand takes significant time to complete
CVS provides an indirect bath measurement since it measures the “combined” effect of the additives and by-products on the plating quality
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An Analytical Challenge
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Chromatographic Overview — Additives
• Copper plating baths are comprised of an aqueous solution of• Copper sulfate and sulfuric acid
• Accelerator solution — a sodium (bis sulfoalkyl) disulfide
• Suppressor solution — a polyalkenylglycol
• Leveller solution – a nitrogen or sulfur-containing molecule or high molecular weight polymer
• Nickel plating bath additives• Sodium alkylsulfate (SAS)
• Saccharin
• Methods consist of reverse phase and ion-paring HPLC
7
High-Performance Liquid Chromatography (HPLC)
Mobile Phase
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Agenda
• Overview — Plating Baths and HPLC• Determination of Accelerator and Suppressor by HPLC and
Charged Aerosol Detection• Sample Preparation, Calibration, Measurements
• Comparisons to CVS data
• Determination of Accelerator and Leveller by HPLC and Electrochemical Detection (ECD) • Coulometric Detection Mechanism and Design
• Calibration and Measurements
• Nickel Additives, Saccharin and Sodium Alkylsulfate • Gage Study Results• Conclusions
9
The Determination of
Accelerator and Suppressor
by HPLC and Charged Aerosol Detection
Thermo Scientific™ Dionex™ Corona™ Veo™ Charged Aerosol Detector
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Charged Aerosol Detection — Schematic
• Non- and semi-volatile analyte down to low nanograms on column
• Lacking a chromophore
• In use since 2004
• The Corona Veo RS detector provides linear calibration fits, needed for suppressor quantitation
1
2
3
4
5
6
7
89
101
2
3
4
5
6
7
89
10
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Sample Preparation and Measurement
• Since acid-copper samples are too acidic to be measured directly, samples are neutralized with N,N-dimethylaminoethanol (DMEA) to a pH between 2 and 4
• Instrument is calibrated using standards that are diluted in matrix and neutralized around targeted concentrations
• Samples are injected on to the HPLC instrument for analysis
• Results are obtained by comparing sample peak area against calibration curve
12
HPLC System: Thermo Scientific™ Dionex™ UltiMate™ 3000 RSLC, dual gradient, one 6-port valve
HPLC Software: Thermo Scientific™ Dionex™ Chromeleon™ Chromatography Data System (CDS) 7.2 SR 1
HPLC Column: Thermo Scientific™ Accucore™ C18, 2.6 µm, 3.0 x 150 mmMobile Phase A: 10 mM Diethylamine* / Acetic Acid in Water, pH 5-6Mobile Phase B: MethanolMobile Phase C: n-PropanolDetector: Corona Veo RS
Filter: 3.6 sPower Function: 2Evap. Temp.: 50 °C
Sample Temperature: 20 °CFlow Rate Pump: 1.0–1.2 mL/minColumn Temperature: 40 °CInjection Volume: 50 µL
Sample Preparation: 980 µL Sample + 20 µL DMEA, cap, and shake.
* Diethylamine, Ethylamine, and Dimethylamine, can be used as ion-pairing, depending on desired retention.
Method Conditions – Accelerator & Suppressor
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Method Conditions – Corona Veo Detector
Flow Gradient:Valve Control:Time
(min)Flow
(mL/min)%A %B %C
-5.0 1.0 98.0 2.0 0.0
1.0 1.0 98.0 2.0 0.0
3.0 1.0 98.0 2.0 0.0
3.8 1.2 15.0 85.0 0.0
4.5 1.2 13.0 87.0 0.0
5.5 1.2 10.0 0.0 90.0
7.0 1.2 0.0 0.0 100.0
8.0 1.2 0.0 0.0 100.0
10.0 1.2 0.0 0.0 100.0
10.0 1.2 98.0 2.0 0.0
11.0 1.0 98.0 2.0 0.0
Time (min)
Detector Valve
Right Valve
Initial On 1-2
2.00 Off 6-1
4.00 On
Control of the organic solvent content controls elution of the additives from the HPLC column.
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4.7 4.8 5.0 5.2 5.4 5.6 5.8 6.0 6.2 6.4 6.6 6.8 7.0 7.2 7.4 7.6-1.0
-0.5
0.0
0.5
1.0
1.5
2.0
2.5
3.0
3.5
4.0
4.5
5.0
9 - Accelerator - 5.576
12 - Suppressor-1 - 7.316
min
pA
6.25 %-Nominal
Accelerator and Suppressor Overlays
4.75 5.00 5.25 5.50 5.75 6.00 6.25 6.50 6.75 7.00 7.25 7.50 7.75 8.00 8.25 8.50 8.758.88 -6 0
10
20
30
40
50
60
70
80
90
100
110
120
130
140
150154
1 - Accelerator - 5.578
2 - Suppressor - 5.922
3 - Suppressor-1 - 7.281
min
pA
Triplicate injections at six concentrations.
200 %-Nominal
100 %-Nominal
50 %-Nominal
25 %-Nominal
12.5 %-Nominal
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Calibration Curves — Accelerator
Linear fit, R2 = 0.999
Each standard injected in triplicate.
Conc.(mL/L)
%RSD
20 0.44
10 1.09
5 1.36
2.5 0.28
1.25 0.97
0.625 2.35
Accelerator External CAD_1
%-Nominal
pA*min
0 20 40 60 80 100 120 140 160 180 200 220 2400.0
0.2
0.4
0.6
0.8
1.0
1.2
1.4
1.6
1.8
2.0
2.2
2.4
2.6
2.8
3.0
3.2
3.4
3.6
3.8
4.0
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Calibration Curves – Suppressor
Linear fit, R2 = 0.998
Each standard injected in triplicate.
Conc.(mL/L)
%RSD
20 0.22
10 0.20
5 0.87
2.5 0.27
1.25 0.14
0.625 0.03
Suppressor (Suppressor-1) External CAD_1
%-Nominal
pA*min
0 20 40 60 80 100 120 140 160 180 200 220 2400.00
1.25
2.50
3.75
5.00
6.25
7.50
8.75
10.00
11.25
12.50
13.75
15.00
16.25
17.50
18.75
20.00
21.25
22.50
23.75
25.00
26.25
27.50
28.75
30.00
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Bath Samples at 0, 5, 12, 20, and 25 Ah/L
4.75 5.00 5.25 5.50 5.75 6.00 6.25 6.50 6.75 7.00 7.25 7.50 7.75 8.00 8.25 8.50 8.88 -6 0
10
20
30
40
50
60
70
80
90
100
110
120
130
140
150154
1 - Accelerator - 5.578
2 - Suppressor - 5.922
3 - Suppressor-1 - 7.281
min
pA
0 Ah/L
5 Ah/L
12 Ah/L
20 Ah/L25 Ah/L
• Amount of accelerator and high molecular weight suppressor decrease with amount of applied current
• Amount of low molecular weight suppressor degradents increases with amount of applied current
Degradents
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Suppressor Degradation
0 5 10 15 20 25 300%
5%
10%
15%
20%
25%
30%
35%
40%
45%
Usage (Ah/L)
Re
l. M
as
s S
up
pre
ss
or
De
gra
da
nts
Suppressor quality can be measured by HPLC as a fraction of smaller molecular weight analytes—peak areas of earlier eluting suppressor.
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Comparison Between HPLC and CVS Results
• Additives decrease with bath usage
• HPLC measures quantities of additives and some degradants, separately
• CVS measures activities of additives
y = 3.1225x -203.59R² = 0.8612
0
2
40
60
80
100
120
140
0 20 40 60 80 100 120
HP
LC
Va
lue
(%
-No
min
al)
CVS Value (%-Nominal)
Suppressor HPLC vs. CVS Data
y = 1.6736x -98.883R² = 0.9799
0
15
30
45
60
75
90
105
120
135
0 30 60 90 120 150 CVS Value (%-Nominal)
Accelerator HPLC vs. CVS
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HPLC or CVS?
• HPLC methods can run between 16 – 30 minutes, per sample total time• CVS methods can take 2- 6 hours, depending on number of additives
• HPLC methods separate and quantify additives• CVS methods provide composite results of all additives added to a
sample, requiring iterative measurements
• HPLC methods can also determine some degradents, measured separately from actual additives• CVS methods do not distinguish between additive and degradent
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Agenda
• Overview — Plating Baths and HPLC• Determination of Accelerator and Suppressor by HPLC and
Charged Aerosol Detection• Sample Preparation, Calibration, Measurements
• Comparisons to CVS data
• Determination of Accelerator and Leveller by HPLC and Electrochemical Detection (ECD) • Coulometric Detection Mechanism and Design
• Calibration and Measurements
• Nickel Additives, Saccharin and Sodium Alkylsulfate • Gage Study Results• Conclusions
22
Determination of Accelerator and Leveller by
HPLC and Electrochemical Detection
Thermo Scientific™ Dionex™ UltiMate™ 3000 ECD-3000RS Electrochemical Detector
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Electrochemical Detection
• Accelerator and leveller are electrochemically active to oxidation and ECD is a suitable means of detection
• The accelerator disulfide bond is oxidizable• The leveller, typically an amine molecule / polymer, often
used in very low concentrations.• Levellers are typically electrochemically
active and most are retained on reversed phase HPLC columns
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Flow
A
AB
B
A AA
A
AA
A
AA
AAA
AA
B
BB
B B BBBB
BBBB
B
B
B
B
A
A
A
AB
AB
A B + e-
Electrochemistry – Coulometric Cell
• A coulometric sensor is a highly efficient type of amperometric sensor in which ~100% of the analyte undergoes electrolysis Lacking a chromophore
• With 100% electrolysis, the peak area is related to the quantity of sample injected by Faraday’s law: Q=nFN
Q = charge transferred (current over time – peak area)
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Coulometric electrodes are both sensitive and, when used in series, selective.
Leveller typically detected on E1 at +650 mV,Accelerator on E2 at +900 mV
E1 E2
A P
A B Q
B Q
Flow
B Q + e-
E2E1A P + e-650
mV900 mV
P
P
P PP
PB
B Q QB
B
B
B
Electrochemistry – Serial Coulometric Electrodes
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Leveller – Standards by HPLC-ECD, 10 – 200% Nominal Concentration
5.66 5.80 6.00 6.20 6.40 6.60 6.80 7.00 7.20 7.40 7.60 7.80 8.00 8.20 8.40 8.60 8.80 9.00 9.20 9.34-0.90.0
2.0
4.0
6.0
8.0
10.0
12.0
14.0
16.0
18.0
20.0
22.0
24.0
26.0
28.0
30.0
32.0
34.0
36.0
38.1
2 - Leveller - 7.030
min
µA
The leveller is a polymeric amine with oxidizable groups and detectable at +650 mV
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Leveller by ECD
• Correlation is linear from 10-200% nominal
• R2 = 0.9945
%-Nominal Conc.
Replicates, n
%RSD
200 3 4.9
150 3 3.6
100 5 6.2
75 3 3.5
50 3 5.2
25 3 11.0
10 3 18.6
Leveller External ECD_1
µA*min
0 20 40 60 80 100 120 140 160 180 200 2200.00
0.10
0.20
0.30
0.40
0.50
0.60
0.70
0.80
0.90
1.00
1.10
1.20
1.30
1.40
1.50
1.60
1.70
1.80
1.90
2.00
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Accelerator by HPLC-ECD with Usage
Detecting accelerator by ECD is an orthogonal measurement to the Corona detector.
Degradant (inset) increases with bath operation.
2.00 2.50 3.00 3.50 4.00 4.50 5.00 5.50 6.00 6.50 7.00 7.50 8.00 8.50 9.00-40
-20
0
20
40
60
80
100
120
140
160
180
200
220
240
260
280
300
320
340
360
380
400
420
440
460
480
500
1 - Accelerator - 3.558
min
µA
Degradant
4.9335.000 5.125 5.250 5.375 5.500 5.625 5.750 5.875 6.000 6.144-16
-10
0
10
20
30
40
50
60
70
80
90
100104
min
µA
25 Ah/L20 Ah/L12 Ah/L
5 Ah/L
0 Ah/L
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Accelerator by Charged Aerosol Detection and ECD
Two measurements trend well, providing similar values.
Correlation Coefficient of ECD vs. Charged Aerosol Detection was 0.9661 0
5
10
15
20
25
30
35
40
45
0 5 10 15 20 25 30
Acc
eler
ato
r (M
ass)
Usage (Ah/L)
Accelerator – Charged Aerosol Detection Accelerator – ECD
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Agenda
• Overview — Plating Baths and HPLC• Determination of Accelerator and Suppressor by HPLC and
Charged Aerosol Detection• Sample Preparation, Calibration, Measurements
• Comparisons to CVS data
• Determination of Accelerator and Leveller by HPLC and Electrochemical Detection (ECD) • Coulometric Detection Mechanism and Design
• Calibration and Measurements
• Nickel Additives, Saccharin and Sodium Alkylsulfate • Gage Study Results• Conclusions
31
HPLC Method Conditions – Nickel additives
HPLC System:Column:
UltiMate 3000 RS with dual-gradient pumpThermo Scientific™ Acclaim™ Surfactant Plus 3 µm, 3.0 x 100 mm
Eluents: A: 100 mM Ammonium acetate in DI Water, pH 5.4 with acetic acidB: Acetonitrile
Column Temperature: 30°CInjection volume: 10.0 LDetector 1: DAD, 230 nmDetector 2: Corona Veo RS Filter: 3.6 s Power Function: Data Rate:Sample Preparation:
1.0010 Hzneat
Gradient:Time (min)
Flow (mL/min)
%A %B
-5 1 98 2
0 1 98 2
15 1 5 95
20 1 5 95
20 1 98 2
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HPLC-Charged Aerosol Detection Chromatogram, Saccharin & SAS
0.0 1.0 2.0 3.0 4.0 5.0 6.0 7.0 8.0 9.0 10.0 11.0 12.0 13.0 14.0 15.0 16.0 17.0 18.0 19.0 20.0
-50
0
50
100
150
200
250
300
350
1 - 0.532
2 - 1.199
3 - 10.647
min
pA
-
SAS
Saccharin2 – 2.935
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Nickel Additives by HPLC
For simplicity, the same mobile phases and columns used for copper additives by Charged Aerosol Detection can be used for saccharin and SAS determinations for nickel additives, but gradient conditions may need to be adjusted.
Saccharin and its degradents absorb UV well at 230 nm, but SAS does not absorb.
34
Saccharin Impurities by HPLC-UV
0.06 1.00 2.00 3.00 4.00 5.00 6.00 7.00 8.00 9.11 - - -
min
mAU
Saccharin
Impurity 1
Impurity 2
Degradents ?
Degradents
153
140 130 120 110 100 90 80 70 60 50 40 30 20 10 0
10 20 26
Use of UV (230 nm) can be used to measure impurities in nickel plating baths. Sample in blue, standards in black. Some may be too volatile for Charged Aerosol Detection.
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Agenda
• Overview — Plating Baths and HPLC• Determination of Accelerator and Suppressor by HPLC and
Charged Aerosol Detection• Sample Preparation, Calibration, Measurements
• Comparisons to CVS data
• Determination of Accelerator and Leveller by HPLC and Electrochemical Detection (ECD) • Coulometric Detection Mechanism and Design
• Calibration and Measurements
• Nickel Additives, Saccharin and Sodium Alkylsulfate • Gage Study Results• Conclusions
36
Gage Capability
• One gage study was performed for saccharin in a nickel plating bath.
• Two gage studies were performed to determine the capability of the method to reliably determine quantities of accelerator and suppressor in acid-copper baths.
• Gage results are a measure of Standard Variance relative to Tolerance, or SV/T.
• Values of SV/T < 30% show capability. • Values of SV/T < 7% show superior capability.
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Gage Results – Nickel Additives
HPLC-UV
SaccharinSV/T = 10.56%
SaccharinSV/T = 5.48%
SAS by HPLC-Charged Aerosol Detection had an SV/T value of 4.5%. No test for SAS was used previously.
Previous Metrology
38
Gage Study – Accelerator by CVS and Electrochemical Detection
Two CVS experiments showed SV/T of 35.84 – 44.90%.
The HPLC-Electrochemical Detection experimental result showed excellent capability, with an SV/T value of 9.69%
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Gage Study – Suppressor by CVS and HPLC-Charged Aerosol Detection
Two CVS experiments showed SV/T of 74 and 79%.
The HPLC-Charged Aerosol Detection experimental result showed acceptable capability, with an SV/T value of 19%
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Conclusions
• The current methods are gage-capable, and are able to quantify the organic additives in both copper and nickel plating chemistries
• The methods require minimal sample preparation, which may only be acid-neutralization
• Analyses are shorter in time, and results are more accurate and reliable than by traditional CVS metrology
• Methods are automated, meaning engineers are free for other important work
• Better results means better efficiency