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current topics in solid state physics Editor-in-Chief Martin Stutzmann Walter Schottky Institut, Technische Universitat MOnchen, Am Coulombwail, 85748 Garching, Germany Fax: +49 (0) 89/28 91-27 37; e-mail: [email protected] Regional Editors Martin S. Brandt Walter-Schottky-lnstitut, Technische Universitat Munchen, Am Coulombwail, 85748 Garching, Germany Fax:+49 (0)89/28 91-27 37; e-mail: [email protected] Shuit-Tong Lee Centre of Super-Diamond and Advanced Films (COSDAF) and Department of Physics and Materials Science City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong SAR Fax: +8 52/27 8446 96; e-mail: [email protected] Pablo Ordejon Institut de Ciencia de Materials de Barcelona -CSIC Campusde la U.A.B., 08193 Bellaterra, Barcelona, Spain Fax: +34 93/5 80 57 29; e-mail: [email protected] Michael Shur Electrical, Computer, and Systems Engineering Department and Physics Department, Rensselaer Polytechnic Institute, 110 8th Street, Troy, NY 12180, USA Fax: +1 (518) 276 2990; e-mail: [email protected] John I. B. Wilson Department of Physics, Heriot Watt University, Riccarton, Edinburgh EH14 4AS, UK Fax: +44(0) 1 31/4 51 31 36; e-mail: [email protected] Managing Editor Stefan Hildebrandt Editorial Office, WILEY-VCH Verlag GmbH & Co. KGaA, BuhringstraBe 10, 13086 Berlin, Germany Fax: +49 (0) 30/47 03 13 34; e-mail: [email protected] 36 2006 ©WILEY-VCH
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Page 1: 'International Conference on Nitride Semiconductors ; 6 ... · currenttopicsinsolidstatephysics Editor-in-Chief Martin Stutzmann WalterSchottkyInstitut, Technische UniversitatMOnchen,

current topics in solid state physics

Editor-in-Chief

Martin Stutzmann

Walter Schottky Institut, Technische Universitat MOnchen,Am Coulombwail, 85748 Garching, GermanyFax: +49 (0) 89/28 91-27 37; e-mail: [email protected]

Regional Editors

Martin S. Brandt

Walter-Schottky-lnstitut, Technische Universitat Munchen,

Am Coulombwail, 85748 Garching, GermanyFax:+49 (0)89/28 91-27 37;

e-mail: [email protected]

Shuit-Tong Lee

Centre of Super-Diamond and Advanced Films (COSDAF)

and Department of Physics and Materials Science

City University of Hong Kong, 83 Tat Chee Avenue,

Kowloon, Hong Kong SAR

Fax: +8 52/27 84 46 96; e-mail: [email protected]

Pablo OrdejonInstitut de Ciencia de Materials de Barcelona -CSIC

Campusde la U.A.B., 08193 Bellaterra, Barcelona, SpainFax: +34 93/5 80 57 29; e-mail: [email protected]

Michael Shur

Electrical, Computer, and Systems EngineeringDepartment and Physics Department,Rensselaer Polytechnic Institute, 110 8th Street,

Troy, NY 12180, USA

Fax: +1 (518) 276 2990; e-mail: [email protected]

John I. B. WilsonDepartment of Physics, Heriot Watt University,Riccarton, Edinburgh EH14 4AS, UKFax: +44(0) 1 31/4 51 31 36; e-mail: [email protected]

Managing Editor

Stefan Hildebrandt

Editorial Office, WILEY-VCH Verlag GmbH & Co. KGaA,

BuhringstraBe 10, 13086 Berlin, GermanyFax: +49 (0) 30/47 03 13 34; e-mail: [email protected]

3 6

2006

©WILEY-VCH

Page 2: 'International Conference on Nitride Semiconductors ; 6 ... · currenttopicsinsolidstatephysics Editor-in-Chief Martin Stutzmann WalterSchottkyInstitut, Technische UniversitatMOnchen,

Contents

Full text on our homepage at; http://www.pss-c.com

Papers presented at

6th International Conference on

Nitride Semiconductors (ICNS-6)Bremen, Germany, 28 August-2 September 2005

Guest Editors: Stefan Hildebrandt, Liverios Lymperakis, Jorg Neugebauer, and Martin Stutzmann

Growth

Molecular beam epitaxy for high-efficiency nitride optoelectronics

J. Heffernan, M. Kauer, J. Windle, S. E. Hooper, V. Bousquet, C. Zellweger, and J. M. Barnes 1379-1382

Radio-frequency MBE growth of cubic GaN on BP(001)/Si(001) hetero-structure

T. Kikuchi, A. S. Somintac, M. Odawara, T. Udagawa, and T. Ohachi 1383-1387

Novel buffer layer for the growth of GaN on c-sapphireWookhyun Lee, Seogwoo Lee, Hiroki Goto, Hyunchul Ko, Meoungwhan Cho,

and Takafumi Yao 1388-1391

Critical aspects ofhigh temperature MOCVD growth ofA1N epilayers on 6H-SiC substrates

K. Balakrishnan, N. Fujimoto, T. Kitano, A. Bartdoh, M. Imura, K. Nakano, M. Iwaya,S. Kamiyama, H. Amano, I. Akasaki, T. Takagi, T. Noro, K. Shimono, T. Riemann,

and J. Christen 1392-1395

Two to three dimensional transitions ofInGaN and the impact ofGaN overgrowthT. Yamaguchi, S. Einfeldt, S. Gangopadhyay, A. Pretorius, A. Rosenauer, J, Falta,andD. Homtnel 1396-1399

Effect of growth temperature on AlGalnN layers: a TEM analysis

D. Mendez, M. Albrecht, E. Monroy, D. Jalabert, H. P. Strank, A. M. Sanchez,

and R. Garcia 1400-1403

Radio-frequency MBE growth of cubic GaN on 3C-SiC(001 )/Si(001) templateT. Ohachi, T. Kikuchi, A, Somintac, S. Yamaguchi, T. Yasuda, and M. Wada 1404-1407

Effect of carrier gas on GaN epilayer characteristics

Y. S. Cho, H. Hardtdegen, N. Kaluza, N. Thillosen, R. Steins, Z. Sofer, and H. Lttth 1408-1411

Large bandgap bowing of In.vGa| _„N films and growth ofblue/green In^Gai ^N/GaN MQWson highly tensile strained GaN/Si(l 11) hetero structures

Kang Jea Lee, Tae Su Oh, Tae Ki Kim, Gye Mo Yang, and Kee Young Lim 1412-1415

Si diffusion in epitaxial GaNRafal Jakiela, Adam Barcz, Ewa Dumiszewska, and Andrzej Jagoda 1416-1419

Doping efficiency and segregation ofSi in A1N grown by molecular beam epitaxy

V. Lebedev, F. M. Morales, H. Romanus, G. Ecke, V. Cimalla, M. Himmerlich, S. Krischok,

J. A. Schaefer, and O. Ambacher 1420-1424

p-type conduction in a C-doped (llOl)GaN grown on a 7-degree-off oriented (001)Si substrate

by selective MOVPE

T. Hikosaka, N. Koidc, Y. Honda, M. Yamaguchi, and N. Sawaki 1425-1428

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1364 Contents

On the incorporation mechanism of Fe in GaN grown by metal-organic vapour phase epitaxy

R. S. Balmer, D. E. J. Soley, A. J. Simons, J. D. Mace, L. Koker, P. O. Jackson, D. J. Wallis,

M. J. Uren, and T.Martin 1429-1434

n-type conductivity control of AlGaN with high Al mole fraction

Takuya Katsuno, Yuhuai Liu, Dabing Li, Hideto Miyake, Kazumasa Hiramatsu,

Tomohiko Shibata, and Mitsuhiro Tanaka 1435-1438

Freestanding two inch c-plane GaN layers grown on (100) y-lithium aluminium oxide

by hydride vapour phase epitaxyE. Richter, Ch. Hennig, U. Zeimer, M. Weyers, G. TrSnkle, P. Reiche, S. Ganschow, R. Uecker,

and K. Peters 1439-1443

InN-based layers grown by modified HVPE

A. Syrkin, A. Usikov, V. Soukhoveev, 0. Kovalenkov, V. Ivantsov, V. Dmitriev, C. Collins,E. Readinger, N. Shmidt, V. Davydov, S. Nikishin, V. Kuryatkov, D. Song, D. Rosenbladt,

andMarkHoltz 1444-1447

Polishing and characterization of thick A1N layers grown on SiC substrates

by stress control hydride vapor phase epitaxyH. Mank, B. Amstatt, D. Turover, E. Bellet-Amalric, B. Daudin, V. Ivantsov, V. Dmitriev,and V. Maslermikov 1448-1452

Crystallization offree standing bulk GaN by HVPE

B. Lucznik, B. Pastuszka, I. Grzegory, M. Bo6kowski, G. Kamler, J. Domagala, G. Nowak,P. Prystawko, S. Krukowski, and S. Porowski 1453-1456

Thermodynamic study on the role ofhydrogen during hydride vapor phase epitaxy of Al,Gai _^.N

H. Murakami, J. Kikuchi, Y. Kumagai, and A. Koukitu 1457-1460

Growth and doping ofAlGaN and electroluminescence of SAG-InGaN/AlGaN heterostructure

by mixed-source HVPE

K. H. Kim, H. S. Ahn, M. Yang, K. S. Jang, S. L. Hwang, W. J. Choi, C. R. Cho, S. W. Kim,

Y. Honda, M. Yamaguchi, N. Sawaki, J. Yoo, S.M.Lee, and M.Koike 1461-1465

Bowing ofthick GaN layers grown by HVPE using ELOGCh. Hennig, E. Richter, U. Zeimer, M. Weyers, and G. Trankle 1466-1470

HVPE growth of high quality GaN layersPeter Bruckner, Frank Habel, and Ferdinand Scholz 1471-1474

Bending in HVPE GaN free-standing films: effects of laser lift-off, polishingand high-pressure annealing

T. Paskova, V. Darakchieva, P. P. Paskov, B. Monemar, M. Bukowski, T. Suski, N. Ashkenov,M. Schubert, and D. Hommel 1475-1478

Fabrication ofthick A1N film by low pressure hydride vapor phase epitaxyYu-Huai Liu, Tomoaki Tanabe, Hideto Miyake, Kazumasa Hiramatsu, Tomohiko Shibata,and Mutsuhiro Tanaka 1479-1482

AlGaN epitaxial layers grown by HVPE on sapphire substrates

V. Soukhoveev, O. Kovalenkov, L. Shapovalova, V. Ivantsov, A. Usikov, V. Dmitriev,V. Davydov, and A. Smirnov 1483-1486

Growth of GaN on patterned thick HVPE free standing GaN substrates by high pressure

solution method

M. Bodkowski, I. Grzegory, G. Nowak, B. Lucznik, B. Pastuszka, G. Kamler, M. Wroblewski,P. Kwiatkowski, K. Jasik, W. Wawer, S. Krukowski, and S. Porowski 1487-1490

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Contents1365

Growth ofA1N films and their characterization

Rakesh B. Jain, Ying Gao, Jianping Zhang, R. S. Qhaleed Fareed, Remis Gaska, Jiawei Li,Arulchakkravarthi Arjunan, Edmundas Kuokstis, Jinwei Yang, and M. Asif Khan 1491-1494

Specific heat calculations ofIII-N bulk materials

A. AlShaikhi and G. P. Srivastava 1495-1498

Photoluminescence of a-plane GaN: comparison between MOCVD and HVPE grown layersP. P. Paskov, R. Schifano, T. Malinauskas, T. Paskova, J. P. Bergman, B. Monemar, S. Figge,D. Hommel, B. A. Haskell, P. T. Fini, J. S. Speck, and S. Nakamura 1499-1502

Impact ofIII/V ratio on polytype and crystalline quality ofA1N grown on 4H-SiC (1120) substrate

by molecular-beam epitaxyM. Horita, J. Suda, andT. Kimoto 1503-1506

Effects of GaN-buffer etching in atmospheric-pressure MOVPE growth of InN on sapphireA. Yamamoto, Y. Nagai, H. Miwa, and A. Hashimoto 1507-1510

Towards fabrication ofIn-polar InN films and InN/GaN MQWsWataru Yamaguchi, Song-Bek Che, Naohiro Kikukawa, Yoshihiro Ishitani,and Akihiko Yoshikawa

1511-1514

RF-MBE growth ofcubic InN films on MgO (001) substrates

Y. Iwahashi, H. Yaguchi, A. Nishimoto, M. Orihara, Y. Hijikata, and S. Yoshida 1515-1518

A comparative study on MOVPE InN grown on Ga- and N-polarity bulk GaN

W. J. Wang, H. Miwa, A. Hashimoto, and A. Yamamoto 1519-1522

Polarity and microstructure in InN thin layers grown by MOVPEN. Kuwano, Y. Nakahara, and H. Amano 1523-1526

NH3/TMI molar ratio dependence ofelectrical and optical propertiesfor atmospheric-pressure MOVPE InN

A. Yamamoto, H. Miwa, Y. Shibata, and A. Hashimoto 1527-1530

Growth ofInN on 6H-SiC by plasma assisted molecular beam epitaxyApril S. Brown, Tong-Ho Kim, Soojeong Choi, Pae Wu, Michael Morse, Maria Losurdo,Maria M. Giangregorio, Giovanni Bruno, and Akihiro Moto 1531-1535

Deterioration ofMOVPE InN films on sapphire during growth and post-growth annealingHiroshi Miwa, Akihiro Hashimoto, and Akio Yamamoto 1536-1539

Study on influence of atomic hydrogen irradiation on growth and properties ofN-polarity InNSong-Bek Che, Koichiro Akasaka, Yoshihiro Ishitani, and Akihiko Yoshikawa 1540-1543

Towards a better understanding of nano-islands formed during atmospheric pressure MOVPE

N. K. van der Laak, R. A. Oliver, J. S. Barnard, P. D. Cherns, M. J. Kappers,and C. J. Humphreys 1544-1547

Investigation of growth mechanisms of GaN quantum dots on (0001)A1N surface

by ammonia MBEV. G, Mansurov, Yu. G. Galitsyn, A. Yu. Nikitin, K. S. Zhuravlev, and Ph. Vennegues .... 1548-1551

Three methods for the growth of InGaN nanostructures by MOVPE

R. A. Oliver, M. J. Kappers, N. K. van der Laak, and C. J. Humphreys 1552-1556

Growth and morphology of MOVPE grown InGaN/GaN islands

S. Gangopadhyay, Th. Schmidt, S. Einfeldt, T. Yamaguchi, D. Hommel, and J. Falta 1557-1560

Growth of In-polar and N-polar InN nanocolumns on GaN templates by molecular beam epitaxyXinqiang Wang, Song-Bek Che, Yoshihiro Ishitani, and Akihiko Yoshikawa 1561-1565

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1366 Contents

Dislocation behaviour in Ill-nitride epitaxial films grown on vicinal sapphire (0001) substrates

X. Q. Shen, H. Matsuhata, and H. Okumura 1566-1569

The effect of Si on the growth mode of GaN

J. von Pezold, R. A. Oliver, M. J. Kappers, P. D. Bristowe, and C. J. Humphreys 1570-1574

The initial growth stage hi PVT growth of aluminum nitride

P. Hermann, B.M. Epelbaum, M. Bickermann, S. Nagata, and A. Winnacker 1575-1578

Investigation ofA1N nucleation layers for AlGaN/GaN heterostructures on 4H-S1C

S. Boeykens, M. R. Leys, M. Germain, K. Cheng, J. Derluyn, B. Van Daele, G. Van Tendeloo,

R. Belmans, and G. Borghs 1579-1582

Real time spectroscopic ellipsometry investigation ofhomoepitaxial GaN grown

by plasma assisted molecular beam epitaxy

Tong-Ho Kim, Soojeong Choi, Pae Wu, April Brown, Maria Losurdo, Maria M. Giangregorio,Giovanni Bruno, and Akihiro Moto 1583-1586

Investigations on local Ga and In incorporation ofGalnN quantum wells on facets

of selectively grown GaN stripes

B. Neubert, F. Habel, P. Bruckner, F. Scholz, M. Schirra, M. Feneberg, K. Thonke, T. Riemann,

J. Christen, M. Beer, J. Zweck, G. Moutchnik, and M. Jetter 1587-1590

Fabrication ofInN/AlInN MQWs by RF-MBE

W. Terashima, S. B. Che, Y. Ishitani, and A. Yoshikawa 1591-1594

In-plane anisotropy in uniaxially-strained GaN films detected by optical diffraction techniqueSatoru Adachi, Yasunori Toda, Tetsuro Ishiguro, Katsuyuki Hoshino, and Yasuhiko Arakawa 1595 -1598

Fabrication ofInN/InGaN multiple quantum well structures by RF-MBE

M. Kurouchi, H. Na, H. Naoi, D. Muto, S. Takado, T. Araki, T. Miyajima, and Y. Nanishi. . . 1599-1603

Growth ofternary and quaternary cubic Ill-nitrides on 3C-SiC substrates

J. SchOrmann, S. Potthast, M. Schnietz, S. F. Li, D. J. As, and K. Lischka 1604-1607

Preparation and characterisation oftantalum carbide as an optional crucible material

for bulk aluminium nitride crystal growth via physical vapour transport

C. Hartmann, J. Wollweber, M. Albrecht, and I. Rasin 1608-1612

Influence of gas composition on the synthesis of gallium nitride powders

by two-stage chemical vapor method

K. Hara, A. Yonemura, and T. Uchida 1613-1616

Growth ofhigh-quality AIN at high growth rate by high-temperature MOVPE

N. Fujimoto, T. Kitano, G. Narita, N. Okada, K, Balakrishnan, M. Iwaya, S. Kamiyama,H. Amano, I. Akasaki, K. Shimono, T. Noro, T. Takagi, and A. Bandoh 1617-1619

Modeling and experimental analysis of InGaN MOVPE in the Aixtron AIX 200/4 RF-S horizontal

reactor

E. V. Yakovlev, R. A. Talalaev, R. W. Martin, C. Jeynes, N. Peng, C. J. Dcatcher,and I. M. Watson 1620-1623

Fabrication ofGaN-based striped structures along the (1120) direction by the combination

of RJE dry-etching and KOH wet-etching techniques to recover dry-etching damageMorimichi Itoh, Tom Kinoshita, Koji Kawasaki, Misaichi Takeuchi, Choshiro Koike,

and Yoshinobu Aoyagi 1624-1628

A control technique of oxygen contamination by Ga beam irradiation in InN MOMBE growthK. Isamoto, Y. Uesaka, A. Yamamoto, and A. Hashimoto 1629-1632

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Contents 1367

AlGaN films grown on trenched sapphire substrates using a low-temperature GaNP buffer layerby MOCVD

K. Sumiyoshi, M. Tsukihara, S. Kawamichi, F. Yan, and S. Sakai 1633-1636

Thermalization and recombination in exponential band tail states

M. Niehus and R. Schwarz 1637-1644

Current crowding effects on blue LED operationI. Yu. Evstratov, V. F. Mymrin, S. Yu. Karpov, and Yu. N. Makarov 1645-1648

Microfabrication of GaN groove on sapphire substrate treated selectively by electron-beam

H. Matsumura, M. Sumiya, Y. Kawai, M. Tomiki, K. Murakami, and S.Fuke 1649-1652

Structural and electrical properties

Recent results on A1N growth by HVPE and fabrication of free standing A1N wafers

V. Soukhoveev, 0. Kovalenkov, V. Ivantsov, A. Syrkin, A. Usikov, V. Maslennikov,and V. Dmitriev 1653-1657

Characterization ofstructural defects in (1120) GaN films grown on (1102) sapphire substrates

P. Vennegues, F. Mathal, and Z. Bougrioua 1658-1661

Diffraction anomalous fine structure investigation of InGaN quantum dots

E. Piskorska, V. Holy, M. Siebert, B. Krause, T. H. Metzger, Th. Schmidt, J. Falta,T. Yamaguchi, and D. Hommel 1662-1666

Quantitative strain analysis ofGaN/AIN quantum dot multilayersE. Sarigiannidou, A. D. Andreev, E. Monroy, B. Daudin, and J. L. Rouviere 1667-1670

Evaluation of strain in A1N thin films grown on sapphire and 6H-SiC by metalorganic chemical

vapor depositionNaolo Kato and Takashi Inushima 1671-1674

Electronic states in nitride semiconductor quantum dots: A tight-binding approachS. Schulz and G. Czycholl 1675-1678

TEM analyses ofwurtzite InGaN islands grown by MOVPE and MBE

A. Pretorius, T. Yamaguchi, C. Ktlbel, R. KrSger, D. Hommel, and A. Rosenauer 1679-1682

Reduced residual stress in GaN grown on 3c-SiC/Si(l 11) templates formed by C+-ion implantationT. Kobayashi, N. Sawazaki, M. S. Cho, A. Hashimoto, A. Yamamoto, and Y. Ito 1683-1686

Structural characterization of InN quantum dots grown by Metalorganic Vapour Phase EpitaxyJ. G. Lozano, D. Gonzalez, A. M. Sanchez, D. Araujo, S. Ruffenach, O. Briot, and R. Garcia. . 1687-1690

AIN/GaN superlattices: strain relaxation

E. Bellet-Amalric, B. Amstatt, and B. Daudin 1691-1694

Investigation ofthermal conductivity ofnitride mixed crystals and superlatticesby molecular dynamics

Takahiro Kawamura, Yoshihiro Kangawa, and Koichi Kakimoto 1695-1699

Thermodynamic stability ofIn1_.;C_vGaTAlvN on GaN and InN

Yoshihiro Kangawa, Koichi Kakimoto, Tomonori Ito, and Akinori Koukitu 1700-1703

Electrical properties ofNi/i-AlGaN/GaN structures and influence of thermal annealingT. Sawada, N. Kimura, K. Suzuki, K. Imai, S.-W. Kim, and T. Suzuki 1704-1708

High temperature characterization ofPt-based Schottky diodes on AlGaN/GaN heterostructures

J. Pedr6s, R. Cuerdo, R. Lossy, N. Chaturvedi, J. Wurfl, and F. Calle 1709-1712

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1368Contents

Experimental evidence for Drude-Boltzmann-like transport in a two-dimensional electron gas

in an AlGaN/GaN heterostructure

Jing-Han Chen, Jyun-Ying Lin, Jung-Kai Tsai, Hun Park, Gil-Ho Kim, Jungseok Ahn,

Hyun-Ick Cho, Eun-Jin Lee, Jung-Hee Lee, C.-T. Liang, and Y.F.Chen 1713-1716

Formation of low resistance nonalloyed ohmic contacts to p-type GaN by KrF laser irradiation

Min-Suk Oh, Ja-Soon Jang, Sang-Ho Kim, and Tae-Yeon Seong 1717-1720

The conductivity ofMg-doped InN

V. Cimalla, M. Niebelschtltz, G. Ecke, O. Ambacher, R. Goldhahn, H. Lu, and W. J. Schaff. .

1721-1724

Surface segregation of Si and Mg dopants in MOVPE grown GaN films revealed

by X-ray photoemission spectro-microscopyTh. Schmidt, M. Siebert, J. I. Flege, S. Gangopadhyay, A. Pretorius, R. Kroger, S. Figge,

L. Gregoratti, A. Barinov, D. Hommel, and J. Falta 1725-1728

Structural investigations ofGaN films with X-ray standing waves

Michael Siebert, Thomas Schmidt, Jan Ingo Flege, Sven Einfeldt, Stephan Figge,

DetlefHommel, and Jens Falta 1729-1732

New core configurations of the c-edge dislocation inwurtzite GaN

I. Belabbas, J. Chen, M. Akli Belkhir, P. Ruterana, and G. Nouet 1733-1737

Local structural characterization ofepitaxial <j-plane InGaN/GaN thin films

by transmission electron microscopyT. Yamazaki, K. Kusakabe, N. Nakanishi, K. Ohkawa, and I. Hashimoto 1738-1741

Analysis ofthe local structure ofAlN:Mn using X-ray absorption fine structure measurements

Takao Miyajima, Yoshihiro Kudo, Tomoya Uruga, and Kazuhiko Hara 1742-1745

Analysis ofthe local structure of InN with a bandgap energy of 0.8 and 1.9 eV and annealed InN

using X-ray absorption fine structure measurements

Takao Miyajima, Yoshihiro Kudo, Akihiro Wakahara, Tomohiro Yamaguchi, Tsutomu Araki,and Yasushi Nanism" 1746-1749

Mechanisms of bending of threading dislocations in MOVPE-grown GaN on (0001) sapphireR, Datta and C. J. Humphreys 1750-1753

Investigation ofhydrogen implantation induced blistering in GaN

R Singh, I. Radu, U. Gosele, and S. H. Christiansen 1754-1757

Control ofleakage current in AlGaN Schottky interfaces by an ultrathin Al layerMasamitsu Kaneko and Tamotsu Hashizume 1758-1761

Electrical characteristics and thermal stability of Ti contact to p-GaN

C. K. Tan, A. Abdul Aziz, Z.Hassan, F.K. Yam, and A. Y. Hudeish 1762-1766

Wet chemical etching ofA1N in KOH solution

I. Cimalla, Ch. Foerster, V. Cimalla, V. Lebedev, D. Cengher, and O. Ambacher 1767-1770

Atomic structure of dislocations in nitride semiconductors

S. Petit, A. B&-6, J. Chen, I. Belabbas, P. Ruterana, and G. Nouet 1771-1774

Investigation ofdefects in GaN with varying Mg doping concentrations

Toshiyuki Obata, Naoki Matsumura, Kiyoshi Ogiwara, Hideki Hirayama, Yoshinobu Aoyagi,and Koji Ishibashi 1775-1778

Multiple defects in GalnN multiple quantum wells grown on ELO GaN layers and on GaN substrates

S.Tomiya, O. Goto, Y. Hoshina, T. Tanaka, and M. Ikeda 1779-1782

Metal (Ni, Au)-vacancy complexes in GaN

J. von Pezold and P. D. Bristowe 1783-1786

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Contents 1369

Reduction of strain and dislocation defects in GaN layers grown on Si substrate by MOCVD

using a substrate defect engineering technique

M. Jamil, Eric Irissou, J. R. Grandusky, V. Jindal, and F. Shahedipour-Sandvik 1787-1791

Development ofpit-defect free smooth a-plane GaN surfaces on r-plane sapphireusing metalorganic chemical vapor deposition: A growth mechanism study

Vibhu Jindal, James Grandusky, Muhammad Jamil, Eric Irissou, Fatemeh Shahedipour Sandvik,Kevin Matocha, and Vinayak Tilak 1792-1797

Optical cavity formation on GaN using a conventional RIE systemF. G. Kalaitzakis, G. Konstantinidis, K. Tsagaraki, M. Androulidaki, and N. T. Pelekanos

. . . 1798-1802

Structural analysis ofpyramidal defects in Mg-doped GaN

A. Pretorius, M. Schowalter, N. Daneu, R. Krfiger, A. Recnik, and A. Rosenauer 1803-1806

Morphological evaluation of epitaxial GaN grown on r-plane sapphire by metalorganic vapor-phaseepitaxy

KKusakabeandK. Ohkawa 1807-1810

InGaN quantum well epilayers morphological evolution under a wide range ofMOCVD

growth parameter sets

D. I. Florescu, S. M. Ting, V. N. Merai, A. Parekh, D. S. Lee, E. A. Armour, and W. E. Quinn 1811-1814

Pinholes in multiple quantum well InxGai _jN/GaN with low In concentration

Florence Gloux, Pierre Ruterana, and Gerard Nouet 1815-1818

Extremely smooth surface morphology ofGaN-based layers on misoriented GaN substrates

for high-power blue-violet lasers

Koichi Tachibana, Hajime Nago, and Shin-ya Nunoue 1819-1822

Structural and electrical characteristics ofAg/Alo.jGao.sN and Ag/Al0.3Ga0.7N Schottky contacts:

an XPS studyB. Boudjelida, I. Gee, J, Evans-Freeman, S. A. Clark, M. Azize, J.-M. Bethoux,

and P. DeMierry 1823-1827

Investigation ofoptimized ohmic contact of direct ITO layer with synchrotron radiation analysisJun-Seok Ha, Jun-Ho Jang, Min-Ho Joo, Tae-Hyeong Kim, Kyu-Ho Park, Hyun-Joon Shin,

Jeong-Soo Lee, and Jong-Jae Jung 1828-1831

TEM analysis of annihilation process of threading dislocations in GaN thin films grown by MOVPE

with anti-surfactant treatment

M. Hijikuro, N. Kuwano, M. Takeuchi, and Y. Aoyagi 1832-1835

C2„ nitrogen-hydrogen complexes in GaAsN revealed by X-ray AbsorptionNear-Edge Spectroscopyand ab initio simulations

G. Ciatto, F. Boscherini, A. Amore Bonapasta, F. Filippone, A. Folimeni, and M. Capizzi . . . 1836-1840

Opticalproperties

InN: Fermi level stabilization by low-energy ion bombardment

L. F. J. Piper, T. D. Veal, C. F. McConville, H. Lu, and W.J. Schaff 1841-1845

Observation of a filled electronic state in the conduction band ofInN

J. J. Kim, H. Makino, K. Kobayashi, P. P. Chen, E. Ikenaga, M, Kobata, A. Takeuchi, M. Awaji,T. Hanada, M. W. Cho, and T. Yao 1846-1849

Conduction and valence band edge properties of hexagonal InN characterized

by optical measurements

Y. Ishitani, W. Terashima, S. B. Che, and A. Yoshikawa 1850-1853

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j 370 Contents

Anisotropy ofthe F-point effective mass and mobility in hexagonal InN

T. Hofmann, T. Chavdarov, V. Darakchieva, H. Lu, W. J. Schaff, and M. Schubert 1854-1857

Photoluminescence depth-profiling oflattice-mismatched InGaN thick film on GaN using inductively

coupled plasma etchingJi-Myon Lee, Byung-Il Kim, and Seong-Ju Park 1858-1861

Dynamic polarization rotation in pump-and-probe transients ofanisotropically strained .M-plane GaNfilms on LiA102

K. Omae, T. Flissikowski, P. Misra, O. Brandt, H. T. Grahn, K. Kojima, and Y. Kawakami. .

1862-1865

Energy gaps and bowing parameters ofInAlGaN ternary and quaternary alloysM. Androulidaki, N. T. Pelekanos, K. Tsagaraki, E. Dimakis, E. Iliopoulos, A. Adikimenakis,E. Bellet-Amalric, D. Jalabert, and A. Georgakilas 1866-1869

Photoluminescence spectra of GaN films grown at low temperature by compound-source molecular

beam epitaxyTohru Honda, Masaru Sawada, Toshiaki Kobayashi, Shinichi Egawa, Yohta Aoki,

Miwako Akiyama, and Hideo Kawanishi 1870-1873

Infrared reflectance measurement for InN thin film characterization

K. Fukui, Y. Kugumiya, N. Nakagawa, and A. Yamamoto 1874-1878

Band-to-band and inner shell excitation VIS-UV photoluminescence ofquaternary InAlGaN alloysK. Fukui, S. Naoe, K. Okada, S. Hamada, and H. Hirayama 1879-1883

High temperature refractive indices ofGaN

C. Liu, S. Stepanov, A. Gott, P. A. Shields, E. Zhirnov, W. N. Wang, E. Steimetz,and J. T. Zettler 1884-1887

Radiative recombination mechanism in highly modulation doped GaN/AlGaN multiple quantum wells

B. Arnaudov, P. P. Paskov, H. Haratizadeh, P. 0. Holtz, B. Monemar, S. Kamiyama, M. Iwaya,H.Amano, andl. Akasaki 1888-1891

The magnesium acceptor states in GaN: an investigation by optically-detected magnetic resonance

G. N. Aliev, S. Zeng, J. J. Davies, D. Wolverson, S. J. Bingham, P. J. Parbrook, and T. Wang 1892-1896

Direct correlation between nonradiative recombination centers and threading dislocations

in InGaN quantum wells by near-field photoluminescence spectroscopyAkio Kaneta, Mitsuru Funato, Yukio Narukawa, Takashi Mukai, and Yoichi Kawakami.... 1897-1901

Orientation-dependent properties of aluminum nitride single crystalsM. Bickermann, P. Hermann, and B. M. Epelbaum 1902-1906

Photo-induced improvement of radiative efficiency and structural changes in GaAsN alloysH. Yaguchi, T. Morioke, T. Aoki, H. Shimizu, Y. Hijikata, S. Yoshida, M. Yoshita,H. Akiyama, N. Usami, D. Aoki, and K. Onabe 1907-1910

Effect ofV/III ratio on the optical properties ofEu-doped GaN

J. Sawahata, J. W. Seo, M. Takiguchi, D. Saito, S. Ncmoto, and K. Akimoto 1911-1914

Cathodoluminescence properties ofInGaN codoped with Zn and Si

Y. Honda, Y. Yanase, M. Yamaguchi, andN. Sawaki 1915-1918

The role of vacancies in the red luminescence from Mg-doped GaNS. Zeng, G. N. Aliev, D. Wolverson, J. J, Davies, S. J. Bingham, D. A. Abdulmalik,P. G. Coleman, T. Wang, and P. J. Parbrook 1919 1922

Carrier lifetime and diffusion in GaN epilayers grown by MEMOCVDG. Tamulaitis, J. Mickevicius, M. S. Shur, R. S. Qhalid Farced, J. P. Zhang,andR. Gaska 1923 1926

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Contents 1371

Depth profiling ofion-implanted AlInN using time-of-flight secondary ion mass spectrometry

and cathodoluminescence

R. W. Martin, D. Rading, R. Kersting, E. Tallarek, E. Nogales, D. Amabile, K. Wang,V. Katchkanov, C. Trager-Cowan, K. P. O'Donnell, I. M. Watson, V. Matias, A. Vantomme,K. Lorenz, and E. Alves 1927-1930

Clustering in GaAsSbN alloys as a possible origin oftheir atypical optical behavior:

a Sb K-edge X-ray absorption study

Gianluca Ciatto, Jean-Christophe Harmand, Ludovic Largeau, and Frank Glas 1931-1934

Determination of carrier diffusion length in MOCVD-grown GaN epilayers on sapphireby optical techniques

E. V. Lutsenko, A. L. Gurskii, V. N. Pavlovskiy G. P. Yablonskii, T. Malinauskas,K. Jarasiflnas, B. Schineller, and M. Heuken 1935-1939

Coupling ofphonons with excitons bound to different donors and acceptors in hexagonal GaNK. P. Korona, A. Wysmolek, J. Kuhl, M. Kamiriska, J. M. Baranowski, D. C. Look,and S.S.Park 1940-1943

Enhanced emission efficiency of InGaN films with Si doping

Da-Bing Li, Yu-Huai Liu, Takuya Katsuno, Keisuke Nakao, Kazuya Nakamura,

Masakazu Aoki, Hideto Miyake, and Kazumasa Hiramatsu 1944-1948

Membrane structures containing InGaN/GaN quantum wells fabricated by wet etchingof sacrificial silicon substrates

S.-H. Park, C. Liu, E. Gu, M. D. Dawson, I. M. Watson, K. Bejtka, P. R. Edwards,

andR. W.Martin 1949-1952

Fabrication and characterization of 20 periods InN/InGaN MQWs

Song-Bek Che, Yoshihiro Ishitani, and Akihiko Yoshikawa 1953-1957

Stimulated emission and carrier dynamics in AlInGaN multi-quantum wells

S, A. Hashemizadeh, J.-P. R. Wells, J. Brown, P. Murzyn, B. D. Jones, T. Wang,P. J. Parbrook, A. M. Fox, D.J.Mowbray, and M.S. Skolnick 1958-1961

Barrier-to-well carrier dynamics ofInGaN/GaN multi-quantum-wells grown

by plasma assisted MBE on bulk GaN substrates

K. P. Korona, C. Skierbiszewski, M. Siekacz, A. Feduniewicz, T. Suski, G. Franssen,I. Grzegory, J. Borysiuk, and M, Leszczynski 1962-1965

Optimizing the internal quantum efficiency ofGalnN SQW structures for green light emitters

D. Fuhrmann, U. Rossow, C. Netzel, H. Bremers, G. Ade, P. Hinze, and A. Hangleiter .... 1966-1969

High quantum efficiency InGaN/GaN structures emitting at 540 nm

D. M. Graham, P. Dawson, M. J. Godfrey, M. J. Kappers, P. M. F. J. Costa, M, E. Vickers,R. Datta, C. J. Humphreys, and E. J. Thrush 1970-1973

Modifying optical properties ofInGaN quantum wells by a large piezoelectric polarizationH. Gotoh, T. Tawara, Y. Kobayashi, N. Kobayashi, Y. Yamauchi, T. Makimoto, and T. Saitoh 1974-1977

Photocapacitance characteristics of(In,Ga)N/GaN MQW structures

C. Rivera, J. L. Pau, E. Munoz, T. Ive, and O. Brandt 1978-1982

Photoluminescence and edge-incident wavelength modulation transmittance spectroscopy

characterizations ofInGaN/GaN multiple-quantum-well structures

D. Y.Lin,W. L. Chen,W. C. Lin, J. J. Shiu, and J. Han 1983-1987

Anisotropic ambipolar diffusion of carriers in InGaN/GaN quantum wells

Y. J. Wang, S. J. Xu, and Q. Li 1988-1991

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1372 Contents

Optical spectra of(HOI) InGaN/GaN and GaN/AlGaN MQW structure grown on a 7 degreeoffaxis (001) Si substrate

Eun-Hee Kim, Toshiki Hikosaka, Tetsuo Narita, Yoshio Honda, and Nobuhiko Sawaki....

1992-1996

Raman scattering from In0.2Gao.sN/GaN superlatticesKenji Kisoda, Kohji Hirakura, and Hiroshi Harima 1997-2000

Resonant photoluminescence excitation studies of InGaN/GaN single quantum wells

D. M. Graham, P. Dawson, M. J. Godfrey, M. J. Kappers, J. S. Barnard, C. J. Humphreys,and E. J. Thrush 2001-2004

The effect ofa Mg-doped GaN cap layer on the optical properties ofInGaN/AlGaN multiple

quantum well structures

D. M. Graham, P. Dawson, Y. Zhang, P. M. F. J. Costa, M. J. Kappers, C. J. Humphreys,and E. J. Thrush 2005-2008

Critical points ofthe bandstructure of AIN/GaN superlattices investigatedby spectroscopic ellipsometry and modulation spectroscopy

C. Buchheim, R. Goldhahn, A. T. Winzer, C. Cobet, M. Rakel, N. Esser, U. Rossow,D. Fuhrmann, A. Hangleiter, and O. Ambacher 2009-2013

Crack-free AlGaN/GaN Bragg mirrors grown on Si(l 11) substrates by metalorganic vapor phaseepitaxy

A. P. Chiu, N. C. Chen, P. H. Chang, and C. F. Shih 2014-2018

Optical characterization of GaN microcavity fabricated by wet etchingC.-Y. Lu, S.-L. Wang, H.-M. Wu, and L.-H. Peng 2019-2021

Large enhancement of GaN-UV light emission using silver mirror resonator

N. M. Ahmed, M. R. Hashim, and Z. Hassan 2022-2025

Eu3+ location in Eu doped GaN thin films and quantum dots

Thomas Andreev, Nguyen Quang Liem, Yuji Hori, Mitsuhiro Tanaka, Osamu Oda,Daniel Le Si Dang, and Bruno Daudin 2026-2029

Quantum kinetic theory ofphonon-assisted carrier transitions in nitride based quantum-dot systemsJ. Seebeck, T. R. Nielsen, M. Lorke, P. Gartner, and F. Jahnke 2030-2033

Tb-doped GaN quantum dots grown by plasma-assisted molecular beam epitaxyYuji Hori, Thomas Andreev, Denis Jalabert, Mitsuhiro Tanaka, Osamu Oda, Daniel Le Si Dang,and Bruno Daudin 2034-2037

Microscopic theory of carrier-carrier scattering in nitride based quantum-dot systemsT. R. Nielsen, J. Seebeck, M. Lorke, P. Gartner, and F. Jahnke 2038-2042

Localization of non-equilibrium carriers in deep InGaN quantum dots and its impacton the device performance

D. S. Sizov, V. S. Sizov, V. V. Lundin, E. E. Zavarin, A. F. Tsatsul'nikov, A. S. Vlasov,Yu. G. Musikhin, N. N. Ledentsov, A. M. Mintairov, K. Sun, and J. Merz 2043 -2047

Microphotoluminescence ofGaN/AIN quantum dots grown by MBEK. S. Zhuravlev, D. D. Ree, V. G. Mansurov, A. Yu. Nikitin, P. P. Paskov, and P.-O. Holtz . .

2048-2051

Quantum confined Stark effect in vertically correlated GaN/AIN quantum dots

S. P. Lepkowski and G. Jurczak 2052--2055

Influence of stacking on optical characteristics ofGaN/AIN self-organized quantum dots

B. J. Kwon, J. S. Hwang, H. S. Kwack, Y. H. Cho, N. Gogneau, B. Daudin, and Le Si Dang . . 2056-2059

Carrier dynamics in site-controlled Ga, _AInrN quantum dots

M. Jetter, V. Perez-Sol6rzano, A. Grfining, H. Grabeldinger, M. Ubl, and H. Schweizer.... 2060-2064

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Contents 1373

Surface enhanced Raman scattering by GaN nanocolumns

A. G. Milekhin, R. Meijers, T. Richter, R. Calarco, H. Ltith, B. A. Paez Sierra, and D. R. T. Zalin 2065-2068

InGaN blue cathodoluminescence phosphors synthesized with long reaction time in a new reactor

Hisashi Kanie, Shingo Kobayashi, and Yuji Sema 2069-2072

Structural and optical characterization of AI>JntGa|_J[_vN quantum dots

V. Perez-Solorzano, A. Groning, H. Schweizer, and M. Jetter 2073-2077

Optical properties ofInGaN/GaN quantum wells on sapphire and bulk GaN substrate

M. Dworzak, T. Stempel, A. Hoffmann, G. Franssen, S. Grzanka, T. Suski, R. Czernecki,M. Leszczynski, and I. Grzegory 2078-2081

Exciton dynamics in nonpolar (1120) InGaN/GaN multiple quantum wells grown on GaN templatesprepared by lateral epitaxial overgrowth

T. Onuma, A. Chakraborty, B. A. Haskell, S. Keller, T. Sota, U. K. Mishra, S. P. DenBaais,J. S. Speck, S. Nakamura, and S. F. Chichibu 2082-2086

Electrical and recombination properties and deep traps spectra in MOCVD ELOG GaN layersIn-Hwan Lee, A. Y. Polyakov, N. B. Smimov, A. V. Govorkov, A. V. Markov,and S. J. Pearton 2087-2090

Two-dimensional electron gas in cubic ALXjai ..^N/GaN heterostructures

S. Potthast, J. Schormann, J. Fernandez, D. J. As, K. Lischka, H. Nagasawa, and M. Abe. . . 2091-2094

Prolonged kinetics ofphotoluminescence oftwo-dimensional electron gasin AlGaN/GaN heterostructure

T. S. Shamirzaev, N. S. Korzhavina, V. G. Mansurov, V. V. Preobrazhenskii,andK. S. Zhuravlev 2095-2098

Study ofexciton hopping in AlGaN epilayers by photoluminescence spectroscopyand Monte Carlo simulation

G. Tamulaitis, K. Kazlauskas, A. Zukauskas, J. Mickevi5ius, M. S. Shur,R. S. Qhalid Fareed, J. P. Zhang, and R. Gaska 2099-2102

Diffusion lengths in GaN obtained from steady state photocarrier gratings (SSPG)M. Niehus and R. Schwarz 2103-2108

Carrier dynamics ofoptical emission from two-dimensional electron gas

in undoped AlGaN/GaN single heterojunctionsH. S. Kwack, Y. H. Cho, G. H. Kim, M. R. Park, D. H. Youn, S. B. Bae, K.-S. Lee, J. H. Lee,and J. H. Lee 2109-2112

Optical characteristics oftwo-dimensional electrons in single and multiple ALGa^N/GaNheterostructures grown by metalorganic chemical vapor deposition

Sun-Mo Kim, Ho-Sang Kwack, Sun-Woong Hwang, Yong-Hoon Cho, H. I. Cho, J. H. Lee,

andKang L.Wang 2113-2116

Below bandgap transitions in an AlGaN/GaN transistor heterostructure observed

by pholoreflectance spectroscopy

R. Kudrawiec, M. Syperek, J. Misiewicz, M. Rudzinski, A, P. Grzegorczyk, P. R. Hageman,andP.K. Larsen 2117-2120

Cathodoluminescence and electrophysical characterization ofAlTGa,_.vN epilayersV. I. Kozlovsky, Y. K. Skasyrsky, Y. Dikme, H. Kalisch, R. H. Jansen, V. G. Litvinov,

andM.Heuken 2121-2124

Defect density dependence ofluminescence efficiency and lifetimes in AlGaN active regionsexhibiting enhanced emission from nanoscale compositional inhomogeneities

G. A. Garrett, A. V. Sampath, C. J. Collins, E. D. Readinger, W. L. Sarney, H. Shen,

M. Wraback, V. Soukhoveev, A. Usikov, and V. Dmitriev 2125-2128

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1374 Contents

Photonic devices

Degradation of blue LEDs related to structural disorder

A. V. Kamanin, A. G. Kolmakov, P. S. Kop'ev, G. A. Onushkin, A. V. Sakharov, N. M. Shmidt,D. S. Sizov, A. A. Sitnikova, A. L. Zakgeim, R. V. Zolotareva, and A. S. Usikov 2129-2132

High quality tin zinc oxide/Ag ohmic contacts for UV flip-chip light-emitting diodes

Hyun-Gi Hong, K.-Y. Ban, June-0 Song, J. Cho, Y. Park, J. S. Kwak, Ian T. Ferguson,and Tae-Yeon Seong 2133-2136

Fabrication and characterization ofInGaN resonant-cavity light-emitting diodes on silicon substrates

Shih-Yung Huang, Ray-Hua Horng, Wei-Kai Wang, and Don-Sing Wuu 2137-2140

InGaN-based light-emitting diodes grown on grooved sapphire substrates

Wei-Kai Wang, Don-Sing Wuu, Shu-Hei Lin, Shih-Yung Huang, and Ray-Hua Horng ....2141-2144

Temperature current-voltage characterisation of MOCVD grown InGaN/GaN MQW LEDs

Grigore Moldovarx, Andrew Phillips, E. J. Thrush, and Colin J. Humphreys 2145-2148

Micro-EL studying of high power blue LEDs

G. A. Onushkin, A. L. Zakgeim, D. A. Zakgeim, I. V. Rozhansky, A. F. Tsatsulnikov,W. V. Lundin, and D. S. Sizov 2149-2152

Nitride-based light emitting diodes with quaternary p-AHnGaN surface layersC. H.Kuo, S.J. Chang, G. C.Chi, K.T. Lam, and Y.S. Sun 2153-2155

Evaluation ofwavelength shifts ofgreen and blue light emitting diodes with InN/GaN

multiple quantum wells

Je Won Kim, Kyu Han Lee, and Sangsu Hong 2156-2159

Analysis of dependence of electroluminescence efficiency ofAlInGaN LED heterostructures

on pumpingI. V. Rozhansky and D. A. Zakheim 2160-2164

Light extraction process in moth-eye structure

H. Kasugai, K. Nagamatsu, Y. Miyake, A. Honshio, T. Kawashima, K. Iida, M. Iwaya,S. Kamiyama, H. Amano, I. Akasaki, H. Kinoshita, and H. Shiomi 2165-2168

Improvement of luminous intensity of InGaN light emitting diodes grown on hemispherical patternedsapphire

Jae-Hoon Lee, Jeong-Tak Oh, Jin-Sub Park, Je-Won Kim, Yong-Chun Kim, Jeong-Wook Lee,and Hyung-Koun Cho 2169-2173

Thermal analysis of GaN-based laser diode packageW.J. Hwang, T.H.Lee, O.H.Nam, H, K. Kim, J. S. Kwak.Y. J. Park, and M. W. Shin.

. . . 2174-2177

Analysis of optical loss on blue-violet laser diodes

J. K. Son, J. S. Hwang, S. N. Lee, T. Sakong, H. Paek, S. Chae, H. K. Kim, O. Nam, J. Y. Kim,Y. H. Cho, and Y. Park 2178-2181

Photoelectrochemical sidewall etching enhances light output power in GaN-based light emittingdiodes

C. F. Lin, J. J. Dai, R. PI. Jiang, J. H. Zheng, Z. J. Yang, C. C. Yu, and W. C. Lcc 2182-2186

Variation of thermal resistance with input power in LEDs

Lianqiao Yang, Jianzheng Hu, Lan Kim, and Moo Whan Shin 2187-2190

MOCVD of InGaN-based light emitting structures on silicon substrates with strain optimized bufferlayers using long Al pre-deposition

J.-Y. Clames, Ch. Giesen, T. Meyer, and M. Heuken 2191 2194

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Contents 1375

Comparative optical studies on violet InGaN quantum well laser diode structures grown

on sapphire and GaN substrates

J. S. Hwang, J. W. Choi, A. Gokarna, Y. H. Cho, J. K. Son, S. N. Lee, T. Sakong, H. S. Paek,0. H. Nam, and Y. Park 2195-2198

Comparison ofhigh quality GaN-based light-emitting diodes grown on alumina-rich spineland sapphire substrates

Frank Tinjod, Philippe de Mierry, David Lancefield, Sebastien Chenot, Eric Virey,Jennifer L. Stone-Sundberg, Milan R. Kokta, and Damien Pauwels 2199-2202

Carrier capture and escape processes in (In,Ga)N single-quantum-well diode under forward bias

condition by photoluminescence spectroscopyA. Satake, K. Soejima, H. Aizawa, and K. Fujiwara 2203-2206

Low resistance and highly reflective ohmic contacts top-type GaN using transparent interlayersfor flip-chip light emitting diodes

June-0 Song, J. S. Kwak, Hyun-Gi Hong, Ian T. Ferguson, and Tae-Yeon Seong 2207-2210

Investigation ofoptical-output-power degradation in 365-nm UV-LEDs

Takashi Mukai, Daisuke Morita, Masashi Yamamoto, Kazuyuki Akaishi, Kousuke Matoba,Katsuhiro Yasutomo, Yoshio Kasai, Masahiko Sano, and Shin-ichi Nagahama 2211-2214

Carrier confinement effect enhanced by AlGaN/GaN multi-quantum barrier in AlInGaN based highpower blue-violet laser diodes

Sung-Nam Lee, S. Y. Cho, K. H. Ha, K. K. Choi, T. Jang, S. H. Chae, H. K. Kim, H. S. Paek,Y. J. Sung,T. Sakong, J.K. Son.H. Y.Ryu, Y.H.Kim, E.Yoon, O.H.Nam, and Y.Park . . 2215-2218

Hexagonally-closed-packed micro-light-emitting diodes

H. W. Choi and S. J. Chua 2219-2222

Broadband spectrally dynamic solid state illumination sourceDavid B. Nicol, Ali Asghar, Shalini Gupta, Hun Kang, Ming Pan, Martin Strassburg,Chris Summers, and Ian T. Ferguson 2223-2226

First InGaN/GaN thin film LED using SiCOI engineered substrate

J. Dorsaz, B. Faure, J.-F. Carlin, M. Mosca, P. Gilet, F. Letertre, S. Bressot, H. Larheche,

andP.Bove 2227-2230

Magnetic properties

Growth ofFe doped semi-insulating GaN on sapphire and 4H-SiC by MOCVDM. Rudzinski, V. Desmaris, P. A. van Hal, J. L. Weyher, P. R. Hageman, K. Dynefors,T. C. R6dle, H. F. F. Jos, H. Zirath, and P. K. Larsen 2231-2236

Optical studies of MOCVD-grown GaN-based ferromagnetic semiconductor epilayers and devices

M. H. Kane, M. Strassburg, W. E. Fenwick, A. Asghar, J. Senawiratne, D. Azamat, Z. Hu,E. Malguth, S. Graham, U. Perera, W. Gehlhoff, A. Hoffmann, N. Dietz, C. J. Summers,and I. T. Ferguson 2237-2240

Investigation ofoptical phonons and electronic properties ofgroup III-V nitride multi quantum wells

by using far infrared magnetoplasmon spectroscopyS. Farjami Shayesteh, A. Rahmani, and T. J. Parker 2241-2245

Influence ofthe magnetic field on the effective mass of the two-dimensional electron gas

in ALGa, _,N/GaN heterostructures

N. Tang, B. Shen, M. J. Wang, Z. J. Yang, K. Xu, G. Y. Zhang, Y. S. Gui, B, Zhu, S. L. Guo,J. H. Chu, K. Hoshino, and Y. Arakawa 2246-2249

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1376 Contents

Magnetic, optical and electrical properties ofGaN and A1N doped with rare-earth element Gd

S. W. Choi, Y. K. Zhou, S. Emura, X. J. Lee, N. Teraguchi, A. Suzuki, and H. Asahi 2250-2253

Electronic devices

Performance ofAlGaN/GaN heterojunction FETs for microwave power applications (invited)

H.Miyamoto 2254-2260

An AlGaN/GaN two-color photodetector based on an AlGaN/GaN/SiC HEMT layer structure

M. Marso, A. Fox, G. Heidelberger, J. Bernat, and H. Ltith 2261-2264

Capacitance characterization ofAIN/GaN double-barrier resonant tunnelling diodes

A. M. Kurakin, S. A. Vitusevich, S. V. Danylyuk, A. V. Naumov, C. T. Foxon, S. V. Novikov,N. Klein, H. Ltith, and A. E. Belyaev 2265-2269

Hydrogen generation from aqueous water using n-GaN by photoassisted electrolysisKatsushi Fujii and Kazuhiro Ohkawa 2270-2273

Piezoelectric properties ofthin A1N layers for MEMS application determined

by piezoresponse force microscopyK. Tonisch, V. Cimalla, Ch. Foerster, D. Dontsov, and O. Ambacher 2274-2277

Narrow-band 400 nm MSM photodetectors using a thin InGaN layer on a GaN/sapphire structure

J. Ohsawa, T. Kozawa, O. Fujishima, and H. Itoh 2278-2282

GaN-based Schottky diodes for hydrogen sensing in transformer oil

Peter Sandvik, Elena Babes-Dornea, Anik Roy Trudel, Marius Georgescu, Vinayak Tilak,and Daniel Renaud 2283-2286

AlGaN metal-semiconductor-metal structure for pressure sensing applicationsZ. Hassan, Y. C. Lee, S. S. Ng, F. K. Yam, Y. Liu, Z. Rang, M. Z. Kauser, P. P. Ruden,and M. I. Nathan 2287-2290

Suppression ofgate leakage current in GaN MOS devices by passivation with photo-grown Ga2OjH.-M. Wu and L.-FI. Peng 2291-2294

Fabrication and characterization ofindium-tin-oxide/GaN visible-blind UV detectors

H. F. Lui, W. K. Fong, C. Surya, C.H.Cheung, and A. B. Djurisic 2295-2298

Fabrication and characterization ofNi-based Schottky-type AL.Gai _.VN ultraviolet photodetectors withdifferent buffer conditions

Ki Yon Park, Bong Joon Kwon, Jeong Hwan Son, and Yong-Hoon Cho 2299-2302

Screening ofpolarization induced electric fields in blue/violet InGaN/GaN laser diodes

by Si doping in quantum barriers revealed by hydrostatic pressure

G. Franssen, T. Suski, P. Perlin, R. Bohdan, A. Bercha, W. Trzeciakowski, I. Makarowa,R. Czernecki, M. Leszczynski, and I. Grzegory 2303-2306

Piezoresistive and piezoelectric effects in GaN

V. Tilak, A. Vertiatchikh, J. Jiang, N. Reeves, and S. Dasgupta 2307-2311

AlGaN/GaN/InGaN/GaN HEMTs with an InGaN-notch

J. Liu, Y. G. Zhou, J. Zhu, K. M. Lau, and K. J. Chen 2312-2316

Fligh temperature characteristics ofdoped channel AlGaN/GaN MIS-HFETs

with thin AlGaN barrier layerC. X. Wang, N. Maeda, M. Hiroki, Y. Yokoyama, T. Makimoto, T. Kobayashi, and T. Enoki 2317-2320

Influence of macro defects in SiC substrate on AlGaN/GaN HEMT DC characteristics

H. Sazawa, T. Mitani, H. Bang, K. Hirata, M. Kosaki, K. Furuta, T. Tsuchiya, K. Hikosaka,S. Nakashima, and H. Okumura 2321-2324

Page 16: 'International Conference on Nitride Semiconductors ; 6 ... · currenttopicsinsolidstatephysics Editor-in-Chief Martin Stutzmann WalterSchottkyInstitut, Technische UniversitatMOnchen,

Contents 1377

Quality and uniformity assessment ofAlGaN/GaN quantum wells and HEMT heterostructures grownby molecularbeam epitaxy with ammonia source

Y. Cordier, F. Pmvost, F. Semond, J. Massies, M. Leroux, P. Lorenzini, and C. Chaix 2325-2328

Low-frequency noise in AlGaN/GaN HEMT structures with A1N thin film layerS. A. Vitusevich, O. A. Antoniuk, M. V. Petrychuk, S. V. Danylyuk, A. M. Kurakin,A. E. Belyaev, and N.Klein 2329-2332

Schottky gate effects on transport properties ofAlo.35Gao.65N/GaN heterostructures

A. Asgari, M. Kalafi, and L. Faraone 2333-2337

High and low energyproton irradiation effects on AlGaN/GaN HFETs

G. Sonia, E. Richter, R. Lossy, M. Mai, J. Schmidt, M. Weyers, G. Trankle, A. Denker,J. Opitz-Coutureau, G. Pensl, I. Brauer, and H. P. Strunk 2338-2341

Advanced buffers for AlGaN/GaN HEMT and InGaN/GaN MQW on silicon substrates

Y. Dikme, M. Fieger, M. Eickelkamp, C. Giesen, E, V. Lutsenko, G. P. Yablonskii,A. Szymakowski, F. O. Jessen, A. Vescan, H. Kalisch, M. Heuken, and R. H. Jansen 2342-2345

Analysis of buffer-trapping effects on current collapse of GaN FETs

K. Horio, H. Takayanagi, and H. Nakano 2346-2349

An analytical model for GaN MESFET's using new velocity-field dependenceSneha Kabra, Harsupreet Kaur, Subhasis Haldar, Mridula Gupta, and R. S. Gupta 2350-2355

A surface trap model and its application to analysis ofIll-nitride HEMT performanceKirill A. Bulashevich and Sergey Yu. Karpov 2356-2359

Effect of epitaxial layer crystal quality on DC and RF characteristics

of AlGaN/GaN short-gate HEMTsK. Shiojima, T. Makimura, T. Maruyama, T. Suemitsu, N. Shigekawa, M. Hiroki,and H. Yokoyama 2360-2363

Ion implantation doping for AlGaN/GaN HEMTs

Muneyoshi Suita, Takuma Nanjo, Toshiyuki Oishi, Yuji Abe, and Yasunori Tokuda 2364-2367

Enhancement-mode AlGaN/GaN HEMTs on silicon substrate

Shuo Jia, Yong Cai, Deliang Wang, Baoshun Zhang, Kei May Lau, and Kevin J. Chen.... 2368-2372

AlGaN/GaN high-electron-mobility transistors on sapphire with Fe-doped GaN buffer layerby MOVPE

T. Aggerstam, M. SjSdin, and S. Lourdudoss 2373-2376

Further papers of Conference ICNS-6 are published in physica status solidi (a) 203, Nr. 7 (2006)

and physica status solidi (b) 243, No. 7 (2006).

physica status solidi (c) is indexed in Cambridge Scientific Abstracts; Chemical Abstracts; Engineering Index

Compendex; Google Scholar; Infotrieve ArticleFinder; INSPEC, Physics Abstracts; ISI Index to Scientific & Technical

Proceedings; OCLC WorldCat; PASCAL, ART!CLE@INIST; Scopus; VINITI.

DOI: The fastest way to find an article online is the Digital Object Identifier (DOI). DOIs are printed in the

header of the first page of every article. On the WWW, one can find an article for example with a DOI of

10.1002/pssc,200306190 at http://dx.doi.org/10.1002/pssc.200306190. Please use the DOI of the article to link

from your home page to the articles in Wiley Interscience. The DOI is a system for the persistent identification of

documents on digital networks, see www.doi.org.


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