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CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

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CLEANING AND SANITATION CLEANING AND SANITATION of of PROCESSING EQUIPMENT PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004
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Page 1: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANING AND SANITATIONCLEANING AND SANITATION

ofof

PROCESSING EQUIPMENTPROCESSING EQUIPMENT

Huub Lelieveld

FSM Chicago November 2004

Page 2: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANING and SANITATIONCLEANING and SANITATION

OBJECTIVESOBJECTIVES

• PREVENTING PRODUCT CONTAMINATION BY:

• ENSURE CONTINUED CORRECT OPERATION OF THE EQUIPMENT, AVOIDING:

- DEPOSITS (PRODUCT ON FREEZERS AND HEATERS)

- INHOMOGENEITY OF PRODUCTS (LUMPS, FLAKES)- MECHANICAL DAMAGE (PUMPS, VALVES, SEALS, …)- HAMPERING PRODUCT FLOW (PASTEURISERS)

• IMPROVE PRODUCTION EFFICIENCY

- MICROORGANISMS

- ALLERGENS- FOREIGN MATERIAL

Page 3: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANINGCLEANING

REMOVALREMOVAL OF SOIL

MAJOR CAUSES OF FOULINGMAJOR CAUSES OF FOULING

• CHEMICAL REACTION AT THE PRODUCT CONTACT SURFACE

• CRYSTALLISATION FOLLOWED BY DEPOSITION

• SEDIMENTATION OF PARTICLES

• BIOFILM FORMATION

• SOLIDIFICATION OF PRODUCT COMPONENTS ON THE SURFACE

Page 4: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

HEAT CHANGES THE SOIL, OFTEN MAKING IT MORE DIFFICULT TO REMOVE:

CLEANINGCLEANING

REMOVALREMOVAL OF SOIL

- DENATURING OF PROTEINS

- POLYMERISATION OF FATS

- REACTION PRODUCTS OF PROTEINS, FATS AND SUGAR

AVOID HIGH TEMPERATURES AS MUCH AS POSSIBLE ALSO DURING CLEANING

Page 5: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANINGCLEANING

REMOVAL REMOVAL OF SOIL

FACTORS AFFECTING CLEANING

• DESIGN OF EQUIPMENT AND PROCESS LINE

• TYPE OF SOIL (PRODUCT RESIDUES)

DETERMINING THE TIME, TEMPERATURE and CHEMICALS NEEDED

• MECHANICAL ENERGY (LIQUID VELOCITY)

Page 6: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

RESIDUAL LEVEL AFTER EFFECTIVE CLEANINGMIC

RO

OR

GA

NIS

MS

/SO

IL

TIME

MAXIMUM ACCEPTABLE CONCENTRATION

CLEANING NEEDED

EXTENSION OF PRODUCTION TIME DUE TO EFFECTIVE CLEANING

POOR CLEANING

CLEANING NEEDED

CLEANING NEEDED

START OF PRODUCTION

RESTART OF PRODUCTION

CLEANINGCLEANING

REMOVAL REMOVAL OF SOIL

Page 7: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

DELIVERING THE REQUIRED MECHANICAL and THERMAL ENERGY TO THE LOCATION OF THE SOIL

KEEPING REMOVED NON-SOLUBLE SOIL SUSPENDED

DEPENDING ON THE TYPE OF SOIL: DELIVERING THE REQUIRED CHEMICALS TO THE SOIL

REMOVAL OF THE SOIL AND CHEMICALS FROM THE EQUIPMENT

CLEANINGCLEANING

REMOVALREMOVAL OF SOIL

Page 8: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

PLATE HEAT-EXCHANGER OPENED FOR INSPECTION AFTER CLEANING

Page 9: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANINGCLEANING

SOIL CHEMICALS

SUSPENSION OF SOIL PARTICLES AND PREVENTING REDEPOSITIONING

SURFACTANTS ANIONICS

- BASED ON FATTY ACIDS- FOAMING- NOT AFFECTED BY HARD WATER

CATIONICS

- QUATERNARY AMMONIUM COMPOUNDS- LESS GOOD- BENEFIT: ANTIMICROBIAL

NONIONICS

- LOW FOAMING- GOOD WETTING- EFFECTIVE ON OIL

Page 10: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANINGCLEANING

SOIL CHEMICALS

FAT and PROTEINS

STRONG ALKALINE SOLUTIONSSODIUM HYDROXIDEPOTASSIUM HYDROXIDEORTHOSILICATEMETASILICATE

Page 11: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANINGCLEANING

SOIL CHEMICALS

INORGANIC SCALE

ACID SOLUTIONSPHOSPHORICNITRICSULPHAMICGLUCONICCITRIC

Page 12: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANINGCLEANING

SOIL CHEMICALS

METALS (Ca, Mg)

SEQUESTRANTSPHOSPHATESEDTAGLUCONATE

Page 13: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANINGCLEANING

SOIL CHEMICALS

PREVENTING DEPOSITION OF HARD WATER SALTS AFTER CLEANING

SEQUESTRANTS IN LOW CONCENTRATIONS (5-20 mg/kg)

Page 14: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANING PROCEDURE - MILKCLEANING PROCEDURE - MILK

• DUAL STAGE WITH RAW MATERIALS– Pre rinse– Alkali dosing (1,5 - 3 % NaOH) ! Gross soil removal drain– Circulation– Intermediate rinse– Acid dosing ( 1 - 3 % Acid) ! Gross soil removal drain– Circulation– Final rinse

Page 15: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

CLEANING PROCEDURE - MILKCLEANING PROCEDURE - MILK

• SINGLE STAGE WITH FORMULATED PRODUCT– Pre rinse– Alkali dosing (0,5 - 1 % NaOH) ! Gross soil removal drain– Adjunct dosing– Circulation– Final rinse

• Acid step periodically

• wetting agents• surfactants• sequestering agents• threshold agents

Page 16: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

COMPARISONCOMPARISON

Cleaning step Dual stage Cleaning step Single stagePre rinse 20 Pre rinse 20Alkali step 70 Pre clean 30Rinse 25 Alkali step 50Acid step 50 Rinse 20Rinse 15Total cleaning time 180 min. 120 min.

Page 17: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

SINGLE STAGE / FORMULATED PRODUCTSSINGLE STAGE / FORMULATED PRODUCTS

DIFFERENCESDIFFERENCES

• Increased costs for cleaning materials• Shorter cleaning time and thus

reduced down time• Less energy• Less water• Lower overall costs

Page 18: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

DUAL STAGE CLEANINGDUAL STAGE CLEANING

Page 19: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

SINGLE STAGE CLEANINGSINGLE STAGE CLEANING

Page 20: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

Blue slides borrowed from:

Lammert BaasLammert Baas

[email protected]

Page 21: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

SANITATIONSANITATION

CLEAN SURFACES ARE EASY TO SANITISECLEAN SURFACES ARE EASY TO SANITISE

• BY HEAT

• BY CHEMICALS

• BY COMBINATIONS

Page 22: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

SANITATIONSANITATION

• BY HEAT PASTEURISATIONPASTEURISATION

- INACTIVATES MOST VEGETATIVE

MICROBES, INCLUDING PATHOGENS

STERILISATIONSTERILISATION

- INACTIVATES ALL MICROBES,

INCLUDING (HEAT RESISTANT) SPORES

Page 23: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

SANITATIONSANITATION

• BY CHEMICALS or COMBINATIONS

INACTIVATES SOME OR MANY OR ALL MICROBES, INCLUDING PATHOGENS AND PATHOGENS, DEPENDING ON CHEMICALS and TEMPERATURE

Page 24: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

SANITATIONSANITATION

IMPORTANT DISINFECTANTSIMPORTANT DISINFECTANTS

• ACTIVE CHLORINE COMPOUNDS

• IODOPHORS

• QUATERNARY AMMONIUM COMPOUNDS

• PEROXY COMPOUNDS

• ACIDS AND ALKALIS AT ELEVATED TEMPERATURE

- SLIGHTLY ALKALINE HYPOCHLORITE

- CHLORINE DIOXIDE

- HYDROGENPEROXIDE

- PERACETIC ACID

Page 25: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

Emulsion picture by Jo Janssen, 1993

Page 26: CLEANING AND SANITATION of PROCESSING EQUIPMENT Huub Lelieveld FSM Chicago November 2004.

Thank you for your Thank you for your attention!attention!


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