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1 Bruker-AXS User Meeting, Sep 20 – 22, 2010 Karlsruhe Eric Hovestreydt Bruker AXS
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Bruker-AXS User Meeting, Sep 20 – 22, 2010
Karlsruhe
Eric HovestreydtBruker AXS
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Users Meetings; continuing …
University of Alabama, AL S Ealick, C Smith, E Westbrook Feb. 26-29, 1989 CARB, MD G Gilliland,A Howard,G Cohen,L Hannick,A Wlodawer,M Amzel Feb. 4-6, 1990 Scripps, CA I Wilson, E Stura, D McRee, M Pique May 5-7, 1991 Purdue University, IN Wladek Minor, Ivan Rayment May 3-5, 1992 GBF Braunschweig, Germany D Schomburg, H.J.Hecht, B.Hofmann Apr. 28-30, 1993 University of Pittsburgh,PA John Rose, William Furey Apr. 28-30, 1994 University of Georgia, Athens, GA B-C Wang, John Rose Apr. 17-19, 1997 Scripps, La Jolla, CA Duncan McRee, Dave Stout Feb. 21-23, 1998 University of Bergen, Norway (ESUM98) Karl Tornroos Sep.11-13, 1998 University of Toledo, OH Alan Pinkerton June 9-11, 1999 Texas A&M University, TX Joe Reibenspies Mar. 16-17, 2000 University of Wisconsin/Bruker, WI Ilia Guzei, Charles Campana May 20-22, 2001 University of Wisconsin/Bruker, WI Ilia Guzei, Charles Campana May 18-20, 2003 University of Wisconsin/Bruker, WI Ilia Guzei Sept 20-22, 2005 Bruker AXS Delft Frank van Meurs Sept 18-19, 2006 University of Wisconsin/Bruker, WI Ilia Guzei Sept 16-18, 2007 Universität Göttingen George Sheldrick Oct 10-13, 2007 Bruker AXS Delft Frank van Meurs Sept 29-1, 2008 University of Wisconsin/Bruker, WI Ilia Guzei June 1-2, 2009 Bruker AXS Karlsruhe Martin Adam Sept 20-23, 2010
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Bruker Corporation
FT-IRNMR
Raman
NIR
TD-NMR
MR Imaging
EPR ESI-TOF MS
FT-MS
ESI Ion Trap MS
MALDI-TOF MS
Bruker BioSpin Bruker DaltonicsBruker AXS Bruker Optics
XRFSC-XRD
XRD
Automation
MAOESAFM
Bruker EST
Synchrotron Instrumentation
Hydr. ExtrusionLow-Tc SCHigh-Tc SC
Magnets
PowerElectronicsTerahertz
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Bruker AXSProduct Lines
X-ray Fluorescence Spectrometry (XRF)Non destructive determination of the elemental composition of solidsand liquids
Optical Emission Spectroscopy (OES)Elemental analysis of metals
Gas Analysis (GA)ONH and CS analysis, specific surface area determination
X-ray Microanalysis (MA)Elemental analysis for electron microscopes
Atomic Force Microscopy (AFM)Surface characterization with sub-nanometer resolution
X-ray Diffraction (XRD)Structure, material properties and phase analysis of solid and liquid polycrystalline material
Single Crystal X-ray Diffraction (SC-XRD)Determination of the 3D structure of crystalline chemical and biologicalcompounds
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X-ray Fluorescence (XRF)Non-destructive Element Analysis
qualitative & quantitative standardless XRF analysis all elements from Be to U all solid, powder and liquid samples sub ppm to 100 % conc. accuracy up to 0.05 % rel. typical LLD: 1 to 10 ppm LLD down to 100 ppb in light
materials (oil, plastics) LLD 100 to 1000 ppm for O, N, C,
B and Be
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X-ray Fluorescence (XRF)Product Line
S4 PIONEERS8 TIGER(((
S2 RANGERS2 PICOFOXARTAX S1 TRACER
S8 LION(((
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Micro X-ray Fluorescence (XRF)Product Line
M1 ORA M4 TORNADOM1 MISTRAL
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Optical Emission Spectroscopy (OES)Product Line
Q8 MAGELLAN Q6 COLUMBUS Q8 CORONADO
Elemental analysis for qualitiy and process control in all fields of metal production and processing
Q4 TASMAN
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Gas Analysis (GA)Product Line
AREAMAT
Analysis of O, N, H as well as C and S Specific surface area determination Metals, minerals and inorganic compounds
G8 GALILEO
AR
EAM
AT
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X-ray Microanalysis (MA)Element Analysis for Electron Microscopes
QUANTAX - EDS with XFlash®
Silicon Drift Detectors Add-on for electron
microscopes
Nanoscale element mapping
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Atomic Force Microscopy (AFM)Surface Characterization
Surface characterization with sub-nanometer resolution Combination of high quality optical microscope with
high resolution AFM
DVD master
Etch structure in GaAsMagnetic structuresin storage media
Image of a TFT element
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Atomic Force Microscopy (AFM)Product Line
N8 ARGOS
N8 RADOS
N8 NEOS
N8 TITANOS
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Atomic Force Microscopy (AFM)Veeco Product Line
MultiMode Scanning Probe Microscope
Dimension Icon AFM
Dimension Edge AFM
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X-ray Diffraction (XRD)Material Properties and Phase Analysis
No competition from other methods
Non destructive method Qualitative and quantitative
composition analysis Material structure analysis:
• crystallite size / particle size in the nm range
• microstrain• residual stress / fatigue stress• texture / preferred orientation• thin films and multilayers:
thickness, layer sequence, density, surface and interface roughness
• nanostructure analysis (particle shape, size and orientation)
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X-ray Diffraction (XRD)Product Line
D8 DISCOVERD8 ADVANCE
D8 FABLINE
NANOSTAR
D8 FOCUS D4 ENDEAVOR
D8 SCREENLAB
D2 PHASER
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Bruker AXS, Madison, WI, USA
SC-XRD Product Line Manager Roger Durst,
CTO, EVP Bruker AXS IncProduct Manager, Marketing Michael RufR&D Manager Detlef BahrSoftware Manager Joerg KaercherBusiness Manager Sue Byram Michael Ruf
Roger Durst
Sue Byram
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Bruker AXS, Madison, WI, USA
Application Charles Campana Bruce NollService Scott Tarran Pete McDonald
Charles Campana
Bruce Noll
Scott Tarran
Pete McDonald
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Bruker AXS, Karlsruhe, Germany
Business Manager Eric Hovestreydt
Product Manager, Marketing Martin Adam
Sales Vernon Smith (bio) Bernd Hinrichsen (X2S)
Martin Adam
Vernon Smith
Eric Hovestreydt
Bernd Hinrichsen
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Bruker AXS, Karlsruhe, Germany
Application Marianna Biadene Holger Ott
Marianna Biadene
Holger Ott
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Service Karl-Heinz Bast Oliver Knaus Markus Nuesse Klaus Orth Felix Schmidt Daniel Stern
Bruker AXS, Karlsruhe, Germany
Karl-Heinz Bast Oliver Knaus Markus Nüsse
Klaus Orth Felix Schmidt Daniel Stern
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Bruker AXS Delft, the Netherlands
R&D Jaap Toorn
Application Leo Straver
Service Cees Baas Henk Lief Dirk Parlevliet Frank Vredenbregt
Cees Baas Henk Lief
Dirk ParlevlietFrank Vredenbregt
Leo Straver
Jaap Toorn
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Partners in SC-XRD
Incoatec GmbH, Germany Carsten Michaelsen Jörg Wiessmann Till Samtleben Jürgen Graf
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Changes
Finalised consolidation of SC-XRD (outside Northern America) Sales & Marketing out of Karlsruhe Service coordinated in Karlsruhe Stock of all spares in Karlsruhe Shipment of systems and Spares from Karlsruhe Expertise of Delft products located in Delft
Frank van Meurs has retired
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BRUKER family for Chemical Crystallography
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Structure discovery the way it was meant to be.
Truly automated operation Virtually no maintenance costs Low price Ideal for every synthetic chemistry laboratory
SMART X2S – From Crystal to Structure with True Walk Away Automation
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Automation flowchart - overview
The automation layer ties all individual steps together
Makes intelligent decisions
Controls the flow of input and output files
Automation layer
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HTML Report Experimental information J-mol applet for structure
display Tables with structural
information Bond lengths and distances
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X-presso plug-in for APEX2
Based on X2S automation
Start after crystal centered
Begin experiment within minutes
Can be run against existing data
Copper or Moly radiation
Single- or dual-source
Kappa or 3-circle goniometers
Structure solution and refinement
Report generation
Diagnostics log file
2 February 201030
Automate experiment for research instruments
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AutoStructure in APEX suite
Automated structure determination for “routine structures”
Finds and models a structure within seconds
Requires only a formula and the space group
Automated structure check to IUCr standards
Available as module in APEX2 software – can read SMART frames, or online collecting data in APEX format
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New Benchtop Powder Unit: D2 PHASERsee it in the demo labs
World's fastest desktop X-ray diffractometer• LYNXEYE detector• Scintillation counter
Innovative high-end goniometer design (patent pending)
Sample always horizontal• Theta / Theta geometry
(Bragg-Brentano)
Sample spinner • 1 rpm to 80 rpm
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SMART BREEZE floor-mount instrument
exceptionally easy to use
more automated molecular 3D structure analysis
Low maintenance air-cooled BREEZE 4K CCD detector – the second best CCD detector in the world!
Rock-solid goniometer
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KAPPA APEX II and SMART APEX II
SMART APEX IIKAPPA APEX II
consolidation finished
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high intensity (upto 3.5 X) flexible beam size (set by collimator selection)
• matches typical samples sizes advantageous price/performance ratio best choice for general purpose/service work
TRIUMPH
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APEX II QUAZAR
03.11.2010Bruker Confidential36
37 37/18Juergen Graf – ACA 2009
Incoatec Microfocus Source – IµSTM
Long lifetime and high reliability
Advanced anode and cathode technology
>6 year tube life (3 years warranty) Small spot size for high brilliance < 50 µm Low power: 30 W Air-cooled Cu, Cr, Mo and Ag radiation QuazarTM Optics
larger collection angle and higher reflectivity Reliable and patented mirror housing (optional motors)
Tube change as easy as for a conventional sealed tube Variable divergence aperture
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APEX II DUO with IS
03.11.2010Bruker Confidential38
3939/22
Juergen Graf – ACA 2010
IµS for Ag-K Radiation
• Ag-IµS:
- Power Settings: 50 kV, 600 µA
- FWHM = 0.09 mm&; FW0.1M = 0.23 mm
- Divergence = 5 mrad
- F.D. = 2 x 109 cts/(s mm2) @ 30 W
Mo-IµS: 1 x 109 cts /(s mm2) @ 30 W
- Benefits of Ag-Radiation:
- Less absorption, less extinction
- “Compressed” reciprocal space2D and 3D beam profiles of theattenuated beam from the Ag-IµS&
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APEX II ULTRA –ultimate performanceElectron Density Studies – high angle Mo data
APEX II ULTRA shown with molybdenum target Turbo Xray Source (higher intensity)
Applications:• nano-sized crystals• high pressure studies• higher quality data on strong
diffractors – charge density studies
Prof. Dietmar Stalke, multipole refinement(Uni Goettingen, Germany)‘exquisite data from APEX II ULTRA’
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Source/optics comparison matrix
gain* Compatible systems Miracol / Monocap 1.3-2x (Mo) All Triumph monochromator >3x (Mo) KAPPA APEX II / recent SMART
(Mo only) IS microfocus source >4x (Mo) D8-based
Turbo X-ray Source >60x (Mo) D8-based
* Intensity compared to sealed tube, standard graphite monochromator
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Upgrades for chemical crystallography
BRUKER has always designed its systems with upgrade capability in mind
Protect the value of your system investment by exploiting the latest technology in:
sources, optics detectors automation software
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CE
CE certified, including 2010 Machine Directive • Absolute Safety is our Top Priority
o no (legal) risk for end usero end user has personal liabilityo Bruker is committed to protect its users
Under the provision and use of work equipment regulations, users take final responsibility for the safety of any machinery that they operate
National authorities may forbid use of non-compliant machinery until the product is brought into conformity; failure to do so may result in product withdrawal from the market
In case of accidents legal proceedings of all kinds may be initiated by state prosecutors, victim's lawyers or insurance companies
Penalties are subject of national law, and range from fines up to imprisonment
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CE (cont.)
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Summary
BRUKER now offers a broad range of systems to fit your application requirements
Most new technologies are also available as upgrades to extend and expand the capabilities of your existing system
Source• TRIUMPH monochromator – also for recent SMART• IµS – new for Ag radiation• TXS• dual wavelength (DUO)
Detector• APEX II
Software• AUTOSTRUCTURE• X-PRESSO
