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Plating for plastics

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    PLATING ON PLASTICS

    Roland P Brassard

    Bayer Corporation

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    Topics of Discussion

    Morphology of ABS and ABS / PC

    Preplate Technology

    Electroplate Technology

    Straight thru vs Bulk processing

    Principles of Electrochemistry

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    Transmission Electron

    Microscopy

    Polymer structure of ABS

    Polymer structure of ABS /PC

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    Scanning Electron Microscopy

    Etch Characteristics of ABS

    Etch Characteristics of ABS / PC

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    Plating Processes

    Straight Through

    Bulk Process

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    Straight Through Process

    Rack Plating

    Continuous Process from Start to Finish

    Minimum of Handling

    Less time consuming

    Most common method of Plating on Plastics Storage reduced

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    Bulk Processing

    Labor Intensive

    Storage facilities needed

    Handling difficulties

    Basket preplate

    Rack electroplate Accessory solutions

    Normally 2 platers

    Single type of Application

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    Preplate Technology

    Cleaners

    Pre-etchant

    Etchant

    Neutralizer

    Pre-Activator Activator

    Accelerator

    Electroless Copper or Nickel

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    Preplate Cleaners

    Can be Alkaline or Acidic

    Used as degreasers to remove smudges,

    oils,and fingerprints from the surface

    may contain surfactants

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    Preplate Pre-Etchants for ABS

    Usually Acidic in Nature

    Normally a dilute CRO3 / H2SO4 to

    initiate surface reactions and break the

    surface tension of the Plastic

    150-155 F 2 - 4 Minutes

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    Pre-Etchants for PC

    Can be either acidic or Alkaline

    Usually an Organic solvent mixture

    Necessary to pre swell the Polycarbonate

    to allow better attack of the Chromic /

    Sulfuric etchant on the rubber phase andcreate a good pore structure

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    Preplate Etchant

    Chromic Acid /Sulfuric Acid

    150 -160 F

    8-10 minutes

    55-70 ounces/gallon Chromic Acid

    15-17 % by volume Sulfuric Acid

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    Preplate Neutralizer

    Reduces any residual Hexavalent

    Chromium trapped in the pores.

    Prepares the surface for Activation

    of the Catalyst Hydrochloric (Muriatic) based

    Room Temperature to 110 F

    2-4 minutes

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    Preplate Activation or Catalysis

    Seeds the surface pore structure

    with a colloidal hydrosol of ionic

    Palladium surrounded with a Tin

    shell.

    Part absorbtion of the catalyst resultsin a color change.

    SKIP PLATE can be detected here.

    RT to 105F 2-6 minutes

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    Preplate Acceleration

    Normally an acidic solution or a

    Borohydryde which is used to remove

    a section of the TIN shell and expose

    the PALLADIUM particle to the surface

    Desensitizes the racks to prevent Plating

    of the vinyl coatings

    125 F 1-2 minutes

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    Preplate - Electroless Copper

    A Chemical Reduction Process

    Metallic Salt is reduced to form a

    film across the entire application

    giving enough electrical conductivity

    to allow an electrical current to beapplied for subsequent metallic layering

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    Preplate - Electroless Copper

    2 HCHO + 4 OH- > 2 HCOO- + 2 H20 +2H-

    2 H - + CU ++ > CU + H 2

    Copper Chloride,Formaldehyde,SodiumHydroxide, Chelators

    100 - 110 F 8-10 minutes

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    Preplate -Electroless Nickel

    Same principles as Electroless Copper

    Alkaline Solution

    reducing agent is Sodium Hypophosphite

    Room Temperature to 90 F

    6-10 minutes

    very stable solution

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    Electroplate Technology

    Copper Strike

    Acid Copper

    Semi- Bright Nickel

    Bright Nickel

    Particulate Nickel

    Decorative Chromium

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    Electroplating Cycle

    Interior Finish

    Copper strike

    Acid Copper

    Bright Nickel

    Decorative Chrome

    Exterior Finish

    Copper Strike

    Acid Copper

    Semi Bright Nickel

    Bright Nickel Particulate Nickel

    Decorative Chrome

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    Copper or Nickel Strike

    First Electrolytic Coating

    Low Current Amperage

    Coating Buildup as lattice work is forming

    Copper Sulfate + Sulfuric Acid + Water

    with or without Brighteners

    80 F 3-5 minutes

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    Electroplate -Bright Acid Copper

    Thickest Single Coating 0.7-0.8 mils

    Very Ductile Coating

    Ability to Flex under temperature change

    during Thermocycling

    Excellent leveling

    Copper Sulfate + Sulfuric Acid + Water

    Brightener System

    80 F 22-45 minutes

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    Electroplate-Semi Bright Nickel

    Second Thickest Coating 0.5 mils

    more ductile than bright nickel

    protects the underlying Copper from

    oxidation

    Nickel Sulfate,Nickel Chloride,Water

    Boric Acid,Brightener system

    130 F 15-30 minutes

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    Electroplate - Bright Nickel

    Coating Thickness of 0.3 mils

    Gives Bright Mirror Like Finish

    Highly Corrosive due to the Brightener

    system (highly sulfonated)

    Not very ductile

    Same components as Semi Bright Nickel

    concentrations different as are brighteners

    130 F 10-20 minutes

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    Electroplate - Particulate Nickel

    Required Coating for Automotive and

    Plumbing Applications for Corrosion

    Protection

    Coating Thickness of 0.1 mil

    130 F 3-5 minutes

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    Electroplate - Decorative Chrome

    Final Coating in the Electroplating Process

    Thinnest Layer 0.01 mils

    Corrosion resistant

    Hardness

    Not ductile

    Hexavalent or Trivalent Chrome

    High Currents needed

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    Electroplate-Decorative Chrome

    Cathodic Reactions

    CR2O7= +14 H+ +12 (e) > 2CRo + 7 H2O

    Side Reactions

    2 H+ 2 (e) > H2

    CR2O7= + 14 H ++6(e) > 2CR++++7H20

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    Service Requirements

    Adhesion of the Metal Plate to Substrate

    Appearance / type of finish required

    Thermocycle

    CASS test

    Canadian Standards

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    Racking Techniques

    Enough contacts located in inconsequential

    areas are necessary to distribute the

    electrical current evenly

    Design of the application will warrant

    whether auxillary anodes are necessary

    for proper coverage

    Factors influencing Plate

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    Factors influencing Plate

    Distribution

    Geometry of Application being Plated

    Location of the part in reference to

    1.anodes

    2.adjacent parts

    3.tank walls

    4.Plating Solution Characteristics

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    Auxilliary Anodes

    Used promarily to give a bright

    mirror like finish to areas normally

    not capable of due to design

    Increases plate distribution to these

    areas

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    Shields

    Used to limit the current distribution

    at high current areas: primarily edges


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