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Main advantages Deposition rates > 1 nm/s; 100 times faster compared to conventional ALD Large range of applications with variety of precursors Enable multi-material stack with multiple precursors Process at atmospheric pressure (no vacuum process) Thickness control at atomic scale Straightforward adjustment of layer thickness Excellent conformity No pinholes No contact on deposition side of foil No parasitic deposition Compact equipment footprint FLEx R2R sALD Spatial ALD coating technology Absolute thickness control, extreme layer homogeneity, superb conformity without cost of vacuum tooling. Atomic layer deposition (ALD) technology uses cyclic exposure of a substrate to different precursors where in each cycle a layer is formed of a single atom thickness. This ensures superior thickness control, extreme layer homogeneity and superb conformity without cost of vacuum tooling. Spatial ALD (sALD) is the enhanced form of traditional ALD improving the deposition rate by several orders of magnitude. The FLEx R2R sALD is a Roll to Roll Spatial ALD production solution for many applications that require these benefits of sALD. Next to high throughput the FLEx platform approach enables integration of various additional coatings and pre-treatment technologies. Schematic representation sALD Key features Accurate controlled exposure time and process temperature High precision rotating spatial ALD drum and WEB tension control High precision WEB unwinding and rewinding modules High uptime Flexibility in foil type and layer thickness Scalable platform 24/7 volume production Customizable configuration Various optional modules available R2R sALD principle
