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Device for in-line pickling

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cleaning composition containing a nonionic rinse agent composition to both wash and rinse. CNIlOMAn POll ZINC. ZINC ALLOY. OIiCADMIUM U.S. Patent 5,876,517. Mar. 2, 1999 E. Jeannier, assignor to Atatech Deutschland GmbH, Germany A chromate bath, consisting es- sentially of an aqueous solution having a pH between 1 and 2 and containing, per liter, 5 to 40 g of hexavalent chromium ions, 5 to 20 g ofsulfate ions, 0.1 to 0.3 g of cobalt ions, 0.1 to 0.65 g of silver ions, and 50 to 150 ml of at least One organic acid. DIVICI POIlIN-UNI PlCIWNG u.s. Patent 5,876,522. Mar. 2, 1999 D. Figge et al., assignors to Mannesmann AG, Dusseldorf, Germany A process for pickling a strip, which is produced in a thin slab installation and subsequently hot-rolled, in a continuous process immediately following a rolling process. SOLVDIT IIICYCU_ SYSnM U.S. Patent 5,876,567. Mar. 2, 1999 S. Yamamoto, Unionville, Ont., and J·P. Pepin, Victoriaville, Que. A solvent recycling system com- prising evaporator means having contaminated liquid solvent inlet means and solvent vapor outlet means. SPUnIIUN8 APPARATUS U.S. Patent 5,876,573. Mar. 2, 1999 M.M. Moslehi et al., assignors to CVC Inc., Rochester, N. Y. A high magnetic flux cathode ap- paratus for high productivity physical vapor deposition. .. 8Nn ...... POll A CHAMa... U.S. Patent 5,876,574. Mar. 2, 1999 R. Hofmann and Z. Xu, assignors to Applied Materials Inc., Santa Clara, Calif. A method of reducing resputter- ing of a sputtering target over which is mounted an opposing pair of magnets comprising moni- toring the target erosion track from the centerline of the target; and revising the shape of the magnets to provide a curved, sin- gle-turn, open-ended magnet shape about twice as thick near the open ends as in the center so that the erosion pattern of the target during sputtering is made more uniform. SPUTnIII_ APPARATUS U.s. Patent 5,876,576. Mar. 2, 1999 J. Fu, assignor to Applied Materials Inc., Santa Clara. Calif. A sputtering system for sputter- ing particles from a magnetron- type target having a first surface and a second surface, where the particles are sputtered from the first surface, comprising a moving magnet assembly positioned adja- cent to the second surface of the target and including a ferro- magnetic pole piece assembly; an actuator for moving the pole piece assembly parallel to the first sur- face of the target; and a magnetic shunt, positioned in an annular trough fonned in the second sur- face of the target, where the an- nular trough is located where a The Secret Is Out! _r----,r----." A wastewatertreatment .... systemmanufacturerthat actuallyprovides: • In-house design, engineering, & manufacturing. • A complete line sized & automated to your needs . Global training, service, & chemical support. Over 1,200 operating systems worldwide! ResourcefulWastewater SolutionsSInce 1978 Beckart Environmental, Inc. 6900· 46th Street· Kenosha, WI 53144 2 2·656·7680' Fax 262·656·7699 E·," i1: beckarl4:tcompuserve.com' Website: www.beckart.com Circle 011 on reader Information card 110 I he J'cro,p;lce .1000 ) 'Iem '\ n "0'1 CffCl'II\C llle.m, of '" itll chromate panH:ul:11C' clt1l"ion, The ... 'Ielll i, al..o crfccthe m Ilrocccling V nhalCmtnl equipll1ent "llIch the rcnlO\al f palOt lXu'Ilculatc 10 P(()Ice.'1 the pnxc" of VOC de,'rucuoo ATrAlr Technologies, Inc. 205 West 17t1l St. 100 624·1739 Ottawa, KS 66067 (7151 242·11U Circle 004 on rMder Information card Metll F1nllhlng
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Page 1: Device for in-line pickling

cleaning composition containing anonionic rinse agent compositionto both wash and rinse.

CNIlOMAn POll ZINC. ZINC ALLOY.OIiCADMIUMU.S. Patent 5,876,517. Mar. 2, 1999E. Jeannier, assignor to AtatechDeutschland GmbH, GermanyA chromate bath, consisting es­sentially of an aqueous solutionhaving a pH between 1 and 2 andcontaining, per liter, 5 to 40 g ofhexavalent chromium ions, 5 to20 g of sulfate ions, 0.1 to 0.3 g ofcobalt ions, 0.1 to 0.65 g of silverions, and 50 to 150 ml of at leastOne organic acid.

DIVICI POIlIN-UNI PlCIWNGu.s. Patent 5,876,522. Mar. 2, 1999D. Figge et al., assignors toMannesmann AG, Dusseldorf,Germany

A process for pickling a strip,which is produced in a thin slabinstallation and subsequentlyhot-rolled, in a continuous processimmediately following a rollingprocess.

SOLVDIT IIICYCU_ SYSnMU.S. Patent 5,876,567. Mar. 2, 1999S. Yamamoto, Unionville, Ont., andJ·P. Pepin, Victoriaville, Que.A solvent recycling system com­prising evaporator means havingcontaminated liquid solvent inletmeans and solvent vapor outletmeans.

SPUnIIUN8 APPARATUSU.S. Patent 5,876,573. Mar. 2, 1999M.M. Moslehi et al., assignors toCVC Inc., Rochester, N. Y.

A high magnetic flux cathode ap­paratus for high productivityphysical vapor deposition.

..8Nn ...... POll A~IIIN8 CHAMa...U.S. Patent 5,876,574. Mar. 2, 1999R. Hofmann and Z. Xu, assignors toApplied Materials Inc., Santa Clara,Calif.A method of reducing resputter­ing of a sputtering target overwhich is mounted an opposingpair of magnets comprising moni­toring the target erosion trackfrom the centerline of the target;and revising the shape of the

magnets to provide a curved, sin­gle-turn, open-ended magnetshape about twice as thick nearthe open ends as in the center sothat the erosion pattern of thetarget during sputtering is mademore uniform.

SPUTnIII_ APPARATUSU.s. Patent 5,876,576. Mar. 2, 1999J. Fu, assignor to Applied MaterialsInc., Santa Clara. Calif.A sputtering system for sputter­ing particles from a magnetron­type target having a first surfaceand a second surface, where theparticles are sputtered from thefirst surface, comprising a movingmagnet assembly positioned adja­cent to the second surface of thetarget and including a ferro­magnetic pole piece assembly; anactuator for moving the pole pieceassembly parallel to the first sur­face of the target; and a magneticshunt, positioned in an annulartrough fonned in the second sur­face of the target, where the an­nular trough is located where a

The Secret Is Out!_r----,r----." A wastewatertreatment

.... systemmanufacturerthat~ actuallyprovides:

• In-house design, engineering,& manufacturing.

• A complete line sized &automated to your needs.

• Global training, service, &chemical support.

Over 1,200 operatingsystems worldwide!ResourcefulWastewaterSolutionsSInce 1978

Beckart Environmental, Inc.6900· 46th Street· Kenosha, WI 531442 2·656·7680' Fax 262·656·7699E·," i1: beckarl4:tcompuserve.com' Website: www.beckart.com

Circle 011 on reader Information card

110

Ihe J'cro,p;lce .1000 ) 'Iem '\ n"0'1 CffCl'II\Cllle.m, of dcalll1~ '" itll chromate panH:ul:11C'clt1l"ion, The ... 'Ielll i, al..o crfccthe mIlrocccling V nhalCmtnl equipll1ent "llIchrc~Ulrc, the rcnlO\al f palOt lXu'Ilculatc 10P(()Ice.'1 the pnxc" of VOC de,'rucuoo

ATrAlr Technologies, Inc.205 West 17t1l St. 100 624·1739Ottawa, KS 66067 (7151 242·11U

Circle 004 on rMder Information card

Metll F1nllhlng

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