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Presentation3 - Inteldownload.intel.com/pressroom/kits/events/idffall_2007/KeynoteOtelli… ·...

Date post: 20-May-2020
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SourceSource DrainDrain

Low Resistance LayerLow Resistance Layer

Silicon SubstrateSilicon Substrate

>20% Performance Increase

>10X Gate Leakage Reduction

HighHigh--K Gate DielectricK Gate DielectricMetal GateMetal Gate

IntelIntel’’s Unique Solutions Unique SolutionHighHigh--K Metal Gate 45nmK Metal Gate 45nm TransistorTransistor


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