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MBE Components Enabling Innovative Materials Research and Cost-Effective Device Production Solutions for a nanoscale world.
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  • MBE ComponentsEnabling Innovative Materials Research and

    Cost-Effective Device Production

    Solutions for a nanoscale world.

  • Family ofVeeco

    Components

    Proven MBE Components Ensure ResultsSince our inception in 1986, Veeco has been and continues to be the world’s leading supplier of MBE components, thanks inpart to our material-specific sources—the first to suit the evaporation characteristics of a certain group of elements orcompounds. We commercialized solid source and gas cracking sources to thermally decompose (crack) large molecules intosimpler species. Our uniquely designed valved crackers not only crack molecules but also modulate flux with a patented valvemechanism. This innovation made MBE a viable production technology. Our latest innovations are enabling the developmentand production of advanced nitride- and oxide-based devices.

    SOURCESVeeco offers the most comprehensive selection of sources, including single and dual filament designs. These designs areoffered in high and low temperature models in capacities from 1cc to 1700cc. Veeco’s SUMO® sources, dual filament in design,utilize uniquely designed and patented crucible shapes. This means only Veeco can deliver the largest charge capacity withoutsacrificing material quality or source performance. Comprised of a cylindrical reservoir with a small tapered orifice, theSUMO source delivers excellent flux stability, fewer defects, large charge capacity, and minimized shutter transients. Inaddition, Veeco also offers varying traditional and emerging application-specific source solutions, including oxides andnitrides.

    Crucible TypesThe type of crucible required for a source is dictated by the material, application and MBE system. Different sizes are availableand each source is optimized for use with a specific crucible. Crucibles are usually constructed of PBN but other materialsare also available. The SUMO crucible features a unique orifice with a small aperture that provides excellent flux uniformity,long term flux stability and a large charge capacity.

    SUMO Crucible Straight-Wall Crucible Conical Crucible

    Uniformity Excellent Decreases as charge is depleted Excellent

    Charge Capacity Excellent—capacities up to 1700cc Up to 700cc Up to 700cc

    Long-Term Flux Stability Excellent Good Poor

    Shutter Transients Low High High

    OrientationUpward, downward without usingan insert

    Upward Upward

    Typical UseDopant, small, medium and largecharge capacity

    Dopant, small and medium chargecapacity

    Dopant, small charge capacity

    Material Type PBN, Ta, Graphite, QuartzPBN, Ta, Graphite, Alumina, W,BeO, ZrO2, Quartz

    PBN, Ta, Graphite, Alumina, W,BeO, Quartz

    ValvedCrackers

    Software &Control

    Electronics

    Sources &Crucibles

    SpecialtySources &Gas Crackers

  • Industry-Changing Valved CrackersVeeco valved crackers mechanically control flux density via a valve mechanism, making itpossible to accurately and reproducibly modulate the beam equivalent pressure. In the pastdecade, we’ve installed more than 700 Veeco valved crackers, including the world’s mostversatile and reliable units for arsenic and phosphorus. In addition, Veeco offers valvedcrackers for selenium, sulfur, antimony, tellurium, magnesium, zinc, cadmium-tellurium, andcadmium along with a valved source for mercury. These sources provide the best qualitymaterial, offer longer uptimes, and come in the largest selection of sizes. Furthermore, thenew Veeco SMC-II Series Automated Valve Positioner ensures precise and repeatableoperation of all Veeco valved sources.

    Our newest valved source, the Mark V Valved Cracker for Arsenic incorporates an innovativenozzle design, through Veeco’s flux modeling capability. This design dramatically reducesmaterial consumption by a factor of four compared to previous valved sources yet maintainsexcellent flux uniformity.

    Specialty Sources and Gas CrackersOn-going developments in materials technology require specialty sources with capabilitiesbeyond radiative heating. Veeco provides the solutions. Our UNI-Bulb® is a leak-free RFplasma source for activating stable source gases such as nitrogen and oxygen. It greatlyincreases GaN growth rates and offers excellent stability and reproducibility. Customizedhigh uniformity (typically ~2%) aperture plates are available for most commercial MBEsystems. An accompanying Autotuner increases the source’s efficiency and ease of use. TheAtom-H gas cracker provides catalytic cracking of the H2 source gas directly at the hotfilament. Other sources include CBr4 for carbon doping and NH3 for nitride applications, bothof which utilize Veeco’s nozzle technology to achieve excellent uniformity and utilization.

    Leading Sources for Production MBEOur SUMO sources and valved sources have the highest capacity and the best reliability forproduction MBE systems. The patented crucible in our SUMO sources improves your runtimes while maintaining excellent uniformity. Out valved crackers allow almost instantaneousflux changes. Arsenic need not be reloaded during every system vent since the valve may beclosed to protect the charge from oxidation. The ability to load additional arsenic before thecharge is fully depleted from the crucible also improves uptime. These sources continue to beused on >80% of production systems in the field, due to their lowest cost of ownershipadvantage.

    Expanded Source OptionsAs researchers explore more materials from the periodic table, Veeco provides more sourceoptions. Our patented negative draft PBN technology enables the only proven antimony valvedcracker. Veeco offers a variety of new oxygen-resistant and ammonia-resistant componentsthat can operate at high temperatures and required partial pressures for emerging oxide andnitride applications.

    SOFTWARE & ELECTRONICSOur newest release ECS1 Molly® Software (for Equipment Control System 1) is designed toenable new instrumentation (specifically, the Wago “sidecar” modular I/O platforms) withbetter performance and greater configurability than the previous data acquisition cards. Thisallows users to utilize a wider range of in-situ monitoring and control capabilities. This latestversion release includes: EpiTrend “always-on” data recorder; “Liberator” off-line EpiTrenddata viewer and export utility; support for new operational modes of MBE instrumentation(cross-over/specialized temp controllers and slaving of source power supplies); and extensivescripting language improvements (user-defined functions for process specific functionalityand user-written communications protocols for unsupported instrumentation).

    The newly released Veeco SMC-II Series Automated Valve Positioner provides control of allVeeco Valved Sources. The unit provides remote (computer), local (keypad) or manual(hand-operated) control of the fluxes generated, as well as remote control of the valveposition via the unit remote interface. This ensures repeatable operation using opticallyencoded position feedback.

    The Veeco DC Power Supplies produce optimal temperature control resolution. They mapsource dependent voltage range requirements to full PID output range, and provide constantpower output even as load characteristics change.

    NEW ECS1 Molly Growth ControlSoftware offers better performanceand greater flexibility.

    NEW Extended life sources andheaters for oxygen and ammoniaenvironments.

    NEW RF Plasma Source Autotunerautomatically optimizes the plasmaconditions.

    NEW Mark V Valved Cracker forArsenic maximizes your return oninvestment.

  • Veeco—Consistently Producing Industry-Changing Firsts

    VEECO INNOVATIONS USER BENEFIT

    • SUMO Sources Improves uniformity, increases capacity and uptime

    • Dual Filament Sources Reduces oval defects, providing higher device yields

    • Low Temperature Sources Provides excellent temperature stability with high vapor pressure materials

    • High Temperature Sources Deposits magnetic materials and other low vapor pressure materials

    • Oxygen-Resistant Components Provides long lifetime for high oxygen partial pressure environments

    • Ammonia-Resistant Components Provides long lifetime for high ammonia partial pressure environments

    • Valved Crackers for Arsenic andPhosphorus

    Thermally cracks large molecular species and mechanically controls material flux

    • Corrosive Series Valved Crackers Enables growth of extremely complex device structures containing antimony,tellurium, magnesium, cadmium, cadmium-tellurium

    • UNI-Bulb RF Plasma Sources withAutotuner

    Provides reactive molecular species for nitrogen, hydrogen and oxygen applications

    • Atom-H Sources Provides thermally cracked atomic hydrogen

    • Low Temperature Gas Injectors Supports growth with ammonia , CBr4 and other low temperature gases

    • Hydride Injectors Provides efficient thermal cracking of arsine and phosphine

    • High Temperature Substrate Heaters Enables high temperature growth for GaN and oxide applications

    • Nozzle Technology Improves uniformity and utilization for a wide variety of sources

    Solutions for a nanoscale world.™

    Veeco MBE Operations4900 Constellation DriveSt. Paul, MN 55127 U.S. A.Tel: 651-482-0800 Fax: 651-482-0600

    For more information, visit www.veeco.com/mbe

    ©2007 Veeco Instruments Inc. All rights reserved.SUMO, UNI-Bulb and Molly are registered trademarks and Veecoand Solutions for a nanoscale world are trademarks of Veeco. (9-07)

    More than 75% of the MBE systems inoperation today are outfitted withVeeco sources.

    /ColorImageDict > /JPEG2000ColorACSImageDict > /JPEG2000ColorImageDict > /AntiAliasGrayImages false /DownsampleGrayImages true /GrayImageDownsampleType /Bicubic /GrayImageResolution 300 /GrayImageDepth -1 /GrayImageDownsampleThreshold 1.50000 /EncodeGrayImages true /GrayImageFilter /DCTEncode /AutoFilterGrayImages true /GrayImageAutoFilterStrategy /JPEG /GrayACSImageDict > /GrayImageDict > /JPEG2000GrayACSImageDict > /JPEG2000GrayImageDict > /AntiAliasMonoImages false /DownsampleMonoImages true /MonoImageDownsampleType /Bicubic /MonoImageResolution 1200 /MonoImageDepth -1 /MonoImageDownsampleThreshold 1.50000 /EncodeMonoImages true /MonoImageFilter /CCITTFaxEncode /MonoImageDict > /AllowPSXObjects false /PDFX1aCheck false /PDFX3Check false /PDFXCompliantPDFOnly false /PDFXNoTrimBoxError true /PDFXTrimBoxToMediaBoxOffset [ 0.00000 0.00000 0.00000 0.00000 ] /PDFXSetBleedBoxToMediaBox true /PDFXBleedBoxToTrimBoxOffset [ 0.00000 0.00000 0.00000 0.00000 ] /PDFXOutputIntentProfile () /PDFXOutputCondition () /PDFXRegistryName (http://www.color.org) /PDFXTrapped /Unknown

    /Description >>> setdistillerparams> setpagedevice


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