Integration of Nano imprint R2R into the production...

27.10.2016 © 2015 COATEMA Coating Machinery GmbH | www.coatema.de 1

Thomas Kolbusch, Vice President

Integration of Nano imprint R2R into the production

processes for printed electronic products


Summary

Introduction

Coatema

SummaryNano

Imprinting

Overview &

Basics


Introduction Coatema

founded

1974

Film/Paper

Printed Electronics

Prepreg

Membranes

Renewables

Textile

Glass

bespokenequipment

working widths

from100 mm

up to 5,400 mm

Fro

mL

ab

2F

ab

R&Dprojects & network

worldwideservice

laminating

coating

printing

inn

ova

tio

ns

qualitymade in Germay


Technologies & Processes

Overview and Basics

Nano-

imprinting

Laser

Patterning

Encapsulation

Pick &

place

Surface

treatment

Printing

CoatingPhoto-

lithography



Process Parameters

Process Parameters are:

Operation speed

Rheology of coating and printing inks

Substrate condition

Tension control MD/CD

Edge control

Resolution and registration accuracy of printing/laminating systems

Precision of coating operations

Curing / drying / crosslinking


Inline Process Integration



RewinderSlot Die

coatingUnwinder 3m Dryers ps Laser Rotary

screen

printing

Ink Jet 3m Dryers ns Laser In-line

Optical

Metrology

(SE,

Raman)

Cooling



Measuring

Controlling


Unwinding cabinet

• Can receive rolls with core of 3 inch.

• Max diameter of 500 mm

• Max weight 50 kg

• Web width of 300 mm

• Automated forward and reverse movement of the web

• Speed of 1-20 m/min

• Tension control of the web within the range of 5-250 N.

Web Cleaning system

• Contact cleaning rollers for particles of >1μm diameter

Winding / Cleaning



1st Printing

• Web surface activation with Plasma Treatment

Dryer 1

• 3 meter Dryers

• Hot air and heated nitrogen

• Temperatures up to 230°C




Slot die coating


• Slot-die coating station compatible for

materials used in OEs

• Print solutions with viscosity range

of 10-1000 mPa·s

• The above range can lead to layer

thickness range of 10-1000nm

• Lateral accuracy of ±1%.


Laser Scribing/Patterning

• Picosecond laser for patterning OE materials

• 3 meters cabinets

• Tension and driving web control

• system ±100 μm of accuracy

Laser Patterning



2nd Printing Station

• Rotary screen printing

• Coating width of 300mm

• Lateral accuracy ±5%.

Dryer 2

• 3 meters Dryers

• Hot air and heated nitrogen

• Temperatures up to 230°C

Rotary screen printing





Inkjet station Inkjet station Trident System Coatema Software

Already integrated:

Fuji Dimatix


Module for the registration Camera


Technical Specifications:

Measurement Accuracy =

+/-5 µm (t.b.d.)

ATEX proof

300 mm roller width

Web speed: 1-20 m/min;

Optimum speed is 3-20

m/min

PLC-driven correction

adjustment system

Module to be operated

under N2


Rewinding station

– The rewinding station has a retaining roller

– Identical specs to the unwinding station

• 3 inch core rolls.

• Automated forward and reverse movement of the web

• Speed of 1-20 m/min

– Tension control and Edge guide system

Lamination/delamination station

– Compatible with 300mm web width.

– Web Control with Edge guide system

– Lateral accuracy of ±100 μm / 20 µm

Encapsulation



Inline Quality control


Ellipsiometry and inline Raman by Horiba


Summary


• 19 m in length

• 300 mm working width

• 30m/min per minutes production speed

• 3 print stations

• Plasma treatment

• 6.000 mm nitrogen dryers in 500 mm sections

• Registration control

• Laminating station


Nanoimprint Lithography



Ther

mal

NIL

• Thermoplastic substrate/ resin

• Long process time

• processing above TG

• Hard molds

• High imprint pressure

• one-component system

• High material shrinkage

Ult

ra V

iole

t

NIL

• UV-curable lacquer/ resin

• short process time

• processing at room temperature

• Hard or soft molds

• Low imprint pressure

• High replication resolution

• Low material shrinkage

Har

d m

old + wear behaviour

+ life time of replication mold

+ resolution Soft

mo

ld + imprint pressure

+ life time of master mold

+ flexibilty

R2R roll-to-roll R2P roll-to-plate P2P plate-to-plate

NIL Nano imprint lithography


The leading producer of high-quality micro- and nanostructured products serving as key components for applications like lighting,

display, life science, solar technology and environmental engineering.

The market leader in coating, printing and laminating technology with more than 40 years of experience in providing the most advanced

scale-up solutions from lab to fab as well as state-of-art full production lines.

COMMON BRAND

The one stop shop solution for

nanoimprint technologies

Imprint tools

Chemicals & materials

Production lines

Processes & guaranties

UV - Nanoimprint Lithography

Nickel Imprint Mould

UV-Laquer

Substrate

Embossing and

Curing

Separation


UV - Nanoimprint LithographyTechnologies & Processes

Field of Applications

Printed

Electronics

Solar

Optical Encoders

Micro Lens Arrays

Waveguides

Lightguides

OLED

3D Displays

Light Enhancement

AR Surfaces

Micro Fluidics

Micro Titer Plates

Cell Separation

Lotus

Moth Eye

Shark Skin

Gecko

Display Photonics

Live Science Bionics


Display:

Flat screens are getting bigger, smart phones, watches and tablets become more and more compact.

Micro- and nanostructures offer energy-efficient and cost-effective solutions to meet the advanced new requirements of the display industry.

Optical components with sophisticated light management functionality are manufactured using roll-to-roll or roll-to-plate UV-Nanoimprint processes.

UV - Nanoimprint LithographyFIELD OF APPLICATIONS

Frontlight System in E-Reader

Head-up Display

Nanoimprinted light guide

in frontlight device

Imprint tools from temicon

Optical component in head-up

display from temicon



Solar:Micro- and nanostructures play an important role in photonics and electronics applications, especially for trapping, coupling or concentration of sunlight on crystalline, thin film or organic photovoltaic cells.

Microstructure technology makes PV technology more efficient and improves the energy yield.


Tandem'cells'with'12%'Efficiency!!'

Periodic Sinusoidal structure


Bionics:Customized microstructures are used to manipulate hydrophobic/hydrophilic surface characteristics (water-repellent or absorbing surfaces, Lotus effect) or oleo phobic surface characteristics (oil-repellent surfaces, anti-fingerprint).

Appropriate surface patterning can reduce wind resistance of airplanes, cars or wind turbines, imitating the “shark skin effect”, the “Gecko effect” or fish scales.

Such modifications allow to reduce frictional resistance, limit or enhance adhesion or induce bacterial resistant effects.

FIELD OF APPLICATIONS


3

1

Unique periodic surface structures in various biological species

are responsible for their exceptional properties

Self-cleaning effect of plants

Anisotropic flow in rice leaves

Reduced drag/antifoulling on a shark’s skin

Antibacterial surface of the Collembola

Lupinus polyphyllos Rice‘s leave

Shark‘s skin Collembola

W. Barthlott, C. Neinhuis, Planta 202 (1997) 1

S. G. Lee, et. al, Adv. Funct. Mater. 23 (2013), 547

P. Ball, Nature 400 (1999) 507

J. Nickerl, et al., J. R. Soc. Interface 11 (2014) 20140619.

UV - Nanoimprint LithographyField of Applications

Life Science:Lab-on-Chip technology of microfluidic structures helps shortening development periods and make examinations more comfortable for patients.

Microfluidic elements such as channels or selectively structured surfaces are necessary to handle and define the volume of a liquid right from the very first drop.


Pathogen diagnostic lab-on-a-chip

Detection platform for flexible detection of

target DNA (e.g. bacteria DNA)

Continuous flow polymerase-chain reaction (PCR)

Mixing of DNA with the appropriate PCR reagents

Amplification of target DNA by rapid thermal cycling

Amplicon detection

-> Reagents must be adapted in terms of types,

concentration and mixture for certain targets

Prototype

Example Protocol

Multi-Layering

Reaction mixtur

167 µL HotStar Master Mix

16.7 µL Taqman Custom Assay

10 µL PEG 8000

3.3 μL H2O

3.3 μL 3% BSA

200 μL TOTAL

On-Chip Mix150 μL Reaction Mixture37.5 μL B. subtilis genomic

DNA (0.24 µg/mL)62.5 μL H2O

250 μL TOTAL

Rapid thermal cycling: Heater 1: 95.5°C, Heater 2: 60°C

Automated Protokoll: PCR takes 15 minutes




50 µm

Micro Pillars (Super-Hydrophobic Surfaces)

Bacterial Resistant Surfaces

200 µm

10 µm

10 µm

Shark Skin (Riblet)

50 µm

500 µm

Haptic Surfaces

10 µm


100 µm

Retroreflectors

500 nm

Diffractive Optical Elements

500 nm

Printed Electronics

2 µm

10 µm

Microfluidic Structures


Customized micro- and nanostructured

sleeves are exactly adapted for the

application in TEMICOAT UV-Nanoimprint

equipment.

The sleeves are made by different mastering

techniques and electroforming of nickel.

Next generation sleeves are seamless,

offering highest efficiency and new fields of

application

for patterned films.

UV - Nanoimprint LithographyImprint Tools

Upscaling tools

Classical Approach

New Approach

Structured nickel plate Welded sleeve with seam Final product with seamlines

Seamless structured

sleeve

Seamless sleeve on

imprint cylinder

Final product without seamlines


Inference lithography

Motorized Cylinder Mirror Beamsplitter

Beam expander

New Approach

Laser Interference Lithography


Classical Approach

UV - Lithography

Classical Approach Wafer based product line

Large format line


UV - Lithography

New Approach


The printing of micro- and nanostructures into a UV-

curing resin results into functional structures with high

quality and accuracy.

Formulation properties like viscosity, chemical resistivity,

environmental stability, scratch resistance and optical

behavior are designed to the customer’s requirements.

UV - Nanoimprint LithographyChemistry

We have developed a portfolio of +20 types ofUV-Lacquer with approved characteristics like

Perfect adhesion to a broad range of substrates

High transparency

Low shrinkage

Weather durability

Chemical resistance

Temperature stability up to + 220 C

UV stability

Scratch resistance

......

UV-Lacquers are a key part of our

know how

Ultimately it is the UV-Lacquer that

gives form, function and durability to

the nanostructure

UV - Nanoimprint LithographyChemistry

PMMA - Polymethylmethacrylat(Plexiglas)

PC - Polycarbonate

PET - Polyethylenterephthalat(Polyester)

PEN - Polyethylene Naphthalate

TAC - Triacetate

OPP - Orientated Polypropylene

TPU - Thermoplastic Polyurthane

Steel foil - Stainless steel

Paper

UV - Nanoimprint LithographyMaterials

TEMICOAT applies the deep expertise of Coatema in building high-

end coating, printing and laminating equipment for full production

lines as well as for the upscale from lab to fab.

The flexible platform strategy of R2R and R2P lines

with working widths between 100 mm and more than

1000 mm allows straightforward integration of UV-

Nanoimprint into inline processes.


Tools for Lab2Fab

Tools for Lab2Fab



Tools for Lab2Fab - R2R


Tools for Lab2Fab - R2P


Tools for Lab2Fab - R2P


Tools for Lab2Fab - R2R

TEMICOAT offers adjusted roll-to-roll and roll-to-plate UV-

Nanoimprint processes, including a final product guarantee.


Process & Guarentees

COATEMA Coating Machinery GmbH

Roseller Str. 4

D-41539 Dormagen

021 33 / 97 84 – 0

[email protected]

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