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Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4...

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Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system
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Page 1: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Facility meeting Oct. 2013Gopal.Lithography Bay

Equipments:Laser writerEVG Mask alignerMJB4 mask alignerEVG Bonder

E-Line systemPioneer E-beam system

Page 2: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Laser writer (OH)

Laser writer (NOH)

EVG620 (OH)

EVG620 (NOH)

EVG501 (OH)

EVG501 (NOH)

MJB4 (TH)

Used 174 246 110 50 50 40 50

Not Used

6 294 70 310 130 320 120

Downtime

0 0 0 0 0 0 0

Un-available

0 0 0 180 0 180 540

Total 180 540 180 540 180 540 720

0100200300400500600700

Litho Equipments Utilization Chart. Oct - 2013To

tal h

rs

Page 3: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Raith e-Line off hrs

Raith e-Line non off hrs

Raith Pioneer off hrs

Raith Pioneer non off hrs

Used

96306

0180

470Not Used

Downtime

Unavailable

Total

50

150

250

Litho Equipments Utilization Chart.October- 2013To

tal h

rs

Page 4: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Other Issues:• PO released for EVG and E-line AMC •Resists/chemicals processed depending on the priority•Bonder quartz plate received, will be fabricated in CENTUM•MJB4 training going on.•E-line is down(27th Oct.)- Colum-Chamber valve not opening•Heidelberg Laser Writer to be delivered on 27th Feb.2014 !

Page 5: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Trend chart Oct. 2013 : E-line

Oct Nov Dec Jan Feb Mar Apr May Jun Jul Aug sept Oct Nov Dec0

5

10

15

20

25

30

9 10 10 1012 13 14 14 13 13 14 14

25

HSQ 120nm

Month

CD in

nm

Page 6: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Jun Jul Aug Sept Oct0

5

10

15

20

25

30

13 1315 15

25HSQ 120nm Pioneer

Month

CD in

nm

Trend chart. Oct.2013 : Pioneer

Page 7: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Trend chart: Oct.2013:

July Aug Sep Oct0

0.5

1

1.5

2

2.5

3

3.5

MJB4

1 Micron

2 Micron

3 Micron

Months

Feat

ure

size

in M

icron

s

Reisit: AZnLoFSpin coated at 3000rpm for 40 sec.Thickness: 2umSoft bake 1 min at 110CExposure for 8 seconds in MJB4Post exposure bake for 1 min at 110CDevelopment for 25 secs (AZ726MIF)

Page 8: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Trend chart : Oct.2013

May

JuneJuly

August

Septem

ber

October

0

0.5

1

1.5

2

2.5

3

3.5

EVG 620

1 Micron2 Micron3 Micron

Months

Feat

ure

size

in M

icron

s

Resist: S1813Spin coated at 6000rpm for 40 secsThickness: 1 umSoft bake 1 min at 110CExposure 50 mJ/cm2 in EVG620Development for 18 secs (AZ351B 1:4)

Page 9: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Nov Dec Jan Feb Mar Apr MayJuneAug Sep Oct0

0.5

1

1.5

2

2.5

3

3.5

Laser Writer (Direct writing)

Series1Series3Series5

Months

Feat

ure

size

in M

icron

s

Resist: S1813Spin coated at 4000rpm for 40 secsThickness: 1.3 umSoft bake 1 min at 110CDose: Lens-5, Filter-3%, Gain-12, D-step-2, Pos speed -1Development for 38 secs (AZ351B 1:4)

Trend chart : Oct.2013

Page 10: Facility meeting Oct. 2013 Gopal. Lithography Bay Equipments: Laser writer EVG Mask aligner MJB4 mask aligner EVG Bonder E-Line system Pioneer E-beam system.

Thanks


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