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E beam lithography, gold deposition and lift off were used ...

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Supplementary Material Section 1: E-beam lithography, gold deposition and lift-off were used to prepare the 25x25 gold droplet arrays. “Standard” InP-InAs stems were grown in the MOVPE reactor at 420°C. Standard patterning of the substrates by e - beam lithography + Growth of InP InAs stems InP(111)B
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Supplementary Material Section 1:

E - beam lithography, gold deposition and lift - off were used to prepare the 25x25 gold droplet arrays.

“Standard” InP - InAs stems were grown in the MOVPE reactor at 420°C.

Standard patterning of the substrates by e - beam lithography +

Growth of InP – InAs stems

InP(111)B

Supplementary Material Section 2 :

EDX measurement s performed in the TEM : the interfaces.

PAGE 5 3 - 10 - 2011

InSb

InP

InAs

HR - TEM measurements : the crystalline structure from pure ZB InAs to pure ZB InSb.

InSb

InAs

ZB InSb

ZB InAs

Strain field

At.%

At

.%

Diffusion length of the precursors: Nanocubes at the side of the arrays / Nanowires in the middle

=> The V/III ratio is lower in the middle of the arrays

=> TMSb has a shorter diffusion length

Supplementary Material Section 3 :

V/III ratio Diffusion length L d (nm)

44 542 ± 88

55 597 ± 296

66 491 ± 47

Estimation of the Sb diffusion length

Estimation of the diffusion length as a function of the nanow ire volume (area of collection):

see Gotschke et al. Applied Physics Letters 2001, 98, 103102

2 d c

L S × = π

200 400 600 800 1000 1200 1400

0,0

2,0x10 7

4,0x10 7

6,0x10 7

8,0x10 7

1,0x10 8

1,2x10 8

Nan

owire

vol

ume

(nm

3 )

Pitch (nm)

2 P S c =

To confirm the hypothesis proposed about the droplet composition evolution, EDX

measurements in the TEM were performed on droplets after growths. Three

samples were prepared having the same droplet size (75 nm) but three different

pitches (300 nm, 500 nm and 800 nm) corresponding to the three different areas

of figure 3b. These samples were grown at the same time with a V/III ratio of 33.1

but were cooled down without any TMI or TMSb flow. This procedure has already

been used to measure the droplet composition of GaSb nanowires grown by

MOVPE1, and even if the measured compositions after growth can differ from the

droplet compositions during growth, we believe that the trend should remains the

same. A dark field TEM image of a droplet is presented in figure S4a and the

droplet composition evolution as a function of the pitch is given in figure S4b. It is

important to note that the indium L-line of the EDX measurement can be partially

absorbed by gold present in the droplet leading to large error bars, but a trend can

still be observed in figure S4b: decreasing the nanowire interdistance leads to an

increase of the indium composition in the droplet, which is coherent with the

hypothesis proposed before. Interestingly if compared to figure 3b, the minimum in

diameter for the 75 nm gold droplets seems to correspond to the AuIn2

composition.

[1] Weng X.; Burke R. A.; Dickey E. C.; Redwing J. M. J. Crys. Growth 2010, 312, 514-519

Supplementary Material Section 4 :

Figure S4: Energy dispersive X-ray (EDX) measurements performed on the 75 nm droplet in a

TEM after cooling down under nothing. (a) Dark field image of the top part of an InSb

nanowire. (b) Quantitative EDX measurements of the indium concentration in the droplet in

atomic percentage in function of the nanowire interdistance. Each point corresponds to the

mean indium concentration measured for 10 nanowires and the error bars corresponds to the

standard deviation.

61

62

63

64

65

66

67

68

69

0 0,2 0,4 0,6 0,8 1

[In] i

n at

%

Pitch (μm)

(a) (b)

InSb

Supplementary Material Section 5 :

Figure S5: 30° tilted SEM image of a “Nanocube” with a smaller diameter (lower InSb growth time). The “Nanocube” diameter is directly proportional to the InSb growth time: here the side of the cube is around 120nm.

Supplementary Material Section 6 :

Figure S6(a): 30° tilted SEM image of a nanowire array field. A cleaving through the patterns allows us to estimate the parasitic bulk growth

0

50

100

150

200

250

300

350

400

0 200 400 600 800 1000 1200 1400 1600

Figure S6(b): Thickness of the parasitic 2D growth in function of the pitch. No significant influence of the pitch (i.e. of the ‘local’ V/III ratio) on the parasitic layer growth can be found. We estimate this influence as a constant offset in out model.

Thic

knes

s (n

m)

Pitch (nm)

Supplementary Material Section 7 :

Figure S7: 30° tilted SEM image of InSb nanowires. The arrow shows a InAs stem completely evaporated during the InSb growth.


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