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Absorption of Laser Light in Overdense Plasmas by Sheath Inverse Bremsstrahlung T.-Y. Brian Yang, W. L. Kruer, R M. More This paper was prepared for submittal to the 36th Annual Meeting of the American Physical Soaev Division of Plasma Physics Minneapolis, MN November 7-11,1994 November 1994 I 4 Thisisa preprint of a paperintended for publication in a joumalorproceedinga Since changes may be made before publication, this preprint is made available with the understanding that it will not be cited or reproduced without the permission of the author.
Transcript
Page 1: Absorption Laser Light Plasmas by Inverse Bremsstrahlung/67531/metadc626240/... · Absorption of Laser Light in Overdense Plasmas by Sheath Inverse Bremsstrahlung T.-Y. Brian Yang,

Absorption of Laser Light in Overdense Plasmas by Sheath Inverse Bremsstrahlung

T.-Y. Brian Yang, W. L. Kruer, R M. More

This paper was prepared for submittal to the 36th Annual Meeting of the American Physical Soaev

Division of Plasma Physics Minneapolis, MN

November 7-11,1994

November 1994

I

4

Thisisa preprint of a paper intended for publication in a joumalorproceedinga Since changes may be made before publication, this preprint is made available with the understanding that it will not be cited or reproduced without the permission of the author.

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DISCLAIMER

This document was prepared as an account of nork sponsored by an agency of the United States Government. Neither the United States Government nor the University of California nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe prhateiy owned rights. Reference herein to any specific commercial products, process, or service by trade name, trademark, manufacturer, or othern ise, does not necessarily constitute or impl? its endorsement, recommendation, or favoring by the United States Government or the University of California. The views and opinions of authon expressed herein do not necessarily state or reflect those of the United States Government or the University of California, and shall not be used for advertising or product endorsement purposes.

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DISCLAIMER

Portions of this document may be illegible in electronic image products. Images are produced from the best available original document.

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Absorption of Laser Light in Overdense Plasmas by Sheath Inverse Bremsstrahlung

T.-Y. Brian Yang, William L. Kruer, and Richard M. More

Lawrence Livermore National Laboratory

The original sheath inverse bremsstrahlung model [P. J. Catto and R. M. More, 19771

is modified by including the vxB term in the equation of motion. It is shown that

the present results are significantly different from those derived without the VXB

term. The vxB term is also important in interpreting the absorption mechanism.

If the vxB term were neglected, the absorption of the light would be incorrectly

interpreted as an increase in the transverse electron temperature. This would vio-

late the conservation of the transverse components of the canonical momentum, in

the case of a normally incident laser light. It is also shown that both the sheath

inverse bremsstrahlung and the anomalous skin effect are limiting cases of the same

collisionless absorption mechanism. Finally, results from PIC plasma simulations are

compared with the absorption coefficient calculated from the linear theory.

1

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. . r Introduction

In recent years, there have been increasing interests in the interaction of short laser

pulses with overdense plasmas1”12. For sufficiently short laser pulses, the hydrody-

namics motion of the heated target does not play a dominant role, and the production

of high-density plasmas with sharp density gradient become feasible. One topic of

great interest is to study the dependence of the light absorption on the laser intensity

and the plasma temperature in such plasmas. It has been observed in experiment~l-~

that, starting from sufficiently low intensity, the absorption rate increases as a func-

tion of laser intensity, until it reaches the “resistivity saturation”’, a condition in

which the electron mean free path reaches a minimum value. Further increase of the

laser intensity and the plasma temperature will then cause an increase in the electron

mean free path and a decrease in the absorption rate. When the electron mean free

path is longer than the skin depth, theoretical s t~d ie s ’~*’~ suggest that. collisionless

absorption mechanisms such as sheath inverse brern~strahlungl~ and the anomalous

skin effect’*J5 become important.

In this paper, we modify the original sheath inverse bremsstrahlung model13 by

including the v x B term in the equation of motion. It will be shown that the present

results are significantly different from those derived without the v x B term, except

when the distribution function is isotropic [fo(v) = fo(lvl)]. For an isotropic distri-

bution function, identical results will be obtained whether or not the v x B term in

the equation of motion is included in the derivation. However, if the v x B term were

neglected, the absorption of the light would be incorrectly interpreted as an increase

in the transverse electron temperature. while the conservation of the transverse corn-

ponents of the canonical momentum requires that, after leaving the interaction region

( Iz lS) , an electron should have the same transverse velocity as before it entered the

- ..

interaction region.

2

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The present analysis also determines self-consistently the profile of the electromag-

. . netic fields in the overdense plasma in the regime of validity for the sheath inverse

bremsstrahlung model, i.e., w2c? >> w;vz. By deriving the absorption coefficients for

both the sheath inverse bremsstrahlung and the anomalous skin effect from the same

set of equations [Eqs. (20) and (21)], it is shown, in Sec. 111, that both phenomena

are limiting cases of the same collisionless absorption mechanism. The sheath inverse

bremsstrahlung corresponds to the limit where w2c2 >> w:v,', while the anomalous

skin effect corresponds to w2c2 << wgv,2.

I '

Finally, numerical simulations of the light absorption in overdense plasmas have

been carried out, using the PIC plasma simulation code ZOHAR". The absorption

coefficients observed in the numerical simulations agree qualitatively with the values

calculated from the linear theory, as illustrated by the results shown in Sec. N.

I1 Theoretical Model and Derivation of the Sheath Inverse Bremsstrahlung Absorption

The model consists of an overdense plasma filling the half-space x > 0, and electro-

magnetic fields of the following form

Ey(x,t) = Re{Eoexp[i(kx -ut)]},

B,(x, t ) = Re {&Eo W exp[i(kz - ut)]} , (1)

where Eo and w are real-valued constants, while k is a complex number with a positive

imaginary part. 'Immobile ions, with zero density for x < 0 and a constant density for

5 > 0, are assumed to form the neutralizing background. The plasma is assumed to be

highly overdense (w i >> w2) and the fiducial thermal velocity we, which characterizes

the electron distribution, is sufficiently small (w2c2 >> ~,"TI,',. Except in the sheath

regime near 2 = 0, the electron density is equal to no for 5 > 0 and is zero for a: < 0.

When an electron hits the sheath (a: = 0) from the right (z > 0), instantaneous

- _ -

3

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specular reflection is assumed, that is the y and z components of the momentum

remain unchanged, while the x-component reverses with the amplitude unchanged.

Since the typical time scale to reverse electron momentum in the sheath region is l / w p ,

which is much shorter than both the wave period (2alw) and the transit time in the

skin depth ( c/oewp) in an overdense non-relativistic plasma, instantaneous reflection

I :

is a good assumption. Here, wp = (4~noe~/rn,)~/ ' is the electron plasma frequency.

The assumption of specular reflection requires that the sheath be one-dimensional,

i.e., the length scale of the transverse variation be much longer than the width of the

sheath (approximately equal to the Debye length). The present analysis also assumes

that the quiver velocity v,, = eEo/mew is much smaller than the fiducial thermal

velocity oe, so that the perturbation analysis is applicable.

For an electron located at z'(t') = x > 0, at the time t' = t , with velocity

~ ' ( t ' = t ) = v = v,2, + vyZy + vZ&, the unperturbed orbits at any earlier time t' < t ,

in the absence of the electromagnetic fields (Eo = 0), are

x(O)(t')

V(O)(t') = v, (2)

= x + v,(t' - t ) ,

€or v, < 0, and

z ( O ) ( t ' ) = x + - t ) , t' > t,, { x(O)(t') = -x - V,(t' - t ) , t' < t,, vp'(t') = vz, t' > t,, { V P ) ( t ' > = -vz, t' < t , ,

v p ( t ' ) = vy, I p ( t ' ) = v,, (3)

for o, > 0, where t , = t - z/o, is the time of reflection.

To calculate the electron orbits correctly to the first-order in Eo, the orbits are

written in the following form

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where the perturbed orbits Sx, Sv,, and Sv, satisfy the following linearized equations

d6v e dt' m e

dSv, evy E - = _-_ EO exp(i[kr(')(t') - ut']},

Y - - -- (I - 2) Eoexp(i[kdO)(tl) - wt']),

dt' me W dSx dtl - = sv, ( t ') . ( 5 )

For an electron moving to the left with v, < 0, Eqs. (2) and (5 ) readily give the

perturbed orbits at the time t' = t

6vy(t) = - eEo exp[i(kz - wt)],

Sv,(t) = - exp[i(kx - wt ) ] .

im,w eEo IcVy

imew w - kv,

For an electron moving to the right with v, > 0, the condition of specular reflection

requires that Sv,(t, + E ) = Sv,(t, - E ) and Sv,(t, + E ) = -Sv,(t, - E ) for a small

positive e. h4aking use of Eq. (3) and the specular reflection conditions, Eq. ( 5 ) is

solved to give the perturbed orbits for the right-moving particle (u, > 0) at the time

t = t I

eEo Sv,(t) = - exp[i(kz - wt) ] , zm#

exp [iu (E - t ) ] 4 7 ) eEo kv, 2eEo iku, Sv,(t) = - exp[i( La: - wt ) ] + - m w2 - k2v2 imM w - ku, X

In the absence of the electromagnetic fields (Eo = 0), the distribution function of the

electron is independent of time and can be expressed as

where fo satisfies the normalization condition J d % f o { 4 ) = 1 and the symmetry

fo( -vZ, vy, v2) = fo(v,, vuy, vz). In the presence of the electromagnetic fields, the

induced current density can be calculated from the perturbed orbits in Eqs. ( 6 ) and

5

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(7), using the relation

_ .

I '. (9)

for x > 0. Here, xi and vi (i=1,2, or 3) are the 2, y, or z components of position (x)

and velocity (v) vectors, and a repeated index implies a summation over the index.

In deriving Eq. (9), use has been made of the relation 3 + % = 0, which can be

derived from the Liouville's theorem. It is worth mentioning that the second term

in the right-hand side of Eq. (9) is due to current bunching, which is characteristic

of collective interactions between electromagnetic fields and plasmas (e-g., Weibel

in~tabili ty '~- '~ and cyclotron maser in~tability'~). Substituting Eqs. (6) and (7) into

Eq. (9) readily gives the induced current density

where jR is defined by

(11)

In the regime where w2c2 >> wiv," and w,' >> w2, the j , term in Eq. (10) is small in

comparison with the other term. Neglecting the j, term, the induced current j , can

be substituted into the Maxwell's equations to determine the relation between k and

w, '.e., W ~ - C 2 2 k =w: 1 + d3v 122v; R(vi] 7 [ J (w - kv,)2

or equivalently

with 6 = i / k . In this regime [w2c2 >> w;vz and wi >> w2], the skin depth S is

6

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. ..

where 60 = c/(W,” - w2)lI2. Making use of l3q. (ll), the power transfering from the

laser to the plasma, per unit area of laser-plasma interface, is readily obtained

It is worth mentioning that a similar derivation without the vxB term in the equation

of motion will give

For an isotropic distribution function [fo(v) = fo(lvI)], it can be shown, by carry-

ing out the integration over the solid angle sinBdBdq5, that Eq.(16) is equivalent to

Eq.( 15). For general distributions function, however, Eq.( 16) gives an absorption

rate significantly different from Eq.(15). Moreover, if the vxB term had been ne-

glected, the absorption of the light would be incorrectly interpreted as an increase

in the transverse (y-direction) electron temperature, while the conservation of the

transverse components of the canonical momentum requires that, after leaving the

interaction re@on (IzlS), an electron should have the same y-velocity as before it

entered the interaction region.

I11 Relation between the Sheath Inverse Brernsst rahlung and the Anomalous Skin Effect

In the usual treatment of the anomalous skin effectl49l5, the absorption coefficient

is calculated by extending the plasma and the electromagnetic fields in the present

model to the half space z < 0 with - _I

Ey(-zc> = Ey(4, Bz(-z) = -B,(z).

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I ’

The discontinuity in B, requires a current sheet J= iyJ&5(z) exp(-iwt), whose am-

plitude is determined by

4T Jo c

&(a: =‘O+) - &(a: = 0-) = 2B,(z = O+) = --.

Since an electron with x > 0 in the extended model will have the same orbits as the

corresponding electron in the original model, the two models me equivalent as far as

the region z > 0 is concerned. In the extended model, the electric field satisfies the

following equation

(2& + w.) E&) = - 4 ~ i ~ [ j ~ ( z ) + JoS(5)J,

where j,(a:) is the current density induced by the electromagnetic fields. Perform-

ing the Fourier transform on Eq. (19), and making use of the well-known relation”

between the induced current density j , and the electric Geld E;, it follows that

w - kv, dv, D(w, k) = w2 - c2k2 - O P [l - /d3v

Here, Z,(k) is the Fouier transform of Ey(z), Le.,

&(k) = dzE,(z) exp(-iks). -m

In the regime of the anomalous skin effect (u22 << u;vz and ug >> u2), and for an

isotropic distribution function [fo(v) = fo(lvI)], the function D(w, k) can be approx-

imated by

Making use of Eq. (18), (20) and (23), the electric field at x = 0 is readily obtained

8

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and so is the Poynting flux at 5 = O+

C w s a , p z ( z = O+)l2 --Re{E,(z = O)BZ(S = O + ) } = 8T 12&

For a laser normally incident on a highly overdense plasma, the magnetic field at

x = 0 is related to the incident electric field (E,) by (B,(z = O+)l = 2Eb; therefore,

the absorption coefficient Tar of the anomalous skin effect is

In the regime of the sheath inverse bremsstrahlung (u22 >> and w," >> u2),

on the other hand, the following approximation is appropriate

, (27) kv,2 - a 0

D ( w , k ) - c* ( l c 2 + - :i)

1

c2 (k2 + &)2

A

c4 ( k 2 + $)2 w - kv, dv, J d3v

w; - - N - 1

where 6 is defined by

and A is a constant to be determined by the condition that the secular term in the

final result should vanish. Substituting Eq. (27) into Eq. (20) and performing the

inverse Fourier transform give

Ey(z > 0) = -!- J dk,??,(k) exp(ilcz) = - 2iw Jo exp( i kx) '27; r

kv; afo + d3vw - kv, dv,

where the contour I' of the dlc integration goes from k = --oo to IC = +oo along

the real k-axis, with a small positive (negative) imaginaty part when Re k < 0 (Re

k > 0), and EA( x > 0) is defined by

9

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Reversing the order of the dk and d3v integrations in Eq. (30), followed by closing

the contour I' in the upper complex-k plane (Im k > 0), it can be shown that

6"; afo ( d S 2 + VZ)2 dv,

- exp (i y ) w2Wi Jo J 61vLvy2 im dv, c4 &(I > 0) = 47r

nwW:Jo Pv WS - iv, dv, c4

s2v; afo ---5 exp (-a) -

It can be readily seen from Eqs (29) and (31) that, for the secular term [zexp(-z/S)

term) to vanish. it requires that

A c 2 = w 2 - m i + - C2 = --iaZJd3v vi - a f o 62 ws - iv, dv,

v;vx - a f o w2S2 + 0; av,-

= wp' / d3v

It can shown, using integration by parts, that Eq. (32) is identical to Eq. (13).

Making use of Eqs. (18), (29), (31) and (32), we obtain the electric field

b4V; -exp afo (if) , ( W W + v;>2 av,

+ 4 ~ ~ ~ ~ ' Jo j d2vlvi 1- dv, c4 (33)

and the Poynting flux at x = O+

Integrating by parts over dv,, it is readily shown that Eq. (34) implies the same

absorption rate as Eq. (15). Since the magnetic field at x = 0 is related to the

incident electric field ( E b ) by IB,(s = 0+)12 = 4Ek--f(w2S2 + c2) , the absorption

coefficient 7, ;b of the sheath inverse bremsstrahlung is

10

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Here, use has been made of Eq. (13) in deriving Eq. (35).

It can be seen from the derivations of Eqs. (26) and (35) that the sheath in-

verse bremsstrahlung and the anomalous skin effect are two limiting cases of a more

general collisionless absorption mechanism described by Eqs. (20) and (21). The

sheath inverse bremsstrahlung corresponds to the limit where w2c2 >> U~V:, while

the anomalous skin effect corresponds to w2c2 << W ~ V : . In the intermediate regime

(w2c2 - w;v,2), the aborption coefficient can be obtained by performing the inverse

Fourier transform of Eqs. (20) and (21).

To further elucidate the result in Eq. (35), the absorption coefficient in a plasma

\vi t h Maxwellian distribution function

is obtained in a closed analytic form

where

W2E2 2 0 0 a = - , &(a) = Jrn exp(-t)dt, erfc(z) = - exp (-t') dt.

22): a t & As can be seen from Eq. (37), the quantity qs;bc/v, depends on the system parameters

only through the dimensionless parameter w6/v,, which is approximately the ratio of

the transit time in the collisionless skin depth over the period of the incident light.

This result is to be compared with the more accurate one calculated from Eqs. (20)

and (21). - .-

Substituting the maxwellian distribution defined in Eq. (36) into Eq. (21) gives

11

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where Z(z) is the plasma dispersion function". For a real-valued x , the function

Z(z) can be expressed as2'

It is then readily shown by the inverse Fourier transform of Eq. (20) that

- (41) iwc 1 Ey(z = 0) = --Bz(z = 0')Jm dk I 2 A z ( e ) d@lve 2lklve

-00 c 2 k 2 - & -

For a highly overdense plasma (u; >$ w2) , the magnetic field at x = 0 is related to

the incident electric field (Eh) by IB,(a: = 0+>12 = 4Ek. Changing the integration

variable to 5 = w/&lk{ue, the absorption coefficient is then readily derived from

where b2 = w2c2/2u~v,2.

Plotted in Fig. 1 are the quantities q,bc/v, (solid line) calculated numerically from

Eq. (42), qsibc/vc (dotted line) calculated from Eq. (37), and qosc/v, (dashed line)

defined in Eq. (26). The curves are plotted versus w2c2/w,2v,2. As mentioned earlier,

the sheath inverse bremsstrahlung (SIB, dotted line) corresponds to the regime where

w2c2 >> u i u z , while the anomalous skin effect corresponds to 02c2 << w;v: (ASE,

dashed line). It can be seen that both q&bC/Vo, and ~ , , c / v , are in good agreement

with ?)&C/Ve, in their respective regimes of validity, It is worth reiterating that, for

an isotropic distribution function [fo(v) = fo(lvI)], such as the one in Eq. (36), an

identical absorption coefficient would be obtained whether or not the vxB term in

the equation of motion was included in the derivation. However, neglecting the VXB - _-

term will lead to an incorrect interpretation of the absorption mechanism.

12

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IV Numerical Simulations of the Light Absorp- tion in Overdense Plasmas

To examine the validity of the absorption coefficient derived in the previous section,

several runs of numerical simulations have been carried out, using the PIC plasma

simulation code ZOHAR". In al l the simulations, the electric field of the incident

light Ei, satisfies E?,, << ?mOrn,v,2 so that the qiver velocity of electrons in the over-

dense plasma is smaller than the thermd velocity, as was assumed in the analytical

derivation of the absorption coefficient. The 1-D simulations are set up as follows:

(i) The electromagnetic fields can vary only in the z-direction. The length of the

simulation region is 1, = 40c/wp. (ii) The boundary conditions of the electromagnetic

fields at z = 0 correspond to a normally incident circularly polarized plane wave. The

amplitude of the wave gradually increases from zero at the beginning of the simulation

(t = 0) to a value of eE;,,/wmec at the end of the fifth wave period. The amplitude

of the incident wave remains constant thereafter. (iii) The wave impedances of the

boundaries are chosen such that the outgoing waves will be completely reflected at

z = 1, and completely transmitted at x = 0. (iv) The initial electron density is zero

for 0 < z < i x /2 , and is equal to a constant value no for 1,/2 < z < 1,. Immobile

neutralizing background charge density with the same profile is imposed to insure

charge neutrality at t = 0. (v) At t = 0, simulation particles are loaded uniformly

in the region 1,/2 < x < I,, with Maxwellian distribution [Eq. (36)] in the velocity

space. (vi) During the simulation, particles that hit the boundary at x = 0 leave the

system, while those that hit the boundary at z

AIaxwellian distribution with the same thermal

function.

Three sets of simulations have been carried

ve equal to O.lc, 0 . 0 5 ~ ~ and 0 .025~~ respectively.

= 1, are re-emitted according to the

velocity ve as the initial distribution - -..

out with the initial thermal velocity

Each set consists of simulations with

13

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different values of w/wp. The simulation parameters for the set with v,/c = 0.1 are:

(i) 400 equally spaced grid points for the electromagnetic fields; (ii) the steady-state

value of laser electric field eE;n/wmec = 0.05; (iii) 12,800 simulation particles; (iv)

the time step At = O.OS/w,. Each time we reduced the value of ve/c by a half (from I '

ve/c = 0.1 to ve/c = 0.05, and then to ue/c = 0.025), we doubled the number of

simulation particles and grid points, and reduced the time step and the steady-state

laser electric field eE;, by a half.

Figure 2 shows the absorption coefficients observed in the simulations in compari-

son with the absorption coefficients calculated numerically from Eq. (42). Qualitative

agreement between the simulations and the linear theory can be seen in Fig. 2. For

the simulations with the parameter u2c2/U,"v," close to unity, the observed absorption

coefficients are higher than the estimates from the linear theory. A possible cause of

the discrepancy is that the linear theory assumes instant reflection in the sheath re-

gion, which may not be a good approximation in those simulations. This explanation

is supported by the trend that the simulations with smaller v,/c agree better with

the linear theory, as smaller ve/C for a given w 2 2 ? / w ~ v ~ means shorter reflection time

(of order l/wp) relative to the wave period (2n/w).

In the simulations, the flows of the electromagnetic energy and the electron kinetic

energy through the boundaries at 5 = 0 and IC = Z, are taken in to account; therefore,

what is shown in Fig. 2 corresponds to the net transfer of the electromagnetic energy

into the electron kinetic energy. For most of the simulations with v,/c = 0.1 or

ue /c = 0.05, the total (electromagnetic plus kinetic) energy is conserved very well in

the simulation. with the change in the total energy (AEtotar) less than 10% of the

net increase in the electron kinetic energy (A&). The exceptions are the cases with

u 2 c 2 / u ~ v ~ = 20.0 and u2c2/w,2v~ = 0.05, for which AEtotar/AEe - 20%. For the

simulations with v,/c = 0.025, AE,,,,l/AE, is also about 20%.

14

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V Summary and Discussion

The sheath inverse bremsstrahlung model13 was modified by including the v x B term

in the equation of motion. The results are significantly different from those derived

without the vxB term, except when the distribution function is isotropic [fo(v) =

fo( Ivl)]. For an isotropic distribution function, identical results would be obtained

whether or not the v x B term in the equation of motion was included in the derivation.

However, if the vxB term had been neglected, the absorption of the light would be

incorrectly interpreted as an increase in the transverse electron temperature, while

the conservation of the transverse components of the canonical momentum requires

that, after leaving the interaction region (~z~&6), an electron should have the same

transverse velocity as before it entered the interaction region.

It was also shown that the sheath inverse bremsstrahlung is related to the anoma-

lous skin effect in the sense that both are limiting cases of a more general colli-

sionless absorption mechanism described by Eqs. (20) and (21). The sheath inverse

bremsstrahlung corresponds to the limit where u2c2 >> W ~ V : , while the anomalous

skin effect corresponds to w2c2 << u;v;. In the intermediate regime (u2c2 - u ; v ~ ) ,

the aborption coefficient can be obtained by performing the inverse Fourier transform

of Eqs. (20) and (21).

Numerical simulations of the light absorption in overdense plasmas have been car-

ried out, using the PIC plasma simulation code ZOHARl'. The absorption coefficients

observed in the numerical simulations are in qualitative agreement with the linear-

theory values. However, some simulations showed absorption coefficients significantly

higher than the linear-theory results. A possible explanation of the discrepancy is that

the assumption of instant reflection made in the linear theory may not apply very well

in those simulations. It should be reiterated that the present analysis assumes that

the electric field of the incident light E;, satisfies E:n << m20mev,2, so that the qiver

- _I

15

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velocity of electrons in the overdense plasma is smaller than the thermal velocity.

Moreover, the present model assumes normal incidence for the laser light. Studies

of the cases of oblique incidence and of intense incident laser light >> 1m0mev,2)

will be subjects of future investigations.

. .

I :

Acknowledgments

We are grateful for valuable discussions with S . C. Wilks, A. B. Langdon,

R. S. Walling, and 2. Zinamon. The research described here was performed under

the auspices of the U.S. Department of Energy by the Lawrence Livermore National

Laboratory under contract No. W-7405-ENG-48.

16

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References

[l] H. M. Milchberg, R. R. Freeman, S. C. Davey, and R. M. More, Phys. Rev. Lett.,

61, 2364 (1988).

[2] J. C. KieEer et al., Phys. Rev. Lett., 62, 760 (1989).

[3] R. Fedosejevs et al., Appl. Phys. B, 50, 79 (1990).

[4] R. Fedosejevs et al., Phys. Rev. Lett., 64, 1253 (1990).

[5] M. M. Murnane, H. C. Kapteyn, and R. W. Fdcone, Phys. Rev. Lett., 62, 155

(1989).

[6] D. Kiihlke, U. Herpes, and D. von der Linde, Appl. Phys. Lett. 50, 1785 (1987).

[7] C. H. Nam et al., Phys. Rev. Lett., 59, 2427 (1987).

[8] D. G. Steams, 0. L. Landen, E. M. Campbell, and J. H. Scofield, Phys. Rev. A,

37, 1684 (1988).

[9] G. Kiihnle, F. P. SchZer, S. Szatmari, and G. D. Tsakiris, Appl. Phys. B, 47,

361 (1988).

[lo] J. A. Cobble et al., Phys. Rev. A, 39, 454 (1989).

[Ill H. W. K. Tom and 0. R. Wood, 11, Appl. Phys. Lett. 54, 517 (1989).

[lZ] S. E. Harris and J. D. Kmetec, Phys. Rev. Lett., 61, 62 (1988).

1131 P. J. Catto and R. M. More, Phys. Fluids, 20, 704 (1977).

[14] W. Ruzmus and V. T. Tikhonchuk, Phys. Rev. A, 42, 7401 (1990).

17

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I '

1151 E. M. Lifshitz and L. P. Pitaevskii, PhysicaZ Kinetics (Pergamon, Oxford, 1981).

[16] A. B. Langdon and B. F. Lasinski, Meth. Comput. Phys. 16, 327 (1976).

[l?] E. S. Weibel, Phys. Rev. Lett. 2,83 (1959).

[18] F. F. Chen, Introduction to Plasma Physics and Controlled Fusion, Vol. 1

(Plenum, New York, 1983), p. 223.

[19] K. R. Chu and J. L. Hirshfield, Phys. Fluids, 21,461 (1978).

[20] R. C. Davidson, Handbook of Plasma Physics, Vol. 1, edited by A. A. Galeev

and R. N. Sudan, (North-polland, New York, 1983): pp. 521-585.

[21] B. D. Fried and S. 13. Conte, The Plasma Dispersion Function (Academic, New

York, 1961).

18

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I '

Figure Captions

Fig. 1 The quantities vabC/Ve (solid h e ) calculated numerically from Eq. (42), q&C/U,

(dotted line) calculated from Eq. (37), and qQ,c/ue (dashed line) defined in

Eq. (26), plotted versus w2c2/w;v,2.

Fig. 2 The absorption coefficents times C/U, observed in the PIC simulations are

plotted in comparison with the linear-theory results.

19

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0 0 0 0 0 0 0 0 0

0 9 ? T r? c'!

0 0 0 0 0 0 4 r: u?

0 0 09

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0 4

-0

0

a

m

m

0

0 o a m

I I I I I I I I I

0

0 09

0 0 0 0 0 0 0 0 t l \ 9 " ! - ? r ! c ' ! - 9 0 0 0 0 0 0 0 0

> 0 H

z 0 H


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