Arizona State University NanoFab
GCA 8500 ILLUMINATION QUALIFICATION PROCEDURE
Rev A
ASU NanoFab Title: GCA 8500 ILLUMINATION QUALIFICATION PROCEDURE Issue: Rev A
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Table of Contents
Contents Table of Contents .........................................................................................................................................1 1. Purpose / Scope ....................................................................................................................................2 2. Reference Documents ..........................................................................................................................2
3. Equipment / Supplies / Material ..........................................................................................................2 4. Safety ...................................................................................................................................................2 5. Set Up Procedures ................................................................................................................................3 6. Operation Procedures ...........................................................................................................................5
7. Process Data .........................................................................................................................................5 8. Revision History ................................................................................................................................13
ASU NanoFab Title: GCA 8500 ILLUMINATION QUALIFICATION PROCEDURE Issue: Rev A
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1. Purpose / Scope 1.1. This document covers the procedure for adjusting and verifying the MAXIMUS illumination
source on the GCA 8500 stepper. This procedure should be performed at least once per week to
determine the proper exposure time based on light output for each job. It is suggested that you
review this document thoroughly before proceeding with the operation of this tool & always
check with staff if an unusual event occurs during the stepper operation.
2. Reference Documents 2.1. Chemical Safety & Hazardous Waste Management Rules & Procedures Handbook
2.2. GCA Reticle Handbook
2.3. GCA Master Operating Program Handbook Version 6.05.1
3. Equipment / Supplies / Material 3.1. GCA 8500 stepper reticle designed within the specifications defined in the GCA Reticle
Handbook. Users should make themselves completely familiar with the contents of this
handbook prior to scheduling training on the system.
3.2. Photoresist coated samples.
3.3. GCA 8500 consisting of the following sub-systems:
3.3.1. The environmental chamber which houses the illumination system, reticle and wafers
stages, and several other electronic and optical systems.
3.3.2. Control console containing the keyboard and computer display.
3.3.3. The Dark Field Alignment System (DFAS) which is located in the control console rack
above the control console computer.
3.3.4. The Air Handler Unit (AHU) located behind the control console rack.
3.3.5. Power supply for the laser interferometer system.
3.3.6. The interchangeable wafer chucks which handle pieces up to 4” wafers and associated
pedestal chucks.
3.3.7. The Atmospheric Compensation System (ACS) which controls the environmental
chamber ambient conditions.
3.3.8. The Reticle Management Systems (RMS) that houses and manipulates the 10 mask
holder magazine.
3.3.9. The Automatic Wafer Handler (AWH) which is designed to automatically load and
unload wafers to the stage but is inactive on this system.
4. Safety 4.1. Identified safety concerns:
4.1.1. Mercury arc lamp illumination source presents heat, ozone, explosion and toxic mercury
hazards.
4.1.2. Moving stage assembly presents pinch points.
4.1.3. There are several laser systems, most notably the interferometer system that meters the
wafer stage and optical column.
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5. Set Up Procedures 5.1. Before running the software to perform the illumination check, a wafer should be loaded onto
the stage. Preferably a 4” Si wafer.
5.1.1. Go to the computer console:
5.1.2. Log into the appropriate directory; ex. “L I [10,X]” (X is the directory number for your
group)
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5.1.3. Enter the appropriate password.
5.1.4. Type “LOAD” to move the stage to the load position for loading a substrate.
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5.1.5. Load the substrate sample on the chuck and load chuck onto the stage. Be
EXTREMELY CAREFUL not to hit the objectives when loading the chuck.
6. Operation Procedures 6.1.1. Next, go to the computer and type in the command “UNIF”.
6.1.2. The menu for Illumination Qualification will appear on the screen with four menu
choices.
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6.1.3. First, select menu item 3 to check and mechanically peak the UV intensity on the
MAXIMUS illumination assembly.
6.1.3.1. The system will proceed to clear the platen if a reticle is present. Then it will ask
you to type “C” to continue. Do so.
6.1.3.2. Next it will ask to switch the Auto/Manual switch on the wafer handler. There is
no switch so type “C” to continue.
6.1.3.3. The system will proceed to request stage initiation by pressing “RESET” and
“MAN”, “S/C”, “MAN” to start the stage and move to the UV detector.
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NOTE: When pressing the “RESET” button, wait until the red LEDs on the wafer
handler flash on and off before continuing with the “MAN’, “S/C, “MAN” buttons.
Also, press the buttons for at least one second or they may not properly register the
selection.
LEDs on the wafer handler that flash
when the “RESET” button is pushed.
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6.1.3.4. The console screen will state the switch for the manual shutter control needs to be
flipped to the “ON” position. The switch is located in the rack below the console
keyboard. Then type “C’ on the keyboard to continue.
Manual shutter switch
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6.1.3.5. At this point, the system, will display the current bulb intensity on the monitor
above the operator console showing the value of intensity in mW/cm2.
6.1.3.6. Go to the MAXIMUS housing in the environmental chamber to the right of the
stepper and locate the three X, Y and Z adjustment knobs. Adjust the knobs to peak
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out the value indicated on the monitor displaying the intensity.
6.1.3.7. Once you have peaked the intensity, type “C” on the console keyboard and flip
the manual shutter switch to the “OFF” position. Then hit “Return” to take you to the
main menu.
6.1.4. To map the illumination uniformity select “1” from the main menu.
Z, Y and X bulb adjustments
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6.1.4.1. The system will guide you through some on-screen commands. Respond same as
steps 5.1.8.1 thru 5.1.8.4.
6.1.4.2. At this point, the system, will display the map of intensity measurements on the
monitor above the operator console showing the value of intensity in mW/cm2. The
map will contain 21 x 21 measurement points across the lens surface.
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6.1.4.3. Once the 21 x 21 measurements is completed, the screen will display the
statistics. Record the mean illumination value and % uniformity in the log book.
6.1.4.4. Once you have peaked the intensity, type “C” on the console keyboard and flip
the manual shutter switch to the “OFF” position. Then hit “Return” to take you to the
main menu.
6.1.4.5. Type “4” to exit the main menu.
6.1.4.6. If there are no further tests, you can log off the system by typing “L” space “O”
and “Return”.
7. Process Data Text
Record the Mean intensity and the %
uniformity.
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8. Revision History Effective
Date Originator DESCRIPTION OF REVISION Issue
7/6/15 Kevin N. Initial Release A
B
C
D
E
F
G
H