CoolCAD Electronics, LLCSiC Fabrication Overview
Zeynep Dilli, Akin Akturk, Neil Goldsman,
Aysanew Abate, Mitchell Gross
We gratefully acknowledge the support of NASA, PowerAmerica, ARL
CoolCAD ElectronicsSiC Fabrication Portfolio
We have
• Designed, • Laid out, • Developed fabrication processes for, • Fabricated
a wide variety of SiC devices, including:
• Linear UV Photodiodes• Linear UV Photodiode Arrays• Avalanche UV Photodiodes• 3-T Pixels• MOSFETs• MOSCAPs• Passive Load Amplifiers• Active Load Amplifiers• CMOS Circuitsand more.
Linear UV Photodiodes
Linear UV Photodiode Modeling
3.2
eV
4.3
7eV
6.3
eV 4.2
eV6.1
7eV
6.4
9eV
4.4
8eV
A L M Γ A H K Γ M K
5.0
2eV
-0.2
0
0.2
0.4
0.6
0.8
1
3 4 5 6 7
Energy (eV)
Normalized Responsivity
3.2eV
4.36eV
5.07eV
Linear UV Photodiode Arrays
Miniaturization Yield Pixel Count Isolation
Avalanche UV Photodiodes
Avalanche UV Photodiodes _ Operation
3-T Pixels
SiC ICs
MOSFETs
0.00E+00
5.00E-05
1.00E-04
1.50E-04
2.00E-04
2.50E-04
0 1 2 3 4 5 6 7 8
Id (
A)
Vd (V)
400 C
40/10
10/40
Amplifiers
SiC MOSFET Common Source
AmplifierPassive Load Differential
Amplifier
Silicon Carbide Device Fabrication
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CoolCAD’s SiC fabrication and rad testing efforts
• Layout Design based on custom process rules.
• Process Design Kit development for various processes
• Lithography mask designs and fabrication
• Complementary electrical simulation tools development:
CoolSPICE.
• Process methods developed for:
• Ion Implantation / Dopant Activation
• Contact Deposition / Contact Anneal
• Oxide growth / deposition
• Etching / passivation
• Silicon carbide, silicon, germanium, etc. fabrication at the Univ. of Maryland’s Maryland Nanocenter FabLab.
• Silicon carbide high temperature complementary processing at CoolCAD’s facility.
• Silicon carbide in-house developed recipes for dopant activation, oxidation, etching, metal deposition, contact annealing, etc.
• Silicon carbide Integrated Circuit components fabrication.
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CoolCAD SiC CMOS: IV CompsGeneration 2
40mm/20mm 40mm/20mm
Raytheon / Scotland SiC
CMOS process
CoolCAD SiC CMOS process:
We offer a competitive higher
performance US based SiC foundry
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CoolCAD SiC CMOS: Hi-TempGeneration 2
15
CoolCAD SiC CMOS: Heavy Ion Tests
Generation 2
Au Normal incident,
Fluence ~2e6 ions/cm2
16
CoolCAD SiC CMOS: Heavy Ion Tests
Generation 2RUN 5 Au
Normal, T=0, Fluence ~2e5 ions/cm2, Average flux ~ 291 ions/cm2/s, Dose ~ 277 rad
PREPOST5
PREPOST5
PREPOST5
PREPOST5
PREPOST5
PREPOST5
DURING RADIATION
EN = 3.5MV/cm EP=-3.5MV/cm
IGNIGP
NM
OS
PM
OS
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CoolCAD SiC CMOS: Heavy Ion TestsAu Normal, T=0, Fluence ~2e5 ions/cm2, Average flux ~ 291 ions/cm2/s, Dose ~ 277 rad