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A Living Roadmap for Semiconductors October 4, 2000 SRC Review. Andrew B. Kahng UCSD CSE and ECE Departments* [email protected] * effective January 1, 2001. Outline. The Design Technology Gap and the GSRC C.A.D. Theme On Roadmaps - PowerPoint PPT Presentation
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A Living Roadmap for Semiconductors A Living Roadmap for Semiconductors October 4, 2000 SRC Review Andrew B. Kahng UCSD CSE and ECE Departments* [email protected] * effective January 1, 2001
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Page 1: A Living Roadmap for Semiconductors October 4, 2000 SRC Review

A Living Roadmap for SemiconductorsA Living Roadmap for Semiconductors

October 4, 2000 SRC Review

Andrew B. KahngUCSD CSE and ECE Departments*

[email protected]

* effective January 1, 2001

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OutlineOutline

The Design The Design TechnologyTechnology Gap and the GSRC C.A.D. Theme Gap and the GSRC C.A.D. Theme On RoadmapsOn Roadmaps The GSRC Technology Extrapolation (GTX) System: The GSRC Technology Extrapolation (GTX) System:

Toward a Living RoadmapToward a Living Roadmap A Living Roadmap for Semiconductors (and Design)A Living Roadmap for Semiconductors (and Design)

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Motivation: The Design Motivation: The Design TechnologyTechnology Gap Gap

Design Productivity Gap Design Productivity Gap Well-documented, threatens quality and value of designsWell-documented, threatens quality and value of designs huge cost to semiconductor industryhuge cost to semiconductor industry

Most research: change the Design Problem, invent new algorithms... Most research: change the Design Problem, invent new algorithms...

Premise of MARCO GSRC “Calibrating Achievable Design” Theme: Premise of MARCO GSRC “Calibrating Achievable Design” Theme: Design Productivity GapDesign Productivity Gap == == Design Technology Productivity GapDesign Technology Productivity Gap

Problem: Must improve Time-To-Market and Quality-of-Result for Problem: Must improve Time-To-Market and Quality-of-Result for Design Design TechnologyTechnology

Goal: improve CAD Industry Productivity by changing how we Goal: improve CAD Industry Productivity by changing how we specifyspecify, , developdevelop, and , and measuremeasure andand improveimprove Design Technology Design Technology

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Facets of the Design Technology GapFacets of the Design Technology Gap FacetsFacets

No clear industry-wide R&D agendaNo clear industry-wide R&D agenda Time-to-Market: 5-7 years to get a leading-edge algorithm into production EDA Time-to-Market: 5-7 years to get a leading-edge algorithm into production EDA

designers battle today’s design problems with yesterday’s design technologydesigners battle today’s design problems with yesterday’s design technology QOR: difficult to evaluate impact of new tools on overall design process QOR: difficult to evaluate impact of new tools on overall design process QOR: published descriptions insufficient for replication or even comparison of QOR: published descriptions insufficient for replication or even comparison of

algorithmsalgorithms CAD R&D cannot CAD R&D cannot identifyidentify, , evaluateevaluate or or reusereuse the CAD technology leading edge the CAD technology leading edge

research and innovation stallresearch and innovation stall CausesCauses

Lack of clear roadmapping for Design Technology w.r.t. ITRS, application marketsLack of clear roadmapping for Design Technology w.r.t. ITRS, application markets Lack of “Foundation CAD-IP”: Lack of “Foundation CAD-IP”: interoperableinteroperable, , reusablereusable, , commoditycommodity infrastructure infrastructure Lack of resources, and relative over-resourcing of non-strategic, de facto Lack of resources, and relative over-resourcing of non-strategic, de facto

commodity technologycommodity technology Lack of standard metrics, benchmarks for Design TechnologyLack of standard metrics, benchmarks for Design Technology More maturity needed w.r.t. control, strategic-vs-commodity distinction, etc.More maturity needed w.r.t. control, strategic-vs-commodity distinction, etc.

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Goal: Improved Design Goal: Improved Design TechnologyTechnology Productivity Productivity The GSRC C.A.D. Theme promotes mature, coopetitive cultures and shared, The GSRC C.A.D. Theme promotes mature, coopetitive cultures and shared,

open infrastructures that lead to improved open infrastructures that lead to improved creationcreation of design technology of design technology Improved vision and design technology planning (Improved vision and design technology planning (“specify”“specify”): ):

What will the design problem look like? What do we need to solve?What will the design problem look like? What do we need to solve?

Improved execution (Improved execution (“develop”“develop”): ): How can we quickly develop the right design technology (TTM)?How can we quickly develop the right design technology (TTM)?

Improved measurement (Improved measurement (“measure“measure andand improve”improve”):): Did we solve the problem (QOR)? Did the design process improve? Did we Did we solve the problem (QOR)? Did the design process improve? Did we

increase the envelope of achievable design?increase the envelope of achievable design?

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““A Vision of the Future”A Vision of the Future” Improved vision and design technology planning (“specify”): Improved vision and design technology planning (“specify”):

What will the design problem look like? What do we need to solve?What will the design problem look like? What do we need to solve? Accurate roadmapping for Design (and Process) Technology (“Living Roadmap”)Accurate roadmapping for Design (and Process) Technology (“Living Roadmap”)

1.5x more focused R&D resources1.5x more focused R&D resources

Improved execution (“develop”): Improved execution (“develop”): How can we quickly develop the right design technology (TTM)?How can we quickly develop the right design technology (TTM)?

Reusable, commodity, Foundation CAD-IP (+ academic publication standards)Reusable, commodity, Foundation CAD-IP (+ academic publication standards) reduce TTM to 2-3 yrs, 2x better leveraged R&D and academic resources, 2x increase in “searched reduce TTM to 2-3 yrs, 2x better leveraged R&D and academic resources, 2x increase in “searched

solution space” (mix-and-match flow optimizations)solution space” (mix-and-match flow optimizations)

Improved measurement (“measure and improve”):Improved measurement (“measure and improve”): Did we solve the problem (QOR)? Did the design process improve? Did we increase the envelope of Did we solve the problem (QOR)? Did the design process improve? Did we increase the envelope of

achievable design?achievable design? Design tool/process metrics, design process instrumentation and CPIDesign tool/process metrics, design process instrumentation and CPI

1.5x increase in “searched solution space” (flow and process optimizations)1.5x increase in “searched solution space” (flow and process optimizations)

Design Technology Productivity improves Design ProductivityDesign Technology Productivity improves Design Productivity

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OutlineOutline

The Design The Design TechnologyTechnology Gap and the GSRC C.A.D. Theme Gap and the GSRC C.A.D. Theme On RoadmapsOn Roadmaps The GSRC Technology Extrapolation (GTX) System: The GSRC Technology Extrapolation (GTX) System:

Toward a Living RoadmapToward a Living Roadmap A Living Roadmap for Semiconductors (and Design)A Living Roadmap for Semiconductors (and Design)

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What is Roadmapping? (Ideally...)What is Roadmapping? (Ideally...)

““Roadmapping drives development of (e.g., CAD) technology”:Roadmapping drives development of (e.g., CAD) technology”: System architects, designers, CAD managers use roadmaps to determineSystem architects, designers, CAD managers use roadmaps to determine

tough problemstough problems risks, …risks, …

EDA suppliers use roadmaps to determineEDA suppliers use roadmaps to determine R&D investmentR&D investment product pipelineproduct pipeline

Government and consortia use roadmaps to determine levels of investmentGovernment and consortia use roadmaps to determine levels of investment

““Roadmaps serve as a guide to the most promising directions, the Roadmaps serve as a guide to the most promising directions, the most critical problems”most critical problems”

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What is a Roadmap? (In reality...)What is a Roadmap? (In reality...) Self-fulfilling prophecy ?Self-fulfilling prophecy ?

Moore’s Law: (Circuits per chip) = 2(year-1975)/1.5 (Gordon Moore, 1975 IEDM) “More than anything, once something like this gets established, it becomes more or less a self-fulfilling

prophecy. The Semiconductor Industry Association puts out a technology road map, which continues this generation [turnover] every three years. Everyone in the industry recognizes that if you don't stay on essentially that curve they will fall behind. So it sort of drives itself.” (Gordon Moore, 1996)

Always wrong, yet comprised of meta-laws ?Always wrong, yet comprised of meta-laws ? Reasons for Moore’s Law (1975): die size growth, feature size decrease, circuit/device cleverness

Gordon Moore, 1975: "There is no room left to squeeze anything out by being clever. Going forward from here we have to depend on the two size factors - bigger dice and finer dimensions.” (Gordon Moore, 1995)

Geopoliticoeconomic ?Geopoliticoeconomic ? QUIZ: Rank the following four regions by decreasing order of aggressiveness in feature size:

United States, Japan, Europe, East Asia

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What is a Roadmap? (In reality...)What is a Roadmap? (In reality...)

SensitiveSensitive Example 1: Cell Area Factor for memory

Scenario 1: 8x/1999 2.5x/2014 Scenario 2: 8x/1999 4x/2016

Example 2: Litho Field Size Maximum Limit Scenario 1: 4x magnification, 6-inch reticle (800mm2 intro, 400 mm2 production) Scenario 2: 5x magnification, 6-inch reticle (572mm2 intro, 286 mm2 production)

Example 3: L2 Cache Size for High-Perf MPU (baseline of ramp going forward) Scenario 1: 2MB on-chip 6t SRAM 170mm2 core + 280mm2 SRAM = 450mm2 in 1999 Scenario 2: 1MB on-chip 6t SRAM 170mm2 core + 140mm2 SRAM = 310mm2 in 1999

QUIZ: By what factor will the high-performance MPU transistor count at the end of the Roadmap change if we switch between Scenario 1 and Scenario 2 ?

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What is a Roadmap? (In reality...)What is a Roadmap? (In reality...) Always evolvingAlways evolving

In: gate length “in resist” vs. “physical”, CMP dishing, SOC complexity, ...In: gate length “in resist” vs. “physical”, CMP dishing, SOC complexity, ... Out: NRE cost of logic (including design cost!), ...Out: NRE cost of logic (including design cost!), ... In flux : “in volume production”, “no known solution”, “high-perf MPU”, ...In flux : “in volume production”, “no known solution”, “high-perf MPU”, ...

Conflicted between Forecasts vs. Statements of NeedsConflicted between Forecasts vs. Statements of Needs “a statement of technology needs in various areas, driven by a forecast of lithography

capability” (D. Jensen, AMD) “a hybrid of the ‘most realistic aggressive’ targets, balanced by the tension created by the

‘red’ limits of ‘unknown solutions’” (A. Allan, Intel) Paralyzed by dependencies

“who owns #package pins/balls?” Test? Assembly/Packaging? Design? how does one go about changing a number, checking for interactions ?

Law of Roadmaps: If it’s worth roadmapping, it can’t be roadmapped.

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1994

19971998/1999

500

350

250

180

130

100

70

50

35

25

DRAM Half Pitch

MPU/ASIC Gate “Physical”

MPU/ASIC Gate “In Resist”

90

65

45

33

23

~.7x per technology node (.5x per 2 nodes)

Year of Production

and

MPU

/ASI

C G

ate

Leng

th M

inim

um F

eatu

re S

ize

(nm

)

Tech

nolo

gy N

ode

- DR

AM

Hal

f-Pitc

h (n

m)

Technology Node

Minimum Feature

[1.0][1.5][2.0]

Scenarios:

1695 97 99 01 04 07 10 13 16

95 97 99 01 04 07 10 13 16

ITRS AccelerationITRS Acceleration

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What Should a Roadmap Be? (More Practically...)What Should a Roadmap Be? (More Practically...)

Comprehensive and “best possible”Comprehensive and “best possible” RobustRobust Flexible and adaptiveFlexible and adaptive

““A Living Roadmap” ???A Living Roadmap” ???

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OutlineOutline

The Design The Design TechnologyTechnology Gap and the GSRC C.A.D. Theme Gap and the GSRC C.A.D. Theme On RoadmapsOn Roadmaps The GSRC Technology Extrapolation (GTX) System: The GSRC Technology Extrapolation (GTX) System:

Toward a Living RoadmapToward a Living Roadmap A Living Roadmap for Semiconductors (and Design)A Living Roadmap for Semiconductors (and Design)

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Technology ExtrapolationTechnology Extrapolation

Evaluates impact Evaluates impact ofof design technologydesign technology process technologyprocess technology

Evaluates impact Evaluates impact onon achievable designachievable design associated design problemsassociated design problems

What do we need to solve?What do we need to solve?

What will the design problem look like ?What will the design problem look like ?

== Roadmapping to drive Design Technology== Roadmapping to drive Design Technology

How and when do L, SOI, How and when do L, SOI, SER, etc. matter?SER, etc. matter?

What is the most power-efficient noise What is the most power-efficient noise management strategy?management strategy?

Will layout tools need to perform Will layout tools need to perform process simulation to effectively model process simulation to effectively model

cross-die and cross-wafer cross-die and cross-wafer manufacturing variation?manufacturing variation?

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Most commonly used optimal repeater sizing expression Most commonly used optimal repeater sizing expression (Bakoglu)(Bakoglu)

New study:New study: Sweep repeater size for single stage in the chain Sweep repeater size for single stage in the chain Examine both delay and energy-delay productExamine both delay and energy-delay product

Optimal Repeater SizingOptimal Repeater Sizing

in

DCRCRS

int

int

0 100 200 300 400 500

0.8

1.0

1.2

1.4

1.6

1.8

2.0

2.2

2.4

Bakogluoptimal sizing

Lseg = 2.14 mm W=S=1m W=S=0.5m

Crit

ical

Pat

h D

elay

(ns)

Repeater Size (X min size)

1

2

3

4

5

6

Norm

alized Energy-Delay Product

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Elastic scattering

Diffuse scattering

Effect of Electron ScatteringEffect of 5 nm Barrier• Conformal 5 nm barrier assumed• Even a 5 nm barrier will increase resistivity drastically

• No barrier assumed• Electron scattering increases resistivity• Lowering temperature has a big effect

525320250

95 58 48

280170133

ITRS 1999 Line width (nm)GlobalSemiglobalLocal

source: MARCO IFRC

Cu Resistivity: Effect of Line Width ScalingCu Resistivity: Effect of Line Width Scaling

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Technology Extrapolation TodayTechnology Extrapolation Today

Many RoadmapsMany Roadmaps ITRS, JISSO, STARC, … RoadmapsITRS, JISSO, STARC, … Roadmaps University tools: SUSPENS, GENESYS, RIPE, BACPAC, …University tools: SUSPENS, GENESYS, RIPE, BACPAC, … Industry tools: HIVE/AIM, ...Industry tools: HIVE/AIM, ...

ObservationsObservations everyone predicts “same” parameters but different assumptions, inputs: everyone predicts “same” parameters but different assumptions, inputs:

near-total duplication of effort !!!near-total duplication of effort !!! no documentation or visibility into internal calculationsno documentation or visibility into internal calculations ““hard-wired” hard-wired” cannot easily test other modeling choices cannot easily test other modeling choices missing: models of CAD tools and optimizations (what is really missing: models of CAD tools and optimizations (what is really

“achievable”?)“achievable”?) missing: scope, comprehensive coveragemissing: scope, comprehensive coverage

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FlexibilityFlexibility edit or define new parameters and relations between themedit or define new parameters and relations between them perform specific studies (but different studies at different times)perform specific studies (but different studies at different times)

QualityQuality continuous improvementscontinuous improvements world-wide participation of expertsworld-wide participation of experts

TransparencyTransparency open-source mechanismopen-source mechanism models visible to the usermodels visible to the user

No more redundant effortNo more redundant effort permanent repository of first choicepermanent repository of first choice adoptability and maintainabilityadoptability and maintainability

A A SharedShared Technology Extrapolation System Technology Extrapolation System

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GTX: GSRC Technology Extrapolation SystemGTX: GSRC Technology Extrapolation System GTX = framework for shared technology extrapolationGTX = framework for shared technology extrapolation ““Living Roadmap”: Repository, sanity-checker for 2001 Living Roadmap”: Repository, sanity-checker for 2001

ITRS renewal (via US Design TWG, (inter-) ITWG activity)ITRS renewal (via US Design TWG, (inter-) ITWG activity)

Open-source: http://vlsicad.cs.ucla.edu/GSRC/GTX/Open-source: http://vlsicad.cs.ucla.edu/GSRC/GTX/

Parameters (data)

Rules (models)

Rule chain (study)

Knowledge

Engine (derivation)

GUI (presentation)

ImplementationUser inputs

Pre-packaged

GTX

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Knowledge RepresentationKnowledge Representation

Human-readable ASCII grammarHuman-readable ASCII grammar

#rule #rule BACPAC_dl_chipBACPAC_dl_chip#description#description#output#outputdouble {m} dl_chipdouble {m} dl_chip;;

#inputs#inputsdouble {m^2} dA_chipdouble {m^2} dA_chip;;

#body #body sqrt(dA_chip)sqrt(dA_chip)#reference#reference#endrule#endrule

#parameter #parameter dl_chipdl_chip#type #type doubledouble#units {#units {mm}}#default#default1e-21e-2

#description#descriptionchip side lengthchip side length

#reference#reference#endparameter#endparameter

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Knowledge RepresentationKnowledge Representation

Human-readable ASCII grammarHuman-readable ASCII grammar

Benefits:Benefits: Easy creation/sharing of parameters/rules by multiple usersEasy creation/sharing of parameters/rules by multiple users

D. Sylvester and Y. Cao: device and power, SOI modules that “drop in” to GTXD. Sylvester and Y. Cao: device and power, SOI modules that “drop in” to GTX P.K. Nag: Yield modelingP.K. Nag: Yield modeling

Extensible to models of arbitrary complexity (specialized prediction Extensible to models of arbitrary complexity (specialized prediction methods, technology data sets, optimization engines)methods, technology data sets, optimization engines) Avant! Apollo or Cadence SE P&R tool: just another wirelength estimatorAvant! Apollo or Cadence SE P&R tool: just another wirelength estimator

Applies to any domain of work in semiconductors, VLSI CADApplies to any domain of work in semiconductors, VLSI CAD Transistor sizing, single wire optimizations, system-level wiring predictions,…Transistor sizing, single wire optimizations, system-level wiring predictions,…

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ParametersParameters Description of technology, circuit and design attributesDescription of technology, circuit and design attributes Importance of consistent naming cannot be overstatedImportance of consistent naming cannot be overstated

Naming conventions for parametersNaming conventions for parameters[<preposition>] _ <[<preposition>] _ <principalprincipal> _ {[> _ {[qualifierqualifier] _ <] _ <placeplace>} _ {<>} _ {<qualifierqualifier>} _ [<>} _ [<adverbialadverbial>] _ [<>] _ [<indexindex>] _ [<>] _ [<unitunit>]>]

Example:Example: rr__intint__tottot__lyrlyr__pu_dlpu_dlRequirements:Requirements:

Relatively easy to understand parameter from its nameRelatively easy to understand parameter from its name Distinguishable (no two parameters should have the same name)Distinguishable (no two parameters should have the same name)

r_int (interconnect resistance) = r_int (interconnect resistivity) ? Unique (no two names for the same parameter)Unique (no two names for the same parameter)

R_int = R_wire ? Sortable (important literals come first)Sortable (important literals come first)

Software to automatically check parameter namingSoftware to automatically check parameter naming

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RulesRules Methods to derive unknown from known parametersMethods to derive unknown from known parameters ASCII rulesASCII rules

Laws of physics, models of electrical behavior, statistical modelsLaws of physics, models of electrical behavior, statistical models Include closed-form expressions, vector operations, tablesInclude closed-form expressions, vector operations, tables Storing of calibration data (e.g., “technology files”) for known process and design Storing of calibration data (e.g., “technology files”) for known process and design

points in lookup tablespoints in lookup tablesConstraints, uConstraints, used to limit range during “sweeping”sed to limit range during “sweeping”

““External executable” rulesExternal executable” rules Assume a callable executable (e.g., PERL script)Assume a callable executable (e.g., PERL script) Use command-line interface and transfer through filesUse command-line interface and transfer through files Allow complex semantics of a ruleAllow complex semantics of a rule

““Code” rulesCode” rules Implemented in C++ and linked into the inference engineImplemented in C++ and linked into the inference engine

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Rule ChainsRule Chains ““Rule chains” guide inferenceRule chains” guide inference

Acyclic set of rules Acyclic set of rules Interactive specification and comparison of alternative modeling choicesInteractive specification and comparison of alternative modeling choices

StudiesStudies Input values + rules that makeInput values + rules that make

a rule chaina rule chain User-controlled and savableUser-controlled and savable ““Sweeping” of a rule chainSweeping” of a rule chain

Evaluation of all combinationsEvaluation of all combinationsof multi-valued inputsof multi-valued inputs

Example: clock frequency forExample: clock frequency fordifferent Rent exponents anddifferent Rent exponents andvarying logic depth varying logic depth

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GTX EngineGTX Engine

Contains no domain-specific knowledgeContains no domain-specific knowledge Evaluates rules in topological orderEvaluates rules in topological order Performs studiesPerforms studies Multiple values through “sweeping”Multiple values through “sweeping”

Runs on three platforms (Solaris, Windows and Linux)Runs on three platforms (Solaris, Windows and Linux)

URL: http://vlsicad.cs.ucla.edu/GSRC/GTX/URL: http://vlsicad.cs.ucla.edu/GSRC/GTX/

Parameters (data)

Rules (models)

Rule chain (study)

Knowledge

Engine (derivation)

GUI (presentation)

ImplementationUser inputs

Pre-packaged

GTX

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Graphical User Interface (GUI)Graphical User Interface (GUI)

Provides user interactionProvides user interaction

Visualization (plotting, printing, saving to file)Visualization (plotting, printing, saving to file)

4 views:4 views: ParametersParameters RulesRules Rule chainRule chain Values in chainValues in chain

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Change parameter values and observe resulting difference Change parameter values and observe resulting difference in outputsin outputs

Sensitivity Analysis of Cycle-time Models: Sensitivity Analysis of Cycle-time Models: Parameter SensitivityParameter Sensitivity

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Sensitivity Analysis of Cycle-time Models: Model Sensitivity Analysis of Cycle-time Models: Model SensitivitySensitivity Replace rule in a model’s rule chain by another model’s Replace rule in a model’s rule chain by another model’s

rule and observe the difference in outputsrule and observe the difference in outputs

BACPAC BACPAC with rule from Fisher

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Staggered repeatersStaggered repeaters Introduced in [Kahng et al, VLSI Design 99] to reduce delay and noiseIntroduced in [Kahng et al, VLSI Design 99] to reduce delay and noise

Delay Uncertainty StudyDelay Uncertainty Study

SOI (NS)

bulk (NS)SOI (S)

bulk (S)

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OutlineOutline

The Design The Design TechnologyTechnology Gap and the GSRC C.A.D. Theme Gap and the GSRC C.A.D. Theme On RoadmappingOn Roadmapping The GSRC Technology Extrapolation (GTX) System: The GSRC Technology Extrapolation (GTX) System:

Toward a Living RoadmapToward a Living Roadmap A Living Roadmap for Semiconductors (and Design)A Living Roadmap for Semiconductors (and Design)

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GTX StatusGTX Status Recent DevelopmentsRecent Developments

GTX is multi-platform, open-source (MIT license)GTX is multi-platform, open-source (MIT license) many industry downloads; basis of development project at eSilicon (?)many industry downloads; basis of development project at eSilicon (?)

Third release of GTX: September 3, 2000Third release of GTX: September 3, 2000 namespaces, partial rule chain evaluation, vector types, etc.namespaces, partial rule chain evaluation, vector types, etc.

Models/studies implemented: Models/studies implemented: cost/yield (CMU), SOI device/power (Synopsys/Berkeley), RLC interconnect modeling and cost/yield (CMU), SOI device/power (Synopsys/Berkeley), RLC interconnect modeling and

optimization (SGI/UCLA/Synopsys/Berkeley/Sun), routability and layer assignment (UCLA/Ghent)optimization (SGI/UCLA/Synopsys/Berkeley/Sun), routability and layer assignment (UCLA/Ghent) GENESYS, RIPE source code translation into GTXGENESYS, RIPE source code translation into GTX

Near-Term FuturesNear-Term Futures Functionality: annotations, “intelligence”, more direct Roadmap supportFunctionality: annotations, “intelligence”, more direct Roadmap support Models/studies: RLC interconnect noise/delay, manufacturing variability, clock distribution, Models/studies: RLC interconnect noise/delay, manufacturing variability, clock distribution,

DRAM/logic implementation tradeoffs, packaging tradeoffs, device layout density, ...DRAM/logic implementation tradeoffs, packaging tradeoffs, device layout density, ... GTX = repository for ITRS-2001 ORTCs (“transparent, living Roadmap”)GTX = repository for ITRS-2001 ORTCs (“transparent, living Roadmap”)

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Roadmapping ChallengesRoadmapping Challenges Valuation, evaluation of Design and Design Technology

scope and definition of design technology, design processes ?formal metrics for QOR, effectiveness of design technology ?cost measures for design ? (e.g., as part of semiconductor NRE $)

Real linkage between Design, other TWGs in ITRS-2001 effortTest, Interconnect, Litho, PIDS, FEP, Assembly/Packaging, ...goal: consistency and integrity of ITRS

Contributions from across the semiconductor process and design communitiesbest known methods and models; best known data

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The GSRC C.A.D. Theme promotes mature, coopetitive cultures and shared, open The GSRC C.A.D. Theme promotes mature, coopetitive cultures and shared, open infrastructures that lead to improved infrastructures that lead to improved creationcreation of design technology (see: of design technology (see: http://vlsicad.cs.ucla.edu/GSRC/ )http://vlsicad.cs.ucla.edu/GSRC/ )

Improved vision and design technology planning (Improved vision and design technology planning (“specify”“specify”): ): What will the design problem look like? What do we need to solve?What will the design problem look like? What do we need to solve? Answer: “Living Roadmap” (The GSRC Technology Extrapolation (GTX) System)Answer: “Living Roadmap” (The GSRC Technology Extrapolation (GTX) System)

Improved execution (Improved execution (“develop”“develop”): ): How can we quickly develop the right design technology (TTM)?How can we quickly develop the right design technology (TTM)? Answer: CAD-IP Reuse (The GSRC Bookshelf for Fundamental CAD-IP)Answer: CAD-IP Reuse (The GSRC Bookshelf for Fundamental CAD-IP)

Improved measurement (Improved measurement (“measure“measure andand improve”improve”):): Did we solve the problem (QOR)? Did the design process improve? Did we increase the Did we solve the problem (QOR)? Did the design process improve? Did we increase the

envelope of achievable design?envelope of achievable design? Answer: Design Process Instrumentation, Optimization (METRICS)Answer: Design Process Instrumentation, Optimization (METRICS)

Toward Improved Design Toward Improved Design TechnologyTechnology Productivity Productivity

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U.S. Design Technical Working Group for ITRS-2001 renewalU.S. Design Technical Working Group for ITRS-2001 renewalstructure, scope, content, links for Design, System Drivers chaptersstructure, scope, content, links for Design, System Drivers chapters

IEEE DATC Electronic Design Processes SubcommitteeIEEE DATC Electronic Design Processes [email protected] ; EDP Workshop (April, Monterey CA)[email protected] ; EDP Workshop (April, Monterey CA)

MARCO GSRC C.A.D. ThemeMARCO GSRC C.A.D. ThemeBookshelf for CAD-IP Reuse, METRICS InitiativeBookshelf for CAD-IP Reuse, METRICS Initiativehttp://vlsicad.cs.ucla.edu/GSRC/http://vlsicad.cs.ucla.edu/GSRC/

GTXGTXnew models and studies ; usability, use model feedbacknew models and studies ; usability, use model feedback

My contact info: [email protected] contact info: [email protected]

Make Your Contribution !!!Make Your Contribution !!!

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““The Design Productivity Gap”The Design Productivity Gap”

Equivalent Added Complexity

68 %/Yr compoundedComplexity growth rate

21 %/Yr compoundProductivity growth rate

Year Technology Chip Complexity Frequency Staff Staff Cost* 3 Yr. Design

1997 250 nm 13 M Tr. 400 MHz 210 90 M

1998 250 nm 20 M Tr. 500 270 120 M

1999 180 nm 32 M Tr. 600 360 160 M

2002 130 nm 130 M Tr. 800 800 360 M

* @ $ 150 k / Staff Yr. (In 1997 Dollars)

Logic Tr./Chip Tr./S.M.

““How many gates How many gates can I get for $N?”can I get for $N?”

Source: SEMATECHSource: SEMATECH

$1$1$3$3

$10$10

Potential Design Complexity and Designer Productivity

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0%20%40%60%80%

100%

1999

2002

2005

2008

2011

2014

% Area Memory

% Area ReusedLogic

% Area New Logic

Percent of die area that must be occupied by memory to maintain SOC design productivity

Design Productivity Gap Design Productivity Gap Low-Value Designs? Low-Value Designs?

Source = Japanese system-LSI industry

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““Roadmap Process and Its Implications” (Ideally...)Roadmap Process and Its Implications” (Ideally...)

Basic TechnologicalAssumptions

Basic MethodologicalAssumptions

Implications tothe Community

Models andDiscussion

Translation to SpecificResearch Agendas

“Timing closure is a hard problem and will only get harder”

“We will fund research ontiming-aware partitioning”

Research Proposedto Implement Agenda R. Newton, ICCAD99 panel

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““Roadmap Process” (More Practically...)Roadmap Process” (More Practically...)

Basic TechnologicalAssumptions

Basic MethodologicalAssumptions

Implications tothe Community

Models andDiscussion

Couched in Terms ofRoadmap Implications

“Timing closure is a hard problem and will only get harder”

Research Proposed to Solve Hard Problem

“I can make a breakthrough in technology or methodology”

“Here’s how my work is critical for addressing your problem”

Newmodels

R. Newton, ICCAD99 panel

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Five different interconnect modelsFive different interconnect models Bakoglu’s model (RC)Bakoglu’s model (RC) [Alpert, Devgan and Kashyap, ISPD 2000] (RC)[Alpert, Devgan and Kashyap, ISPD 2000] (RC) [Ismail, Friedman and Neves, TCAD 19(1), 2000] (RLC)[Ismail, Friedman and Neves, TCAD 19(1), 2000] (RLC) [Kahng and Muddu, TCAD 1997] (RLC)[Kahng and Muddu, TCAD 1997] (RLC) Extension of [Alpert, Devgan and Kashyap, ISPD 2000] (RLC)Extension of [Alpert, Devgan and Kashyap, ISPD 2000] (RLC)

RLC Interconnect Delay ApproximationRLC Interconnect Delay Approximation

25

75

125

175

225

3.0 4.0 5.0 6.0 7.0 8.0 9.0 10.0Wire Length (mm)

Wire

Del

ay (p

s)

RC_ADK

RC_B

RLC_ADK

RLC_IFN

RLC_KM

HSPICE

25

45

65

85

105

125

145

0.4 0.6 0.8 1.0 1.2 1.4Wire Width (µm)

Wire

Del

ay (p

s)

RC_ADK

RC_B

RLC_ADK

RLC_IFN

RLC_KM

HSPICE

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Cu Resistivity: Barrier Deposition TechnologyCu Resistivity: Barrier Deposition Technology

Atomic Layer Deposition (ALD)

Ionized PVD

Collimated PVD

• 5 nm barrier assumed at the thinnest spot• No scattering assumed, I.e., bulk resistivity

Interconnect dimensions scaled according to ITRS 1999

source: MARCO IFRC


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