Fujii, H.; Kumakiri, T, et al. Water cooling a r rangement for gas phase (including vapor arc) deposition chamber uses rotating vertical cylinders.
ISLAND COATED PART, METHOD FOR PRODUCING THE S A M E , A N D APPARATUS C O M P R I S I N G THE S A M E EP 1435401 (Tosoh Corp.) Kohgo, M.; Matsunaga, 0., et al. Means for prevent ing dust or metal flake contaminat ion from plasma deposited coatings, which par t ly lift or blister. A textured glass surface traps such particu- late matter.
POWDER COATED WITH T I T A N I A F ILM A N D METHOD FOR ITS PRODUCTION EP 1435402 (Nittetsu Mining Co. Ltd.) Atarashi, T; Nakatsuka, K., et al. A ti tania film-coated powder com- prising a base particle with at least one t i tania film, wherein the base particle is coated with the t i t an ia film by suspending the base particle in a buffer solution having a pH from 7 to 12 to obtain a suspension, and adding a hydrogen peroxide-ammonia mix- ture solution containing peroxoti- tanic acid to the suspension to thereby regulate a t i tania deposi- tion reaction induced by decom- position of the peroxotitanic acid in the suspension.
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