Progress on DPP source development towards HVM light to new dimensions… Progress on DPP source...

Taking light to new dimensionsTaking light to new dimensions……

Progress on DPP source development towards HVM

Masaki YoshiokaXTREME technologies GmbH

2007 International Symposium on Extreme Ultraviolet Lithography29-31 October 2007Sapporo, Japan

XTS 13-150 IF

20020077 International Symposium on Extreme Ultraviolet LithographyInternational Symposium on Extreme Ultraviolet Lithography, , 2929 –– 3131 October 200October 20077, , Sapporo, JapanSapporo, Japan Page Page 22


OutlineOutline

1. Progress on commercial Xe sources2. HVM source development and Roadmap3. Summary



XTREME leads installed EUV sources in the field

• Integrated metrology tools provide for reliable operation with constant source characteristics

• Performance results and improvements benefit from partnering with key component suppliers and feedback received from customers

• 6 DPP sources in use for wafer exposures• 10 DPP sources operated for EUV research• XTS13-150 IF has been successfully

integrated at customer side

XTS13-150IFXTS13-75IFXTS13-352003 2006 2007



DPP source is an integration of crucial key components

DMTDMT

ElectrodesElectrodes cooling, Preionization control,gas supplying etc

Vacuum control, Gas supply, optical alignment etc.

Vacuum control, contamination controloptical alignment etc.

XTREME has provided integrated performance of SoCoMo

HVPSHVPScooling,

Preionization control

Collector opticsCollector optics

IF power and imageIF power and image

Integrated performance needs fundamental study and feedback received from customers

VacummVacumm Tech.Tech.



(identical scale & total power)

Optical source model permits reliable calculations:Collection efficiency reproduced within 10%SoCoMo Far Field simulations

Source Model Enables Reliable Ray Tracing Simulations

Pinch, measured Pinch, ZEMAX® model

Key objective: model to reproduce spatial plasma power distribution



SoCoMo Ray Tracing Allows Far Field Predictions

Point like source Extended source

Effect of extended source vs. point like source:• Collector efficiency drop 15.9% 8.8%• DMT transmission drop 87.8% 83.2%Extended source prediction confirmed by measurements



Point like source Extended pinch like source

VIS Test Stand Strongly Supports Optical Performance Optimization

• Measurements with different source geometry• Characterization of individual and convoluted contributions of collector and DMT

to far field uniformity• Efficiently used for optimization of far field imaging performance



Successful Introduction of New Basic EUV Metrology

EUV-reflectometer realized by LZH• Full collector acceptance• Collector reflectivity accuracy < 2 %• Collector/DMT characterization capability• Keying XTS 13-150 SoCoMo optical performance

Intensity distribution of full collector behind source point

SO-05: U. Hintze et.al., EUV Source Collectors: Characterization of Performance and Lifetime using a Full Size EUV Collector Reflectometer



Electrode Lifetime Extension Improves Downtime and CoO

0 100 200 300 400 500 600

Total Pulses (Mio)

Col

lect

ion

effic

ienc

y (a

rb. u

nits

)• Electrode lifetime extension achieved by design improvements• Cathode lifetime 500M and anode lifetime >4B demonstrated• CE fluctuations can be compensated by energy control

No power stabilization applied during test



XTS 13-150 IF: EUV Power @IF vs. source power

• These are real IF powers, which have been measured and NOT scaled! • Up to 4W achieved in 100% duty cycle operation• Collection efficiency almost independent on source parameters (e.g.

repetition rate, buffer gas flow)

1

2

3

4

50 100 150 200 250

EUV pinch power, W in 2pi

EUV

pow

erin

IF, W



• Current Output power @ IF (3 W level) is limited by component lifetime considerations

• Experimental results on improved components evidence output power capability of 7W @IF

• Output power improvement to 4-5W expected in December 2007

• 7W evidence until Q2/2008

XTS 13-150 IF Power Status and Roadmap

0

2

4

6

8

TODAY Q1/2008 Q3/2008

Pow

er [W

]



OutlineOutline

1. Progress on commercial Xe sources2. HVM source development and Roadmap3. Summary



XTREME Develops LA RDE as Promising Technology

• Tin supply regenerates electrode surface and serves as fuel

• increases effective electrode area• reduces heat load per area • increases electrode lifetime

Laser Assisted DPP source with Rotating Disk Electrodes (RDE)



overall

useable (energy content in ø 1.3 mm)

0 2 4 6 8 10 12 14 16 18 200

40

80

120

160

200

240

280

E EU

V[2π s

r,2%

bw] /

mJ

Ein / J

LA RDE Exhibits Scaling Issues with surface evaporation

ø = 1.3 mm

ø = 1.3 mm

Usable energy saturatesat input energies of about 8J



Adding Tin Droplet to LA RDE Solves Saturation Issue

Laser assisted droplet RDE design provides;

• higher brightness plasma • mass limited tin fuel

supply independent of electrode material and electrode surface regeneration

• superior scaling possibilities

• large collecting angles feasible

Droplet Technology brings Advantage over Surface Evaporation



ø = 1.3 mm

ø = 1.3 mm

High pulse energy while maintaining a small emitting volume – the key to scalable of highpower

LA Droplet RDE Source provides High Power for HVM

overall

useable(energy contentin ø 1.3 mm)

0 2 4 6 8 10 12 14 16 18 200

40

80

120

160

200

240

280

Ein / J

E EU

V[2π

sr,2

%bw

] / m

J

No saturation of usable energy detected for up to 14J



Visible image of the plasma showing a potentially large opening angle of the electrode arrangement

ø = 1.3 mm

EUV in-band picture of the same pulse

Electrodesurface

LA Droplet RDE Source allows for Large Collection Angle



Comparison between surface evaporation and droplet injection

surface evaporation

droplet evaporation

useable(energy contentin ø 1.3 mm)

Ein / J

overall

0 2 4 6 8 10 12 14 16 18 200

40

80

120

160

200

240

280E E

UV

[2π s

r,2%

bw] /

mJ

LA RDE with Tin Droplets makes available LPP scalingadvantages on robust and proven DPP Technology



OutOutlook and EUV look and EUV power power demonstration demonstration

Experimental result strongly support scalability.600W in source power @5kHz will be demonstratedby end of December 2007

0,0 0,5 1,0 1,5 2,00

50

100

150

200

250

Pow

er /

W /

2πsr

Repetition rate / kHz

Experimental installation

Output power: 200 W/ 2πsr at 1.4 kHzConstant conversion efficiency



Key componeKey componentsnts development for HVM DPP development for HVM DPP

•• Droplet system is fundamentally established and Droplet system is fundamentally established and continuously improvecontinuously improvedd for practical usefor practical use

•• Adding new functions onto similar DMT concept Adding new functions onto similar DMT concept of Xe DPP sourceof Xe DPP source

•• ScalScaling fing for higher power metrolor higher power metroloogy toolsgy tools



DPP EUV sources: DPP EUV sources: Power status and HVM power roadmapPower status and HVM power roadmap

CurrentlyStatus 10/2007

1st generation

HVM

2nd generation

HVM

3rd generation

HVM

Electrical input energy into plasma (J) 10 10

7

62.5

15 20

Repetition frequency (kHz) 1.5 10 10

Intermediate focus power (W) 6.4 (1) 178.5 238

(1) calculated for existing collector mirror



SummarySummary

Commercial Xe sources• Output power @ IF currently 3 W level• Improvement to 7 W level ongoing according to our roadmap

HVM source development• The new concept of laser assisted droplet RDE source has

demonstrated its intrinsic performance• Thermal management of RDE combined with droplet target

supply strognly supports the path to HVM• Demonstration of 600 W power in 2π sr by end of 2007 will enable

XTREME technologies to commit for a Beta Level SoCoMo with 50 W IF power in 2008 according to our HVM power roadmap

DPP source provides a cost effective solution for HVM!



• Research supported by – German Government / BMBF under contracts no. 13N8866 – European Commission FP6 project „more Moore“, IST-1-507754-IP

• Thanks to the teams at XTREME technologies and our partners for their contribution and support

– Institute for Optics and Fine Mechanics, Jena, Germany– Laser Zentrum Hannover, Germany– Laser Laboratorium Göttingen, Germany– Media Lario Technologies, Italy– TRINITI, Troitsk, Russia– JENOPTIK, Jena, Germany– USHIO, Tokyo, Japan

Acknowledgements

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Progress on DPP source development towards HVM light to new dimensions… Progress on DPP source...

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