COURSE PREVIEW• - SPIE · - Photon Upconversion Nanomaterials, Technologies and Biomedical...

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COURSE PREVIEW•

Conferences & Courses 7–12 February 2015

Photonics West Exhibition10–12 February 2015

BiOS EXPO 7–8 February 2015

The Moscone Center San Francisco, California, USA

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Make the most of your time at SPIE Photonics West—get training and access to professional development courses to stay competitive and advance your career. Learn current approaches in lasers and applications, sensors, imaging, IR systems, optical & optomechanical engineering, and more. With 65 half- and full-day courses and workshops offered, you can find those that meet your specific needs and earn CEUs to fulfill ongoing professional education requirements. SEE DETAILED DESCRIPTIONS AND REGISTER FOR COURSES ONLINE.

Take advantage of face-to-face instruction from some of the biggest names in industry and research.

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65SPIE COURSES & WORKSHOPS

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CONTINUING EDUCATION UNITSSPIE has been approved as an authorized provider of CEUs by IACET, The International Association for Continuing Education and Training (Provider #1002091). In obtaining this approval, SPIE has demonstrated that it complies with the ANSI/IACET Standards

which are widely recognized as standards of good practice.SPIE reserves the right to cancel a course due to insufficient advance registration.

- Laser Welding and Drilling Fundamentals & Practices

- Monte Carlo Modeling Explained

- A Practical Guide to Specifying Optical Components- GaN Optoelectronics: Material Properties and Device

Principles

- Cost Conscious Tolerancing of Optical Systems

- MTF in Optical and ElectroOptical Systems

- Head Mounted Displays for Augmented Reality

Applications

- Laser Systems Engineering

- Powering and Integration of Laser Diode Systems

- Laser Diode Beam Basics, Characteristics and

Manipulations

- Vibration Control for Optomechanical Systems

- Introduction to Quantitative Phase Imaging (QPI)

- Photon Upconversion Nanomaterials, Technologies and

Biomedical Applications

- Flow Cytometry Trends & Drivers

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Contents.

GET SMART. TAKE A COURSE AT SPIE PHOTONICS WEST AND LEARN FROM THE BEST INSTRUCTORS IN THE INDUSTRY

ADVANCED QUANTUM AND OPTOELECTRONIC APPLICATIONSSC1152 Monte Carlo Modeling Explained (Kanick)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 65

BIOMEDICAL SPECTROSCOPY, MICROSCOPY, AND IMAGINGSC1020 Splicing of Specialty Fibers and Glass Processing ofSun Fused Components for Fiber Laser and Medical Probe

Applications (Wang) 8:30 am to 12:30 pm, $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 54

SC1072 Statistics for Imaging and Sensor Data (Bajorski)Sun 8:30 am to 5:30 pm, $585 / $695. . . . . . . . . . . . . . . . . . . . . . . .52SC746 Introduction to Ultrafast Optics (Trebino)Sun 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . .53SC1126 Neurophotonics (Levi, Dufour) 1:30 pm to 5:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 54SC1149 Photon Upconversion Nanomaterials, Technologies andSun Biomedical Applications (Prasad) 1:30 pm to 5:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 51SC868 Optical Design for Biomedical Imaging (Liang)Mon 8:30 am to 12:30 pm, $380 / $435. . . . . . . . . . . . . . . . . . . . . . .53SC1150 Flow Cytometry Trends & Drivers (Vacca)Mon 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 49SC1003 Optical Scatter Metrology for Industry (Stover)Mon 1:30 pm to 5:30 pm, $370 / $425 . . . . . . . . . . . . . . . . . . . . . . . . 51SC952 Applications of Detection Theory (Carrano)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 50SC1152 Monte Carlo Modeling Explained (Kanick)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . .52SC309 Fluorescent Markers: Usage and Optical SystemTue Optimization (Levi) 1:30 pm to 5:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .52SC1123 The Building Blocks of IR Instrument Design (Grant)Tue 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . .53SC1148 Introduction to Quantitative Phase Imaging (QPI)Wed (Popescu, Park) 8:30 am to 5:30 pm, $525 / $635. . . . . . . . 49

CLINICAL TECHNOLOGIES AND SYSTEMSSC1020 Splicing of Specialty Fibers and Glass Processing of Sun Fused Components for Fiber Laser and Medical Probe

Applications (Wang) 8:30 am to 12:30 pm, $300 / $355. . .32SC1072 Statistics for Imaging and Sensor Data (Bajorski)Sun 8:30 am to 5:30 pm, $585 / $695. . . . . . . . . . . . . . . . . . . . . . . .33SC1126 Neurophotonics (Levi, Dufour) 1:30 pm to 5:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 31SC1149 Photon Upconversion Nanomaterials, Technologies Sun and Biomedical Applications (Prasad)

1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 29SC312 Principles and Applications of Optical Coherence Sun Tomography (Fujimoto) 1:30 pm to 5:30 pm, $300 / $355 . 28SC868 Optical Design for Biomedical Imaging (Liang)Mon 8:30 am to 12:30 pm, $380 / $435. . . . . . . . . . . . . . . . . . . . . . .28SC1150 Flow Cytometry Trends & Drivers (Vacca)Mon 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 29

SC952 Applications of Detection Theory (Carrano)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . . 31SC1152 Monte Carlo Modeling Explained (Kanick)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 30SC1123 The Building Blocks of IR Instrument Design (Grant)Tue 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . .32SC972 Basic Laser Technology (Sukuta) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .33SC1096 Head Mounted Displays for Augmented RealityWed Applications (Browne, Melzer) 8:30 am to 5:30 pm,

$525 / $635. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 30SC1148 Introduction to Quantitative Phase Imaging (QPI) Wed (Popescu, Park) 8:30 am to 5:30 pm, $525 / $635. . . . . . . . .28

DISPLAYS AND HOLOGRAPHYSC011 Design of Efficient Illumination Systems (Cassarly)Mon 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . .78SC1096 Head Mounted Displays for Augmented RealityWed Applications (Browne, Melzer) 8:30 am to 5:30 pm,

525 / $635 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .78

IMAGING AND AUGMENTED REALITYSC1072 Statistics for Imaging and Sensor Data (Bajorski)Sun 8:30 am to 5:30 pm, $585 / $695. . . . . . . . . . . . . . . . . . . . . . . . 17SC157 MTF in Optical and Electro-Optical Systems (Boreman)Tue 8:30 am to 5:30 pm, $565 / $675. . . . . . . . . . . . . . . . . . . . . . . . 16SC1096 Head Mounted Displays for Augmented RealityWed Applications (Browne, Melzer) 8:30 am to 5:30 pm,

$525 / $635. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 16SC1148 Introduction to Quantitative Phase Imaging (QPI) Wed (Popescu, Park) 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . 17

LASER APPLICATIONSSC818 Laser Beam Quality (Paschotta) 8:30 am to 12:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 69SC746 Introduction to Ultrafast Optics (Trebino)Sun 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 66SC1151 Laser Welding and Drilling - Fundamentals & PracticesMon (Engel) 8:30 am to 5:30 pm, $525 / $635 . . . . . . . . . . . . . . . 66SC1146 Laser Diode Beam Basics, Characteristics and Tue Manipulation (Sun) 8:30 am to 12:30 pm, $300 / $355 . . . 68SC1144 Laser Systems Engineering (Kasunic) 8:30 am to 5:30 pm, Tue $525 / $635. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .67SC1145 Powering and Integration of Laser Diode SystemsTue (Bystryak, Trestman) 1:30 pm to 5:30 pm, $300 / $355 . . . .67SC1089 Laser Safety for Engineers (Lieb) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 68

SPIE COURSES

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LASER MICRO-/NANOENGINEERINGSC818 Laser Beam Quality (Paschotta) 8:30 am to 12:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .57SC746 Introduction to Ultrafast Optics (Trebino) Sun 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . .57SC1151 Laser Welding and Drilling - Fundamentals & PracticesMon (Engel) 8:30 am to 5:30 pm, $525 / $635 . . . . . . . . . . . . . . . 56SC743 Micromachining with Femtosecond Lasers Mon (Nolte, Schaffer) 8:30 am to 12:30 pm, $300 / $355 . . . . . . .55SC689 Precision Laser Micromanufacturing (Schaeffer)Mon 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . .55SC1144 Laser Systems Engineering (Kasunic) 8:30 am to 5:30 pm,Tue $525 / $635. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 56SC1089 Laser Safety for Engineers (Lieb) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .57

LASER SOURCE ENGINEERINGSC748 High-Power Fiber Sources (Nilsson) 8:30 am to 5:30 pm,Sun $525 / $635. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 18SC818 Laser Beam Quality (Paschotta)8:30 am to 12:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 20SC1020 Splicing of Specialty Fibers and Glass Processing ofSun Fused Components for Fiber Laser and Medical Probe

Applications (Wang) 8:30 am to 12:30 pm, $300 / $355. . 20SC746 Introduction to Ultrafast Optics (Trebino) Sun 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . .22SC931 Applied Nonlinear Frequency Conversion (Paschotta)Mon 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . .22SC047 Introduction to Nonlinear Optics (Fisher)Mon 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . .22SC1146 Laser Diode Beam Basics, Characteristics and Tue Manipulation (Sun) 8:30 am to 12:30 pm, $300 / $355 . . . . 21SC1144 Laser Systems Engineering (Kasunic) 8:30 am to Tue 5:30 pm, $525 / $635 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 17SC744 Ultrafast Fiber Lasers and Frequency Combs (Fermann)Tue 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 18SC1145 Powering and Integration of Laser Diode Systems Tue (Bystryak, Trestman) 1:30 pm to 5:30 pm, $300 / $355 . . . . 21SC972 Basic Laser Technology (Sukuta) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 19SC1089 Laser Safety for Engineers (Lieb) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 20SC752 Solid State Laser Technology (Hodgson) Wed 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . . 19SC1012 Coherent Mid-Infrared Sources and ApplicationsThu (Vodopyanov) 1:30 pm to 5:30 pm, $300 / $355 . . . . . . . . . .23

METROLOGY & STANDARDSSC1003 Optical Scatter Metrology for Industry (Stover)Mon 1:30 pm to 5:30 pm, $370 / $425 . . . . . . . . . . . . . . . . . . . . . . . 34SC1153 A Practical Guide to Specifying Optical Components Tue (Aikens) 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . 34SC1152 Monte Carlo Modeling Explained (Kanick) Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 36SC1089 Laser Safety for Engineers (Lieb) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 36SC212 Modern Optical Testing (Wyant)8:30 am to 12:30 pm, Wed $335 / $390 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 34SC700 Understanding Scratch and Dig Specifications (Aikens)Wed 8:30 am to 12:30 pm, $370 / $425 . . . . . . . . . . . . . . . . . . . . . . .35SC1017 Optics Surface Inspection Workshop (Aikens)Wed 1:30 pm to 5:30 pm, $380 / $435. . . . . . . . . . . . . . . . . . . . . . . .35

MOEMS-MEMS IN PHOTONICSSC818 Laser Beam Quality (Paschotta) 8:30 am to 12:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 61SC743 Micromachining with Femtosecond Lasers Mon (Nolte, Schaffer) 8:30 am to 12:30 pm, $300 / $355 . . . . . . 60SC689 Precision Laser Micromanufacturing (Schaeffer)Mon 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 59SC1071 Understanding Diffractive Optics (Soskind)Mon 1:30 pm to 5:30 pm, $335 / $390 . . . . . . . . . . . . . . . . . . . . . . . 58SC454 Fabrication Technologies for Micro- and Nano-OpticsTue (Suleski) 8:30 am to 12:30 pm, $300 / $355 . . . . . . . . . . . . . 59SC1146 Laser Diode Beam Basics, Characteristics and Tue Manipulation (Sun) 8:30 am to 12:30 pm, $300 / $355 . . . 60SC1144 Laser Systems Engineering (Kasunic)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 60SC1125 Design Techniques for Micro-optics (Kress) Wed 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . 58

NANO/BIOPHOTONICSSC1126 Neurophotonics (Levi, Dufour) 1:30 pm to 5:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 70SC1149 Photon Upconversion Nanomaterials, Technologies andSun Biomedical Applications (Prasad) 1:30 pm to 5:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 69SC1152 Monte Carlo Modeling Explained (Kanick)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 70SC309 Fluorescent Markers: Usage and Optical SystemTue Optimization (Levi) 1:30 pm to 5:30 pm, $300 / $355 . . . . 69

NANOTECHNOLOGIES IN PHOTONICSSC608 Photonic Crystals: A Crash Course, from Bandgaps toSun Fibers (Johnson) 8:30 am to 12:30 pm, $345 / $400 . . . . . . 41SC1149 Photon Upconversion Nanomaterials, Technologies andSun Biomedical Applications (Prasad) 1:30 pm to 5:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 41

NONLINEAR OPTICSSC1020 Splicing of Specialty Fibers and Glass Processing of Sun Fused Components for Fiber Laser and Medical Probe

Applications (Wang)8:30 am to 12:30 pm, $300 / $355 . . 38SC931 Applied Nonlinear Frequency Conversion (Paschotta)Mon 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . .37SC047 Introduction to Nonlinear Optics (Fisher)Mon 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 36SC1012 Coherent Mid-Infrared Sources and ApplicationsThu (Vodopyanov) 1:30 pm to 5:30 pm, $300 / $355 . . . . . . . . . .37

OPTICAL ENGINEERING & FABRICATIONSC321 Thin Film Optical Coatings (Macleod)Mon 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 42SC1003 Optical Scatter Metrology for Industry (Stover)Mon 1:30 pm to 5:30 pm, $370 / $425 . . . . . . . . . . . . . . . . . . . . . . . 44SC1071 Understanding Diffractive Optics (Soskind)Mon 1:30 pm to 5:30 pm, $335 / $390 . . . . . . . . . . . . . . . . . . . . . . . 46SC1153 A Practical Guide to Specifying Optical ComponentsTue (Aikens)8:30 am to 12:30 pm, $300 / $355 . . . . . . . . . . . . . . 43SC454 Fabrication Technologies for Micro- and Nano-OpticsTue (Suleski)8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . 45SC1086 Optical Materials, Fabrication and Testing for the Tue Optical Engineer (DeGroote Nelson) 1:30 pm to 5:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 43

SPIE COURSES

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SC972 Basic Laser Technology (Sukuta) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 46SC700 Understanding Scratch and Dig Specifications Wed (Aikens) 8:30 am to 12:30 pm, $370 / $425. . . . . . . . . . . . . . 44SC720 Cost-Conscious Tolerancing of Optical Systems Wed (Youngworth)1:30 pm to 5:30 pm, $300 / $355 . . . . . . . . . . 43SC1017 Optics Surface Inspection Workshop (Aikens)Wed 1:30 pm to 5:30 pm, $380 / $435. . . . . . . . . . . . . . . . . . . . . . . 45SC1039 Evaluating Aspheres for Manufacturability (Hall)Thu 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . 42

OPTICAL SYSTEMS & LENS DESIGNSC156 Basic Optics for Engineers (Boreman) 8:30 am to Sun 5:30 pm, $565 / $675 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 62SC690 Optical System Design: Layout Principles and PracticeSun (Greivenkamp)8:30 am to 5:30 pm, $560 / $670. . . . . . . . . 62SC011 Design of Efficient Illumination Systems (Cassarly)Mon 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . 65SC003 Practical Optical System Design (Youngworth)Mon 8:30 am to 5:30 pm, $615 / $725 . . . . . . . . . . . . . . . . . . . . . . . 63SC609 Basic Optics for Non-Optics Personnel (Harding)Mon 1:30 pm to 4:00 pm, $100 / $150 . . . . . . . . . . . . . . . . . . . . . . . . 61SC1123 The Building Blocks of IR Instrument Design (Grant)Tue 1:30 pm to 5:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . . 63SC1125 Design Techniques for Micro-optics (Kress)Wed 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . 65SC935 Introduction to Lens Design (Bentley) 8:30 am to Wed 5:30 pm, $560 / $670. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 62SC720 Cost-Conscious Tolerancing of Optical Systems Wed (Youngworth)1:30 pm to 5:30 pm, $300 / $355 . . . . . . . . . . 64SC1039 Evaluating Aspheres for Manufacturability (Hall)Thu 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . 64

OPTOELECTRONIC MATERIALS AND DEVICESSC1091 Fundamentals of Reliability Engineering for Sun Optoelectronic Devices (Leisher)8:30 am to 12:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24SC747 Semiconductor Photonic Device Fundamentals (Linden)Sun 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 24SC817 Silicon Photonics (Michel, Saini)1:30 pm to 5:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24SC822 GaN Optoelectronics: Material Properties and DeviceTue Principles (Piprek) 8:30 am to 12:30 pm, $300 / $355 . . . . .23SC1125 Design Techniques for Micro-optics (Kress)Wed 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . .25

OPTOMECHANICSSC015 Structural Adhesives for Optical Bonding (Daly)Mon 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . .72SC1147 Vibration Control for Optomechanical Systems (Ryaboy)Mon 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . . 71SC010 Introduction to Optical Alignment Techniques (Castle)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . . 71SC1120 Finite Element Analysis of Optics (Doyle, Genberg)Wed 8:30 am to 5:30 pm, $595 / $705. . . . . . . . . . . . . . . . . . . . . . . .72SC720 Cost-Conscious Tolerancing of Optical SystemsWed (Youngworth) 1:30 pm to 5:30 pm, $300 / $355 . . . . . . . . . .73SC1085 Optomechanical Systems Engineering (Kasunic)Thu 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . .72

PHOTONIC INTEGRATIONSC1091 Fundamentals of Reliability Engineering for Sun Optoelectronic Devices (Leisher) 8:30 am to 12:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 40SC608 Photonic Crystals: A Crash Course, from Bandgaps toSun Fibers (Johnson) 8:30 am to 12:30 pm, $345 / $400 . . . . . 39SC747 Semiconductor Photonic Device Fundamentals (Linden)Sun 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . 39SC817 Silicon Photonics (Michel, Saini) 1:30 pm to 5:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 38SC822 GaN Optoelectronics: Material Properties and Device Tue Principles (Piprek) 8:30 am to 12:30 pm, $300 / $355 . . . . 39SC1125 Design Techniques for Micro-optics (Kress)Wed 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . 40

PHOTONIC THERAPEUTICS AND DIAGNOSTICSSC1072 Statistics for Imaging and Sensor Data (Bajorski)Sun 8:30 am to 5:30 pm, $585 / $695. . . . . . . . . . . . . . . . . . . . . . . 26SC1126 Neurophotonics (Levi, Dufour) 1:30 pm to 5:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 26SC702 Optics and Optical Quality of the Human Eye (Roorda)Mon 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . .25SC972 Basic Laser Technology (Sukuta) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .27SC1096 Head Mounted Displays for Augmented Reality Wed Applications (Browne, Melzer) 8:30 am to 5:30 pm,

$525 / $635. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .27

SEMICONDUCTOR LASERS AND LEDSSC747 Semiconductor Photonic Device Fundamentals (Linden)Sun 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . .77SC1020 Splicing of Specialty Fibers and Glass Processing ofSun Fused Components for Fiber Laser and Medical Probe

Applications (Wang) 8:30 am to 12:30 pm, $300 / $355. . .76SC011 Design of Efficient Illumination Systems (Cassarly)Mon 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . .73SC1151 Laser Welding and Drilling - Fundamentals & PracticesMon (Engel) 8:30 am to 5:30 pm, $525 / $635 . . . . . . . . . . . . . . . .75SC052 Light-Emitting Diodes (Schubert) 1:30 pm to 5:30 pm, Mon $375 / $430 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .74SC822 GaN Optoelectronics: Material Properties and DeviceTue Principles (Piprek)8:30 am to 12:30 pm, $300 / $355 . . . . .75SC1146 Laser Diode Beam Basics, Characteristics and Tue Manipulation (Sun) 8:30 am to 12:30 pm, $300 / $355 . . . .74SC1145 Powering and Integration of Laser Diode Systems Tue (Bystryak, Trestman)1:30 pm to 5:30 pm, $300 / $355. . . . .74SC1125 Design Techniques for Micro-optics (Kress)Wed 8:30 am to 12:30 pm, $300 / $355. . . . . . . . . . . . . . . . . . . . . . .76SC1089 Laser Safety for Engineers (Lieb) 8:30 am to 12:30 pm, Wed $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .77SC1012 Coherent Mid-Infrared Sources and ApplicationsThu (Vodopyanov) 1:30 pm to 5:30 pm, $300 / $355 . . . . . . . . . .76

SPIE COURSES

6

SPIE COURSES

TISSUE OPTICS, LASER-TISSUE INTERACTION, AND TISSUE ENGINEERINGSC1072 Statistics for Imaging and Sensor Data (Bajorski)Sun 8:30 am to 5:30 pm, $585 / $695. . . . . . . . . . . . . . . . . . . . . . . .47SC312 Principles and Applications of Optical Coherence Sun Tomography (Fujimoto) 1:30 pm to 5:30 pm,

$300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 48SC029 Tissue Optics (Jacques) 1:30 pm to 5:30 pm, Sun $300 / $355 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 46SC868 Optical Design for Biomedical Imaging (Liang)Mon 8:30 am to 12:30 pm, $380 / $435. . . . . . . . . . . . . . . . . . . . . . 48SC1152 Monte Carlo Modeling Explained (Kanick)Tue 8:30 am to 5:30 pm, $525 / $635. . . . . . . . . . . . . . . . . . . . . . . .47SC1148 Introduction to Quantitative Phase Imaging (QPI)Wed (Popescu, Park) 8:30 am to 5:30 pm, $525 / $635. . . . . . . . .47

PROFESSIONAL DEVELOPMENT WORKSHOPSWS667 The Craft of Scientific Presentations: A Workshop on Mon Technical Presentations (Haas) 8:30 am to 12:30 pm,

$75 / $125 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .79WS668 The Craft of Scientific Writing: A Workshop on Mon Technical Writing (Haas) 1:30 pm to 5:30 pm,

$75 / $125 . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 80WS1059 Resumes to Interviews: Strategies for a Successful Tue Job Search (Lawson, Krinsky) 1:30 pm to 4:30 pm,

$50 / $100. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .79

7

SATURDAY SUNDAY MONDAY TUESDAY WEDNESDAY THURSDAY

New Courses for 2015SC1149 Photon Upconversion Nanomaterials, Technologies and Biomedical Applications (Prasad) 1:30 pm to 5:30 pm, $300 / $355, p.29

SC1147 Vibration Control for Optomechanical Systems (Ryaboy) 8:30 am to 5:30 pm, $525 / $635, p.71

SC1144 Laser Systems Engineering (Kasunic) 8:30 am to 5:30 pm, $525 / $635, p.17

SC1096 Head Mounted Displays for Augmented Reality Applications (Browne, Melzer) 8:30 am to 5:30 pm, $525 / $635, p.16

SC1150 Flow Cytometry Trends & Drivers (Vacca) 1:30 pm to 5:30 pm, $300 / $355, p.29

SC1145 Powering and Integration of Laser Diode Systems (Bystryak, Trestman) 1:30 pm to 5:30 pm, $300 / $355, p.21

SC1148 Introduction to Quantitative Phase Imaging (QPI) (Popescu, Park) 8:30 am to 5:30 pm, $525 / $635, p.17

SC1151 Laser Welding and Drilling - Fundamentals & Practices (Engel) 8:30 am to 5:30 pm, $525 / $635, p.56

SC1146 Laser Diode Beam Basics, Characteristics and Manipulation (Sun) 8:30 am to 12:30 pm, $300 / $355, p.21

SC720 Cost-Conscious Tolerancing of Optical Systems (Youngworth) 1:30 pm to 5:30 pm, $300 / $355, p.43

SC1152 Monte Carlo Modeling Explained (Kanick) 8:30 am to 5:30 pm, $525 / $635, p.30

SC1153 A Practical Guide to Specifying Optical Components (Aikens) 8:30 am to 12:30 pm, $300 / $355, p.34

SC157 MTF in Optical and Electro-Optical Systems (Boreman) 8:30 am to 5:30 pm, $565 / $675, p.16

SC822 GaN Optoelectronics: Material Properties and Device Principles (Piprek) 8:30 am to 12:30 pm, $300 / $355, p.23

Advanced Quantum and Optoelectronic ApplicationsSC1152 Monte Carlo Modeling Explained (Kanick) 8:30 am to 5:30 pm, $525 / $635, p.65

DAILY COURSE SCHEDULELEARN DIRECTLY FROM INDUSTRY EXPERTS AND GET THE

TRAINING YOU NEED TO STAY AT THE TOP OF YOUR FI ELD.

8


Biomedical Spectroscopy, Microscopy, and ImagingSC1020 Splicing of Specialty Fibers and Glass Processing of Fused Components for Fiber Laser and Medical Probe Applications (Wang) 8:30 am to 12:30 pm, $300 / $355, p.54

SC868 Optical Design for Biomedical Imaging (Liang) 8:30 am to 12:30 pm, $380 / $435, p.53

SC952 Applications of Detection Theory (Carrano) 8:30 am to 5:30 pm, $525 / $635, p.50


SC1072 Statistics for Imaging and Sensor Data (Bajorski) 8:30 am to 5:30 pm, $585 / $695, p.52



SC746 Introduction to Ultrafast Optics (Trebino) 1:30 pm to 5:30 pm, $300 / $355, p.53

SC1003 Optical Scatter Metrology for Industry (Stover) 1:30 pm to 5:30 pm, $370 / $425, p.51

SC309 Fluorescent Markers: Usage and Optical System Optimization (Levi) 1:30 pm to 5:30 pm, $300 / $355, p.52

SC1126 Neurophotonics (Levi, Dufour) 1:30 pm to 5:30 pm, $300 / $355, p.54

SC1123 The Building Blocks of IR Instrument Design (Grant) 1:30 pm to 5:30 pm, $300 / $355, p.53

SC1149 Photon Upconversion Nanomaterials, Technologies and Biomedical Applications (Prasad) 1:30 pm to 5:30 pm, $300 / $355, p.51

Clinical Technologies and SystemsSC1020 Splicing of Specialty Fibers and Glass Processing of Fused Components for Fiber Laser and Medical Probe Applications (Wang) 8:30 am to 12:30 pm, $300 / $355, p.32


SC952 Applications of Detection Theory (Carrano) 8:30 am to 5:30 pm, $525 / $635, p.31

SC972 Basic Laser Technology (Sukuta) 8:30 am to 12:30 pm, $300 / $355, p.33

SC1072 Statistics for Imaging and Sensor Data (Bajorski) 8:30 am to 5:30 pm, $585 / $695, p.33








SC312 Principles and Applications of Optical Coherence Tomography (Fujimoto) 1:30 pm to 5:30 pm, $300 / $355, p.28

DAILY COURSE SCHEDULE

9


Displays and HolographySC011 Design of Efficient Illumination Systems (Cassarly) 8:30 am to 12:30 pm, $300 / $355, p.78


Imaging and Augmented RealitySC1072 Statistics for Imaging and Sensor Data (Bajorski) 8:30 am to 5:30 pm, $585 / $695, p.17

SC157 MTF in Optical and Electro-Optical Systems (Boreman) 8:30 am to 5:30 pm, $565 / $675, p.16



Laser ApplicationsSC818 Laser Beam Quality (Paschotta) 8:30 am to 12:30 pm, $300 / $355, p.69






SC1089 Laser Safety for Engineers (Lieb) 8:30 am to 12:30 pm, $300 / $355, p.68

Laser Micro-/NanoengineeringSC818 Laser Beam Quality (Paschotta) 8:30 am to 12:30 pm, $300 / $355, p.57





SC743 Micromachining with Femtosecond Lasers (Nolte, Schaffer) 8:30 am to 12:30 pm, $300 / $355, p.55

SC689 Precision Laser Micromanufacturing (Schaeffer) 1:30 pm to 5:30 pm, $300 / $355, p.55


10


Laser Source Engineering

SC748 High-Power Fiber Sources (Nilsson) 8:30 am to 5:30 pm, $525 / $635, p.18

SC931 Applied Nonlinear Frequency Conversion (Paschotta) 8:30 am to 5:30 pm, $525 / $635, p.22



SC1012 Coherent Mid-Infrared Sources and Applications (Vodopyanov) 1:30 pm to 5:30 pm, $300 / $355, p.23

SC818 Laser Beam Quality (Paschotta) 8:30 am to 12:30 pm, $300 / $355, p.20

SC047 Introduction to Nonlinear Optics (Fisher) 1:30 pm to 5:30 pm, $300 / $355, p.22



SC1020 Splicing of Specialty Fibers and Glass Processing of Fused Components for Fiber Laser and Medical Probe Applications (Wang) 8:30 am to 12:30 pm, $300 / $355, p.20

SC744 Ultrafast Fiber Lasers and Frequency Combs (Fermann) 8:30 am to 12:30 pm, $300 / $355, p.18

SC752 Solid State Laser Technology (Hodgson) 8:30 am to 5:30 pm, $525 / $635, p.19



Metrology & StandardsSC1003 Optical Scatter Metrology for Industry (Stover) 1:30 pm to 5:30 pm, $370 / $425, p.34




SC212 Modern Optical Testing (Wyant) 8:30 am to 12:30 pm, $335 / $390, p.34

SC700 Understanding Scratch and Dig Specifications (Aikens) 8:30 am to 12:30 pm, $370 / $425, p.35

SC1017 Optics Surface Inspection Workshop (Aikens) 1:30 pm to 5:30 pm, $380 / $435, p.35


11


MOEMS-MEMS in PhotonicsSC818 Laser Beam Quality (Paschotta) 8:30 am to 12:30 pm, $300 / $355, p.61

SC743 Micromachining with Femtosecond Lasers (Nolte, Schaffer) 8:30 am to 12:30 pm, $300 / $355, p.60

SC454 Fabrication Technologies for Micro- and Nano-Optics (Suleski) 8:30 am to 12:30 pm, $300 / $355, p.59

SC1125 Design Techniques for Micro-optics (Kress) 8:30 am to 12:30 pm, $300 / $355, p.58

SC689 Precision Laser Micromanufacturing (Schaeffer) 1:30 pm to 5:30 pm, $300 / $355, p.59


SC1071 Understanding Diffractive Optics (Soskind) 1:30 pm to 5:30 pm, $335 / $390, p.58


Nano/BiophotonicsSC1126 Neurophotonics (Levi, Dufour) 1:30 pm to 5:30 pm, $300 / $355, p.70



SC309 Fluorescent Markers: Usage and Optical System Optimization (Levi) 1:30 pm to 5:30 pm, $300 / $355, p.69

Nanotechnologies in PhotonicsSC608 Photonic Crystals: A Crash Course, from Bandgaps to Fibers (Johnson) 8:30 am to 12:30 pm, $345 / $400, p.41



12


Nonlinear OpticsSC1020 Splicing of Specialty Fibers and Glass Processing of Fused Components for Fiber Laser and Medical Probe Applications (Wang) 8:30 am to 12:30 pm, $300 / $355, p.38

SC931 Applied Nonlinear Frequency Conversion (Paschotta) 8:30 am to 5:30 pm, $525 / $635, p.37

SC047 Introduction to Nonlinear Optics (Fisher) 1:30 pm to 5:30 pm, $300 / $355, p.36

Optical Engineering & FabricationSC321 Thin Film Optical Coatings (Macleod) 8:30 am to 5:30 pm, $525 / $635, p.42



SC1039 Evaluating Aspheres for Manufacturability (Hall) 8:30 am to 12:30 pm, $300 / $355, p.42

SC1003 Optical Scatter Metrology for Industry (Stover) 1:30 pm to 5:30 pm, $370 / $425, p.44

SC454 Fabrication Technologies for Micro- and Nano-Optics (Suleski) 8:30 am to 12:30 pm, $300 / $355, p.45

SC700 Understanding Scratch and Dig Specifications (Aikens) 8:30 am to 12:30 pm, $370 / $425, p.44

SC1071 Understanding Diffractive Optics (Soskind) 1:30 pm to 5:30 pm, $335 / $390, p.46

SC1086 Optical Materials, Fabrication and Testing for the Optical Engineer (DeGroote Nelson) 1:30 pm to 5:30 pm, $300 / $355, p.43


SC1017 Optics Surface Inspection Workshop (Aikens) 1:30 pm to 5:30 pm, $380 / $435, p.45

Optical Systems & Lens DesignSC156 Basic Optics for Engineers (Boreman) 8:30 am to 5:30 pm, $565 / $675, p.63

SC011 Design of Efficient Illumination Systems (Cassarly) 8:30 am to 12:30 pm, $300 / $355, p.65



SC1039 Evaluating Aspheres for Manufacturability (Hall) 8:30 am to 12:30 pm, $300 / $355, p.64

SC690 Optical System Design: Layout Principles and Practice (Greivenkamp) 8:30 am to 5:30 pm, $560 / $670, p.62

SC003 Practical Optical System Design (Youngworth) 8:30 am to 5:30 pm, $615 / $725, p.63

SC935 Introduction to Lens Design (Bentley) 8:30 am to 5:30 pm, $560 / $670, p.62

SC609 Basic Optics for Non-Optics Personnel (Harding) 1:30 pm to 4:00 pm, $100 / $150, p.61




13


Optoelectronic Materials and DevicesSC1091 Fundamentals of Reliability Engineering for Optoelectronic Devices (Leisher) 8:30 am to 12:30 pm, $300 / $355, p.24



SC747 Semiconductor Photonic Device Fundamentals (Linden) 8:30 am to 5:30 pm, $525 / $635, p.24

SC817 Silicon Photonics (Michel, Saini) 1:30 pm to 5:30 pm, $300 / $355, p.24

OptomechanicsSC015 Structural Adhesives for Optical Bonding (Daly) 8:30 am to 12:30 pm, $300 / $355, p.72

SC010 Introduction to Optical Alignment Techniques (Castle) 8:30 am to 5:30 pm, $525 / $635, p.71

SC1120 Finite Element Analysis of Optics (Doyle, Genberg) 8:30 am to 5:30 pm, $595 / $705, p.72

SC1085 Optomechanical Systems Engineering (Kasunic) 8:30 am to 5:30 pm, $525 / $635, p.72

SC1147 Vibration Control for Optomechanical Systems (Ryaboy) 8:30 am to 5:30 pm, $525 / $635, p.71


Photonic IntegrationSC1091 Fundamentals of Reliability Engineering for Optoelectronic Devices (Leisher) 8:30 am to 12:30 pm, $300 / $355, p.40



SC608 Photonic Crystals: A Crash Course, from Bandgaps to Fibers (Johnson) 8:30 am to 12:30 pm, $345 / $400, p.39

SC747 Semiconductor Photonic Device Fundamentals (Linden) 8:30 am to 5:30 pm, $525 / $635, p.39

SC817 Silicon Photonics (Michel, Saini) 1:30 pm to 5:30 pm, $300 / $355, p.38


14


Photonic Therapeutics and DiagnosticsSC1072 Statistics for Imaging and Sensor Data (Bajorski) 8:30 am to 5:30 pm, $585 / $695, p.26

SC702 Optics and Optical Quality of the Human Eye (Roorda) 8:30 am to 12:30 pm, $300 / $355, p.25




Semiconductor Lasers and LEDsSC747 Semiconductor Photonic Device Fundamentals (Linden) 8:30 am to 5:30 pm, $525 / $635, p.77

SC011 Design of Efficient Illumination Systems (Cassarly) 8:30 am to 12:30 pm, $300 / $355, p.73




SC1020 Splicing of Specialty Fibers and Glass Processing of Fused Components for Fiber Laser and Medical Probe Applications (Wang) 8:30 am to 12:30 pm, $300 / $355, p.76




SC052 Light-Emitting Diodes (Schubert) 1:30 pm to 5:30 pm, $375 / $430, p.74


Tissue Optics, Laser-Tissue Interaction, and Tissue EngineeringSC1072 Statistics for Imaging and Sensor Data (Bajorski) 8:30 am to 5:30 pm, $585 / $695, p.47




SC312 Principles and Applications of Optical Coherence Tomography (Fujimoto) 1:30 pm to 5:30 pm, $300 / $355, p.48

SC029 Tissue Optics (Jacques) 1:30 pm to 5:30 pm, $300 / $355, p.46


15


Professional Development WorkshopsWS667 The Craft of Scientific Presentations: A Workshop on Technical Presentations (Haas) 8:30 am to 12:30 pm, $75 / $125, p.79

WS1059 Resumes to Interviews: Strategies for a Successful Job Search (Lawson, Krinsky) 1:30 pm to 4:30 pm, $50 / $100, p.79

WS668 The Craft of Scientific Writing: A Workshop on Technical Writing (Haas) 1:30 pm to 5:30 pm, $75 / $125, p.80


16

COURSES

Imaging and Augmented RealityHead Mounted Displays for New Augmented Reality ApplicationsSC1096Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Wednesday 8:30 am to 5:30 pm

There has never been a more exciting time for augmented reality. The advent of high resolution microdisplays, the invention of new optical designs like waveguide eyepieces, and the significant advances in optical manufacturing techniques mean that augmented reality head mounted displays can be produced now that were not possible even a few years ago. This new hardware, coupled with innovative concepts in software applications as demonstrated in Google’s Project Glass video, mean that for the first time it may be possible to develop a compelling augmented reality system for the consumer market.

The authors, with a combined experience of almost 50 years in the design of augmented reality systems, will identify the key performance parameters necessary to understand the specification, design and purchase of augmented reality HMD (head mounted display) systems and help students understand how to separate the hype from reality in evaluating new augmented reality HMDs. This course will evaluate the performance of various HMD systems and give students the basic tools necessary to understand the important parameters in augmented reality HMDs. This is an introductory class and assumes no background in head mounted displays or optical design.

LEARNING OUTCOMESThis course will enable you to:• define basic components and attributes of augmented reality

head-mounted displays and visually coupled systems• describe important features and enabling technologies of an HMD

and their impact on user performance and acceptance• differentiate between video and optical see-through augmented

reality HMDs• identify key user-oriented performance requirements and link their

impact on HMD design parameters• list basic features of the human visual system and biomechanical

attributes of the head and neck and the guidelines to follow to prevent fatigue or strain

• identify key tradeoffs for monocular, binocular and biocular systems

• classify current image source technologies and their methods for producing color imagery

• describe methods of producing augmented reality HMDs• evaluate tradeoffs for critical display performance parameters

INTENDED AUDIENCESoftware developers, hardware engineers, scientists, engineers, researchers, technicians, or managers who wish to learn the funda-mentals of the specification, design, and use of augmented reality head mounted displays.

INSTRUCTORMichael Browne is the Vice President of Product Development at SA Photonics in San Francisco, California. He has a Ph.D. in Optical Engineering from the University of Arizona’s Optical Sciences Center. Mike has been involved in the design, test and measurement of aug-mented reality systems since 1991. At Kaiser Electronics, Mike led the design of numerous augmented reality head mounted displays systems including those for the RAH-66 Comanche helicopter and the F-35 Joint Strike Fighter. Mike also invented one of the first head-mounted “virtual workstations” for interacting with data in a virtual space. Mike leads SA Photonics’ programs for the design and development of

person-mounted information systems, including body-worn electron-ics, head-mounted displays and night vision systems. Mike’s current research includes investigations into the design of wide field of view augmented reality head mounted displays, binocular rivalry in head mounted displays, and smear reduction in digital displays.

James Melzer is Manager of Research and Technology at Rockwell Collins Optronics, in Carlsbad, California, where he has been designing head-mounted displays for over 27 years. He holds a BS from Loyola Marymount University and an SM from the Massachusetts Institute of Technology. He has extensive experience in optical and displays engineering, visual human factors, and is an expert in display design for head-mounted systems, aviation life-support, and user interfaces. His research interests are in visual and auditory perception, cognitive workload reduction, and bio-inspired applications of insect vision. He has authored over 40 technical papers and book chapters and holds four patents in head-mounted display design.

MTF in Optical and Electro- New Optical SystemsSC157Course Level: IntroductoryCEU: 0.65 $565 Members | $675 Non-Members USD Tuesday 8:30 am to 5:30 pm

Modulation transfer function (MTF) is used to specify the image quality achieved by an imaging system. It is useful in analysis of situations where several independent subsystems are combined. This course provides a background in the application of MTF techniques to per-formance specification, estimation and characterization of optical and electro-optical systems.

LEARNING OUTCOMESThis course will enable you to:• list the basic assumptions of linear systems theory, including the

concept of spatial frequency• identify relationship between impulse response, resolution, MTF,

OTF, PTF, and CTF• estimate the MTF for both diffraction-limited and aberration-

limited systems• explain the relationship between MTF, line response, and edge

response functions• identify MTF contributions from finite detector size, crosstalk,

charge transfer inefficiency, and electronics• summarize the effects of noise

INTENDED AUDIENCEEngineers, scientists, and managers who need to understand and apply the basic concepts of MTF to specifying, estimating, or characterizing performance. Some prior background in Fourier concepts is helpful.

INSTRUCTORGlenn Boreman is the Chairman of the Department of Physics and Optical Science at the University of North Carolina at Charlotte since 2011. He received a BS in Optics from Rochester and PhD in Optics from Arizona. Prof. Boreman served on the faculty of University of Central Florida for 27 years, with 25 PhD students supervised to completion. His research interests are in infrared detectors, infrared metamateri-als, and electro-optical sensing systems. Prof. Boreman is a Fellow of SPIE, OSA, and the Military Sensing Symposium, and is the 2015 Vice-President of SPIE.is the Chairman of the Department of Physics and Optical Science at the University of North Carolina at Charlotte. He received a BS in Optics from Rochester and PhD in Optics from Arizona. Prof. Boreman served on the faculty of University of Central Florida for 27 years, with 23 PhD students supervised to completion. His research interests are in infrared detectors, infrared metamaterials, and electro-optical sensing systems. Prof. Boreman is a Fellow of SPIE, OSA, and the Military Sensing Symposium.

COURSE PRICE INCLUDES the text Modulation Transfer Function in Opti-cal and Electro-Optical Systems (SPIE Press, 2001) by Glenn D. Boreman.

17

Introduction to Quantitative New Phase Imaging (QPI)SC1148Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Wednesday 8:30 am to 5:30 pm

This course aims to help researchers join the exciting and quickly emerging field of biomedical QPI. Quantifying cell-induced shifts in the optical path-lengths permits nanometer scale measurements of structures and motions in a non-contact, non-invasive manner. We will explain the basic principles and applications of QPI.

In the first part of the course – Methods - we will cover the main ap-proaches to QPI, including phase-shifting, off-axis, common-path, and white-light methods, together with their figures of merit. A practical guide to designing and implementing instrumentation for QPI, along with image processing techniques will be presented.

The second part of the course – Applications – will review recent ad-vances in biomedical applications of QPI. We will cover basic applica-tions published in the recent literature on cell structure, dynamics and light scattering, as well as clinical applications such as blood testing and tissue diagnosis.

LEARNING OUTCOMESThis course will enable you to:• identify and describe the pros and cons of various QPI

experimental geometries• write down the interference and phase retrieval equations for

phase shifting and off-axis methods• discriminate between the spatial and temporal phase noise in QPI• explain the relationship between QPI and angular light scattering• compute tomographic reconstructions under the Born

approximation using QPI data• summarize the applications of quantitative phase imaging to

biomedicine• estimate cell dry mass, red blood cell volume, angular scattering

map, etc., from QPI data

INTENDED AUDIENCEScientists and engineers who wish to broaden their research portfolio by exploring the possibilities in the field of quantitative phase imaging. Undergraduate training in optics or equivalent is assumed.

INSTRUCTORGabriel Popescu is Associate Professor of Electrical Engineering and Bioengineering at University of Illinois at Urbana-Champaign. He earned a Ph.D. in Optics from CREOL and began work on QPI as a postdoctoral associate at MIT’s Spectroscopy Laboratory. He has been active in Biomedical Optics for the past two decades and focused on QPI since 2002. Recognition for his work includes the National Science Foundation CAREER Award, Innovation Discovery finalist (UIUC, 2012), Center for Advanced Fellow at UIUC (2012-2013), New Venture Compe-tition finalists (UIUC, 2014). Dr. Popescu is a Senior Member of OSA and SPIE Fellow. He is Associate Editor of Optics Express and Biomedical Optics Express and Editorial Board Member of Journal of Biomedical Optics. Dr. Popescu founded Phi optics, Inc., a startup company that commercializes QPI technology for materials life sciences. To learn more about Prof. Popescu’s research, visit http://light.ece.illinois.edu/.

YongKeun Park is the Ewon Assistant Professor of Physics at Korea Advanced Institute of Science and Technology (KAIST), Republic of Korea. He earned a Ph.D. in Medical Science and Medical Engineer-ing from Harvard-MIT Health Science and Technology. He has been working on QPI techniques and their applications for the study of pathophysiology of cells and tissues. Dr. Park is a Senior Member of SPIE and Editorial Board Member of Scientific Reports (Nature Pub-lishing Group) and Journal of Optical Society of Korean. To learn more about Prof. Park’s research projects, visit his website: http://bmokaist.wordpress.com/

Notes based from the text Quantitative Phase Imaging of Cells and Tissues (McGraw-Hill, 2011) by G. Popescu, as well as current journal publications, will be provided to attendees.

Statistics for Imaging and Sensor DataSC1072Course Level: IntroductoryCEU: 0.65 $585 Members | $695 Non-Members USD Sunday 8:30 am to 5:30 pm

The purpose of this course is to survey fundamental statistical methods in the context of imaging and sensing applications. You will learn the tools and how to apply them correctly in a given context. The instructor will clarify many misconceptions associated with using statistical meth-ods. The course is full of practical and useful examples of analyses of imaging data. Intuitive and geometric understanding of the introduced concepts will be emphasized. The topics covered include hypothesis testing, confidence intervals, regression methods, and statistical signal processing (and its relationship to linear models). We will also discuss outlier detection, the method of Monte Carlo simulations, and bootstrap.

LEARNING OUTCOMES• apply the statistical methods suitable for a given context• demonstrate the statistical significance of your results based on

hypothesis testing• construct confidence intervals for a variety of imaging applications• fit predictive equations to your imaging data• construct confidence and prediction intervals for a response

variable as a function of predictors• explain the basics of statistical signal processing and its

relationship to linear regression models• perform correct analysis of outliers in data• implement the methodology of Monte Carlo simulations

INTENDED AUDIENCEThis course is intended for participants who need to incorporate funda-mental statistical methods in their work with imaging data. Participants are expected to have some experience with analyzing data.

INSTRUCTORPeter Bajorski is Professor of Statistics and Graduate Program Chair at the Rochester Institute of Technology. He teaches graduate and undergraduate courses in statistics including a course on Multivariate Statistics for Imaging Science. He also designs and teaches short courses in industry, with longer-term follow-up and consulting. He performs research in statistics and in hyperspectral imaging. Dr. Ba-jorski wrote a book on Statistics for Imaging, Optics, and Photonics published in a prestigious Wiley Series in Probability and Statistics. He is a senior member of SPIE and IEEE.

COURSE PRICE INCLUDES the text Statistics for Imaging, Optics, and Photonics (Wiley, 2011) by Peter Bajorski.

Laser Source EngineeringLaser Systems Engineering NewSC1144Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Tuesday 8:30 am to 5:30 pm

While there are a number of courses on laser design, this course emphasizes a systems-level overview of the design and engineering of systems which incorporate lasers. Starting with a summary of the various types of lasers and their selection, it reviews common laser

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specifications (peak power, spatial coherence, etc.), Gaussian beam characteristics and propagation, laser system optics, beam control and scanning, radiometry and power budgets, detectors specific to laser systems, and the integration of these topics for developing a complete laser system. The emphasis is on real-world design problems, as well as the commercial off-the-shelf (COTS) components used to solve them.

LEARNING OUTCOMESThis course will enable you to:• describe laser types, properties, and selection, including

semiconductor, solid-state, fiber, and gas lasers• identify laser specifications such as average power, peak power,

linewidth, pulse repetition frequency, etc. that are unique to specific applications such as manufacturing, biomedical systems, laser radar, laser communications, laser displays, and directed energy

• quantify Gaussian beam characteristics, propagation, and imaging; compare beam quality metrics [M2, beam-parameter product (BPP), and Strehl ratio]

• select laser system optics (windows, focusing lenses, beam expanders, collimators, beam shapers and homogenizers) and identify critical specifications for their use, including beam truncation, aberrations, surface figure, surface roughness, surface quality, material absorption, backreflections, coatings, and laser damage threshold (LDT)

• distinguish between hardware elements available for beam control, including galvonometers, polygon scanners, MEMs scanners, and f-theta lenses

• develop power budgets and radiometric estimates of performance for point and extended objects; estimate signal-to-noise ratio (SNR) for active imaging, laser ranging, and biomedical systems

• select detectors appropriate for laser systems, including PIN photodiodes, avalanche photodiodes (APDs), and photomultiplier tubes (PMTs); estimate the performance limitations of noise sources (detector, speckle, etc.) and their effects on sensitivity and SNR

INTENDED AUDIENCEIntended for engineers (laser, systems, optical, mechanical, and electrical), scientists, technicians, and managers who are developing, specifying, or purchasing laser systems.

INSTRUCTORKeith Kasunic has more than 25 years of experience developing optical, electro-optical, infrared, and laser systems. He holds a Ph.D. in Optical Sciences from the University of Arizona, an MS in Mechan-ical Engineering from Stanford University, and a BS in Mechanical Engineering from MIT. He has worked for or been a consultant to a number of organizations, including Lockheed Martin, Ball Aerospace, Sandia National Labs, Nortel Networks, and Bookham; he is currently the Technical Director of Optical Systems Group, LLC. He is also the author of two textbooks [Optical Systems Engineering (McGraw-Hill, 2011) and Optomechanical Systems Engineering (John Wiley, 2014)], an Adjunct Professor at Univ. of Central Florida’s CREOL, an Affiliate Instructor with Georgia Tech’s SENSIAC, and an Instructor for the Optical Engineering Certificate Program at Univ. of California – Irvine.

Ultrafast Fiber Lasers and Frequency CombsSC744Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm

Starting from an introduction to fiber lasers, basic properties of fiber amplifiers are described and current state of the art fiber amplifier tech-nology is reviewed. The course then describes preferred construction methods for ultrafast fiber lasers, covering mode locked oscillators, supercontinuum sources, ultrafast fiber amplifiers, frequency convert-

ers as well as pulse compressors with numerous design examples. The utilization of these element in the construction of precision frequency combs is explained and an introduction to electronic comb control is provided.

The attendee learns about available techniques for modelling and test-ing ultrafast fiber lasers and frequency combs. Numerical modelling techniques for pulse evolution, stability, jitter and noise will be covered. Testing methods for mode quality, spectral coherence, RIN noise, and carrier phase noise, as central to the performance of frequency combs are explained in detail.

The course concludes with an overview of applications in materials processing, frequency metrology, spectroscopy and optical sampling.

LEARNING OUTCOMESThis course will enable you to:• design and build pico-and femtosecond fiber lasers• build a fiber frequency comb• model pulse evolution and timing jitter in fiber systems• characterize RIN noise, phase noise and coherence properties of

frequency combs• gain an overview of applications in material processing• gain an overview of applications in coherent optical technologies

INTENDED AUDIENCEThis course is intended for researchers, engineers and graduate stu-dents who are interested in ultrafast optical technology and frequency combs. It will not only be a ‘how to’ instruction but will also address the ‘why’ for those who want to build their own ultrafast fiber laser systems.

INSTRUCTORMartin Fermann is VP of Laser Research and Advanced Development with IMRA America Inc. He has been involved in fiber and ultrafast laser research for 30 years and is a fellow of the Optical Society of America.

High-Power Fiber SourcesSC748Course Level: AdvancedCEU: 0.65 $525 Members | $635 Non-Members USD Sunday 8:30 am to 5:30 pm

This course describes the current state of the art, research directions, and principles of high-power fiber lasers and amplifiers. Recent ad-vances have permitted output powers of these devices to reach well over a kilowatt, and underpinning fiber technology, pump lasers and pump coupling will be addressed. Rare-earth-doped fiber devices including those based on Yb-doped fibers at 1.0 - 1.1 m and the more complicated Er:Yb codoped fibers at 1.5 - 1.6 m and Tm-doped fibers at 2 m will be described in detail. Operating regimes extend from continuous-wave single-frequency to short pulses. Key equations will be introduced to establish limits and identify critical parameters. For example, high pump brightness is critical for some devices but not others. Methods to mitigate limitations in different op-erating regimes will be discussed. A large core is a critical fiber design feature of high-power fiber lasers, and the potential and limits of this approach will be covered, e.g., as it comes to beam quality. Advanced options such as beam combining and electronic control for enhanced performance will be considered, as well, together with other topics of particular interest to attendees (insofar as time allows).

LEARNING OUTCOMESThis course will enable you to:• describe the state of the art of high-power fiber lasers and

amplifiers• assess performance limitations and their underlying physical

reasons in different operating regimes• design fiber devices to mitigate detrimental effects and reach

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• describe possibilities, limitations, and implications of current technology regarding core size and rare earth concentration of doped fibers

• get a sense of areas in need of further research

INTENDED AUDIENCEThis course is intended for scientists and engineers involved in the research and development of commercial and military high power fiber systems.

INSTRUCTORJohan Nilsson leads the high-power fiber laser group at the Optoelec-tronics Research Centre (ORC), University of Southampton, England. He received a doctorate in Engineering Science from the Royal Institute of Technology, Stockholm, Sweden, for research on optical amplification, and has worked on optical amplifiers and amplification in lightwave systems, optical communications, and guided-wave lasers, for both Samsung and the ORC. His research has covered system, fabrication, and materials aspects of guided-wave lasers and amplifiers, particu-larly device aspects of high power fiber lasers and erbium-doped fiber amplifiers. He has published 300+ scientific articles and served on pro-gram committees including chairing the 2006 Fiber Laser Technology & Applications conference at Photonics West. In 2009, he guest edited two issues on high power fiber lasers and applications in IEEE J. Sel. Top. Quantum Electron. He is a fellow of the OSA.

Solid State Laser TechnologySC752Course Level: IntermediateCEU: 0.65 $525 Members | $635 Non-Members USD Wednesday 8:30 am to 5:30 pm

This course provides an overview of the design, performance character-istics and the current state of the art of solid state lasers and devices. The course reviews the laser-relevant properties of key solid state materials, and discusses the design principles for flashlamp pumped and diode-pumped solid state lasers in cw, pulsed, Q-switched and modelocked operation. Solid state media emphasized include Nd and Yb-doped crystals but mid-IR materials such as Tm, Ho and Er-doped fluorides and oxides will be addressed as well. The course will cover the fundamental scaling laws for power, energy and beam quality for various geometries of the gain medium (rod, slab, disk, waveguide) and pumping arrangements (side and end-pumped) and provides an overview of the state-of-the art of solid state lasers. This includes a review of the design and performance of fiber lasers/amplifiers and their comparison to bulk solid state lasers. An overview of the state-of the art of optically pumped semiconductor lasers (OPSL) will also be given.

Important technical advances (such as diode pump developments) that allowed the technology to mature into diverse industrial and biomedi-cal OEM devices as well as high power and scientific applications will be highlighted along with some remaining design and performance challenges. Topics also include nonlinear frequency conversion tech-niques, such as harmonic generation, Raman scattering and parametric processes, commonly used in solid state lasers to extend operation to alternative spectral regimes. The course includes an overview of currently available solid state laser products and their industrial and scientific applications.

LEARNING OUTCOMESThis course will enable you to:• describe the significant laser-relevant properties of solid state

laser materials• acquire an up-to-date overview of solid state laser materials,

components, resonators and applications• assess how thermal properties limit power scaling and beam

quality in practical laser systems• acquire the design criteria for solid state lasers in cw and pulsed

operation• learn about the design methodology of Q-switched and

modelocked lasers

• compare the properties, advantages and limitations of different high power solid state laser configurations including fiber lasers/amplifiers

• become familiar with design principles for solid state lasers with second and third harmonic generation

• develop an appreciation of the scope, depth and pace of technical progress of the state-of-the art of solid state lasers in the UV, visible, IR and mid-IR wavelengths range

INTENDED AUDIENCEThis course is intended for graduate students, engineers, scientists, technicians and managers working in solid state laser research or product development.

INSTRUCTORNorman Hodgson is Vice President for Technology and Advanced R&D at Coherent. He has more than 25 years experience in solid state laser design, optimization and product development. Previously held posi-tions include Vice President of Engineering at Coherent (2003-2009), Director of Engineering at Spectra-Physics (1998-2003), Inc., Senior Laser Engineer and Program Manager at Carl Zeiss, Inc. (1992-1996) and various university positions. He received his PhD in Physics from Technical University Berlin in 1990. He is co-author of the book “Optical Resonators” (Springer-Verlag 1996) which went into a second edition as “Laser Resonators and Beam Propagation” (Springer- Verlag 2005). Dr. Hodgson has authored over 80 publications and conference presenta-tions and is co-inventor on more than 25 issued and pending patents.

Basic Laser TechnologySC972Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Wednesday 8:30 am to 12:30 pm

If you are uncomfortable working with lasers as “black boxes” and would like to have a basic understanding of their inner workings, this introductory course will be of benefit to you. The workshop will cover the basic principles common to the operation of any laser/laser system. Next, we will discuss laser components and their functionality. Compo-nents covered will include laser pumps/energy sources, mirrors, active media, nonlinear crystals, and Q-switches. The properties of laser beams will be described in terms of some of their common performance specifications such as longitudinal modes and monochromaticity, transverse electromagnetic (TEM) modes and focusability, continuous wave (CW) power, peak power and power stability. Laser slope and wall-plug efficiencies will also be discussed.

LEARNING OUTCOMESThis course will enable you to:• describe the overall inner workings of any laser• describe the functionality of the key laser components• know the difference between how acousto- and electro-optic

Q-switches work• explain how each key component in a laser may contribute to laser

performance• intelligently engage your clients or customers using proper laser

terminology• build stronger relationships with clients and customers by

demonstrating product knowledge• obtain the technical knowledge and confidence to enhance your

job performance and rise above the competition, inside and outside your company

INTENDED AUDIENCEManagers, engineers, technicians, assemblers, sales/marketing, customer service, and other support staff. This short course will help cultivate a common/standardized understanding of lasers across the company.

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INSTRUCTORSydney Sukuta is currently a Laser Technology professor at San Jose City College. He also has industry experience working for the some the world’s leading laser manufacturers in Silicon Valley where he saw first-hand the issues they encounter on a daily basis. In response, Dr. Sukuta developed prescriptive short courses to help absolve most of these issues.

Laser Safety for EngineersSC1089Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Wednesday 8:30 am to 12:30 pm

A primary goal of the course is to provide the attendee with a review and explanation of laser safety considerations and requirements in-cumbent on a designer when bringing a product that contains a laser to market. Attendees will also obtain an understanding of laser safety considerations in the R&D environment. This includes being able to communicate the eye safety concerns & required protections for laser products as well as their hazard classification (on the internationally harmonized Classification scale for laser hazards).

LEARNING OUTCOMESThis course will enable you to:• discuss basic principles of laser technology and elementary bio-

effects of discreet wavelength ranges (acute & chronic damage mechanisms)

• become familiar with the US Laser Product Performance Standard (including both 21 CFR 1040 & IEC 60825, under FDA Laser Policy Notice 50)

• determine the classification of most common types of laser products (this course includes practical methods in an overview format, but does not include extensive content on Laser Hazard Analysis Calculations)

• identify laser safety hazards pertinent to R&D work and recommend hazard control measures required in a laser or laser product development lab.

• list the elements required to select, maintain and use proper laser protective eyewear

• list the requirements for compliance and reporting laser products to FDA

INTENDED AUDIENCEEngineers, technicians, or managers who wish to learn about product and user laser safety and who are responsible for bringing laser prod-ucts to market. Undergraduate training in engineering or science is desirable (or comparable experience and responsibility).

INSTRUCTORThomas Lieb is President, Laser Safety Officer at L*A*I International, and has more than 25 years experience in laser systems, laser safety and laser safety education. A Certified Laser Safety Officer (CLSO), Lieb is a member of the Board of Laser Safety, responsible for reviewing and editing qualification exams. He is a member of ANSI Accredited Standards Committee and the Administrative Committee of ASC Z136 Safe Use of Lasers, Chairman of the subcommittee for ANSI Z136.9 Safe Use of Lasers in a Manufacturing Environment; contributor to ANSI B11.21 Design, Construction, Care, and Use of Laser Machine Tools (and other subcommittees of ANSI for laser safety). He has been a past member of the Board of Directors of the Laser Institute of America (LIA); and highly involved in the International Laser Safety Conference and current Chair of the 2015 ILSC PAS (Practical Application Seminars), Involved for many years in International laser safety issues, Lieb is the International Chairman of IEC/TC 76 on the Laser Safety Standard IEC [EN] 60825 and Chair of the subcommittee for ISO/IEC [EN] 11553 Safety of Machines, Laser Processing Machines He was 2008 recipient of the IEC’s “1906 Award” for significant contribution to electro-technology and the work of the IEC (International Electrotechnical Commission). An

invited lecturer at the University of Tokyo and British Health Protection Agency, as well as advising various businesses and institutions world-wide, Lieb has authored a number of technical papers and articles, and contributed to the CLSO’s Best Practices in Laser Safety manual and the text Laser Materials Processing.

Laser Beam QualitySC818Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 8:30 am to 12:30 pm

This course will address all aspects of laser beam quality. Topics to be covered are: a short introduction to Gaussian beams, definitions and importance of beam quality, measurement techniques, typical beam quality issues related to various kinds of lasers (primarily solid state la-sers and semiconductor lasers), an overview on methods for optimizing the beam quality particularly of diode-pumped solid state lasers, and the working principles of common beam shapers and mode cleaners.

LEARNING OUTCOMESThis course will enable you to:• describe the essentials of common beam quality definitions (e.g.

M2 factor and beam parameter product)• select an appropriate beam quality measurement technique for a

given type of laser• perform correct M2 measurements based on ISO 11146, and list

some common mistakes• compare different types of lasers in terms of their potential for

high beam quality• explain the most common causes for beam quality deterioration in

solid state lasers and identify options to reduce their impact• judge the potential of beam shapers and mode cleaners to

improve beam quality

INTENDED AUDIENCEThis material is intended for engineers and researchers dealing with solid state and semiconductor lasers. They should already have some basic knowledge of optics and lasers, but do not need to be experts in optical modeling or laser design. It would be useful, although not strictly required, to acquire some basic knowledge of Gaussian beams before the course – e.g., by studying the web page http://www.rp-photonics.com/gaussian_beams.html.

INSTRUCTORRuediger Paschotta is an expert in laser physics and laser technol-ogy, who originally was a scientific researcher. In 2004, he founded RP Photonics Consulting GmbH and provides technical consultancy primarily for companies building or using lasers.

Splicing of Specialty Fibers and Glass Processing of Fused Components for Fiber Laser and Medical Probe ApplicationsSC1020Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 8:30 am to 12:30 pm

This course provides attendees with the fundamentals of specialty fiber fusion splicing and fiber glass processing technologies with a focus on high power fiber laser and medical fiber probe applications. It pro-vides an introduction on specialty fibers, reviews the fiber processing approach, and compares different techniques, especially on different fiber fusion processes along with different fusion hardware. It describes

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fiber waveguide and coupling optics associated with these processes and discusses practical fusion splicing methods for specialty fibers in order to achieve optimal optical coupling between dissimilar fibers. In addition, it illustrates fiber glass processing and fabrication techniques for producing fused fiber components, such as adiabatic taper, mode-field adaptor (MFA), fiber combiners and couplers, and other related fused fiber devices. The course also describes several practical ap-plication examples on fiber lasers and monolithic fiber-based probes for OCT medical imaging.

LEARNING OUTCOMESThis course will enable you to:• become familiar with fiber processing fundamentals and state-of-

the-art fiber splicing and fusion processing tools and hardware• learn specialty fiber basics and waveguide coupling optics

between dissimilar fibers• gain in-depth knowledge of the fiber fusion splicing process and

fiber glass processing techniques• learn practical fiber fusion and glass processing methods for the

splicing of various specialty fibers (including LMA fibers, PCF fibers, and soft-glass fibers), and fabrication of adiabatic taper, MFA, combiner, and other fiber coupling devices

• apply these fiber fusion and glass processing technologies to fiber laser and fiber based medical probe applications

INTENDED AUDIENCEThis material is intended for anyone who needs to handle and splice specialty fibers and wants to learn advanced fiber fusion splicing, tapering, and glassing processing technologies for fabricating high performance fiber-based devices. This course is valuable for those who want to develop or fabricate fiber-based devices or further improve their fiber system performance.

INSTRUCTORBaishi Wang is Director of Technology at Vytran. He received his Ph.D from SUNY at Stony Brook. He has over 15 years of experience in specialty fibers, fused component fabrication and fiber fusion, and automated process equipment. His work is focused on fiber fused component technology, fiber fusion process and instrumentation, spe-cialty fibers especially those for fiber lasers and amplifiers, waveguide theory and modeling, and fiber test and measurements. Prior to joining Vytran, he was a technical staff member in the Specialty Fiber Division at Lucent Technologies and OFS. He has published numerous papers in referred conferences and journals, has given many invited talks, and has been awarded patents on specialty fibers, fused components, and fiber lasers and amplifiers. He is a member of SPIE and OSA.

Powering and Integration New of Laser Diode SystemsSC1145Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 1:30 pm to 5:30 pm

This course will provide attendees with a basic knowledge of the pro-cess of integrating diode lasers into systems. The course encourages a multidisciplinary approach in system design. The course is intended to help engineers to overcome complex technical (e.g. electromagnetic compatibility) and non-technical (e.g. cost consideration) problems.

Yet another goal of this course is to teach system integrators to ask the subsystem suppliers the right questions (“The importance and cost of power factor”) in order to select the best vendor. Our goal is to demonstrate the way to find optimal design solutions for different ap-plications. Some practical examples are described covering the design process. During the question-and-answer session of the course, the instructors will help attendees to resolve some of their system issues.

LEARNING OUTCOMESThis course will enable you to:• choose the correct type of power source for the diode laser and

auxiliary electronics• specify a diode laser power system for your application• optimize configuration for maximum efficiency and reliability• optimize the overall cost of the system• determine whether it is reasonable or not to use universal input

feeding systems• resolve difficult electromagnetic compatibility problems

INTENDED AUDIENCEThis material is intended for anyone who needs to learn how to inte-grate a laser diode based system. Those who either design their own power supplies or who work with power designers will find this course valuable and be enriched with new ideas.

INSTRUCTORIlya Bystryak has been developing laser systems as well as power supplies for lasers and gas discharge devices for more than 35 years. He is a Senior IEEE Member. He earned a Ph.D. in Applied Physics at Moscow State University. Currently he is an independent consultant.

Grigoriy Trestman has been developing power supplies for Laser Di-odes, LEDs, gas-discharge lamps and lasers for more than 4 decades. He is a Senior IEEE Member, Masters in Optics and Laser Physics and earned a Ph.D. at the Academy of Science of USSR.

Laser Diode Beam Basics, NewCharacteristics and ManipulationSC1146Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm

Laser diodes are the most widely used lasers and have several unique properties that are difficult to handle. This course first describes laser diode basic properties. Then, laser diode beam properties are exten-sively explained in detail. Attendees of the course will gain practical knowledge about laser diode beam characteristics, modeling and parameter measurement, learn about designing laser diode optics, and be able to effectively handle and utilize laser diodes.

LEARNING OUTCOMESThis course will enable you to:• describe the unique properties of laser diodes• describe the unique properties of laser diode beams• model laser diode beams• describe the operating principles of laser diode beam

measurement instruments• measure laser diode beam parameters• design laser diode optics• become familiar with laser diode, laser diode optics and laser

diode module vendors• tailor a diode laser beam to suit your own application

INTENDED AUDIENCEScientists, engineers, technicians, college students or managers who wish to learn how to effectively use laser diodes. Undergraduate training in engineering or science is assumed.

INSTRUCTORHaiyin Sun has thirty years’ engineering, research and management experience in optics and lasers. He held senior optical engineer or manager positions with L-3 Communications, Coherent, Oplink Com-munications, and Power Technology, working mainly on laser diode optics design and optical engineering. He has designed and tested numerous types of laser diode modules and is the co-inventor of five laser diode optics patents. He is the primary author of two books, one

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book chapter and about twenty journal papers on laser diodes, laser diode beams and laser diode optics published by Springer, CRC Press, IEEE J. Q.E., JOSA., Opt. Lett., Appl. Opt., Opt. Eng., Opt. Comm., etc., and his work has been cited in Photonics Spectraand the Melles Griot Catalog. He was an adjunct assistant professor of applied science at the University of Arkansas and an editorial board member of the Journal of Optical Communications (Germany). He earned a Ph.D. in Applied Science, a M.S in Optics and a B.S in Physics.

This course will cover the content of the text Laser Diode Beam Ba-sics, Characteristics and Manipulations (Springer, 2012), written by the instructor.

Introduction to Nonlinear OpticsSC047Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Monday 1:30 pm to 5:30 pm

This introductory and intermediate level course provides the basic concepts of bulk media nonlinear optics. Although some mathemat-ical formulas are provided, the emphasis is on simple explanations. It is recognized that the beginning practitioner in nonlinear optics is overwhelmed by a constellation of complicated nonlinear optical effects, including second-harmonic generation, optical parametric oscillation, optical Kerr effect, self-focusing, self-phase modulation, self-steepening, fiber-optic solitons, chirping, stimulated Raman and Brillouin scattering, two-photon absorption, and photorefractive phenomena. It is our job in this course to demystify this daunting collection of seemingly unrelated effects by developing simple and clear explanations for how each works, and learning how each effect can be used for the modification, manipulation, or conversion of light pulses. Where possible, examples will address the nonlinear optical effects that occur inside optical fibers. Also covered are examples in liquids, bulk solids, and gases.

LEARNING OUTCOMESThis course will enable you to:• be able to explain to another person the origins and concepts

behind the Slowly-Varying Envelope Approximation (SVEA)• recognize what nonlinear events come into play in different effects • appreciate the intimate relationship between nonlinear events

which at first appear quite different • appreciate how a variety of different nonlinear events arise, and

how they affect the propagation of light• comprehend how wavematching, phase-matching, and index

matching are related• be able, without using equations, to explain to others how self-

phase modulation impresses “chirping” on pulses• describe basic two-beam interactions in photorefractive materials• develop an appreciation for the extremely broad variety of ways in

which materials exhibit nonlinear behavior

INTENDED AUDIENCEThe material presented will be useful to engineers, scientists, students and managers who need a fundamental understanding of nonlinear optics.

INSTRUCTORRobert Fisher is the owner of RA Fisher Associates, LLC, his firm providing technical training in lasers and in optics, private consulting, and expert legal services. He has been active in laser physics and in nonlinear optics for the last 40 years. He has taught graduate courses at the Univ. of California, Davis, and worked at both Lawrence Livermore National Lab. and Los Alamos National Lab. He is an SPIE Fellow and an OSA Fellow, and was a 3-year member of SPIE’s Board of Directors. He has served on the CLEO Conference Nonlinear Optics Subcom-mittee for 5 years, with two of those years as its chair. He has chaired numerous SPIE conferences. He was the Program Chair of the CLEO 2010 Conference and is General Chair of the CLEO 2012 Conference (now renamed CLEO: Science and Innovations).

Applied Nonlinear Frequency ConversionSC931Course Level: IntermediateCEU: 0.65 $525 Members | $635 Non-Members USD Monday 8:30 am to 5:30 pm

This course provides detailed knowledge on the operation and design of nonlinear frequency conversion devices. The emphasis is on fre-quency conversion in (2) nonlinear crystals, such as frequency doubling, sum and difference frequency generation and parametric oscillation. In addition, Raman amplifiers and lasers (including bulk and fiber-based devices) are treated, and briefly also Brillouin fiber lasers. The course gives an overview of nonlinear crystal materials and addresses the details of phase matching, showing how a certain phase-matching configuration may be chosen based on given device requirements. For various cases, it is shown how to estimate the achievable conversion efficiency. The conversion of short and ultrashort optical pulses is also discussed. Some case studies demonstrate the influence of various practical issues.

LEARNING OUTCOMESThis course will enable you to:• explain the principles of operation of various nonlinear conversion

devices, including resonant frequency doublers and parametric amplifiers

• select a suitable nonlinear material for use in conversion device• estimate the conversion efficiency of such devices• identify special considerations for the conversion of short pulses• describe some typical design trade-offs• design at least some simpler devices, (e.g. resonant continuous-

wave frequency doublers) for your own applications

INTENDED AUDIENCEThis course is intended for laser engineers and researchers being interested in nonlinear frequency conversion devices. They should already have some basic knowledge of laser beams and ideally also of elementary nonlinear optics.


Introduction to Ultrafast OpticsSC746Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

Ultrafast Optics-the science, technology, and applications of ultrashort laser pulses-is one of the most exciting and dynamic fields of science. While ultrashort laser pulses seem quite exotic (they’re the shortest events ever created!), their applications are many, ranging from the study of ultrafast fundamental events to telecommunications to mi-cro-machining to biomedical imaging, to name a few. Interestingly, these lasers are easy to understand, and they are readily available. But their use requires some sophistication. This course is a basic introduction to the nature of these lasers, their use, and some of their applications.

LEARNING OUTCOMESThis course will enable you to:• describe how ultrafast lasers and amplifiers work• explain common temporal and spatio-temporal distortions in

ultrashort laser pulses

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• discuss nonlinear-optical effects for transforming the pulse’s wavelength and spectrum

• discuss nonlinear-optical effects that can do serious damage to pulses and materials

• explain how to meaningfully measure these pulses vs. space and time

• discuss problems encountered when focusing these pulses

INTENDED AUDIENCEThe intended audience is any scientist, engineer or biomedical re-searcher interested in this exciting field, especially those new to the field.

INSTRUCTORRick Trebino is the Georgia Research Alliance-Eminent Scholar Chair of Ultrafast Optical Physics at the School of Physics at the Georgia Institute of Technology. His research focuses on the use and measure-ment of ultrashort laser pulses. He is best known for his invention and development of Frequency-Resolved Optical Gating (FROG), the first general method for measuring the intensity and phase evolution of an ultrashort laser pulse, and which is rapidly becoming the standard technique for measuring such pulses. He has also invented techniques for measuring ultraweak ultrashort pulses, ultrafast polarization varia-tion, and ultrafast material relaxation. He is a Fellow of the SPIE, OSA, APS, and AAAS.

Expanded course lectures will be available on the instructor’s web site.

Coherent Mid-Infrared Sources and ApplicationsSC1012Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Thursday 1:30 pm to 5:30 pm

This course explains why the mid-IR spectral range is so important for molecular spectroscopy, standoff sensing, and trace molecular detec-tion. We will regard different approaches for generating coherent light in the mid-IR including solid state lasers, fiber lasers, semiconductor (including quantum cascade) lasers, and laser sources based on non-linear optical methods. The course will discuss several applications of mid-IR coherent light: spectral recognition of molecules, trace gas sensing, standoff detection, and frequency comb Fourier transform spectroscopy.

LEARNING OUTCOMESThis course will enable you to:• define the “molecular fingerprint” region• identify existing direct laser sources of mid-IR coherent

radiation, including solid state lasers, fiber lasers, semiconductor heterojunction and quantum cascade lasers

• identify laser sources based on nonlinear optical methods, including difference Frequency generators and optical parametric oscillators and generators

• describe the principles of trace gas sensing and standoff detection

• explain mid-IR frequency combs and how they can be used for advanced spectroscopic detection

INTENDED AUDIENCEStudents, academics, researchers and engineers in various disciplines who require a broad introduction to the subject and would like to learn more about the state-of-the-art and upcoming trends in mid-infrared coherent source development and applications. Undergraduate training in engineering or science is assumed.

INSTRUCTORKonstantin Vodopyanov is a professor of optics and physics at the College of Optics & Photonics (CREOL) at the University of Central Florida. He is a world expert in mid-IR solid state lasers, nonlinear optics and laser spectroscopy and has 350 technical publications in the field; he co-authored, with Irina Sorokina, the book ‘Solid-State Mid-Infrared Laser Sources’ (Springer, 2003). Dr. Vodopyanov is a Fellow of SPIE - International Society for Optical Engineering, Optical Society of America (OSA), American Physical Society (APS), and UK Institute of Physics (IOP). He is a member of program committees for several major laser conferences including CLEO (most recent, General Chair in 2010) and Photonics West (LA107 Conference Chair). His re-search interests include nonlinear optics, mid-IR and terahertz-wave generation, nano-IR spectroscopy, and ultra broadband frequency combs and their spectroscopic applications. Dr. Vodopyanov has delivered numerous invited talks and tutorials at scientific meetings on the subject of mid-IR technology.

Optoelectronic Materials and DevicesGaN Optoelectronics: Material New Properties and Device PrinciplesSC822Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm

The course focuses on key material properties and essential physical principles of III-nitride semiconductor devices such as light-emitting diodes, laser diodes, and photo detectors. Device design and internal physical mechanism are explained in detail. The impact of material properties and design variations on the device performance is demon-strated using advanced computer simulation. Practical simulation results provide deep insight into device physics, help to understand performance limitations, and enable the development of design opti-mization strategies.

LEARNING OUTCOMESThis course will enable you to:• explain the basic principles of optoelectronic devices• identify key nitride material properties and parameters• design and analyze modern nitride devices• apply advanced material and device models

INTENDED AUDIENCEStudents, device engineers, and researchers who are interested in a deeper understanding of GaN-based optoelectronic devices.

INSTRUCTORJoachim Piprek has been conducting research on optoelectronic devices for more than 25 years, both in industry and academia, and he has published three books in this field. He currently serves as pres-ident of the NUSOD Institute (www.nusod.org). Dr. Piprek has taught graduate courses at universities in Germany, Sweden, and in the United States and he co-chairs the SPIE conference on “GaN Materials and Devices” as well as the IEEE conference on “Numerical Simulation of Optoelectronic Devices”.

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Fundamentals of Reliability Engineering for Optoelectronic DevicesSC1091Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 8:30 am to 12:30 pm

Component reliability impacts the bottom line of every supplier and customer in the optics industry. Nevertheless, a solid understanding of the fundamental principles of reliability is often limited to a small team of engineers who are responsible for product reliability for an entire organization. There is tremendous value in expanding this knowledge base to others to ensure that all stakeholders (product engineers, man-agers, technicians, and even customers) speak a “common language” with respect to the topic of reliability.

This course provides a broad foundation in reliability engineering methods applied to lifetest design and data analysis. While the course focuses on the application of reliability engineering to optoelectronic devices, the underlying principles can be applied to any component.

LEARNING OUTCOMESThis course will enable you to:• identify the primary goals of reliability testing• define a complete reliability specification• differentiate between parametric and non-parametric reliability

lifetests• list the models used to describe reliability and select the best for a

given population• define a FIT score and explain why it is not a good measure of

reliability• estimate reliability model parameters from real data• analyze cases which include insufficient, problematic, and/or

uncertain data• compute confidence bounds and explain their importance• differentiate between failure modes and root causes• identify infant mortalities, random failures, and wear-out in the

data• compare competing failure modes• analyze cases in which slow degradation is present• state the goal of accelerated lifetesting and identify when it is (and

is not) appropriate• list common stresses used in accelerated lifetesting and explain

how to treat these quantitatively• differentiate between step-stress and multicell accelerated

lifetesting• use accelerated lifetest data to simultaneously extract

acceleration parameters and population reliability• relate component reliability to module/system reliability

INTENDED AUDIENCEThe course targets a wide range of participants, including students, engineers, and managers and seeks to dispel common misconceptions which pervade the industry. A basic understanding of probability and statistics (high school level) may be helpful, but is not required.

INSTRUCTORPaul Leisher is an Associate Professor of Physics and Optical Engi-neering at Rose-Hulman Institute of Technology in Terre Haute, Indiana. Prior to joining Rose-Hulman, Dr. Leisher served as the Manager of Advanced Technology at nLight Corporation in Vancouver, Washington where his responsibilities included the design and analysis of acceler-ated lifetests for assessing the reliability of high power diode lasers.

Semiconductor Photonic Device FundamentalsSC747Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Sunday 8:30 am to 5:30 pm

This provides a review of the basics of semiconductor materials, with primary emphasis on their optoelectronic properties. The motion of electrons and holes is discussed, and photon absorption and gener-ation mechanisms are presented. The course examines basic device structures such as quantum wells and quantum dots, Bragg reflectors, cascade devices, distributed feedback devices, avalanching, tunnel-ing, and various electro-optic effects. Device operating principles are presented, and an overview of current device applications is given. The participants should walk away with a good understanding of semiconductor optoelectronics covering the entire UV to terahertz spectral region, including devices such as diode and cascade lasers, LEDs, SLEDs, VCSELs, modulators, and photodetectors.

LEARNING OUTCOMESThis course will enable you to:• identify semiconductor materials from which optoelectronic

devices are produced• explain operating principles of lasers, LEDs, VCSELs, modulators,

and detectors• understand their figures of merit and performance limitations • explain the fabrication techniques used to manufacture

optoelectronic devices• know what questions to ask device manufacturers• summarize current device applications

INTENDED AUDIENCEAimed at managers, engineers, system designers, R&D personnel, and technicians working on components and sub-assemblies as well as systems. No formal mathematics or physics background is necessary.

INSTRUCTORKurt Linden received a PhD in Electrical Engineering, with primary em-phasis on semiconductor optoelectronics. With over 35 years of prac-tical experience in the design, development, manufacture, testing, and application of a broad range of semiconductor optoelectronic devices, he is a pioneer in the development of visible, infrared, and far-infrared devices, and has recently been involved with their incorporation into operational systems. Dr. Linden has taught courses at MIT and North-eastern University, presents annual tutorials on optoelectronics and has served as an expert witness on this subject. He is currently a senior scientist at N2 Biomedical, a part-subsidiary of the Spire Corporation.

Silicon PhotonicsSC817Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

Silicon Microphotonics is a platform for the large scale integration of CMOS electronics with photonic components. This course will eval-uate the most promising silicon optical components and the path to electronic-photonic integration. The subjects will be presented in two parts: 1) Context: a review of optical interconnection and the enabling solutions that arise from integrating optical and electronic devices at a micron-scale, using thin film processing; and 2) Technology: case stud-ies in High Index Contrast design for silicon-based waveguides, filters, photodetectors, modulators, laser devices, and an application-specific opto-electronic circuit. The course objective is an overview of the silicon microphotonic platform drivers and barriers in design or fabrication.

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LEARNING OUTCOMESThis course will enable you to:• identify trends in optical interconnection and the power of

electronic-photonic convergence• explain how the electronic, thermal and mechanical constraints

of planar integration promote silicon as the optimal platform for microphotonics

• design application-specific photonic devices that take advantage of unique materials processing and device design solutions

• compute the performance of micron-scale optically passive/active devices

• judge the feasibility and impact of the latest silicon photonic devices

INTENDED AUDIENCEThis material is intended for anyone who needs to learn how to design integrated optical systems on a silicon platform. Those who either design their own photonic devices or who work with engineers and scientists will find this course valuable.

INSTRUCTORJurgen Michel is a Senior Research Scientist at the MIT Micropho-tonics Center and a Senior Lecturer at the Department of Materials Science and Engineering at MIT. He has conducted research on silicon based photonic devices for more than 20 years.

Sajan Saini is with Princeton University. Previously, he was an assistant professor in the Department of Physics at Queens College following a Postdoctoral Associate position at the MIT Microphotonics Center. He is co-author of the upcoming textbook Photonic Materials and Devices (Cambridge Press).

Design Techniques for Micro-opticsSC1125Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Wednesday 8:30 am to 12:30 pm

This course attempts to bridge the gap between classical optical design / modeling using ray tracing (refractives, reflectives, graded index optics) and diffractive optics design / modeling using analytic or numeric techniques.

It is built around three tasks: (1) design (2) modeling and (3) fabrication.

(1) We will review in this course the various techniques used by stan-dard optical CAD tools such as Zemax and CodeV to design diffractive optical elements (DOEs), micro-lens arrays (MLAs), hybrid optics and micro-optics, as well as the various numerical design techniques for computer generated holograms (CGHs).

(2) Modeling single micro optics or more complex micro-optical sys-tems including MLAs, DOEs, CGHs, and other hybrid elements can be difficult or impossible when using classical ray tracing algorithms. We will review various techniques using physical optics propagation to model not only diffraction effects, but also systematic and random fabrication errors, multi-order propagation and other effects which cannot be modeled accurately through ray tracing.

(3) Following the modeling task, the optical engineer is left with the fabrication task, which is either a lithography layout file generation similar to IC fabrication, or a sag table generation for single point diamond turning (SPDT), or a combination thereof. We will review the various techniques to produce layout files for the different lithographic fabrication techniques described in SC454, Fabrication Technologies for Micro- and Nano-Optics.

LEARNING OUTCOMESThis course will enable you to:• review the various micro-optics / diffractive optics design

techniques used today in popular optical design software such as Zemax and CodeV

• decide which design software would be best suited for a particular micro-optics design task

• evaluate the various constraints linked to either ray tracing or physical optics propagation techniques, and develop custom numerical propagation algorithms

• model systematic and random fabrication errors, especially for lithographic fabrication

• compare the various constraints linked to mask layout generation for lithographic fabrication (GDSII)

• review the different GDSII fabrication layout file architectures, and how to adapt them to various lithographic fabrication techniques such as the ones described in SC454

INTENDED AUDIENCEScientists, engineers, technicians, or managers who wish to learn more about how to design, model and fabricate micro-optics, diffrac-tive optics and hybrid optics. Undergraduate knowledge in optics is assumed. Attendees will benefit maximally by attending SC454 Fabri-cation Technologies for Micro- and Nano-Optics prior to this course.

INSTRUCTORBernard Kress has made significant scientific contributions over the last 20 years as researcher, professor, consultant, advisor, instructor, and author, generating IP, teaching and transferring technological solu-tions to industry. Dr Kress has been involved in various application fields of micro-optics such as; laser materials processing, optical security, optical telecom/datacom, optical data storage, optical computing, optical motion sensors, pico- projectors, virtual displays, optical ges-ture sensing, three dimensional remote sensing and biotech sensors.

Bernard has generated more than 30 patents, published three books and a book chapter, numerous refereed publications and proceedings, as well as technical publications. He has also been Involved in European Research Projects in Micro-Optics including the Eureka Flat Optical Technology and Applications (FOTA) Project and the Network for Ex-cellence in Micro-Optics (NEMO) Project. He is currently with Google [X] Labs in Mountain View.

Photonic Therapeutics and DiagnosticsOptics and Optical Quality of the Human EyeSC702Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Monday 8:30 am to 12:30 pm

The eye has a complex and exquisitely designed optical system yet, when compared with modern optical systems, its image quality is surprisingly poor. This course will discuss the optical properties of the different components of the eye from the cornea to the retina, and how they impact visual quality. We will evaluate benefits and limitations of various techniques, such as adaptive optics and laser refractive surgery, which have been developed to overcome the eye’s optical limitations. Aberration limits will be presented so that designers of optical systems, where the eye often plays an intrinsic role, can estimate the degree of correction required for their products to produce high quality perceived imagery.

LEARNING OUTCOMESThis course will enable you to:• name and describe the major optical components of the eye and

how they work together to form an image on the retina• identify the limitations of the optical system of the eye and how

they impact perceived image quality

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• compare and contrast the optical system of the eye with other man-made optical instruments

• design an optical system that appreciates and considers the intrinsic role of the eye in that system as an optical component

INTENDED AUDIENCEThe course is intended to impart practical knowledge to optical design engineers or clinicians (ophthalmologists, refractive surgeons, optome-trists), but it will also be of general interest to anyone who is interested in learning about the unique optical system of the eye.

INSTRUCTORAustin Roorda has a PhD in Vision Science and Physics and is a Pro-fessor of Vision Science and Optometry at the University of California, Berkeley. His research areas include adaptive optics, high resolution ophthalmoscopy, and optics of the human eye.

NeurophotonicsSC1126Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

The brain is the most widely studied body organ, and yet our under-standing of its operation and the connection between changes to the physiology and the progression of disease is quite limited. Modern imaging tools, including optical imaging techniques, have enabled the study of many neural diseases and conditions and have assisted in evaluating the effect of drugs in model animal pre-clinical studies and in medical diagnosis.

This course will review the principles and major optical techniques used for optical brain imaging. We will review the main cellular types in the brain and the organization of the anatomical regions into func-tional units. We will compare the major optical techniques used in brain imaging and discuss the contrast mechanisms that are used in each technique.

We will review the use of external markers (mainly fluorescent markers), compare them to optical imaging techniques that use intrinsic contrast mechanisms (scattering, absorption, coherence, auto-fluorescence), and give examples in functional imaging of blood flow, oxygen levels, and neuronal activity. New methods using genetic introduction of pro-teins to control brain activity (Optogenetics) and selectively label cells will be described. Finally, we will discuss, with the help of examples, the relevance of these optical techniques in pre-clinical studies and clinical diagnosis.

LEARNING OUTCOMESThis course will enable you to:• be familiar with the major cellular components and functional

areas of the brain• compare optical imaging to other common techniques for brain

imaging applications• learn about the most common optical techniques used for

anatomical and functional evaluation of the brain, and to identify major attributes of each technique including the contrast mechanism, use of external markers (dyes), temporal and lateral resolution, and penetration depth into the tissue

• explain how intrinsic optical techniques (OCT, Raman, Speckle contrast, IOSI) work and evaluate their use in optical brain imaging

• describe the use of these optical imaging techniques in evaluating functional brain information including blood flow, oxygen consumption, and neural activity

• summarize the use of proteins as fluorescent markers and for Optogenetic optical brain stimulation

• list common applications of optical techniques in pre-clinical animal studies and clinical applications

INTENDED AUDIENCEScientists, engineers, technicians, or managers who wish to learn more about optical imaging techniques and how to apply them to image biological cells and tissues in the brain. Undergraduate training in engineering or science is assumed.

INSTRUCTOROfer Levi is a Professor of Electrical Engineering and Biomedical Engi-neering at the University of Toronto. He also holds a Visiting Professor position at Stanford University, CA. He has spent over two decades in academia and industry, designing and developing optical imaging systems, laser sources, and optical sensors. He specializes in design and optimization of optical bio-sensors, Bio-MEMS, and optical imag-ing systems for biomedical applications, including in cancer and brain imaging. Dr. Levi is a member of OSA, IEEE-P, and SPIE.

Suzie Dufour is a Post Doctoral Fellow at the University of Toronto and currently hold a MITACS elevate postdoctoral fellowship. For the past seven years, she has developed optical fiber-based sensing techniques and imaging systems for optical neural imaging, and studied brain dis-eases including epilepsy and stroke using optical sensing and imaging techniques at the Institut universitaire en santé mentale de Québec.










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Head Mounted Displays for New Augmented Reality ApplicationsSC1096Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Wednesday 8:30 am to 5:30 pm













INSTRUCTORMichael Browne is the Vice President of Product Development at SA Photonics in San Francisco, California. He has a Ph.D. in Optical Engineering from the University of Arizona’s Optical Sciences Center. Mike has been involved in the design, test and measurement of aug-mented reality systems since 1991. At Kaiser Electronics, Mike led the design of numerous augmented reality head mounted displays systems including those for the RAH-66 Comanche helicopter and the F-35 Joint Strike Fighter. Mike also invented one of the first head-mounted “virtual workstations” for interacting with data in a virtual space. Mike leads SA Photonics’ programs for the design and development of person-mounted information systems, including body-worn electron-ics, head-mounted displays and night vision systems. Mike’s current research includes investigations into the design of wide field of view augmented reality head mounted displays, binocular rivalry in head mounted displays, and smear reduction in digital displays.












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Clinical Technologies and SystemsPrinciples and Applications of Optical Coherence TomographySC312Course Level: AdvancedCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

Optical coherence tomography (OCT) is a new imaging modality, which is the optical analog of ultrasound. OCT can perform high resolution cross sectional imaging of the internal structure of biological tissues and materials. OCT is promising for biomedical imaging because it functions as a type of optical biopsy, enabling tissue pathology to be imaged in suit and in real time. This technology also has numerous applications in other fields ranging from nondestructive evaluation of materials to optical data storage. This course describes OCT and the integrated disciplines including fiber optics, interferometry, high-speed optical detection, biomedical imaging, in vitro and in vivo studies, and clinical medicine

LEARNING OUTCOMESThis course will enable you to:• describe the principles of optical coherence tomography (OCT) • explain a systems viewpoint of OCT technology• describe OCT detection approaches and factors governing

performance• describe ultrafast laser technology and other low coherence light

sources• describe OCT imaging devices such as microscopes, hand held

probes and catheters • describe functional imaging such as Doppler and spectroscopic

OCT • provide an overview of clinical imaging including clinical

ophthalmology, surgical guidance, and detection of neoplasia and guiding biopsy

• gain an overview of materials applications • discuss transitioning technology from the laboratory to the clinic

INTENDED AUDIENCEThis material is appropriate for scientists, engineers, and clinicians who are performing research in medical imaging.

INSTRUCTORJames Fujimoto is Professor of Electrical Engineering and Computer Science at the Massachusetts Institute of Technology. His research interests include femtosecond optics and biomedical imaging and his group is responsible for the invention and development of optical coherence tomography. Dr. Fujimoto is a member of the National Academy of Sciences and National Academy of Engineering. He is co-chair of the SPIE BIOS symposium and co-chair of the conference on Optical Coherence Tomography and Coherence Domain Techniques at BIOS. Dr. Fujimoto is a co-founder of LightLabs Imaging, a company developing OCT for intravascular imaging that was recently acquired by St. Jude Medical.

Optical Design for Biomedical ImagingSC868Course Level: IntermediateCEU: 0.35 $380 Members | $435 Non-Members USD Monday 8:30 am to 12:30 pm

This course provides attendees with a basic working knowledge of optical design for biomedical imaging. The course will begin with the fundamentals of biomedical optics, followed by the light sources, de-tectors, and other optical components for biomedical imaging. It will briefly discuss illumination and imaging system design, and then focus on optical systems and techniques for different imaging modalities. Design examples, such as fluorescence imaging and OCT imaging, will be presented

LEARNING OUTCOMESThis course will enable you to:• learn the fundamentals of biomedical optics • specify and select lenses, light sources, detectors and other

optical components• describe the optical system requirements for biomedical imaging• become familiar with various optical systems for biomedical

imaging• design and model illumination and imaging systems for biomedical

applications

INTENDED AUDIENCEThis material is intended for anyone who is interested in understanding and developing optical systems for biomedical applications. Basic knowledge of optical fundamentals is expected.

INSTRUCTORRongguang (Ron) Liang is an associate professor at College of Optical Sciences, University of Arizona. Prior to that, he was a Senior Principal Research Scientist at Carestream Health Inc and a Principal Research Scientist at Eastman Kodak Company. He has been working on optical design for 15 years, in the fields of biomedical imaging, digital imaging, display, and 3D imaging. He is a Topical Editor of Applied Optics.

COURSE PRICE INCLUDES the text Optical Design for Biomedical Imaging (SPIE Press, 2010) by Rongguang Liang.





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Photon Upconversion New Nanomaterials, Technologies and Biomedical ApplicationsSC1149Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

This course introduces the basic principles of photon upconversion and the current state of upconversion nanomaterials. It will focus on rare-earth doped nanophosphors as well as on their emerging applications. We will describe the use of nanophotonic concepts to manipulate excitation dynamics and guide nanochemistry to make a hierarchically built new generation of rare-earth of doped nanoparticles. We call these photon nanotransformers, with highly efficient frequency conversion of infrared (IR) light from a low power cw light source into visible or ultraviolet (UV) light.

These photon nanotransformers open up numerous opportunities such

as in high contrast bioimaging, photodynamic therapy, remote photo-activation, displays, anti-counterfeiting, biosensing, drug release and gene delivery, as well as in solar cells. They exhibit the following merits :

(1) They utilize light excitation in near IR and can produce upconverted emission also in NIR, both being within the “optical transparency win-dow” of tissues, and therefore provide high contrast 3D in vitro and in vivo imaging; (2) The naked eye is highly sensitive in the visible range, while it has no response to the NIR light, creating interest in NIR to visible frequency upconversion for security and display applications; (3) Frequency upconversion of IR to visible can be useful for IR photon harvesting, as current solar devices do not utilize IR. It is also useful for night vision (4 ) IR to UV upconversion has potential applications in photocleavage for drug /gene release, and 3D volume curing of photoactive resins for industrial and dental applications.

LEARNING OUTCOMESThis course will enable you to:• describe the processes of photon upconversion of low power, CW

light• distinguish the upconversion process in Rare-earth doped

nanoparticles from the nonlinear multiphoton process• gain knowledge on the current state of upconversion materials• assess the role of nanophotonics in the control of photon

upconversion to enhance the efficiency of upconverion to a selected wavelength

• apply design principles for nanochemistry approaches to control the size, phase, shape and upconversion efficiency of photon upconversion nanomaterials

• learn the vast applications of photon upconversion technology in biomedical applications, such as 3D deep tissue optical imaging, multimodal imaging, as well as in NIR light-regulated photochemistry for drug activation and release, and photodynamic therapy of thick cancer tissues

• learn applications in harvesting IR photons for photovoltaics• learn their applications in IR-to-Visible image upconversion , night

vision and LIDAR

INTENDED AUDIENCEScientists, engineers, biomedical researchers, students, technicians, or managers who wish to learn about photon upconversion materials and technologies and their applications. Undergraduate training in engineering or science is assumed.

INSTRUCTORParas Prasad is a State University of New York (SUNY) distinguished professor of chemistry, physics, medicine and electrical engineering. He is also the executive director of the Institute for Lasers, Photonics and Biophotonics. He was named among top 50 science and tech-nology leaders in the world by Scientific American in 2005. He has published over 700 scientific and technical papers; four monographs (Introduction to Nanomedicine and Nanobioengineering, Nanopho-tonics, Introduction to Biophotonics, Introduction to Nonlinear Optical Effects in Molecules and Polymers); eight edited books. He received many scientific awards and honors (Morley Medal; Schoellkopf Medal; Guggenheim Fellowship; Fellow of the APS, OSA, and SPIE, Honorary doctorate from Royal technical Institute in Sweden, etc.). He has been actively engaged in the fields of biophotonics, nanophotonics, nonlinear optics, nanomedicine, metamaterials, and solar cells.

Flow Cytometry Trends & Drivers NewSC1150Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Monday 1:30 pm to 5:30 pm

Flow cytometry is an extremely versatile optical cell analysis technology in widespread use. For example, it is the gold standard for monitoring of treatment for HIV patients, and the majority of the 200M+ routine blood tests performed worldwide per year are carried out on instruments based on flow cytometry engines.

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This course consists of two parts: (1) flow cytometry basics, and (2) trends and drivers. The first part will explain the basics of flow cytom-etry: the physical principles of the technique, typical system layout, critical photonic components, and application examples. You will walk away with a solid grasp of flow cytometry instrumentation and principles of operation. The second part will explore current trends in flow cytometry, focusing on the relationship between market drivers and technology enablers. You will receive an overview of current unmet needs, the latest innovations, and up-and-coming players.

LEARNING OUTCOMESThis course will enable you to:• compare and contrast flow cytometry to microscopy, and highlight

pros and cons of each• name the most critical photonic components common to every

flow cytometer• explain the design principles behind different types of beam

shaping• identify the two most common schemes in use for light delivery

and collection• describe three architectures for spectral light detection• diagram typical experimental outcomes of common flow

cytometry assays, and link them to basic physical principles• explain how different physical characteristics of cells affect

different measurable parameters• outline current market drivers• list the top technology enablers• relate recent technology innovations to application-side unmet

needs• identify significant new entrants to the flow cytometry market• generate instrument specifications responsive to current market

needs

INTENDED AUDIENCEScientists, engineers, technicians, managers, and people in sales/marketing functions who wish to learn more about the optical under-pinnings of flow cytometry, as well as current technology trends and market drivers. Basic undergraduate training in engineering or science is assumed.

INSTRUCTORGiacomo Vacca Ph.D. has designed and developed over a dozen flow cytometry systems, and regularly delivers flow cytometry seminars. He is founder and President of Kinetic River Corp., a biophotonics design, consulting, and product development company, and is cofounder and Chief Scientific Officer of BeamWise, Inc., an optomechanical design automation company, both in Silicon Valley. Dr. Vacca is a Senior Mem-ber of OSA, was inducted as Research Fellow of the Volwiler Scientific Society at Abbott Laboratories, and is a recipient of several awards for his research and inventions. He holds a Ph.D. in Applied Physics from Stanford University.

Monte Carlo Modeling Explained NewSC1152Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Tuesday 8:30 am to 5:30 pm

Monte Carlo modeling is widely used in biomedical optics to describe light transport in complicated situations where closed-form solutions to analytical models do not exist. While this standard definition describes Monte Carlo modeling as powerful and flexible, which it is, it also sounds overly-complicated, which it is not! This course will provide an intro-duction into both the theoretical concepts and real-world applications of Monte Carlo modeling of light transport in tissue.

The course will provide an interactive description of how the stochastic sampling methods can be used to simulate individual photon-tissue interactions during photon propagation. Attendees will be also be given experience using basic Monte Carlo models and examples will

highlight how to develop simulations that accurately mimic experimen-tal measurements. This course would be instructive for anyone who is interested in using Monte Carlo models to guide design choices for new optical measurement approaches.

LEARNING OUTCOMESThis course will enable you to:• explain how Monte Carlo models use statistical sampling

techniques to simulate photon-tissue interactions by ‘rolling dice’• operate basic publically-available Monte Carlo software packages

to simulate light remission from tissue• define sampling techniques that optimize simulation performance• validate customized code to mimic real world optical

measurements• be familiar with specialized packages to simulate fluorescence,

time-resolved acquisition, polarization, radiation-induced photons, and complex geometries

INTENDED AUDIENCEThis course is intended for scientists and engineers who are interested in performing Monte Carlo simulations, or for managers and group leaders who are interested in learning how these models work. Prior understanding of probability theory and tissue optical properties would be helpful. Competency in MATLAB and C-programming would be ben-eficial for the interactive components, but not necessary for attendance.

INSTRUCTORStephen Kanick Ph.D. is an Assistant Professor of Engineering at Dartmouth College and has over 10 years of experience in the de-velopment of Monte Carlo models of light transport in tissue. He has widely published studies that use Monte Carlo simulations to guide the development of new optical measurements that have been translated into clinical studies.

In order to engage in the interactive exercise, attendees are encouraged to bring a laptop with MATLAB and a functioning standard c-compiler.

Head Mounted Displays for New Augmented Reality ApplicationsSC1096Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Wednesday 8:30 am to 5:30 pm




head-mounted displays and visually coupled systems

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• describe important features and enabling technologies of an HMD and their impact on user performance and acceptance

• differentiate between video and optical see-through augmented reality HMDs

• identify key user-oriented performance requirements and link their impact on HMD design parameters

• list basic features of the human visual system and biomechanical attributes of the head and neck and the guidelines to follow to prevent fatigue or strain






















Applications of Detection TheorySC952Course Level: IntermediateCEU: 0.65 $525 Members | $635 Non-Members USD Tuesday 8:30 am to 5:30 pm

The fundamental goal of this course is to enable you to assess and explain the performance of sensors, detectors, diagnostics, or any other type of system that is attempting to give, with some level of confidence, a determination of the presence or absence of a “target.” In this case the term “target” may be a wide variety of types (e.g. a biological pathogen or chemical agent; or a physical target of some sort; or even just some electronic signal). We will rigorously cover the theory and mathematics underlying the construction of the “Receiver Operating Characteristic” (ROC) curve, including dichotomous test histograms, false positives, false negatives, sensitivity, specificity,

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and total accuracy. In addition, we will discuss in depth the theory behind “Decision Tree Analysis” culminating with an in class exercise. Decision tree analysis allows one to “fuse together” multivariate signals (or results) in such a manner as to produce a more accurate outcome than would have been attained with any one signal alone. This course includes two major in class exercises: the first will involve constructing a ROC curve from real data with the associated analysis; the second will involve constructing a complete decision tree including the new (improved) ROC curve. The first exercise will be ~30min in length, and the second will be ~60min.

LEARNING OUTCOMESThis course will enable you to:• define false positives, false negatives and dichotomous test• define sensitivity, specificity, limit-of-detection, and response time• comprehend and analyze a dose-response curve• construct and analyze a Receiver Operating Characteristic (ROC)

curve from raw data• define Positive Predictive Value (PPV) and Negative Predictive

Value (NPV)• analyze statistical data and predict results• describe the process and theory underlying decision tree analysis• construct and analyze a decision tree using real data• construct a “Spider Chart” from system-level attributes• interpret sensor performance trade-offs using a ROC curve

INTENDED AUDIENCEThis course designed for scientists, engineers, and researchers that are involved in sensor design and development, particular from the standpoint of complex data analysis. Application areas for which De-tection Theory is most relevant includes biological detection, medical diagnostics, radar, multi-spectral imaging, explosives detection and chemical agent detection. A working knowledge of basic freshman-level statistics is useful for this course.

INSTRUCTORJohn Carrano is President of Carrano Consulting. Previously, he was the Vice President, Research & Development, Corporate Executive Officer, and Chairman of the Scientific Advisory Board for Luminex Corporation, where he led the successful development of several major new products from early conception to market release and FDA clear-ance. Before joining Luminex, Dr. Carrano was as a Program Manager at DARPA, where he created and led several major programs related to bio/chem sensing, hyperspectral imaging and laser systems. He retired from the military as a Lieutenant Colonel in June 2005 after over 24 years’ service; his decorations include the “Defense Superior Service Medal” from the Secretary of Defense. Dr. Carrano is a West Point graduate with a doctorate in Electrical Engineering from the University of Texas at Austin. He has co-authored over 50 scholarly publications and has 3 patents pending. He is the former DSS Symposium Chairman (2006-2007), and is an SPIE Fellow.

COURSE PRICE INCLUDES a free PDF copy of the report, “Chemical and Biological Sensor Standards Study” (Principal author, Dr. John C. Carrano.)


This course provides attendees with the fundamentals of specialty fiber fusion splicing and fiber glass processing technologies with a focus on high power fiber laser and medical fiber probe applications. It pro-

vides an introduction on specialty fibers, reviews the fiber processing approach, and compares different techniques, especially on different fiber fusion processes along with different fusion hardware. It describes fiber waveguide and coupling optics associated with these processes and discusses practical fusion splicing methods for specialty fibers in order to achieve optimal optical coupling between dissimilar fibers. In addition, it illustrates fiber glass processing and fabrication techniques for producing fused fiber components, such as adiabatic taper, mode-field adaptor (MFA), fiber combiners and couplers, and other related fused fiber devices. The course also describes several practical ap-plication examples on fiber lasers and monolithic fiber-based probes for OCT medical imaging.









The Building Blocks of IR Instrument DesignSC1123Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 1:30 pm to 5:30 pm

As infrared detector technology continues to migrate from government labs to commercial markets, photonic system designers see new tech-nology opportunities to accomplish their design goals. Concurrently, developments in IR sources make near-infrared solutions attractive in terms of cost and performance. This course will help system de-signers, researchers, integrators, applications engineers, and related professionals navigate the infrared spectrum and trade off performance parameters for their solutions in applications such as laboratory imag-ing, UAV (“drone”) imaging, spectrometry, and biomedical diagnostics, while also considering cost.

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LEARNING OUTCOMESThis course will enable you to:• describe the different regions of the infrared spectrum in terms of

their reflective and emissive properties• choose a region of the infrared spectrum for your design or

integration project• describe the basic properties of photon and thermal infrared

detectors and how each type may be optimally utilized• compare NIR sources including LEDs and laser diodes• apply figures of merit including NEP, NEI, and NETD to your

solution• determine whether or not the atmosphere will affect your results,

and how to correct for it

INTENDED AUDIENCESystems engineers, researchers, applications engineers, systems integrators including those working with UAV sensors, and managers whose work involves developing, configuring, and analyzing the data from optoelectronic systems in the infrared portion of the spectrum. Basic familiarity with radiometric terminology and units according to the SI system is assumed.

INSTRUCTORBarbara Grant has 30 years’ engineering experience and holds an M. S. in Optical Sciences from the University of Arizona. She consults on practical problems in electro-optical systems, detector technology, spectrometry, and spectroradiometry. She is the author or co-author of two bestselling SPIE books (“Field Guide to Radiometry,” “The Art of Radiometry”) and is currently preparing a book on UAV imaging sensors for SPIE Press. She received two NASA awards for her work on the integration and test phase of the GOES weather satellite im-ager and sounder. She teaches courses to optical and electro-optical engineering professionals at meetings of SPIE, through Georgia Tech Professional Education, UC Irvine Extension, government agencies, and for commercial clients.




















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Metrology & StandardsA Practical Guide to Specifying NewOptical ComponentsSC1153Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm

Specifying optics, even commercial optics, can be a daunting task. The optics industry has evolved its own language, symbology, and standards for specifying and manufacturing optical components which can be obscure to even a veteran engineer, much less a newcomer to the industry. This course provides an overview of the basic principles, terms, and standards that are necessary for someone specifying optical elements. A primary goal of the course is to serve as a practical guide to optics specifications and drawings, and how they relate to optical system performance. Engineers and users of optics who need to buy optical components, but are unsure of all the detailed specifications, will benefit from taking this course.

LEARNING OUTCOMESThis course will enable you to:• identify the key specifications associated with optics• determine the impact of the specifications on system performance• recognize when commercial optics may not be adequate for their

requirements• define the various optics specifications in standard optics formats• read and comprehend standard optics drawings notations• specify commercial optics for imaging and non-imaging

applications

INTENDED AUDIENCEScientists, engineers, technicians, or managers who work with optics, but do not have an optical engineering background or who are new to specifying optics. Basic knowledge of optics and optical instruments is assumed.

INSTRUCTORDavid Aikens has been designing and specifying optics for defense, biomedical, laser and illumination systems for more than 30 years. In 1994 he joined ASC OP, the American optics standards committee, and in 2004 he became the head of the US delegation to ISO TC172 SC1 for fundamental optics standards. He is currently serving as Executive Director of the Optics and Electro-Optics Standards Council, and has personally participated in the development and revision of more than 20 standards related to optics.

Modern Optical TestingSC212Course Level: IntermediateCEU: 0.35 $335 Members | $390 Non-Members USD Wednesday 8:30 am to 12:30 pm

This course describes the basic interferometry techniques used in the evaluation of optical components and optical systems. It discusses interferogram interpretation, computer analysis, and phase-shifting interferometry, as well as various commonly used wavefront-measuring interferometers. The instructor describes specialized techniques such as testing windows and prisms in transmission, 90-degree prisms and corner cubes, measuring index inhomogeneity, and radius of curvature. Testing cylindrical and aspheric surfaces, determining the absolute shape of flats and spheres, and the use of infrared interferometers for testing ground surfaces are also discussed. The course also covers state-of-the-art direct phase measurement interferometers.

LEARNING OUTCOMESThis course will enable you to:• better specify optical components and systems • produce higher-quality optical systems • determine if an optics supplier can actually supply the optics you

are ordering • evaluate optical system performance • explain basic interferometry and interferometers for optical testing• analyze interferograms• test flat and spherical surfaces• test ground and aspheric surfaces• make absolute measurements and discuss state-of-the-art direct

phase - measurement interferometers.

INTENDED AUDIENCEEngineers and technical managers who are involved with the construc-tion, analysis or use of optical systems will find this material useful.

INSTRUCTORJames Wyant is Professor of Optical Sciences at the University of Arizona. He is currrently Chairman of the Board of 4D Technology. He was a founder of the WYKO Corporation and served as its president from 1984 to 1997. Dr. Wyant was the 1986 President of SPIE.

COURSE PRICE INCLUDES the text Field Guide to Interferometric Opti-cal Testing (SPIE Press, 2006) by Eric P. Goodwin and James C. Wyant.

Optical Scatter Metrology for IndustrySC1003Course Level: IntermediateCEU: 0.35 $370 Members | $425 Non-Members USD Monday 1:30 pm to 5:30 pm

Optical scatter, originally used almost exclusively to characterize the stray light generated by optically smooth surfaces, is now being used as a sensitive, economical way to monitor the surface texture require-ments in a variety of industries. For example, the photo-voltaic industry uses specific types of texture on surfaces to increase absorption and system efficiency. Texture is often an important requirement for the metal producing industry and it changes with roll wear. The appearance of every day appliances (from door hinges to computer cases) varies dramatically with texture. The quality of flat panel displays depends on the scatter characteristics of the screen and components behind it. SEMI and ASTM are responding to the new applications with “scatter standards” to help communication between manufacturers, vendors and customers.

The low signal (hard to measure) optical applications were solved first because the math was easy. Rougher surface scatter relationships are more complicated, but the signals are much larger - making instru-mentation easier. The course starts with the optical applications and then explores the transition to rougher industry surfaces. Between a good optical mirror and a concrete sidewalk there are thousands of industry surfaces that can be monitored with scatter metrology. There are two key points for these “in-between” surfaces: (1) If the texture changes - the scatter changes and (2) these changes (and product function) cannot be adequately monitored by a single variable - such as RMS Roughness, Haze or Gloss. The course emphasizes quantify-ing, measuring and understanding scatter. The modeling of scatter is mentioned, but is not emphasized here.

LEARNING OUTCOMESThis course will enable you to:• quantify and analyze scatter in terms of BRDF, TIS, Haze and DSC

units• explain the instrumentation for obtaining scatter data and evaluate

system calibration• describe and overcome the various difficulties in comparing

roughness statistics found from profilometers and scatterometers for both one- and two- dimensional samples

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• convert scatter to roughness statistics when possible and understand when it is not possible

• evaluate the use of scatter measurement for specific applications such as: stray system radiation, surface micro-roughness, particulate sizing, background sensor noise

• explain the use of polystyrene latex sphere depositions as an optical scattering standard

• review scattering standards for the semiconductor and photo-voltaic industries

INTENDED AUDIENCEEngineers, scientists, and managers who need to understand and apply the basic concepts of scatter metrology to laboratory research and industrial process control. Some knowledge of calculus is helpful, but the course does not require that the student follow mathematical derivations. The instructor has worked with Thomas Germer (SC492 instructor) to avoid overlap between the two courses.

INSTRUCTORJohn Stover is President of The Scatter Works, Inc., a Tucson firm concentrating on scatter based metrology standards, consulting, and measurement as they apply to diverse industries. He has researched light scatter related problems for over 30 years and led teams of engineers who developed state-of-the-art scatterometers, verified theoretical relationship between surface roughness and scatter and characterized surface defects to improve wafer metrology. He has been involved with international standards organizations for over 20 years, is an SPIE Fellow, and has been active as an author, conference chairman, and editor, and has over one hundred publications.

COURSE PRICE INCLUDES the text Optical Scattering: Measurement and Analysis, 3rd Edition (SPIE Press, 2012) by John Stover.

Understanding Scratch and Dig SpecificationsSC700Course Level: IntroductoryCEU: 0.35 $370 Members | $425 Non-Members USD Wednesday 8:30 am to 12:30 pm

Surface imperfection specifications (i.e. Scratch-Dig) are among the most misunderstood, misinterpreted, and ambiguous of all optics component specifications. This course provides attendees with an understanding of the source of ambiguity in surface imperfection specifications, and provides the context needed to properly specify surface imperfections using a variety of specification standards, and to evaluate a given optic to a particular level of surface imperfection specification. The course will focus on the differences and application of the Mil-PRF-13830, ISO 10110-7, and BSR/OP1.002. Many practical and useful specification examples are included throughout, as well as a hands-on demonstration on visual comparison evaluation techniques.

The course is followed by SC1017 Optics Surface Inspection Workshop, which provides hands-on experience conducting inspections using the specification information provided in this course.

LEARNING OUTCOMESThis course will enable you to:• describe the various surface imperfection specifications that exist

today• compose a meaningful surface imperfection specification for

cosmetic imperfections using ISO, ANSI, or Mil standards• identify the different illumination methods and comparison

standards for evaluation• demonstrate a surface imperfection visual inspection• understand the options available for controlling surface

imperfections in a vendor/supplier relationship

INTENDED AUDIENCEThis material is intended for anyone who needs specify, quote, or

evaluate optics for surface imperfections. Those who either design their own optics or who are responsible for optics quality control will find this course valuable.

INSTRUCTORDavid Aikens a.k.a “the scratch guy”, is among the foremost experts on surface imperfection standards and inspection. Dave is President and founder of Savvy Optics Corp., is the head of the American delegation to ISO TC 172 SC1, and is currently the Executive Director of the Optics and Electro-Optics Standards Council, OEOSC.

COURSE PRICE INCLUDES a copy of the latest ANSI approved surface imperfections specification standard.

Optics Surface Inspection WorkshopSC1017Course Level: IntroductoryCEU: 0.35 $380 Members | $435 Non-Members USD Wednesday 1:30 pm to 5:30 pm

Understanding the correct way to inspect optical surfaces is one the most important skills anyone working with or around optics can have, including technicians, material handlers, engineers, managers, and buyers. While understanding the specifications is the first step, learn-ing how to actually perform the inspection is just as important. This hands-on workshop will allow attendees to learn the “Best Practice” for cleaning and inspecting optical surfaces. The course has many demonstrations and labs and gives attendees practice handling and inspecting optics to develop a high level of proficiency.

This course was designed to bring photonics personnel up to an immediate working knowledge on the correct methods to conduct a surface inspection in accordance with MIL, ANSI, and ISO standards. It is designed to complement SC700 Understanding Scratch and Dig Specifications and provide hands-on experience applying the specifi-cation and inspection parameters covered in that course.

LEARNING OUTCOMESThis course will enable you to:• perform a visual review of the surface• create a surface map• safely clean the surface using air only, and the drag method• assess when magnification or high-intensity light is allowed or

required• conduct a visual inspection according to MIL-PRF-13830B• conduct a visual inspection according to ANSI OP1.002• conduct a visual inspection according to ISO 10110-7 and ISO

14997 standards• acquire and apply the accumulation rules• review the tools available for microscope-based inspection to

ANSI and ISO standards• evaluate a surface and determine if a surface passes or fails

INTENDED AUDIENCEThis course is designed for all optical practitioners who need to handle and evaluate optics or optical assemblies. Other suggested attendees include mechanical engineers, purchasing agents, quality assurance personnel and other persons working with or around optical compo-nents. <b>SC700 Understanding Scratch and Dig Specifications is a pre-requisite for the course.</b>


COURSE PRICE includes a copy of the OP1.002 the American National Standard for surface imperfections on optics, if desired.

Due to the hands-on nature of this course, class size is limited to 15 participants. Early registration is recommended.

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The course will provide an interactive description of how the stochastic sampling methods can be used to simulate individual photon-tissue interactions during photon propagation. Attendees will be also be given experience using basic Monte Carlo models and examples will highlight how to develop simulations that accurately mimic experimen-tal measurements. This course would be instructive for anyone who is interested in using Monte Carlo models to guide design choices for new optical measurement approaches.



















INSTRUCTORThomas Lieb is President, Laser Safety Officer at L*A*I International, and has more than 25 years experience in laser systems, laser safety and laser safety education. A Certified Laser Safety Officer (CLSO), Lieb is a member of the Board of Laser Safety, responsible for reviewing and editing qualification exams. He is a member of ANSI Accredited Standards Committee and the Administrative Committee of ASC Z136 Safe Use of Lasers, Chairman of the subcommittee for ANSI Z136.9 Safe Use of Lasers in a Manufacturing Environment; contributor to ANSI B11.21 Design, Construction, Care, and Use of Laser Machine Tools (and other subcommittees of ANSI for laser safety). He has been a past member of the Board of Directors of the Laser Institute of America (LIA); and highly involved in the International Laser Safety Conference and current Chair of the 2015 ILSC PAS (Practical Application Seminars), Involved for many years in International laser safety issues, Lieb is the International Chairman of IEC/TC 76 on the Laser Safety Standard IEC [EN] 60825 and Chair of the subcommittee for ISO/IEC [EN] 11553 Safety of Machines, Laser Processing Machines He was 2008 recipient of the IEC’s “1906 Award” for significant contribution to electro-technology and the work of the IEC (International Electrotechnical Commission). An invited lecturer at the University of Tokyo and British Health Protection Agency, as well as advising various businesses and institutions world-wide, Lieb has authored a number of technical papers and articles, and contributed to the CLSO’s Best Practices in Laser Safety manual and the text Laser Materials Processing.

Nonlinear OpticsIntroduction to Nonlinear OpticsSC047Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Monday 1:30 pm to 5:30 pm

This introductory and intermediate level course provides the basic concepts of bulk media nonlinear optics. Although some mathemat-ical formulas are provided, the emphasis is on simple explanations. It is recognized that the beginning practitioner in nonlinear optics is overwhelmed by a constellation of complicated nonlinear optical effects, including second-harmonic generation, optical parametric

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oscillation, optical Kerr effect, self-focusing, self-phase modulation, self-steepening, fiber-optic solitons, chirping, stimulated Raman and Brillouin scattering, two-photon absorption, and photorefractive phenomena. It is our job in this course to demystify this daunting collection of seemingly unrelated effects by developing simple and clear explanations for how each works, and learning how each effect can be used for the modification, manipulation, or conversion of light pulses. Where possible, examples will address the nonlinear optical effects that occur inside optical fibers. Also covered are examples in liquids, bulk solids, and gases.

LEARNING OUTCOMESThis course will enable you to:• be able to explain to another person the origins and concepts

behind the Slowly-Varying Envelope Approximation (SVEA)• recognize what nonlinear events come into play in different effects • appreciate the intimate relationship between nonlinear events

which at first appear quite different • appreciate how a variety of different nonlinear events arise, and

how they affect the propagation of light• comprehend how wavematching, phase-matching, and index

matching are related• be able, without using equations, to explain to others how self-

phase modulation impresses “chirping” on pulses• describe basic two-beam interactions in photorefractive materials• develop an appreciation for the extremely broad variety of ways in

which materials exhibit nonlinear behavior

INTENDED AUDIENCEThe material presented will be useful to engineers, scientists, students and managers who need a fundamental understanding of nonlinear optics.

INSTRUCTORRobert Fisher is the owner of RA Fisher Associates, LLC, his firm providing technical training in lasers and in optics, private consulting, and expert legal services. He has been active in laser physics and in nonlinear optics for the last 40 years. He has taught graduate courses at the Univ. of California, Davis, and worked at both Lawrence Livermore National Lab. and Los Alamos National Lab. He is an SPIE Fellow and an OSA Fellow, and was a 3-year member of SPIE’s Board of Directors. He has served on the CLEO Conference Nonlinear Optics Subcom-mittee for 5 years, with two of those years as its chair. He has chaired numerous SPIE conferences. He was the Program Chair of the CLEO 2010 Conference and is General Chair of the CLEO 2012 Conference (now renamed CLEO: Science and Innovations).

Applied Nonlinear Frequency ConversionSC931Course Level: IntermediateCEU: 0.65 $525 Members | $635 Non-Members USD Monday 8:30 am to 5:30 pm

This course provides detailed knowledge on the operation and design of nonlinear frequency conversion devices. The emphasis is on fre-quency conversion in (2) nonlinear crystals, such as frequency doubling, sum and difference frequency generation and parametric oscillation. In addition, Raman amplifiers and lasers (including bulk and fiber-based devices) are treated, and briefly also Brillouin fiber lasers. The course gives an overview of nonlinear crystal materials and addresses the details of phase matching, showing how a certain phase-matching configuration may be chosen based on given device requirements. For various cases, it is shown how to estimate the achievable conversion efficiency. The conversion of short and ultrashort optical pulses is also discussed. Some case studies demonstrate the influence of various practical issues.

LEARNING OUTCOMESThis course will enable you to:• explain the principles of operation of various nonlinear conversion

devices, including resonant frequency doublers and parametric amplifiers

• select a suitable nonlinear material for use in conversion device• estimate the conversion efficiency of such devices• identify special considerations for the conversion of short pulses• describe some typical design trade-offs• design at least some simpler devices, (e.g. resonant continuous-

wave frequency doublers) for your own applications

INTENDED AUDIENCEThis course is intended for laser engineers and researchers being interested in nonlinear frequency conversion devices. They should already have some basic knowledge of laser beams and ideally also of elementary nonlinear optics.










INSTRUCTORKonstantin Vodopyanov is a professor of optics and physics at the College of Optics & Photonics (CREOL) at the University of Central Florida. He is a world expert in mid-IR solid state lasers, nonlinear optics and laser spectroscopy and has 350 technical publications in the field; he co-authored, with Irina Sorokina, the book ‘Solid-State

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Mid-Infrared Laser Sources’ (Springer, 2003). Dr. Vodopyanov is a Fellow of SPIE - International Society for Optical Engineering, Optical Society of America (OSA), American Physical Society (APS), and UK Institute of Physics (IOP). He is a member of program committees for several major laser conferences including CLEO (most recent, General Chair in 2010) and Photonics West (LA107 Conference Chair). His re-search interests include nonlinear optics, mid-IR and terahertz-wave generation, nano-IR spectroscopy, and ultra broadband frequency combs and their spectroscopic applications. Dr. Vodopyanov has delivered numerous invited talks and tutorials at scientific meetings on the subject of mid-IR technology.


This course provides attendees with the fundamentals of specialty fiber fusion splicing and fiber glass processing technologies with a focus on high power fiber laser and medical fiber probe applications. It pro-vides an introduction on specialty fibers, reviews the fiber processing approach, and compares different techniques, especially on different fiber fusion processes along with different fusion hardware. It describes fiber waveguide and coupling optics associated with these processes and discusses practical fusion splicing methods for specialty fibers in order to achieve optimal optical coupling between dissimilar fibers. In addition, it illustrates fiber glass processing and fabrication techniques for producing fused fiber components, such as adiabatic taper, mode-field adaptor (MFA), fiber combiners and couplers, and other related fused fiber devices. The course also describes several practical ap-plication examples on fiber lasers and monolithic fiber-based probes for OCT medical imaging.








INSTRUCTORBaishi Wang is Director of Technology at Vytran. He received his Ph.D from SUNY at Stony Brook. He has over 15 years of experience in specialty fibers, fused component fabrication and fiber fusion, and automated process equipment. His work is focused on fiber fused component technology, fiber fusion process and instrumentation, spe-cialty fibers especially those for fiber lasers and amplifiers, waveguide

theory and modeling, and fiber test and measurements. Prior to joining Vytran, he was a technical staff member in the Specialty Fiber Division at Lucent Technologies and OFS. He has published numerous papers in referred conferences and journals, has given many invited talks, and has been awarded patents on specialty fibers, fused components, and fiber lasers and amplifiers. He is a member of SPIE and OSA.

Photonic IntegrationSilicon PhotonicsSC817Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

Silicon Microphotonics is a platform for the large scale integration of CMOS electronics with photonic components. This course will eval-uate the most promising silicon optical components and the path to electronic-photonic integration. The subjects will be presented in two parts: 1) Context: a review of optical interconnection and the enabling solutions that arise from integrating optical and electronic devices at a micron-scale, using thin film processing; and 2) Technology: case stud-ies in High Index Contrast design for silicon-based waveguides, filters, photodetectors, modulators, laser devices, and an application-specific opto-electronic circuit. The course objective is an overview of the silicon microphotonic platform drivers and barriers in design or fabrication.

LEARNING OUTCOMESThis course will enable you to:• identify trends in optical interconnection and the power of

electronic-photonic convergence• explain how the electronic, thermal and mechanical constraints

of planar integration promote silicon as the optimal platform for microphotonics

• design application-specific photonic devices that take advantage of unique materials processing and device design solutions

• compute the performance of micron-scale optically passive/active devices

• judge the feasibility and impact of the latest silicon photonic devices

INTENDED AUDIENCEThis material is intended for anyone who needs to learn how to design integrated optical systems on a silicon platform. Those who either design their own photonic devices or who work with engineers and scientists will find this course valuable.

INSTRUCTORJurgen Michel is a Senior Research Scientist at the MIT Micropho-tonics Center and a Senior Lecturer at the Department of Materials Science and Engineering at MIT. He has conducted research on silicon based photonic devices for more than 20 years.

Sajan Saini is with Princeton University. Previously, he was an assistant professor in the Department of Physics at Queens College following a Postdoctoral Associate position at the MIT Microphotonics Center. He is co-author of the upcoming textbook Photonic Materials and Devices (Cambridge Press).

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Photonic Crystals: A Crash Course, from Bandgaps to FibersSC608Course Level: IntermediateCEU: 0.35 $345 Members | $400 Non-Members USD Sunday 8:30 am to 12:30 pm

This half-day course will survey basic principles and developments in the field of photonic crystals, nano-structured optical materials that achieve new levels of control over optical phenomena. This leverage over photons is primarily achieved by the photonic band gap: a range of wavelengths in which light cannot propagate within a suitably designed crystal, forming a sort of optical insulator.

The course will begin with an introduction to the fundamentals of wave propagation in periodic systems, Bloch’s theorem and band diagrams, and from there moves on to the origin of the photonic band gap and its realization in practical structures. After that we will cover a number of topics and applications important for understanding the field and its future.

Topics will include: the introduction of intentional defects to create waveguides, cavities, and ideal integrated optical devices in a crystal; exploitation of exotic dispersions for negative-refraction, super-prisms, and super-lensing; the combination of photonic band gaps and con-ventional index guiding to form easily fabricated hybrid systems (pho-tonic-crystal slabs); the origin and control of losses in hybrid systems; photonic band gap and microstructured optical fibers; and computa-tional approaches to understanding these systems (from brute-force simulation to semi-analytical techniques).

LEARNING OUTCOMESThis course will enable you to:• learn the fundamental concepts necessary for understanding

photonic crystals• gain familiarity with the unusual phenomena and devices that have

been enabled by photonic bandgaps, and the directions taken to achieve them in practice

• understand the principles and perspectives by which future applications in nano-structured photonics may be developed and described

INTENDED AUDIENCEThis course is designed for engineers and scientists who wish to understand how photonic crystals work and its potential applications to quantum optical devices and optoelectronics. It is aimed at those who have an understanding of elementary electromagnetism and some familiarity with the applications and governing principles of optical devices.

INSTRUCTORSteven Johnson received his Ph.D. in 2001 from the Dept. of Physics at MIT, where he also earned undergraduate degrees in computer science and mathematics. He is currently an assistant professor of applied mathematics at the Massachusetts Institute of Technology, and also consults for OmniGuide Communications Inc. on hollow bandgap fibers. Several free software packages he has written have seen widespread use in computational electromagnetism and other fields, including the MPB package to solve for photonic eigenmodes and the FFTW fast Fourier transform library (for which he received the 1999 J. H. Wilkinson Prize for Numerical Software, along with M. Frigo). In 2002, Kluwer published his Ph. D. thesis as a book Photonic Crys-tals: The Road from Theory to Practice . His recent work has ranged from the development of new semi-analytical and numerical methods for electromagnetism in high-index-contrast periodic systems to the design of integrated optical devices.

COURSE PRICE INCLUDES the text Photonic Crystals: Molding the Flow of Light (Second Edition) (Princeton University Press, 2008) by John D. Joannopoulos, Steven G. Johnson, Joshua N. Winn & Robert D. Meade.

GaN Optoelectronics: Material NewProperties and Device PrinciplesSC822Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm






This provides a review of the basics of semiconductor materials, with primary emphasis on their optoelectronic properties. The motion of electrons and holes is discussed, and photon absorption and gener-ation mechanisms are presented. The course examines basic device structures such as quantum wells and quantum dots, Bragg reflectors, cascade devices, distributed feedback devices, avalanching, tunnel-ing, and various electro-optic effects. Device operating principles are presented, and an overview of current device applications is given. The participants should walk away with a good understanding of semiconductor optoelectronics covering the entire UV to terahertz spectral region, including devices such as diode and cascade lasers, LEDs, SLEDs, VCSELs, modulators, and photodetectors.



and detectors• understand their figures of merit and performance limitations

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• explain the fabrication techniques used to manufacture optoelectronic devices

• know what questions to ask device manufacturers• summarize current device applications



Fundamentals of Reliability Engineering for Optoelectronic DevicesSC1091Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 8:30 am to 12:30 pm

Component reliability impacts the bottom line of every supplier and customer in the optics industry. Nevertheless, a solid understanding of the fundamental principles of reliability is often limited to a small team of engineers who are responsible for product reliability for an entire organization. There is tremendous value in expanding this knowledge base to others to ensure that all stakeholders (product engineers, man-agers, technicians, and even customers) speak a “common language” with respect to the topic of reliability.

This course provides a broad foundation in reliability engineering methods applied to lifetest design and data analysis. While the course focuses on the application of reliability engineering to optoelectronic devices, the underlying principles can be applied to any component.

LEARNING OUTCOMESThis course will enable you to:• identify the primary goals of reliability testing• define a complete reliability specification• differentiate between parametric and non-parametric reliability

lifetests• list the models used to describe reliability and select the best for a

given population• define a FIT score and explain why it is not a good measure of

reliability• estimate reliability model parameters from real data• analyze cases which include insufficient, problematic, and/or

uncertain data• compute confidence bounds and explain their importance• differentiate between failure modes and root causes• identify infant mortalities, random failures, and wear-out in the data• compare competing failure modes• analyze cases in which slow degradation is present• state the goal of accelerated lifetesting and identify when it is (and

is not) appropriate• list common stresses used in accelerated lifetesting and explain

how to treat these quantitatively• differentiate between step-stress and multicell accelerated

lifetesting• use accelerated lifetest data to simultaneously extract

acceleration parameters and population reliability• relate component reliability to module/system reliability

INTENDED AUDIENCEThe course targets a wide range of participants, including students, engineers, and managers and seeks to dispel common misconceptions which pervade the industry. A basic understanding of probability and statistics (high school level) may be helpful, but is not required.

INSTRUCTORPaul Leisher is an Associate Professor of Physics and Optical Engi-neering at Rose-Hulman Institute of Technology in Terre Haute, Indiana. Prior to joining Rose-Hulman, Dr. Leisher served as the Manager of Advanced Technology at nLight Corporation in Vancouver, Washington where his responsibilities included the design and analysis of acceler-ated lifetests for assessing the reliability of high power diode lasers.




(1) We will review in this course the various techniques used by standard optical CAD tools such as Zemax and CodeV to design diffractive optical elements (DOEs), micro-lens arrays (MLAs), hybrid optics and micro-optics, as well as the various numerical design techniques for computer generated holograms (CGHs).










INTENDED AUDIENCEScientists, engineers, technicians, or managers who wish to learn more about how to design, model and fabricate micro-optics, diffrac-tive optics and hybrid optics. Undergraduate knowledge in optics is

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assumed. Attendees will benefit maximally by attending SC454 Fabri-cation Technologies for Micro- and Nano-Optics prior to this course.



Nanotechnologies in PhotonicsPhotonic Crystals: A Crash Course, from Bandgaps to FibersSC608Course Level: IntermediateCEU: 0.35 $345 Members | $400 Non-Members USD Sunday 8:30 am to 12:30 pm

This half-day course will survey basic principles and developments in the field of photonic crystals, nano-structured optical materials that achieve new levels of control over optical phenomena. This leverage over photons is primarily achieved by the photonic band gap: a range of wavelengths in which light cannot propagate within a suitably designed crystal, forming a sort of optical insulator.

The course will begin with an introduction to the fundamentals of wave propagation in periodic systems, Bloch’s theorem and band diagrams, and from there moves on to the origin of the photonic band gap and its realization in practical structures. After that we will cover a number of topics and applications important for understanding the field and its future.

Topics will include: the introduction of intentional defects to create waveguides, cavities, and ideal integrated optical devices in a crystal; exploitation of exotic dispersions for negative-refraction, super-prisms, and super-lensing; the combination of photonic band gaps and con-ventional index guiding to form easily fabricated hybrid systems (pho-tonic-crystal slabs); the origin and control of losses in hybrid systems; photonic band gap and microstructured optical fibers; and computa-tional approaches to understanding these systems (from brute-force simulation to semi-analytical techniques).

LEARNING OUTCOMESThis course will enable you to:• learn the fundamental concepts necessary for understanding

photonic crystals• gain familiarity with the unusual phenomena and devices that have

been enabled by photonic bandgaps, and the directions taken to achieve them in practice

• understand the principles and perspectives by which future applications in nano-structured photonics may be developed and described

INTENDED AUDIENCEThis course is designed for engineers and scientists who wish to

understand how photonic crystals work and its potential applications to quantum optical devices and optoelectronics. It is aimed at those who have an understanding of elementary electromagnetism and some familiarity with the applications and governing principles of optical devices.

INSTRUCTORSteven Johnson received his Ph.D. in 2001 from the Dept. of Physics at MIT, where he also earned undergraduate degrees in computer science and mathematics. He is currently an assistant professor of applied mathematics at the Massachusetts Institute of Technology, and also consults for OmniGuide Communications Inc. on hollow bandgap fibers. Several free software packages he has written have seen widespread use in computational electromagnetism and other fields, including the MPB package to solve for photonic eigenmodes and the FFTW fast Fourier transform library (for which he received the 1999 J. H. Wilkinson Prize for Numerical Software, along with M. Frigo). In 2002, Kluwer published his Ph. D. thesis as a book Photonic Crys-tals: The Road from Theory to Practice . His recent work has ranged from the development of new semi-analytical and numerical methods for electromagnetism in high-index-contrast periodic systems to the design of integrated optical devices.

COURSE PRICE INCLUDES the text Photonic Crystals: Molding the Flow of Light (Second Edition) (Princeton University Press, 2008) by John D. Joannopoulos, Steven G. Johnson, Joshua N. Winn & Robert D. Meade.



These photon nanotransformers open up numerous opportunities such as in high contrast bioimaging, photodynamic therapy, remote photo-activation, displays, anti-counterfeiting, biosensing, drug release and gene delivery, as well as in solar cells. They exhibit the following merits :




nanoparticles from the nonlinear multiphoton process• gain knowledge on the current state of upconversion materials

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• assess the role of nanophotonics in the control of photon upconversion to enhance the efficiency of upconverion to a selected wavelength




vision and LIDAR



Optical Engineering & FabricationThin Film Optical CoatingsSC321Course Level: IntermediateCEU: 0.65 $525 Members | $635 Non-Members USD Monday 8:30 am to 5:30 pm

Virtually no modern optical system could operate without optical coat-ings. Much of any optical system consists of a series of coated and shaped surfaces. The shape determines the power of the surface but it is the coating that determines the specular properties, the amount of light transmitted or reflected, the phase change, the emittance, the color, the polarization, the retardation, including even the mechanical properties. Optical coatings consist of assemblies of thin films of mate-rials where interference properties combine with the intrinsic properties of the materials to yield the desired optical performance. They act to reduce the reflectance losses of lenses, increase the reflectance of mirrors, reduce glare and electromagnetic emission from display sys-tems, improve the thermal insulation of buildings, protect eyes from laser radiation, analyze gases, act as anticounterfeiting devices on banknotes, multiplex or demultiplex communication signals, separate or combine color channels in display projectors, and these are just a few of their roles. This course emphasizes understanding and takes students from fundamentals to techniques for design and manufacture.

LEARNING OUTCOMESThis course will enable you to:

• understand the basic principles of optical interference coatings• perform many rapid design calculations and assessments without

needing a computer• speak knowledgeably about the parameters that characterize

optical coatings• design simple coatings given a suitably equipped computer• know the advantages and disadvantages of the basic processes

for the production of these filters• understand the influence of errors in monitoring and estimate

tolerances in production

INTENDED AUDIENCEAnyone who is or wishes to become involved in the manufacture or use of optical coatings or who wants to know more about this rapidly growing and important field. The level is appropriate for someone who has completed high school mathematics and/or science.

INSTRUCTORH. Angus Macleod is President of Thin Film Center, a software, training and consulting company in optical coatings, and is Professor Emeritus of Optical Sciences at the University of Arizona. He has been deeply involved in optical coatings for over forty years.

Evaluating Aspheres for ManufacturabilitySC1039Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Thursday 8:30 am to 12:30 pm

This course provides an overview of how aspheric surfaces are de-signed, manufactured, and measured. The primary goal of this course is to teach how to determine whether a particular aspheric surface design will be difficult to make and/or test. This will facilitate cost/performance trade off discussions between designers, fabricators, and metrologists.

We will begin with a discussion of what an asphere is and how they benefit optical designs. Next we will explain various asphere geometry characteristics, especially how to evaluate local curvature plots. We will also review flaws of the standard polynomial representation, and how the Forbes polynomials can simplify asphere analysis. Then we will discuss how various specifications (such as figure error and local slope) can influence the difficulty of manufacturing an asphere. Optical assembly tolerances, however, are beyond the scope of this course - we will focus on individual elements (lenses / mirrors).

The latter half of the course will focus on the more common technol-ogies used to generate, polish, and/or measure aspheric surfaces (e.g. diamond turning, glass molding, pad polishing, interferometry). We’ll give an overview of a few generic manufacturing processes (e.g. generate-polish-measure). Then we’ll review the main strengths and weaknesses of each technology in the context of cost-effective asphere manufacturing.

LEARNING OUTCOMESThis course will enable you to:• answer the question “Can these aspheres be made within my

budget?”• interpret an aspheric prescription from an optical component print• describe how Forbes polynomials can simplify asphere

interpretation• know how aspheres are manufactured and tested• evaluate key characteristics of an aspheric surface to determine

whether an asphere will be difficult to manufacture and/or test

INTENDED AUDIENCEThis material is intended for engineers, optical designers, and managers who want an overview of the benefits and challenges associated with manufacturing aspheric surfaces for use in optical systems. It will be of benefit for specialists in a particular area (e.g. design, manufacturing, or

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testing), as it will give a broad overview in all three of those areas with a focus on aspheric surfaces. It is intended to facilitate communication between designers, fabricators, and testers of aspheric surfaces.

INSTRUCTORChristopher Hall is a Senior Engineer at QED Technologies Interna-tional, where he has focused on optical manufacturing within the QED Optics group. He received his B.S. in Physics from Colgate University and M.S. in Optics from the Institute of Optics at the University of Rochester.

Optical Materials, Fabrication and Testing for the Optical EngineerSC1086Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 1:30 pm to 5:30 pm

This course is designed to give the optical engineer or lens designer an introduction to the technologies and techniques of optical materials, fabrication and testing. This knowledge will help the optical engineer understand how the choice of optical specifications and tolerances can either lead to more cost effective optical components, or can ex-cessively drive the price up. Topics covered include optical materials, traditional, CNC and novel optical fabrication technologies, surface testing and fabrication tolerances.

LEARNING OUTCOMESThis course will enable you to:• identify key mechanical, chemical and thermal properties of

optical materials (glass, crystals and ceramics) and how they affect the optical system performance and cost of optical components

• describe the basic processes of optical fabrication• define meaningful surface and dimensional tolerances• communicate effectively with optical fabricators• design optical components that are able to be manufactured and

measured using state of the art optical fabrication technologies• choose the optimum specifications and tolerances for your next

project

INTENDED AUDIENCEOptical engineers, lens designers, or managers who wish to learn more about how optical materials, fabrication and testing affect the optical designer. Undergraduate training in engineering or science is assumed.

INSTRUCTORJessica DeGroote Nelson is the Director of Engineering at Optimax Systems, Inc, where she oversees Optimax engineering, quality and research and development departments. She is an adjunct faculty member at The Institute of Optics at the University of Rochester teach-ing an undergraduate course on Optical Fabrication and Testing, and has given several guest lectures on optical metrology methods. She earned a Ph.D. in Optics at The Institute of Optics at the University of Rochester. Dr. Nelson is a member of both OSA and SPIE.

A Practical Guide to Specifying NewOptical ComponentsSC1153Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm

Specifying optics, even commercial optics, can be a daunting task. The optics industry has evolved its own language, symbology, and

standards for specifying and manufacturing optical components which can be obscure to even a veteran engineer, much less a newcomer to the industry. This course provides an overview of the basic principles, terms, and standards that are necessary for someone specifying optical elements. A primary goal of the course is to serve as a practical guide to optics specifications and drawings, and how they relate to optical system performance. Engineers and users of optics who need to buy optical components, but are unsure of all the detailed specifications, will benefit from taking this course.

LEARNING OUTCOMESThis course will enable you to:• identify the key specifications associated with optics• determine the impact of the specifications on system performance• recognize when commercial optics may not be adequate for their

requirements• define the various optics specifications in standard optics formats• read and comprehend standard optics drawings notations• specify commercial optics for imaging and non-imaging

applications

INTENDED AUDIENCEScientists, engineers, technicians, or managers who work with optics, but do not have an optical engineering background or who are new to specifying optics. Basic knowledge of optics and optical instruments is assumed.

INSTRUCTORDavid Aikens has been designing and specifying optics for defense, biomedical, laser and illumination systems for more than 30 years. In 1994 he joined ASC OP, the American optics standards committee, and in 2004 he became the head of the US delegation to ISO TC172 SC1 for fundamental optics standards. He is currently serving as Executive Director of the Optics and Electro-Optics Standards Council, and has personally participated in the development and revision of more than 20 standards related to optics.

Cost-Conscious Tolerancing New of Optical SystemsSC720Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Wednesday 1:30 pm to 5:30 pm

The purpose of this course is to present concepts, tools, and methods that will help attendees determine optimal tolerances for optical sys-tems. Detailed topics in the course apply to all volumes of systems being developed – from single systems to millions of units. The importance of tolerancing throughout the design process is discussed in detail, including determining robustness of the specification and design for manufacture and operation. The course also provides a background to effective tolerancing with discussions on variability and relevant applied statistics. Tolerance analysis and assignment with strong methodology and examples are discussed in detail. A short introduc-tion is also provided for useful development and production tools like design of experiments and statistical process control. References and examples are included to help researchers, designers, engineers, and technicians practically apply the concepts to plan, design, engineer, and build high-quality cost-competitive optical systems.

LEARNING OUTCOMESThis course will enable you to:• define variability and comprehend its impact on nominal systems• utilize fundamental applied statistics in tolerancing• construct tolerance analysis budgets• perform detailed tolerance analysis• summarize different design of experiment and statistical process

control strategies

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INTENDED AUDIENCEThis material is intended for managers, engineers, and technical staff involved in product design from concept through manufacturing.

INSTRUCTORRichard Youngworth is Founder and Chief Engineer of Riyo LLC, an optical design and engineering firm providing engineering and product development services. His industrial experience spans diverse topics including optical metrology, design, manufacturing, and analysis. Dr. Youngworth has spent significant time working on optical systems in the challenging transition from ideal design to successful volume manufacturing. He is widely considered an expert, due to his research, lectures, publications, and industrial work on the design, producibility, and tolerance analysis of optical components and systems. Dr. Young-worth teaches “Practical Optical System Design” and “Cost-Conscious Tolerancing of Optical Systems” for SPIE. He has a B.S. in electrical engineering from the University of Colorado at Boulder and earned his Ph.D. in optics at the University of Rochester by researching tolerance analysis of optical systems.


Optical scatter, originally used almost exclusively to characterize the stray light generated by optically smooth surfaces, is now being used as a sensitive, economical way to monitor the surface texture requirements in a variety of industries. For example, the photo-voltaic industry uses specific types of texture on surfaces to increase absorption and system efficiency. Texture is often an important requirement for the metal pro-ducing industry and it changes with roll wear. The appearance of every day appliances (from door hinges to computer cases) varies dramatically with texture. The quality of flat panel displays depends on the scatter characteristics of the screen and components behind it. SEMI and ASTM are responding to the new applications with “scatter standards” to help communication between manufacturers, vendors and customers.













Understanding Scratch and Dig SpecificationsSC700Course Level: IntroductoryCEU: 0.35 $370 Members | $425 Non-Members USD Wednesday 8:30 am to 12:30 pm

Surface imperfection specifications (i.e. Scratch-Dig) are among the most misunderstood, misinterpreted, and ambiguous of all optics component specifications. This course provides attendees with an understanding of the source of ambiguity in surface imperfection specifications, and provides the context needed to properly specify surface imperfections using a variety of specification standards, and to evaluate a given optic to a particular level of surface imperfection specification. The course will focus on the differences and application of the Mil-PRF-13830, ISO 10110-7, and BSR/OP1.002. Many practical and useful specification examples are included throughout, as well as a hands-on demonstration on visual comparison evaluation techniques.

The course is followed by SC1017 Optics Surface Inspection Workshop, which provides hands-on experience conducting inspections using the specification information provided in this course.

LEARNING OUTCOMESThis course will enable you to:• describe the various surface imperfection specifications that exist

today• compose a meaningful surface imperfection specification for

cosmetic imperfections using ISO, ANSI, or Mil standards• identify the different illumination methods and comparison

standards for evaluation• demonstrate a surface imperfection visual inspection• understand the options available for controlling surface

imperfections in a vendor/supplier relationship

INTENDED AUDIENCEThis material is intended for anyone who needs specify, quote, or evaluate optics for surface imperfections. Those who either design their own optics or who are responsible for optics quality control will find this course valuable.

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COURSE PRICE INCLUDES a copy of the latest ANSI approved surface imperfections specification standard.

Optics Surface Inspection WorkshopSC1017Course Level: IntroductoryCEU: 0.35 $380 Members | $435 Non-Members USD Wednesday 1:30 pm to 5:30 pm

Understanding the correct way to inspect optical surfaces is one the most important skills anyone working with or around optics can have, including technicians, material handlers, engineers, managers, and buyers. While understanding the specifications is the first step, learn-ing how to actually perform the inspection is just as important. This hands-on workshop will allow attendees to learn the “Best Practice” for cleaning and inspecting optical surfaces. The course has many demonstrations and labs and gives attendees practice handling and inspecting optics to develop a high level of proficiency.

This course was designed to bring photonics personnel up to an immediate working knowledge on the correct methods to conduct a surface inspection in accordance with MIL, ANSI, and ISO standards. It is designed to complement SC700 Understanding Scratch and Dig Specifications and provide hands-on experience applying the specifi-cation and inspection parameters covered in that course.

LEARNING OUTCOMESThis course will enable you to:• perform a visual review of the surface• create a surface map• safely clean the surface using air only, and the drag method• assess when magnification or high-intensity light is allowed or

required• conduct a visual inspection according to MIL-PRF-13830B• conduct a visual inspection according to ANSI OP1.002• conduct a visual inspection according to ISO 10110-7 and ISO

14997 standards• acquire and apply the accumulation rules• review the tools available for microscope-based inspection to

ANSI and ISO standards• evaluate a surface and determine if a surface passes or fails

INTENDED AUDIENCEThis course is designed for all optical practitioners who need to handle and evaluate optics or optical assemblies. Other suggested attendees include mechanical engineers, purchasing agents, quality assurance personnel and other persons working with or around optical compo-nents. SC700 Understanding Scratch and Dig Specifications is a pre-requisite for the course.


COURSE PRICE includes a copy of the OP1.002 the American National Standard for surface imperfections on optics, if desired.

Due to the hands-on nature of this course, class size is limited to 15 participants. Early registration is recommended.

Fabrication Technologies for Micro- and Nano-OpticsSC454Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm

Applications of micro and nano-scale optics are widespread in essen-tially every industry that uses light in some way. A short list of sample application areas includes communications, solar power, biomedical sensors, laser-assisted manufacturing, and a wide range of consumer electronics. Understanding both the possibilities and limitations for manufacturing micro- and nano-optics is useful to anyone interested in these areas. To this end, this course provides an introduction to fabrication technologies for micro- and nano-optics, ranging from refractive microlenses to diffractive optics to sub-wavelength optical nanostructures.

After a short overview of key applications and theoretical background for these devices, the principles of photolithography are introduced. With this backdrop, a wide variety of lithographic and non-lithograph-ic fabrication methods for micro- and nano-optics are discussed in detail, followed by a survey of testing methods. Relative advantages and disadvantages of different techniques are discussed in terms of both technical capabilities and scalability for manufacturing. Issues and trends in micro- and nano-optics fabrication are also considered, focusing on both technical challenges and manufacturing infrastructure.

LEARNING OUTCOMESThis course will enable you to:• describe example applications and key ‘rules of thumb’ for micro-

and nano-optics• explain basic principles of photolithography and how they apply to

the fabrication of micro- and nano-optics• identify and explain multiple techniques for micro- and nano-

optics fabrication• compare the advantages and disadvantages of different

manufacturing methods• describe and compare performance and metrological testing

methods for micro- and nano-optics• evaluate fabrication trends and supporting process technologies

for volume manufacturing

INTENDED AUDIENCEEngineers, scientists, and managers who are interested in the design, manufacture, or application of micro/nano-optics, or systems that integrate these devices. A background in basic optics is helpful but not assumed.

INSTRUCTORThomas Suleski has been actively involved in research and develop-ment of micro- and nano-optics since 1991 at Georgia Tech, Digital Optics Corporation, and since 2003, as a member of the faculty at the University of North Carolina at Charlotte. He holds 12 patents and more than 110 technical publications on the design, fabrication, and testing of micro- and nano-optical components and systems. Dr. Suleski is a Fellow of SPIE, the International Society for Optical Engineering, and currently serves as Senior Editor for JM3, the Journal of Micro/Nanolithography, MEMS and MOEMS.

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Understanding Diffractive OpticsSC1071Course Level: IntroductoryCEU: 0.35 $335 Members | $390 Non-Members USD Monday 1:30 pm to 5:30 pm

The course covers the fundamental principles of diffraction phenomena. Qualitative explanation of diffraction by the use of field distributions and graphs provides the basis for understanding fundamental relations and the important trends. Attendees will also learn the important terminol-ogy employed in the field of diffractive optics. The instructor provides a comprehensive overview of the main types of diffractive optical components, including phase plates, diffraction gratings, binary optics, diffractive kinoforms, stepped-diffractive surfaces, holographic optical elements, and photonic crystals. Based on practical examples provid-ed by the instructor, attendees will learn the benefit of incorporating diffractive optical components in optical and photonics instruments.

LEARNING OUTCOMESThis course will enable you to:• explain the fundamentals of diffraction, including Fresnel and

Fraunhofer diffraction, the Talbot effect, apodization, diffraction by multiple apertures, and superresolution phenomena

• explain terminology in the field of diffractive optics• describe the operational principles of the major types of diffractive

optical components in the scalar and resonant domains, the diffraction efficiency, and the blazing condition

• describe diffraction phenomena associated with the propagation of laser beams

• compare the main diffractive optics fabrication techniques• distinguish the various functions performed by diffractive optics

components in optical systems• compare the benefits and limitations of diffractive components

INTENDED AUDIENCEThis material is intended for engineers, scientists, college students, and photonics enthusiasts who would like to broaden their knowledge and understanding of diffractive optics, as well as to learn the numerous practical applications of diffractive optical components in modern optical instruments.

INSTRUCTORYakov Soskind is Photonics Instrumentation Development Manager with DHPC Technologies, Inc. For over 30 years, Dr. Soskind has made extensive contributions in the areas of optical engineering, laser systems development, fiber-optics and photonics instrumentation, diffractive and micro-optics, imaging, and illumination devices. Dr. Soskind is a founding chair of the Photonic Instrumentation Engineer-ing conference. He is the author of Field Guide to Diffractive Optics, SPIE Press, 2011, and has been awarded more than 20 domestic and international patents in the field of photonics.

COURSE PRICE INCLUDES the Field Guide to Diffractive Optics , FG21 (SPIE Press, 2011) by Yakov Soskind.


If you are uncomfortable working with lasers as “black boxes” and would like to have a basic understanding of their inner workings, this introductory course will be of benefit to you. The workshop will cover the basic principles common to the operation of any laser/laser system. Next, we will discuss laser components and their functionality. Compo-nents covered will include laser pumps/energy sources, mirrors, active media, nonlinear crystals, and Q-switches. The properties of laser

beams will be described in terms of some of their common performance specifications such as longitudinal modes and monochromaticity, transverse electromagnetic (TEM) modes and focusability, continuous wave (CW) power, peak power and power stability. Laser slope and wall-plug efficiencies will also be discussed.









Tissue Optics, Laser-Tissue Interaction, and Tissue EngineeringTissue OpticsSC029Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

This course outlines the principles of light transport in tissues that un-derlie design of optical measurement devices and laser dosimetry for medicine. Topics include radiative transport in turbid tissues, the optical properties of tissues, modeling techniques for light transport simulation in tissues, analysis of reflectance and fluorescence spectra measured in turbid tissues by topical and imbedded optical fiber devices, video techniques, and criteria involved in establishing laser dosimetry proto-cols. Lessons are illustrated using case studies of optical fiber devices, video imaging techniques, and design of therapeutic laser protocols.

LEARNING OUTCOMESThis course will enable you to:• conduct optical measurements of tissue optical properties • calculate light distributions in tissues• design an optical measurement of tissue using optical fibers or

video • justify the dosimetry of therapeutic laser protocols

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INTENDED AUDIENCEThis material is intended for biomedical engineers and medical physi-cists interested in medical applications of ultraviolet, visible, and near infrared wavelengths from both conventional and laser light sources.

INSTRUCTORSteven Jacques is Professor of Electrical and Computer Engineering at the Oregon Graduate Institute, a Research Associate Professor of Dermatology at Oregon Health Sciences University, a Senior Scientist at Providence St. Vincent Medical Center, and an Associate at Oregon Center for Optics at the University of Oregon Medical Laser Center.
























The second part of the course – Applications – will review recent ad-

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vances in biomedical applications of QPI. We will cover basic applica-tions published in the recent literature on cell structure, dynamics and light scattering, as well as clinical applications such as blood testing and tissue diagnosis.











Principles and Applications of Optical Coherence TomographySC312Course Level: AdvancedCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm

Optical coherence tomography (OCT) is a new imaging modality, which is the optical analog of ultrasound. OCT can perform high resolution cross sectional imaging of the internal structure of biological tissues and materials. OCT is promising for biomedical imaging because it functions as a type of optical biopsy, enabling tissue pathology to be imaged in suit and in real time. This technology also has numerous applications in other fields ranging from nondestructive evaluation of

materials to optical data storage. This course describes OCT and the integrated disciplines including fiber optics, interferometry, high-speed optical detection, biomedical imaging, in vitro and in vivo studies, and clinical medicine

LEARNING OUTCOMESThis course will enable you to:• describe the principles of optical coherence tomography (OCT) • explain a systems viewpoint of OCT technology• describe OCT detection approaches and factors governing

performance• describe ultrafast laser technology and other low coherence light

sources• describe OCT imaging devices such as microscopes, hand held

probes and catheters • describe functional imaging such as Doppler and spectroscopic

OCT • provide an overview of clinical imaging including clinical

ophthalmology, surgical guidance, and detection of neoplasia and guiding biopsy

• gain an overview of materials applications • discuss transitioning technology from the laboratory to the clinic

INTENDED AUDIENCEThis material is appropriate for scientists, engineers, and clinicians who are performing research in medical imaging.

INSTRUCTORJames Fujimoto is Professor of Electrical Engineering and Computer Science at the Massachusetts Institute of Technology. His research interests include femtosecond optics and biomedical imaging and his group is responsible for the invention and development of optical coherence tomography. Dr. Fujimoto is a member of the National Academy of Sciences and National Academy of Engineering. He is co-chair of the SPIE BIOS symposium and co-chair of the conference on Optical Coherence Tomography and Coherence Domain Techniques at BIOS. Dr. Fujimoto is a co-founder of LightLabs Imaging, a company developing OCT for intravascular imaging that was recently acquired by St. Jude Medical.






applications


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Biomedical Spectroscopy, Microscopy, and ImagingIntroduction to Quantitative New Phase Imaging (QPI)SC1148Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Wednesday 8:30 am to 5:30 pm











INSTRUCTORGabriel Popescu is Associate Professor of Electrical Engineering and Bioengineering at University of Illinois at Urbana-Champaign. He earned a Ph.D. in Optics from CREOL and began work on QPI as a postdoctoral associate at MIT’s Spectroscopy Laboratory. He has been active in Biomedical Optics for the past two decades and focused on QPI since 2002. Recognition for his work includes the National Science

Foundation CAREER Award, Innovation Discovery finalist (UIUC, 2012), Center for Advanced Fellow at UIUC (2012-2013), New Venture Compe-tition finalists (UIUC, 2014). Dr. Popescu is a Senior Member of OSA and SPIE Fellow. He is Associate Editor of Optics Express and Biomedical Optics Express and Editorial Board Member of Journal of Biomedical Optics. Dr. Popescu founded Phi optics, Inc., a startup company that commercializes QPI technology for materials life sciences. To learn more about Prof. Popescu’s research, visit http://light.ece.illinois.edu/.



Flow Cytometry Trends & Drivers NewSC1150Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Monday 1:30 pm to 5:30 pm

Flow cytometry is an extremely versatile optical cell analysis technology in widespread use. For example, it is the gold standard for monitoring of treatment for HIV patients, and the majority of the 200M+ routine blood tests performed worldwide per year are carried out on instruments based on flow cytometry engines.

This course consists of two parts: (1) flow cytometry basics, and (2) trends and drivers. The first part will explain the basics of flow cytom-etry: the physical principles of the technique, typical system layout, critical photonic components, and application examples. You will walk away with a solid grasp of flow cytometry instrumentation and principles of operation. The second part will explore current trends in flow cytometry, focusing on the relationship between market drivers and technology enablers. You will receive an overview of current unmet needs, the latest innovations, and up-and-coming players.

LEARNING OUTCOMESThis course will enable you to:• compare and contrast flow cytometry to microscopy, and highlight

pros and cons of each• name the most critical photonic components common to every

flow cytometer• explain the design principles behind different types of beam

shaping• identify the two most common schemes in use for light delivery

and collection• describe three architectures for spectral light detection• diagram typical experimental outcomes of common flow

cytometry assays, and link them to basic physical principles• explain how different physical characteristics of cells affect

different measurable parameters• outline current market drivers• list the top technology enablers• relate recent technology innovations to application-side unmet

needs• identify significant new entrants to the flow cytometry market• generate instrument specifications responsive to current market

needs

INTENDED AUDIENCEScientists, engineers, technicians, managers, and people in sales/

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marketing functions who wish to learn more about the optical under-pinnings of flow cytometry, as well as current technology trends and market drivers. Basic undergraduate training in engineering or science is assumed.

INSTRUCTORGiacomo Vacca Ph.D. has designed and developed over a dozen flow cytometry systems, and regularly delivers flow cytometry seminars. He is founder and President of Kinetic River Corp., a biophotonics design, consulting, and product development company, and is cofounder and Chief Scientific Officer of BeamWise, Inc., an optomechanical design automation company, both in Silicon Valley. Dr. Vacca is a Senior Mem-ber of OSA, was inducted as Research Fellow of the Volwiler Scientific Society at Abbott Laboratories, and is a recipient of several awards for his research and inventions. He holds a Ph.D. in Applied Physics from Stanford University.

Applications of Detection TheorySC952Course Level: IntermediateCEU: 0.65 $525 Members | $635 Non-Members USD Tuesday 8:30 am to 5:30 pm

The fundamental goal of this course is to enable you to assess and explain the performance of sensors, detectors, diagnostics, or any other type of system that is attempting to give, with some level of confidence, a determination of the presence or absence of a “target.” In this case the term “target” may be a wide variety of types (e.g. a biological pathogen or chemical agent; or a physical target of some sort; or even just some electronic signal). We will rigorously cover the theory and mathematics underlying the construction of the “Receiver Operating Characteristic” (ROC) curve, including dichotomous test histograms, false positives, false negatives, sensitivity, specificity, and total accuracy. In addition, we will discuss in depth the theory behind “Decision Tree Analysis” culminating with an in class exercise. Decision tree analysis allows one to “fuse together” multivariate signals (or results) in such a manner as to produce a more accurate outcome than would have been attained with any one signal alone. This course includes two major in class exercises: the first will involve constructing a ROC curve from real data with the associated analysis; the second will involve constructing a complete decision tree including the new (improved) ROC curve. The first exercise will be ~30min in length, and the second will be ~60min.

LEARNING OUTCOMESThis course will enable you to:• define false positives, false negatives and dichotomous test• define sensitivity, specificity, limit-of-detection, and response time• comprehend and analyze a dose-response curve• construct and analyze a Receiver Operating Characteristic (ROC)

curve from raw data• define Positive Predictive Value (PPV) and Negative Predictive

Value (NPV)• analyze statistical data and predict results• describe the process and theory underlying decision tree analysis• construct and analyze a decision tree using real data• construct a “Spider Chart” from system-level attributes• interpret sensor performance trade-offs using a ROC curve

INTENDED AUDIENCEThis course designed for scientists, engineers, and researchers that are involved in sensor design and development, particular from the standpoint of complex data analysis. Application areas for which De-tection Theory is most relevant includes biological detection, medical diagnostics, radar, multi-spectral imaging, explosives detection and chemical agent detection. A working knowledge of basic freshman-level statistics is useful for this course.

INSTRUCTORJohn Carrano is President of Carrano Consulting. Previously, he was the Vice President, Research & Development, Corporate Executive Officer, and Chairman of the Scientific Advisory Board for Luminex Corporation, where he led the successful development of several major new products from early conception to market release and FDA clear-ance. Before joining Luminex, Dr. Carrano was as a Program Manager at DARPA, where he created and led several major programs related to bio/chem sensing, hyperspectral imaging and laser systems. He retired from the military as a Lieutenant Colonel in June 2005 after over 24 years’ service; his decorations include the “Defense Superior Service Medal” from the Secretary of Defense. Dr. Carrano is a West Point graduate with a doctorate in Electrical Engineering from the University of Texas at Austin. He has co-authored over 50 scholarly publications and has 3 patents pending. He is the former DSS Symposium Chairman (2006-2007), and is an SPIE Fellow.

COURSE PRICE INCLUDES a free PDF copy of the report, “Chemical and Biological Sensor Standards Study” (Principal author, Dr. John C. Carrano.)










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Optical scatter, originally used almost exclusively to characterize the stray light generated by optically smooth surfaces, is now being used as a sensitive, economical way to monitor the surface texture requirements in a variety of industries. For example, the photo-voltaic industry uses specific types of texture on surfaces to increase absorption and system efficiency. Texture is often an important requirement for the metal pro-ducing industry and it changes with roll wear. The appearance of every day appliances (from door hinges to computer cases) varies dramatically with texture. The quality of flat panel displays depends on the scatter characteristics of the screen and components behind it. SEMI and ASTM are responding to the new applications with “scatter standards” to help communication between manufacturers, vendors and customers.
















(1) They utilize light excitation in near IR and can produce upconverted emission also in NIR, both being within the “optical transparency window” of tissues, and therefore provide high contrast 3D in vitro and in vivo imaging

(2) The naked eye is highly sensitive in the visible range, while it has no response to the NIR light, creating interest in NIR to visible frequency upconversion for security and display applications

(3) Frequency upconversion of IR to visible can be useful for IR photon harvesting, as current solar devices do not utilize IR. It is also useful for night vision

(4) IR to UV upconversion has potential applications in photocleavage for drug /gene release, and 3D volume curing of photoactive resins for industrial and dental applications.








vision and LIDAR


INSTRUCTORParas Prasad is a State University of New York (SUNY) distinguished professor of chemistry, physics, medicine and electrical engineering. He is also the executive director of the Institute for Lasers, Photonics

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and Biophotonics. He was named among top 50 science and tech-nology leaders in the world by Scientific American in 2005. He has published over 700 scientific and technical papers; four monographs (Introduction to Nanomedicine and Nanobioengineering, Nanopho-tonics, Introduction to Biophotonics, Introduction to Nonlinear Optical Effects in Molecules and Polymers); eight edited books. He received many scientific awards and honors (Morley Medal; Schoellkopf Medal; Guggenheim Fellowship; Fellow of the APS, OSA, and SPIE, Honorary doctorate from Royal technical Institute in Sweden, etc.). He has been actively engaged in the fields of biophotonics, nanophotonics, nonlinear optics, nanomedicine, metamaterials, and solar cells.












Fluorescent Markers: Usage and Optical System OptimizationSC309Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 1:30 pm to 5:30 pm

Fluorescent dyes are frequently used as markers in many biological samples. They are used in research labs to track different tissues, cells and individual molecules. Studying these interactions is a key part of understanding physiology and developing new cures to common dis-eases. Fluorescent markers are also used in many analytical chemistry tests in hospitals for assisting the diagnosis of a health condition and evaluating the progression of a treatment. Applications of molecular markers, including the use of fluorescent markers as anatomical and functional markers in the body, have grown rapidly in recent years.

This course will include cover the fundamental properties of fluorescent dyes, optimizing and matching an optical imaging system to specific dye spectra, and tailoring the optical system modules for specific applications such as bench-top microscopes, three-dimensional high resolution cellular imaging, and in vivo fluorescence imaging in pre-clin-ical studies and in clinical applications. We will also review common applications of fluorescent dyes and fluorescence imaging in current research and clinical activities.

LEARNING OUTCOMESThis course will enable you to:• describe dye properties such as excitation and emission spectra,

quantum efficiency, and the schematic of a fluorescence process• summarize the different main classes of fluorescent markers

including small molecule dyes, nano-crystal quantum dots, and fluorescent proteins and their attributes

• explain the principles of fluorescence microscopy and the main modules (lenses, filters, sensors, light sources) involved in fluorescence imaging systems

• estimate the expected fluorescence signal in a given imaging system

• explain advanced microscopy techniques such as fluorescence resonance energy transfer (FRET), fluorescence lifetime (FLIM), fluorescence recovery after photo-bleaching (FRAP), and three-dimensional techniques such as confocal and two-photon microscopy

• describe the design of miniature fluorescence imaging systems and their unique challenges

• summarize common applications of fluorescent dyes and fluorescence imaging in current research and clinical activities

INTENDED AUDIENCEEngineers, scientists, students and managers who wish to learn more about fluorescent markers, design of bench-top and miniature fluores-cence imaging systems, and their application in biomedical imaging. Some prior knowledge in optoelectronic devices and microscopy is desirable.

INSTRUCTOROfer Levi is a Professor of Electrical Engineering and Biomedical Engineering at the University of Toronto. He also holds a Visiting Professor position at Stanford University, CA. He has spent over two decades in academia and industry, designing and developing optical imaging systems, laser sources, and optical sensors. He specializes in design and optimization of optical bio-sensors, Bio-MEMS, and optical imaging systems for biomedical applications, including in cancer and brain imaging. Dr. Levi is a member of OSA, IEEE-Photonics, and SPIE.

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ultrashort laser pulses• discuss nonlinear-optical effects for transforming the pulse’s

wavelength and spectrum• discuss nonlinear-optical effects that can do serious damage to

pulses and materials• explain how to meaningfully measure these pulses vs. space and

time• discuss problems encountered when focusing these pulses









applications









detectors and how each type may be optimally utilized• compare NIR sources including LEDs and laser diodes• apply figures of merit including NEP, NEI, and NETD to your

solution• determine whether or not the atmosphere will affect your results,



INSTRUCTORBarbara Grant has 30 years’ engineering experience and holds an M.

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S. in Optical Sciences from the University of Arizona. She consults on practical problems in electro-optical systems, detector technology, spectrometry, and spectroradiometry. She is the author or co-author of two bestselling SPIE books (“Field Guide to Radiometry,” “The Art of Radiometry”) and is currently preparing a book on UAV imaging sensors for SPIE Press. She received two NASA awards for her work on the integration and test phase of the GOES weather satellite im-ager and sounder. She teaches courses to optical and electro-optical engineering professionals at meetings of SPIE, through Georgia Tech Professional Education, UC Irvine Extension, government agencies, and for commercial clients.

























INSTRUCTORBaishi Wang is Director of Technology at Vytran. He received his Ph.D from SUNY at Stony Brook. He has over 15 years of experience

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in specialty fibers, fused component fabrication and fiber fusion, and automated process equipment. His work is focused on fiber fused component technology, fiber fusion process and instrumentation, spe-cialty fibers especially those for fiber lasers and amplifiers, waveguide theory and modeling, and fiber test and measurements. Prior to joining Vytran, he was a technical staff member in the Specialty Fiber Division at Lucent Technologies and OFS. He has published numerous papers in referred conferences and journals, has given many invited talks, and has been awarded patents on specialty fibers, fused components, and fiber lasers and amplifiers. He is a member of SPIE and OSA.

Laser Micro-/NanoengineeringPrecision Laser MicromanufacturingSC689Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Monday 1:30 pm to 5:30 pm

This course is a comprehensive look at laser technology as applied to precision micromanufacturing. A brief background discussion on laser history, technology and definition of important terms will be presented. Then, available laser sources will be compared and contrasted including CO2, excimer, Nd:YAG, fiber and short pulse lasers. IR and UV material/photon interaction, basic optical components and system integration are also crucial to getting good processing results and these will all be examined in detail. Finally, real applications from the medical, micro-electronics, aerospace and other fields will be presented.

This course has been greatly expanded to include detailed discussions on short pulse lasers (ps and fs) and their applications, both present and future. Also, MicroManufacturing includes technologies such as welding, joining and additive technologies. While the main emphasis of the course is still MicroMachining (material removal), additive tech-nologies will be discussed also – especially 3D LAM (Laser Additive Manufacturing)

LEARNING OUTCOMESThis course will enable you to:• compare UV, IR and other laser sources to each other and learn

where each is best applied• describe and be familiar with several kinds of microprocessing

lasers on the market• describe material/photon interaction and why and how UV lasers

for instance are different than IR lasers• analyze a potential manufacturing application to identify it as a

possible candidate for laser processing• familiarize yourself with ‘real world’ opportunities for laser

micromanufacturing• identify marketplace growth opportunities

INTENDED AUDIENCEThe course will benefit anyone with an interest in small-scale industrial laser processing and achieving the best part quality, highest resolu-tion and cost effectiveness. Engineers will benefit from the technical discussions. Project Managers will benefit from cost considerations and risk reduction scenarios.

INSTRUCTORRonald Schaeffer is Chief Executive Officer of PhotoMachining, Inc. He has been involved in laser manufacture and materials processing for over 30 years, working in and starting small companies. He has over 150 publications, has written monthly web and print columns (currently writing a column for MicroManufacturing Magazine) and is on the Editorial Advisory Board of Industrial Laser Solutions. He is the author of the textbook “Fundamentals of Laser Micromachining”. He is also a past member of the Board of Directors of the Laser Institute

of America and is affiliated with the New England Board of Higher Education. He has a Ph.D. in Physical Chemistry from Lehigh Univer-sity and did graduate work at the University of Paris, after which he worked for several major laser companies. He is a US Army veteran of the 172nd Mountain Brigade and the 101st Airborne division. In his spare time he farms, collects antique pocket watches, plays guitar and rides a motorcycle.

Micromachining with Femtosecond LasersSC743Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Monday 8:30 am to 12:30 pm

This course provides attendees with the knowledge necessary to understand and apply femtosecond laser pulses for micromachining tasks in a variety of materials. Emphasis will be placed on developing a fundamental understanding of how femtosecond pulses interact with the sample. From this knowledge, the advantages and limitations of femtosecond lasers for various micromachining tasks can be readily understood. Examples will be given in the micromachining of the sur-face of metals, semiconductors, and transparent materials, as well as the formation of photonic and microfluidic devices in the bulk of transparent materials.

LEARNING OUTCOMESThis course will enable you to:• summarize the linear and non-linear interaction mechanisms

of femtosecond laser pulses with metals, semiconductors, and transparent materials

• explain mechanisms for material removal and modification, as well as factors affecting precision and degree of collateral damage

• describe unique capabilities afforded by femtosecond pulses for micromachining bulk transparent materials

• determine appropriate femtosecond laser parameters for a micromachining task

• compare various micromachining methods and evaluate the most appropriate for a given job

INTENDED AUDIENCEThis course is aimed at people already doing or interested in starting research on short-pulse laser micromachining, as well as at people who have specific micromachining problems and wish to evaluate the potential of femtosecond lasers for accomplishing their task. Those who do not have a background in some of the unique properties of femtosecond laser pulses would benefit from attending SC541, “An Introduction to Femtosecond Laser Techniques,” by Eric Mazur and/or SC746 “Introduction to Ultrafast Technology” by Rick Trebino before attending this course.

INSTRUCTORStefan Nolte is a Professor at the Friedrich-Schiller University in Jena, Germany. His research topics include ultrashort pulse micromachining for industrial and medical applications. He has been actively engaged in research on femtosecond laser micromachining since the field’s inception in the mid-1990s.

Christopher Schaffer is an Assistant Professor at Cornell University, where his current research focuses on applications of femtosecond laser ablation in biology. He has been actively engaged in research on femtosecond laser micromachining since the field’s inception in the mid-1990s.

COURSE PRICE INCLUDES a detailed reading list of key papers.

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Laser Welding and Drilling - NewFundamentals & PracticesSC1151Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Monday 8:30 am to 5:30 pm

The two most demanding applications of industrial lasers are laser welding and laser drilling. The process of bonding materials, such as the welding of metals with lasers, has been demonstrated and practiced since the early 1970s. In the mid-1970s precision drilling of cooling holes in jet engine blades and combustors was developed and introduced in to the manufacturing world. Over the past five decade a lot of knowledge has been gained in these applications. This course reviews the key topics of of these two technologies in simplified terms.

The common denominator in laser drilling and laser welding is the power density of the laser as it is focused on the surface of the ma-terial. This short course reviews the main parameters that control the power density and the tools used to measure the power density (laser beam metrology).

The second common denominator is the behavior of the material when exposed to the high power density of the laser beam. Surface and bulk effects are discussed. The extent and the characteristics of the heat affected zones in both laser welding and laser drilling are considered. We discuss the aspect ratio of laser drilled holes and weld nuggets. We consider four alloying systems and review some of the metals that are members of these systems.

The new generation of solid state lasers (Fiber, Disc and Direct Diode lasers) offer opportunities to control welding and drilling processes to produce repeatable high quality products. To assure good quality, real time process monitoring is being installed in some equipment. The benefits and the cost of real time process monitoring will conclude the course.

The instructor will be available after the course for short discussions.

LEARNING OUTCOMESThis course will enable you to:• identify the laser weldability of metals• define the critical laser beam characteristics for laser welding• choose the appropriate devices to measure the quality of the laser

beam• choose the correct type of laser (CO2, YAG or solid state) for your

application• identify the source of weld defects• appreciate the value of using real time weld monitoring

INTENDED AUDIENCEProcess technicians, process engineers, manufacturing engineers, research engineers, manufacturing managers, service engineers. Two years of college education and or a few years of hands on experience with lasers welding equipment is desirable.

INSTRUCTORSimon Engel is the President of HDE Technologies, Inc. His formal education (B.A.Sc. ME) is from the University of British Columbia, Canada. He has 45 years of experience in the industrial laser and laser applications field. He spent a few years at Caterpillar Tractor Company and at GTE Sylvania. His company (HDE) may have been the first one in the USA to build multi-axis laser processing systems, and for the past 38 years provided contract manufacturing and research services to a variety of industries. During the same years (for 34 years) Mr. Engel was the Principal Instructor of laser processing courses at EPD of the University of Wisconsin. He was also the Program Director of the Laser Welding Certification Program at UW. Mr. Engel published a large number of technical papers, has over 8 Patents and is an active member of SME, LIA and AWS. At AWS he is currently the Vice Chair of the C7.4 Laser Welding Standards revision committee.

Laser Systems Engineering NewSC1144Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Tuesday 8:30 am to 5:30 pm

While there are a number of courses on laser design, this course emphasizes a systems-level overview of the design and engineering of systems which incorporate lasers. Starting with a summary of the various types of lasers and their selection, it reviews common laser specifications (peak power, spatial coherence, etc.), Gaussian beam characteristics and propagation, laser system optics, beam control and scanning, radiometry and power budgets, detectors specific to laser systems, and the integration of these topics for developing a complete laser system. The emphasis is on real-world design problems, as well as the commercial off-the-shelf (COTS) components used to solve them.











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M2 factor and beam parameter product)

• select an appropriate beam quality measurement technique for a given type of laser

• perform correct M2 measurements based on ISO 11146, and list some common mistakes

• compare different types of lasers in terms of their potential for high beam quality

• explain the most common causes for beam quality deterioration in solid state lasers and identify options to reduce their impact

• judge the potential of beam shapers and mode cleaners to improve beam quality













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MOEMS-MEMS in PhotonicsUnderstanding Diffractive OpticsSC1071Course Level: IntroductoryCEU: 0.35 $335 Members | $390 Non-Members USD Monday 1:30 pm to 5:30 pm

The course covers the fundamental principles of diffraction phenomena. Qualitative explanation of diffraction by the use of field distributions and graphs provides the basis for understanding fundamental relations and the important trends. Attendees will also learn the important terminol-ogy employed in the field of diffractive optics. The instructor provides a comprehensive overview of the main types of diffractive optical components, including phase plates, diffraction gratings, binary optics, diffractive kinoforms, stepped-diffractive surfaces, holographic optical elements, and photonic crystals. Based on practical examples provid-ed by the instructor, attendees will learn the benefit of incorporating diffractive optical components in optical and photonics instruments.

LEARNING OUTCOMESThis course will enable you to:• explain the fundamentals of diffraction, including Fresnel and

Fraunhofer diffraction, the Talbot effect, apodization, diffraction by multiple apertures, and superresolution phenomena

• explain terminology in the field of diffractive optics• describe the operational principles of the major types of diffractive

optical components in the scalar and resonant domains, the diffraction efficiency, and the blazing condition

• describe diffraction phenomena associated with the propagation of laser beams

• compare the main diffractive optics fabrication techniques• distinguish the various functions performed by diffractive optics

components in optical systems• compare the benefits and limitations of diffractive components

INTENDED AUDIENCEThis material is intended for engineers, scientists, college students, and photonics enthusiasts who would like to broaden their knowledge and understanding of diffractive optics, as well as to learn the numerous

practical applications of diffractive optical components in modern optical instruments.

INSTRUCTORYakov Soskind is Photonics Instrumentation Development Manager with DHPC Technologies, Inc. For over 30 years, Dr. Soskind has made extensive contributions in the areas of optical engineering, laser systems development, fiber-optics and photonics instrumentation, diffractive and micro-optics, imaging, and illumination devices. Dr. Soskind is a founding chair of the Photonic Instrumentation Engineer-ing conference. He is the author of Field Guide to Diffractive Optics, SPIE Press, 2011, and has been awarded more than 20 domestic and international patents in the field of photonics.

COURSE PRICE INCLUDES the Field Guide to Diffractive Optics , FG21 (SPIE Press, 2011) by Yakov Soskind.




(1) We will review in this course the various techniques used by stan-dard optical CAD tools such as Zemax and CodeV to design diffractive optical elements (DOEs), micro-lens arrays (MLAs), hybrid optics and micro-optics, as well as the various numerical design techniques for computer generated holograms (CGHs).










INTENDED AUDIENCEScientists, engineers, technicians, or managers who wish to learn more about how to design, model and fabricate micro-optics, diffrac-

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tive optics and hybrid optics. Undergraduate knowledge in optics is assumed. Attendees will benefit maximally by attending SC454 Fabri-cation Technologies for Micro- and Nano-Optics prior to this course.



Fabrication Technologies for Micro- and Nano-OpticsSC454Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm

Applications of micro and nano-scale optics are widespread in essen-tially every industry that uses light in some way. A short list of sample application areas includes communications, solar power, biomedical sensors, laser-assisted manufacturing, and a wide range of consumer electronics. Understanding both the possibilities and limitations for manufacturing micro- and nano-optics is useful to anyone interested in these areas. To this end, this course provides an introduction to fabrication technologies for micro- and nano-optics, ranging from refractive microlenses to diffractive optics to sub-wavelength optical nanostructures.

After a short overview of key applications and theoretical background for these devices, the principles of photolithography are introduced. With this backdrop, a wide variety of lithographic and non-lithograph-ic fabrication methods for micro- and nano-optics are discussed in detail, followed by a survey of testing methods. Relative advantages and disadvantages of different techniques are discussed in terms of both technical capabilities and scalability for manufacturing. Issues and trends in micro- and nano-optics fabrication are also considered, focusing on both technical challenges and manufacturing infrastructure.

LEARNING OUTCOMESThis course will enable you to:• describe example applications and key ‘rules of thumb’ for micro-

and nano-optics• explain basic principles of photolithography and how they apply to

the fabrication of micro- and nano-optics• identify and explain multiple techniques for micro- and nano-

optics fabrication• compare the advantages and disadvantages of different

manufacturing methods• describe and compare performance and metrological testing

methods for micro- and nano-optics• evaluate fabrication trends and supporting process technologies

for volume manufacturing

INTENDED AUDIENCEEngineers, scientists, and managers who are interested in the design, manufacture, or application of micro/nano-optics, or systems that integrate these devices. A background in basic optics is helpful but not assumed.

INSTRUCTORThomas Suleski has been actively involved in research and develop-ment of micro- and nano-optics since 1991 at Georgia Tech, Digital Optics Corporation, and since 2003, as a member of the faculty at the University of North Carolina at Charlotte. He holds 12 patents and more than 110 technical publications on the design, fabrication, and testing of micro- and nano-optical components and systems. Dr. Suleski is a Fellow of SPIE, the International Society for Optical Engineering, and currently serves as Senior Editor for JM3, the Journal of Micro/Nanolithography, MEMS and MOEMS.

Precision Laser MicromanufacturingSC689Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Monday 1:30 pm to 5:30 pm

This course is a comprehensive look at laser technology as applied to precision micromanufacturing. A brief background discussion on laser history, technology and definition of important terms will be presented. Then, available laser sources will be compared and contrasted including CO2, excimer, Nd:YAG, fiber and short pulse lasers. IR and UV material/photon interaction, basic optical components and system integration are also crucial to getting good processing results and these will all be examined in detail. Finally, real applications from the medical, micro-electronics, aerospace and other fields will be presented.

This course has been greatly expanded to include detailed discussions on short pulse lasers (ps and fs) and their applications, both present and future. Also, MicroManufacturing includes technologies such as welding, joining and additive technologies. While the main emphasis of the course is still MicroMachining (material removal), additive technologies will be discussed also – especially 3D LAM (Laser Additive Manufacturing)

LEARNING OUTCOMESThis course will enable you to:• compare UV, IR and other laser sources to each other and learn

where each is best applied• describe and be familiar with several kinds of microprocessing

lasers on the market• describe material/photon interaction and why and how UV lasers

for instance are different than IR lasers• analyze a potential manufacturing application to identify it as a

possible candidate for laser processing• familiarize yourself with ‘real world’ opportunities for laser

micromanufacturing• identify marketplace growth opportunities

INTENDED AUDIENCEThe course will benefit anyone with an interest in small-scale industrial laser processing and achieving the best part quality, highest resolu-tion and cost effectiveness. Engineers will benefit from the technical discussions. Project Managers will benefit from cost considerations and risk reduction scenarios.

INSTRUCTORRonald Schaeffer is Chief Executive Officer of PhotoMachining, Inc. He has been involved in laser manufacture and materials processing for over 30 years, working in and starting small companies. He has over 150 publications, has written monthly web and print columns (currently writing a column for MicroManufacturing Magazine) and is on the Edi-torial Advisory Board of Industrial Laser Solutions. He is the author of the textbook “Fundamentals of Laser Micromachining”. He is also a past member of the Board of Directors of the Laser Institute of America and is affiliated with the New England Board of Higher Education. He has a Ph.D. in Physical Chemistry from Lehigh University and did graduate work at the University of Paris, after which he worked for several major laser companies. He is a US Army veteran of the 172nd Mountain Brigade and the 101st Airborne division. In his spare time he farms, collects antique pocket watches, plays guitar and rides a motorcycle.

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Micromachining with Femtosecond LasersSC743Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Monday 8:30 am to 12:30 pm

This course provides attendees with the knowledge necessary to understand and apply femtosecond laser pulses for micromachining tasks in a variety of materials. Emphasis will be placed on developing a fundamental understanding of how femtosecond pulses interact with the sample. From this knowledge, the advantages and limitations of femtosecond lasers for various micromachining tasks can be readily understood. Examples will be given in the micromachining of the sur-face of metals, semiconductors, and transparent materials, as well as the formation of photonic and microfluidic devices in the bulk of transparent materials.

LEARNING OUTCOMESThis course will enable you to:• summarize the linear and non-linear interaction mechanisms

of femtosecond laser pulses with metals, semiconductors, and transparent materials

• explain mechanisms for material removal and modification, as well as factors affecting precision and degree of collateral damage

• describe unique capabilities afforded by femtosecond pulses for micromachining bulk transparent materials

• determine appropriate femtosecond laser parameters for a micromachining task

• compare various micromachining methods and evaluate the most appropriate for a given job

INTENDED AUDIENCEThis course is aimed at people already doing or interested in starting research on short-pulse laser micromachining, as well as at people who have specific micromachining problems and wish to evaluate the potential of femtosecond lasers for accomplishing their task. Those who do not have a background in some of the unique properties of femtosecond laser pulses would benefit from attending SC541, “An Introduction to Femtosecond Laser Techniques,” by Eric Mazur and/or SC746 “Introduction to Ultrafast Technology” by Rick Trebino before attending this course.

INSTRUCTORStefan Nolte is a Professor at the Friedrich-Schiller University in Jena, Germany. His research topics include ultrashort pulse micromachining for industrial and medical applications. He has been actively engaged in research on femtosecond laser micromachining since the field’s inception in the mid-1990s.

Christopher Schaffer is an Assistant Professor at Cornell University, where his current research focuses on applications of femtosecond laser ablation in biology. He has been actively engaged in research on femtosecond laser micromachining since the field’s inception in the mid-1990s.

COURSE PRICE INCLUDES a detailed reading list of key papers.


Laser diodes are the most widely used lasers and have several unique properties that are difficult to handle. This course first describes laser

diode basic properties. Then, laser diode beam properties are exten-sively explained in detail. Attendees of the course will gain practical knowledge about laser diode beam characteristics, modeling and parameter measurement, learn about designing laser diode optics, and be able to effectively handle and utilize laser diodes.





INSTRUCTORHaiyin Sun has thirty years’ engineering, research and management experience in optics and lasers. He held senior optical engineer or manager positions with L-3 Communications, Coherent, Oplink Com-munications, and Power Technology, working mainly on laser diode optics design and optical engineering. He has designed and tested numerous types of laser diode modules and is the co-inventor of five laser diode optics patents. He is the primary author of two books, one book chapter and about twenty journal papers on laser diodes, laser diode beams and laser diode optics published by Springer, CRC Press, IEEE J. Q.E., JOSA., Opt. Lett., Appl. Opt., Opt. Eng., Opt. Comm., etc., and his work has been cited in Photonics Spectraand the Melles Griot Catalog. He was an adjunct assistant professor of applied science at the University of Arkansas and an editorial board member of the Journal of Optical Communications (Germany). He earned a Ph.D. in Applied Science, a M.S in Optics and a B.S in Physics.







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Optical Systems & Lens DesignBasic Optics for Non-Optics Personnel SC609 A

VAIL

AB

LE IN

O

NLINE FORMAT

Course Level: IntroductoryCEU: 0.2 $100 Members | $150 Non-Members USD Monday 1:30 pm to 4:00 pm

This course will provide the technical manager, sales engineering, marketing staff, or other non-optics personnel with a basic, non-math-ematical introduction to the terms, specifications, and concepts used in optical technology to facilitate effective communication with optics professionals on a functional level. Topics to be covered include basic concepts such as imaging, interference, diffraction, polarization and aberrations, definitions relating to color and optical quality, and an over-view of the basic measures of optical performance such as MTF and wavefront error. The material will be presented with a minimal amount of math, rather emphasizing working concepts, definitions, rules of thumb, and visual interpretation of specifications. Specific applica-tions will include defining basic imaging needs such as magnification, depth-of-field, and MTF as well as the definitions of radiometric terms.

LEARNING OUTCOMESThis course will enable you to:• read optical system descriptions and papers• ask the right questions about optical component performance• describe basic optical specifications for lenses, filters, and other

components• assess differences in types of filters, mirrors and beam directing

optics• know how optics is used in our everyday lives

INTENDED AUDIENCEThis course is intended for the non-optical professional who needs to understand basic optics and interface with optics professionals.

INSTRUCTORKevin Harding has been active in the optics industry for over 30 years, and has taught machine vision and optical methods for over 25 years in over 70 workshops and tutorials, including engineering workshops on machine vision, metrology, NDT, and interferometry used by vendors and system houses to train their own engineers. He has been recog-nized for his leadership in optics and machine vision by the Society of Manufacturing Engineers, Automated Imaging Association, and Engineering Society of Detroit. Kevin is a Fellow of SPIE and was the 2008 President of the Society.

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Basic Optics for EngineersSC156

AVA

ILA

BLE

IN O

NLINE FORMAT

Course Level: IntroductoryCEU: 0.65 $565 Members | $675 Non-Members USD Sunday 8:30 am to 5:30 pm

This course introduces each of the following basic areas of optics, from an engineering point of view: geometrical optics, image quality, flux transfer, sources, detectors, and lasers. Basic calculations and concepts are emphasized.

LEARNING OUTCOMESThis course will enable you to:• compute the following image properties: size, location, fidelity,

brightness• estimate diffraction-limited imaging performance• explain optical diagrams• describe the factors that affect flux transfer efficiency, and their

quantitative description• compute the spectral distribution of a source• describe the difference between photon and thermal detectors• calculate the signal to noise performance of a sensor (D* and

noise equivalent power)• differentiate between sensitivity and responsivity• explain the main factors of laser beams: monochromaticity,

collimation, and propagation

INTENDED AUDIENCEThis class is intended for engineers, technicians, and managers who need to understand and apply basic optics concepts in their work. The basics in each of the areas are covered, and are intended for those with little or no prior background in optics, or for those who need a fundamental refresher course.

INSTRUCTORGlenn Boreman is the Chairman of the Department of Physics and Optical Science at the University of North Carolina at Charlotte since 2011. He received a BS in Optics from Rochester and PhD in Optics from Arizona. Prof. Boreman served on the faculty of University of Central Florida for 27 years, with 25 PhD students supervised to completion. His research interests are in infrared detectors, infrared metamateri-als, and electro-optical sensing systems. Prof. Boreman is a Fellow of SPIE, OSA, and the Military Sensing Symposium, and is the 2015 Vice-President of SPIE.

COURSE PRICE INCLUDES the text Basic Electro-Optics for Electrical Engineers (SPIE Press, 1998) by Glenn D. Boreman.

Introduction to Lens DesignSC935Course Level: IntroductoryCEU: 0.65 $560 Members | $670 Non-Members USD Wednesday 8:30 am to 5:30 pm

Have you ever needed to specify, design, or analyze a lens system and wondered how to do it or where to start? Would you like a better understanding of the terminology used by lens designers? Are you interested in learning techniques to better utilize your optical design software? Have you always wanted to know what the difference is between spherical aberration and coma or where those crazy optical tolerances come from? If your answer to any of these questions is yes, this course is for you!

This full day course begins with a review of basic optics, including paraxial optics, system layout, and lens performance criteria. A dis-cussion of how different system specifications influence the choice of design form, achievable performance, and cost will be presented. Third-order aberration theory, stop shift theory, and induced aberra-

tions are examined in detail. Factors that affect aberrations and the principles of aberration correction are discussed. Demonstrations of computer aided lens design are given accompanied by a discussion of optimization theory, variables and constraints, and local vs. global optimization. Techniques for improving an optical design are illustrat-ed with easy-to-understand examples. The optical fabrication and tolerancing process is explored including an example comparison between a simple copier lens and a complex lithography lens (used to print computer circuit boards) to help explain why some optical designs require precision mechanics and precision assembly and some do not.

LEARNING OUTCOMESThis course will enable you to:• specify and evaluate a lens system• describe the source and correction of aberrations• interpret ray-intercept plots• classify the limits imposed by aberration theory• determine how to improve a design• use optical design software to its best advantage• design toleranced, easily manufacturable lenses

INTENDED AUDIENCEThis course is intended for engineers, scientists, managers, techni-cians, and students whose main job function is not lens design, but are occasionally called upon to specify, design, analyze, or review an optical system and would like to have a better understanding of the subject. No previous knowledge of geometrical optics, optical design, and computer optimization is assumed.

INSTRUCTORJulie Bentley is an Associate Professor at The Institute of Optics, University of Rochester and has been teaching undergraduate and graduate level courses in geometrical optics, optical design, and product design for more than 15 years. She received her B.S., M.S., and PhD in Optics from the The Institute of Optics, University of Roch-ester. After graduating she spent two years at Hughes Aircraft Co. in California designing optical systems for the defense industry and then twelve years at Corning Tropel Corporation in Fairport, New York designing and manufacturing precision optical assemblies such as microlithographic inspection systems. She has experience designing a wide variety of optical systems from the UV to the IR, refractive and reflective configurations, for both the commercial and military markets.

COURSE PRICE INCLUDES the text Field Guide to Lens Design (SPIE Press, 2012) by Julie Bentley and Craig Olson.

Optical System Design: Layout Principles and PracticeSC690Course Level: IntroductoryCEU: 0.65 $560 Members | $670 Non-Members USD Sunday 8:30 am to 5:30 pm

This course provides the background and principles necessary to understand how optical imaging systems function, allowing you to produce a system layout which will satisfy the performance require-ments of your application.

This course teaches the methods and techniques of arriving at the first-order layout of an optical system by a process which determines the required components and their locations. This process will produce an image of the right size and in the right location. A special emphasis is placed on understanding the practical aspects of the design of optical systems.

Optical system imagery can readily be calculated using the Gaussian cardinal points or by paraxial ray tracing. These principles are extended to the layout and analysis of multi-component systems. This course includes topics such as imaging with thin lenses and systems of thin lenses, stops and pupils, and afocal systems. The course starts by providing the necessary background and theory of first-order optical

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design followed by numerous examples of optical systems illustrating the design process.

LEARNING OUTCOMESThis course will enable you to:• specify the requirements of an optical system for your application

including magnification, object-to-image distance, and focal length

• diagram ray paths and do simple ray tracing• describe the performance limits imposed on optical systems by

diffraction and the human eye• predict the imaging characteristics of multi-component systems• determine the required element diameters• apply the layout principles to a variety of optical instruments

including telescopes, microscopes, magnifiers, field and relay lenses, zoom lenses, and afocal systems

• adapt a known configuration to suit your application• grasp the process of the design and layout of an optical system

INTENDED AUDIENCEThis course is intended for engineers, scientists, managers, technicians and students who need to use or design optical systems and want to understand the principles of image formation by optical systems. No previous knowledge of optics is assumed in the material development, and only basic math is used (algebra, geometry and trigonometry). By the end of the course, these techniques will allow the design and analysis of relatively sophisticated optical systems.

INSTRUCTORJohn Greivenkamp is a professor at the College of Optical Sciences of The University of Arizona where he teaches geometrical optics and optical system design to undergraduate and graduate students. John is the editor of the SPIE Field Guides and is the author of the Field Guide to Geometrical Optics (SPIE Press, 2004).

COURSE PRICE INCLUDES the Field Guide to Geometrical Optics (SPIE Press, 2004) by John E. Greivenkamp.

SPECIAL NOTE: This course is a continuation of Warren Smith’s long-standing SPIE course SC001, Optical System Design: Layout Principles and Practice and incorporates many of the same approaches and material used for that course.

Practical Optical System DesignSC003Course Level: IntermediateCEU: 0.65 $615 Members | $725 Non-Members USD Monday 8:30 am to 5:30 pm

This course will provide attendees with a basic working knowledge of optical design and associated engineering. The information in this course will help novice and experienced designers, as well as people who interact with optical designers and engineers, sufficiently under-stand these problems and solutions to minimize cost and risk. The course includes background information for optical design and an array of pragmatic considerations such as optical system specification, analysis of optical systems, material selection, use of catalog systems and components, ultraviolet through infrared system considerations, environmental factors and solutions, Gaussian beam optics, and production considerations such as optical testing and alignment. The course includes many practical and useful examples emphasizing rigor-ous optical design and engineering with an emphasis on designing for manufacture. Even if you have never used an optical design program before, you will become fluent with how to estimate, assess, execute, and manage the design of optical systems for many varied applications.

This course is a continuation of the long-running Practical Optical Systems Design course established and taught by Robert E. Fischer.

LEARNING OUTCOMESThis course will enable you to:• develop a complete optical system design specification

• review fundamental physics and engineering related to optical design

• assess and analyze optical systems using computer-aided methods

• properly take into account system considerations such as environmental factors

• design for manufacture, alignment, and testing• describe all aspects of optical design and associated engineering

INTENDED AUDIENCEThis course is intended for anyone who needs to learn how to design optical systems. It will be of value to those who either design their own optics or those who work directly or indirectly with optical designers, as you will now understand what is really going on and how to ask the right questions of your designers.


COURSE PRICE INCLUDES the text Optical System Design, 2nd Edition (SPIE Press, 2008) by Robert E. Fischer, Biljana Tadic-Galeb, and Paul R. Yoder, Jr.

This course is also available in online format .






detectors and how each type may be optimally utilized• compare NIR sources including LEDs and laser diodes• apply figures of merit including NEP, NEI, and NETD to your solution• determine whether or not the atmosphere will affect your results,


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INSTRUCTORBarbara Grant has 30 years’ engineering experience and holds an M. S. in Optical Sciences from the University of Arizona. She consults on practical problems in electro-optical systems, detector technology, spectrometry, and spectroradiometry. She is the author or co-author of two bestselling SPIE books (“Field Guide to Radiometry,” “The Art of Radiometry”) and is currently preparing a book on UAV imaging sensors for SPIE Press. She received two NASA awards for her work on the integration and test phase of the GOES weather satellite im-ager and sounder. She teaches courses to optical and electro-optical engineering professionals at meetings of SPIE, through Georgia Tech Professional Education, UC Irvine Extension, government agencies, and for commercial clients.



LEARNING OUTCOMESThis course will enable you to:• define variability and comprehend its impact on nominal systems• utilize fundamental applied statistics in tolerancing• construct tolerance analysis budgets• perform detailed tolerance analysis• summarize different design of experiment and statistical process

control strategies


INSTRUCTORRichard Youngworth is Founder and Chief Engineer of Riyo LLC, an optical design and engineering firm providing engineering and product development services. His industrial experience spans diverse topics including optical metrology, design, manufacturing, and analysis. Dr. Youngworth has spent significant time working on optical systems in the challenging transition from ideal design to successful volume manufacturing. He is widely considered an expert, due to his research, lectures, publications, and industrial work on the design, producibility, and tolerance analysis of optical components and systems. Dr. Young-

worth teaches “Practical Optical System Design” and “Cost-Conscious Tolerancing of Optical Systems” for SPIE. He has a B.S. in electrical engineering from the University of Colorado at Boulder and earned his Ph.D. in optics at the University of Rochester by researching tolerance analysis of optical systems.

Evaluating Aspheres for ManufacturabilitySC1039Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Thursday 8:30 am to 12:30 pm

This course provides an overview of how aspheric surfaces are de-signed, manufactured, and measured. The primary goal of this course is to teach how to determine whether a particular aspheric surface design will be difficult to make and/or test. This will facilitate cost/performance trade off discussions between designers, fabricators, and metrologists.

We will begin with a discussion of what an asphere is and how they benefit optical designs. Next we will explain various asphere geometry characteristics, especially how to evaluate local curvature plots. We will also review flaws of the standard polynomial representation, and how the Forbes polynomials can simplify asphere analysis. Then we will discuss how various specifications (such as figure error and local slope) can influence the difficulty of manufacturing an asphere. Optical assembly tolerances, however, are beyond the scope of this course - we will focus on individual elements (lenses / mirrors).

The latter half of the course will focus on the more common technol-ogies used to generate, polish, and/or measure aspheric surfaces (e.g. diamond turning, glass molding, pad polishing, interferometry). We’ll give an overview of a few generic manufacturing processes (e.g. generate-polish-measure). Then we’ll review the main strengths and weaknesses of each technology in the context of cost-effective asphere manufacturing.

LEARNING OUTCOMESThis course will enable you to:• answer the question “Can these aspheres be made within my

budget?”• interpret an aspheric prescription from an optical component print• describe how Forbes polynomials can simplify asphere

interpretation• know how aspheres are manufactured and tested• evaluate key characteristics of an aspheric surface to determine

whether an asphere will be difficult to manufacture and/or test

INTENDED AUDIENCEThis material is intended for engineers, optical designers, and managers who want an overview of the benefits and challenges associated with manufacturing aspheric surfaces for use in optical systems. It will be of benefit for specialists in a particular area (e.g. design, manufacturing, or testing), as it will give a broad overview in all three of those areas with a focus on aspheric surfaces. It is intended to facilitate communication between designers, fabricators, and testers of aspheric surfaces.

INSTRUCTORChristopher Hall is a Senior Engineer at QED Technologies Interna-tional, where he has focused on optical manufacturing within the QED Optics group. He received his B.S. in Physics from Colgate University and M.S. in Optics from the Institute of Optics at the University of Rochester.

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Design of Efficient Illumination SystemsSC011Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Monday 8:30 am to 12:30 pm

Illumination systems are included in fiber illuminators, projectors, and lithography systems. The design of an illumination system requires balancing uniformity, maximizing the collection efficiency from the source, and minimizing the size of the optical package. These choic-es are examined for systems using lightpipes, lens arrays, faceted optics, tailored edge rays designs, and integrating spheres through a combination of computer simulations, hardware demonstrations and discussions.

LEARNING OUTCOMESThis course will enable you to:• describe the differences between illuminance, intensity and

luminance• compute the required source luminance given typical illumination

system specifications• compute the change in luminance introduced by an integrating

sphere • distinguish between a Kohler illuminator and an Abbe illuminator• explain the difference in uniformity performance between a

tailored edge ray reflector and a standard conic reflector• design a lightpipe system to provide uniform illuminance• design a lens array system to create a uniform illuminance

distribution• design a reflector with facets to create a uniform illuminance

distribution

INTENDED AUDIENCEIndividuals who design illumination systems or need to interface with those designers will find this course appropriate. Previous exposure to Optical Fundamentals (Reflection, Refraction, Lenses, Reflectors) is expected.

INSTRUCTORWilliam Cassarly is a Senior Scientist with Synopsys (formerly Opti-cal Research Associates). Before joining ORA 18 years ago, Cassarly worked at GE for 13 years, holds 47 US patents, and has worked exten-sively in the areas of illumination system design, sources, photometry, light pipes, and non-imaging optics. Bill was awarded the GE Corporate ‘D. R. Mack Advanced Course Supervisor Award’ for his efforts in the training of GE Engineers and is an SPIE Fellow.




(1) We will review in this course the various techniques used by standard optical CAD tools such as Zemax and CodeV to design diffractive optical elements (DOEs), micro-lens arrays (MLAs), hybrid optics and micro-optics, as well as the various numerical design techniques for computer generated holograms (CGHs).

(2) Modeling single micro optics or more complex micro-optical systems including MLAs, DOEs, CGHs, and other hybrid elements can be difficult or impossible when using classical ray tracing algorithms.

We will review various techniques using physical optics propagation to model not only diffraction effects, but also systematic and random fabrication errors, multi-order propagation and other effects which cannot be modeled accurately through ray tracing.












Advanced Quantum and Optoelectronic ApplicationsMonte Carlo Modeling Explained NewSC1152Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Tuesday 8:30 am to 5:30 pm

Monte Carlo modeling is widely used in biomedical optics to describe light transport in complicated situations where closed-form solutions to

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analytical models do not exist. While this standard definition describes Monte Carlo modeling as powerful and flexible, which it is, it also sounds overly-complicated, which it is not! This course will provide an intro-duction into both the theoretical concepts and real-world applications of Monte Carlo modeling of light transport in tissue.










Laser ApplicationsLaser Welding and Drilling - NewFundamentals & PracticesSC1151Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Monday 8:30 am to 5:30 pm


The common denominator in laser drilling and laser welding is the power density of the laser as it is focused on the surface of the ma-terial. This short course reviews the main parameters that control the

power density and the tools used to measure the power density (laser beam metrology).











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This course will provide attendees with a basic knowledge of the pro-cess of integrating diode lasers into systems. The course encourages a multidisciplinary approach in system design. The course is intended to help engineers to overcome complex technical (e.g. electromagnetic compatibility) and non-technical (e.g. cost consideration) problems.






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INSTRUCTORThomas Lieb is President, Laser Safety Officer at L*A*I International, and has more than 25 years experience in laser systems, laser safety and laser safety education. A Certified Laser Safety Officer (CLSO), Lieb is a member of the Board of Laser Safety, responsible for reviewing and editing qualification exams. He is a member of ANSI Accredited Standards Committee and the Administrative Committee of ASC Z136 Safe Use of Lasers, Chairman of the subcommittee for ANSI Z136.9 Safe Use of Lasers in a Manufacturing Environment; contributor to ANSI B11.21 Design, Construction, Care, and Use of Laser Machine Tools (and other subcommittees of ANSI for laser safety). He has been a past member of the Board of Directors of the Laser Institute of America (LIA); and highly involved in the International Laser Safety Conference and current Chair of the 2015 ILSC PAS (Practical Application Seminars), Involved for many years in International laser safety issues, Lieb is the International Chairman of IEC/TC 76 on the Laser Safety Standard IEC [EN] 60825 and Chair of the subcommittee for ISO/IEC [EN] 11553 Safety of Machines, Laser Processing Machines He was 2008 recipient of the IEC’s “1906 Award” for significant contribution to electro-technology and the work of the IEC (International Electrotechnical Commission). An invited lecturer at the University of Tokyo and British Health Protection Agency, as well as advising various businesses and institutions world-wide, Lieb has authored a number of technical papers and articles, and contributed to the CLSO’s Best Practices in Laser Safety manual and the textLaser Materials Processing.

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Nano/BiophotonicsPhoton Upconversion New Nanomaterials, Technologies and Biomedical ApplicationsSC1149Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Sunday 1:30 pm to 5:30 pm











vision and LIDAR



Fluorescent Markers: Usage and Optical System OptimizationSC309Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 1:30 pm to 5:30 pm

Fluorescent dyes are frequently used as markers in many biological samples. They are used in research labs to track different tissues, cells

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and individual molecules. Studying these interactions is a key part of understanding physiology and developing new cures to common dis-eases. Fluorescent markers are also used in many analytical chemistry tests in hospitals for assisting the diagnosis of a health condition and evaluating the progression of a treatment. Applications of molecular markers, including the use of fluorescent markers as anatomical and functional markers in the body, have grown rapidly in recent years.

This course will include cover the fundamental properties of fluorescent dyes, optimizing and matching an optical imaging system to specific dye spectra, and tailoring the optical system modules for specific applications such as bench-top microscopes, three-dimensional high resolution cellular imaging, and in vivo fluorescence imaging in pre-clin-ical studies and in clinical applications. We will also review common applications of fluorescent dyes and fluorescence imaging in current research and clinical activities.

LEARNING OUTCOMESThis course will enable you to:• describe dye properties such as excitation and emission spectra,

quantum efficiency, and the schematic of a fluorescence process• summarize the different main classes of fluorescent markers

including small molecule dyes, nano-crystal quantum dots, and fluorescent proteins and their attributes

• explain the principles of fluorescence microscopy and the main modules (lenses, filters, sensors, light sources) involved in fluorescence imaging systems

• estimate the expected fluorescence signal in a given imaging system

• explain advanced microscopy techniques such as fluorescence resonance energy transfer (FRET), fluorescence lifetime (FLIM), fluorescence recovery after photo-bleaching (FRAP), and three-dimensional techniques such as confocal and two-photon microscopy

• describe the design of miniature fluorescence imaging systems and their unique challenges

• summarize common applications of fluorescent dyes and fluorescence imaging in current research and clinical activities

INTENDED AUDIENCEEngineers, scientists, students and managers who wish to learn more about fluorescent markers, design of bench-top and miniature fluores-cence imaging systems, and their application in biomedical imaging. Some prior knowledge in optoelectronic devices and microscopy is desirable.

INSTRUCTOROfer Levi is a Professor of Electrical Engineering and Biomedical Engineering at the University of Toronto. He also holds a Visiting Professor position at Stanford University, CA. He has spent over two decades in academia and industry, designing and developing optical imaging systems, laser sources, and optical sensors. He specializes in design and optimization of optical bio-sensors, Bio-MEMS, and optical imaging systems for biomedical applications, including in cancer and brain imaging. Dr. Levi is a member of OSA, IEEE-Photonics, and SPIE.



This course will review the principles and major optical techniques used for optical brain imaging. We will review the main cellular types in the

brain and the organization of the anatomical regions into functional units. We will compare the major optical techniques used in brain imaging and discuss the contrast mechanisms that are used in each technique.















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INSTRUCTORStephen Kanick Ph.D. is an Assistant Professor of Engineering at Dart-mouth College and has over 10 years of experience in the development of Monte Carlo models of light transport in tissue. He has widely published studies that use Monte Carlo simulations to guide the development of new optical measurements that have been translated into clinical studies.


OptomechanicsVibration Control for NewOptomechanical SystemsSC1147Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Monday 8:30 am to 5:30 pm

The course discusses ways in which vibration may affect optical performance, as well as methods and means of reducing this impact. Principal methods of vibration control, such as damping and isolation, are described using mathematical models and real-life examples. Vibration measurements and environmental standards are presented as applicable to optomechanical systems. State-of-the art vibration control systems are reviewed, including pneumatic and elastomeric isolators, damping treatments, and active control systems.

LEARNING OUTCOMESThis course will enable you to:• perform simple vibration measurements according to best

practices and standards• estimate vibration environments with respect to possible impact

on optical systems• formulate requirements for vibration control systems• model and calculate vibration properties of simple mechanical

systems and structures

• describe properties of various types of state-of-the-art vibration control systems

• specify and use vibration control systems

INTENDED AUDIENCEScientists, engineers, technicians, or engineering managers who design, test and use advanced optical and optomechanical systems and wish to learn more about vibration affecting optical performance and proper use of vibration control systems. Pre-requisites include Introductory college level mathematics and physics.

INSTRUCTORVyacheslav Ryaboy Ph.D., Dr.Sci., is the Principal Engineer in Vibration Control Product Development at Newport Corporation of Irvine, CA. He is the author of a monograph on optimal vibration isolation, numerous papers and inventions in the field of Vibration Control. Previously, he held research and teaching positions in the areas of Applied Mechan-ics and Mechanical Engineering at universities and research centers worldwide. He holds a Ph.D. and Doctor of Sciences degrees from the Lomonosov Moscow State University in Mechanics of Solids and System Dynamics, respectively.

Introduction to Optical Alignment TechniquesSC010Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Tuesday 8:30 am to 5:30 pm

This course discusses the equipment, techniques, tricks, and skills necessary to align optical systems and devices. You learn to identify errors in an optical system, and how to align lens systems.

LEARNING OUTCOMESThis course will enable you to:• determine if errors in the optical system are due to misalignment

errors or other factors such as fabrication, design, or mounting problems

• recognize and understand the fundamental imaging errors associated with optical systems

• diagnose (qualitatively and quantitively) what is wrong with an optical system by simply observing these fundamental imaging errors

• use the variety of tools available for aligning optical systems, and more importantly, how to “tweak” logically the adjustments on these devices so that the alignment proceeds quickly and efficiently

• align basic lens systems and telescopes• align more complex optical systems such as those containing off-

axis aspheric surfaces, and maintain alignment using automatic mounting techniques

INTENDED AUDIENCEThis course is directed toward engineers and technicians needing basic practical information and techniques to achieve alignment of simple optical systems, as well as seemingly more complicated off-axis aspheric mirrors. To benefit most from this course you will need a basic knowledge of the elementary properties of lenses and optical systems (i.e. focal lengths, f/numbers, magnification, and other imaging properties) and a working knowledge of simple interferometry. Some familiarity with the basic aberrations such as spherical aberration, coma, and astigmatism will be helpful.

INSTRUCTORKenneth Castle Ph.D. is president of Ruda-Cardinal, Inc., an optical engineering consulting firm located in Tucson, Arizona. Ken has worked with Mitch Ruda, the originator of this course, for 28 years. Mitch passed away August 31, 2013, and Ruda-Cardinal is continuing the tradition of this course in his memory.

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Structural Adhesives for Optical BondingSC015Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Monday 8:30 am to 12:30 pm

Optomechanical systems require secure mounting of optical elements. Adhesives are commonly used, but rarely addressed in the literature. This course has compiled an overview of these adhesives, their proper-ties, and how to test them. How to use them is addressed in detail with guidelines and examples provided. A summary of common adhesives is presented with justification for their use. Consideration and analysis of adhesive strength, reliability, and stability are included. Different design approaches to optimize the application are presented and discussed. Many examples are described as well as lessons learned from past experience. Discussions are encouraged to address current problems of course attendees.

LEARNING OUTCOMESThis course will enable you to:• describe and classify adhesives and how they work (epoxy,

urethane, silicone, acrylic, RTV, VU-cure, etc.)• obtain guidance in: adhesive selection, surface preparation,

application, and curing• develop a basis for analysis of stress and thermal effects• recognize contamination/outgassing and how to avoid it• review design options• create and use an adhesive check list

INTENDED AUDIENCEThis course is for engineers, managers, and technicians. This course provides a foundation for the correct design for successful optical mounting; an understanding of the best options to employ for each application, and the selection and approach conducive to production. A bound course outline (that is a good reference text) is provided, in-cluding summaries of popular adhesives and their properties.

INSTRUCTORJohn Daly has 35 years of experience in lasers and optomechanics. Over this period, he has worked optical bonding problems since his thesis projects, as an employee of several major corporations, and now as a consultant. His academic background in mechanical engineering and applied physics compliments this discipline. His work experience has been diverse covering areas such as: military lasers, medical lasers, spectroscopy, point and standoff detection, and E-O systems. His roles over these years have included analysis, design, development, and production. He is a SPIE member, with numerous publications, and is a committee member of the SPIE Optomechanical Engineering Program.

Optomechanical Systems EngineeringSC1085Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Thursday 8:30 am to 5:30 pm

This course emphasizes a systems-level overview of optomechanical engineering. Starting with the fundamentals of imaging, it reviews how optical system concepts flow down into optomechanical requirements on optical fabrication, alignment, structural design, mechanics of ma-terials (metals, composites, and glasses), structural vibrations, thermal management, and kinematic mounts. The focus is on real-world design problems, as well as the commercial off-the-shelf (COTS) components used to solve them.

LEARNING OUTCOMESThis course will enable you to:• utilize the basic concepts and terminology of optical engineering

required for the development of optomechanical components• read conventional and ISO-10110 drawings used for the fabrication

of lenses• develop an alignment plan with an emphasis on critical tolerances,

alignment mechanisms, and “go-no go” decisions for adjusting tilt, decenter, despace, and defocus

• quantify the ability of a structural design to maintain alignment using efficient architectures and lightweight materials; compare low-strain lens and mirror mounts for reducing wavefront error (WFE)

• utilize the results of STOP (structural-thermal-optical) analysis for the deflection and distortion of optical components under static loads; estimate the impact of stress concentrations and contact stresses; select optical materials with appropriate structural properties

• estimate the effects of vibration environments on the alignment of optomechanical systems; select COTS components for vibration isolation

• predict the effects of conductive, convective, and radiative thermal environments on the performance of optical systems; select materials and off-the-shelf hardware to manage the effects of heat loads and temperature changes

• compare kinematic and semi-kinematic mounts and the limitations of COTS hardware

INTENDED AUDIENCEIntended for engineers (systems, optical, mechanical, and electrical), scientists, technicians, and managers who are developing, specifying, or purchasing optical, electro-optical, infrared, or laser systems.

INSTRUCTORKeith Kasunic has more than 25 years of experience developing op-tical, electro-optical, infrared, and laser systems. He holds a Ph.D. in Optical Sciences from the University of Arizona, an MS in Mechanical Engineering from Stanford University, and a BS in Mechanical Engi-neering from MIT. He has worked for or been a consultant to a number of organizations, including Lockheed Martin, Ball Aerospace, Sandia National Labs, Nortel Networks, and Bookham. He is currently the Technical Director of Optical Systems Group, LLC. He is also an Adjunct Professor at Univ. of Central Florida’s CREOL – The College of Optics and Photonics, as well as an Affiliate Instructor with Georgia Tech’s SENSIAC, and an Instructor for the Optical Engineering Certificate Program at Univ. of California Irvine. This course is based on courses he teaches at CREOL and Georgia Tech’s SENSIAC.

Finite Element Analysis of OpticsSC1120Course Level: IntermediateCEU: 0.65 $595 Members | $705 Non-Members USD Wednesday 8:30 am to 5:30 pm

This course presents the use of finite element methods to model and predict the behavior of optical elements and support structures includ-ing lenses, mirrors, windows, and optical mounts in the presence of mechanical and environmental loads. Students will learn general FEA modeling strategies and guidelines specific to optical systems including how to develop low-fidelity models to quickly perform optomechani-cal design tradeoffs as well as the creation of high-fidelity models to support detailed design.

Emphasized will be the application of FEA techniques to meet optical system error budget allocations including mounting tolerances, align-ment errors, optical surface distortions, image stability, and wavefront error. In addition, use of FEA to ensure structural integrity requirements including yield, buckling, and fracture will be discussed.

LEARNING OUTCOMESThis course will enable you to:• develop optical component and system level finite element models• model conventional and lightweight mirrors including evaluating

the impact of optical coatings

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• analyze optical mounts including kinematic, flexure, and optical bond designs

• predict optical alignment errors due to mechanical, assembly, and environmental loads

• perform optical surface error analyses using Zernike polynomials• predict optical system image motion due to thermal and dynamic

environments• evaluate the effects of temperature and stress on optical

performance

INTENDED AUDIENCEThis course is intended for mechanical engineers interested in learning about the application of finite element analysis in the mechanical design of optical systems. An interest in optomechanical engineering and/or familiarity with finite element software is recommended.

INSTRUCTORKeith Doyle has over 25-years experience in the field of optomechanical engineering, specializing in the multidisciplinary modeling of optical systems. He is a co-author of the book titled Integrated Optomechan-ical Analysis, has authored or co-authored over 40-publications in the field, and is a Fellow of SPIE. He is currently employed at MIT Lincoln Laboratory as a Group Leader in the Engineering Division. Previously he served as Vice President of Sigmadyne Inc. and as a Senior Sys-tems Engineer at Optical Research Associates. He received his Ph.D. in engineering mechanics with a minor in optical sciences from the University of Arizona.

Victor Genberg has over 40-years experience in the application of finite element methods to high-performance optical structures and is a recognized expert in opto-mechanics. He is currently President of Sigmadyne, Inc. and a Professor of Mechanical Engineering at the University of Rochestor where he teaches courses in optomechanics, finite element analysis, and design optimization. He is the co-author of the book titled Integrated Optomechanical Analysis has over 40 publications in this field including two chapters in the CRC Handbook of Optomechanical Engineering. Prior to founding Sigmadyne, Dr. Genberg spent 28-years at Eastman Kodak serving as a technical specialist for military and commercial optical systems.

COURSE PRICE INCLUDES the text Integrated Optomechanical Analy-sis, 2nd Edition (SPIE Press, 2012) by Keith Doyle, Victor Genberg, and Gregory Michels.



LEARNING OUTCOMESThis course will enable you to:• define variability and comprehend its impact on nominal systems

• utilize fundamental applied statistics in tolerancing• construct tolerance analysis budgets• perform detailed tolerance analysis• summarize different design of experiment and statistical process

control strategies



Semiconductor Lasers and LEDsDesign of Efficient Illumination SystemsSC011Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Monday 8:30 am to 12:30 pm








distribution

INTENDED AUDIENCEIndividuals who design illumination systems or need to interface with those designers will find this course appropriate. Previous exposure

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to Optical Fundamentals (Reflection, Refraction, Lenses, Reflectors) is expected.


Light-Emitting DiodesSC052Course Level: IntermediateCEU: 0.35 $375 Members | $430 Non-Members USD Monday 1:30 pm to 5:30 pm

This course presents the history, operating principles, fabrication pro-cesses, and applications of light-emitting diodes (LEDs) with particular emphasis on solid-state lighting applications. The course provides an overview of LED fundamentals, design, and fabrication techniques. Furthermore, the fundamentals of solid-state lighting are discussed, including human factors, efficacy, efficiency, and color rendering properties of novel light sources. Although the course participants do not need to be specialists in optoelectronic device physics, familiarity with semiconductors is expected.

LEARNING OUTCOMESThis course will enable you to:• explain the operating principles of LEDs• explain the fundamentals of solid state lighting• explain quantum efficiency, power efficiency, luminous efficiency,

color rendering, and other figures of merit• design LED structures and drive circuits• identify present and future areas of applications for LEDs

INTENDED AUDIENCEThis course is intended for scientists, engineers, technicians, and managers working on light-emitting diodes, solid-state lighting, and LED application areas.

INSTRUCTORE. Fred Schubert is Wellfleet Senior Constellation Professor of the Future Chips Constellation at Rensselaer Polytechnic Institute (RPI) in Troy, New York. He is Professor of Electrical, Computer, and Systems Engineering. He has taught and published extensively on the subject of optoelectronic materials and devices in particular LEDs. He is the author of Doping in III-V Semiconductors (1992), Delta-Doping of Semi-conductors (1996) and Light-Emitting Diodes (2006). He is a fellow of the SPIE, OSA, APS, and IEEE.

COURSE PRICE INCLUDES the text Light-Emitting Diodes (Cambridge University Press, 2006) by E. Fred Schubert.


This course will provide attendees with a basic knowledge of the pro-cess of integrating diode lasers into systems. The course encourages a multidisciplinary approach in system design. The course is intended to help engineers to overcome complex technical (e.g. electromagnetic

compatibility) and non-technical (e.g. cost consideration) problems.














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Laser Welding and Drilling - NewFundamentals & PracticesSC1151Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Monday 8:30 am to 5:30 pm


The common denominator in laser drilling and laser welding is the power density of the laser as it is focused on the surface of the ma-terial. This short course reviews the main parameters that control the power density and the tools used to measure the power density (laser beam metrology).









GaN Optoelectronics: Material NewProperties and Device PrinciplesSC822Course Level: IntroductoryCEU: 0.35 $300 Members | $355 Non-Members USD Tuesday 8:30 am to 12:30 pm





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INSTRUCTORKonstantin Vodopyanov is a professor of optics and physics at the College of Optics & Photonics (CREOL) at the University of Central Florida. He is a world expert in mid-IR solid state lasers, nonlinear optics and laser spectroscopy and has 350 technical publications in the field; he co-authored, with Irina Sorokina, the book ‘Solid-State Mid-Infrared Laser Sources’ (Springer, 2003). Dr. Vodopyanov is a Fellow of SPIE - International Society for Optical Engineering, Optical Society of America (OSA), American Physical Society (APS), and UK Institute of Physics (IOP). He is a member of program committees for several major laser conferences including CLEO (most recent, General Chair in 2010) and Photonics West (LA107 Conference Chair). His re-search interests include nonlinear optics, mid-IR and terahertz-wave generation, nano-IR spectroscopy, and ultra broadband frequency combs and their spectroscopic applications. Dr. Vodopyanov has delivered numerous invited talks and tutorials at scientific meetings on the subject of mid-IR technology.














(1) We will review in this course the [i] various techniques used by standard optical CAD tools such as Zemax and CodeV to design diffractive optical elements (DOEs), micro-lens arrays (MLAs), hybrid optics and micro-optics, as well as the various numerical design techniques for computer generated holograms (CGHs).

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(2) Modeling single micro optics or more complex micro-optical systems including MLAs, DOEs, CGHs, and other hybrid elements can be difficult or impossible when using classical ray tracing algorithms. We will review various techniques using physical optics propagation to model not only diffraction effects, but also systematic and random fabrication errors, multi-order propagation and other effects which cannot be modeled accurately through ray tracing.













This provides a review of the basics of semiconductor materials, with primary emphasis on their optoelectronic properties. The motion of electrons and holes is discussed, and photon absorption and gener-ation mechanisms are presented. The course examines basic device

structures such as quantum wells and quantum dots, Bragg reflectors, cascade devices, distributed feedback devices, avalanching, tunnel-ing, and various electro-optic effects. Device operating principles are presented, and an overview of current device applications is given. The participants should walk away with a good understanding of semiconductor optoelectronics covering the entire UV to terahertz spectral region, including devices such as diode and cascade lasers, LEDs, SLEDs, VCSELs, modulators, and photodetectors.



and detectors• understand their figures of merit and performance limitations • explain the fabrication techniques used to manufacture

optoelectronic devices• know what questions to ask device manufacturers• summarize current device applications











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Displays and HolographyHead Mounted Displays for New Augmented Reality ApplicationsSC1096Course Level: IntroductoryCEU: 0.65 $525 Members | $635 Non-Members USD Wednesday 8:30 am to 5:30 pm















Design of Efficient Illumination SystemsSC011Course Level: IntermediateCEU: 0.35 $300 Members | $355 Non-Members USD Monday 8:30 am to 12:30 pm


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distribution

INTENDED AUDIENCEIndividuals who design illumination systems or need to interface with those designers will find this course appropriate. Previous exposure to Optical Fundamentals (Reflection, Refraction, Lenses, Reflectors) is expected.


Professional Development WorkshopsResumes to Interviews: Strategies for a Successful Job SearchWS1059Course Level: IntroductoryCEU: 0.25 $50 Members | $100 Non-Members USD Tuesday 1:30 pm to 4:30 pm

This course reviews effective strategies and techniques for a success-ful job search such as: compiling resumes, writing cover letters, and interviewing tips. The primary goal of the course is to provide creative and proven techniques for new college graduates and professionals to plan and conduct their job search and secure a job.

Creative and comprehensive job search techniques will be discussed as well as actual resume and interviewing examples and tips. Anyone who is getting ready to enter the work force who wants to answer questions such as, “when and how do I start my job search?,” “what kind of cover letter and resume gets noticed?” or “how do I sell myself in an interview?” will benefit from taking this course.

LEARNING OUTCOMESThis course will enable you to:• start and create your job search plan• create an online networking presence• build and write effective cover letters and resumes that get noticed• avoid common resume and cover letter mistakes• interview with confidence

INTENDED AUDIENCEGraduate students, new graduates, and early-career professionals who wish to learn more about creating a job search plan, writing an effective cover letter and resume that gets you noticed, and techniques for successful interviews.

INSTRUCTORPaige Lawson has been in professional recruiting for more than 20 years. She has extensive experience with both in-house corporate en-vironments as well as outside agency/consulting environments. Paige is currently a recruiter for LightWorks Optical Systems in Murrieta, CA, and a member of the local networking group Professionals in Human Resources (PHIRA).

Suzanne Krinsky has been in human resources and corporate recruit-ing for more than 15 years. She has extensive experience with both in-house corporate environments as well as outside agency/consulting environments. Suzanne is currently the Human Resource Director for Daylight Solutions in San Diego, and also a long-time Board member for the Biotech Human Resource Development Coalition (BEDC) and Human Resource Roundtable member.

This workshop is free to SPIE Student Members. You must register to attend.

This workshop presents introductory information and is intended primarily for university students and others with little professional experience.

The Craft of Scientific Presentations: A Workshop on Technical PresentationsWS667Course Level: IntroductoryCEU: 0.35 $75 Members | $125 Non-Members USD Monday 8:30 am to 12:30 pm

This course provides attendees with an overview of what distinguishes the best scientific presentations. The course introduces a new design for presentation slides that is both more memorable and persuasive from what is typically shown at conferences.

LEARNING OUTCOMESAfter completing this course, attendees will be able to:• account for the audience, purpose, and occasion in a presentation• logically structure the introduction, middle, and ending of a

scientific presentation• create a memorable and persuasive set of presentation slides• deliver a presentation with more confidence

INTENDED AUDIENCEThis material is intended for anyone who needs to present scientific research. Those who either have not yet presented or have made several presentations will find this course valuable.

INSTRUCTORChristine Haas brings ten years of experience working at the inter-section of communication and science. She held positions as the director of marketing for Drexel’s College of Engineering and director of operations for the dean of engineering at Worcester Polytechnic Institute. Now, as CEO of Christine Haas Consulting, LLC and director of the Engineering Ambassadors Network, she continues to work with scientists and engineers across government, industry and higher education to deliver training on presentations and technical writing. Christine received her MBA in marketing from Drexel University and her BA in English from Dickinson College.

COURSE PRICE INCLUDES the text The Craft of Scientific Presentations (Springer, 2003) by Michael Alley. This workshop is free to SPIE Student Members. You must register to attend.

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The Craft of Scientific Writing: A Workshop on Technical WritingWS668Course Level: IntroductoryCEU: 0.35 $75 Members | $125 Non-Members USD Monday 1:30 pm to 5:30 pm

This course provides an overview on writing a scientific paper. The course focuses on the structure, language, and illustration of scientific papers.

LEARNING OUTCOMESThis course will enable you to:• account for the audience, purpose, and occasion in a scientific

paper• logically structure the introduction, middle, and ending of a

scientific paper• make your language clear, energetic, and fluid• avoid the most common mechanical errors in scientific writing

INTENDED AUDIENCEThis material is intended for anyone who needs to write about scientific research. Those who either have not yet written a paper or have written several papers will find this course valuable.

INSTRUCTORChristine Haas brings ten years of experience working at the inter-section of communication and science. She held positions as the director of marketing for Drexel’s College of Engineering and director of operations for the dean of engineering at Worcester Polytechnic Institute. Now, as CEO of Christine Haas Consulting, LLC and director of the Engineering Ambassadors Network, she continues to work with scientists and engineers across government, industry and higher education to deliver training on presentations and technical writing. Christine received her MBA in marketing from Drexel University and her BA in English from Dickinson College.

COURSE PRICE INCLUDES the text The Craft of Scientific Writing (Springer, 2003) by Michael Alley. This workshop is free to SPIE Student Members. You must register to attend.

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Join us in celebrating the International Year of LightThe International Year of Light is a global initiative highlighting to the citizens of the world the importance

of light and light-based technologies in their lives, for their futures, and for the development of society.

We hope that The International Year of Light will increase global awareness of the central role of light in

human activities and that the brightest young minds continue to be attracted to careers in this field.

www.spie.org/IYL

Light-based technologies respond to the needs of humankind

For more information on how you and your organization can participate visit www.spie.org/IYL

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