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7/29/2019 Roadmap for Future Semicnductor Development From Itswjs
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Fraunhofer IZM, Germany 23.05.2011
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Fraunhofer IZM
ITRS Packaging Roadmap
M. Jrgen Wolf
Fraunhofer IZM,Berlin, Dresden, Germany
Fraunhofer IZM
M.J. Wolf
Moores Law
The observation made in 1965 by Gordon Moore,co-founder of Intel, that the number of transistorsper square inch on integrated circuits haddoubled every year since the integrated circuitwas invented. Moore predicted that this trend
would continue for the foreseeable future.
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Interacting with peopleand environmentNon-digital contentSystem-in-Package (SiP)
Moores Law Scaling can not maintain the Pace of
Progress and Packaging enables equivalent Scaling
BeyondCMOS
InformationProcessingDigital content
System-on-Chip(SOC)
Biochips
Fluidics
Sensors
Actuators
HV
PowerAnalog/RF Passives
More than Moore :
Functional Diversification
130nm
90nm
65nm
45nm
32nm
..22nm
More
Moore:
Scaling
Baseline CMOS:CPU, Memory, Logic
Fraunhofer IZM
M.J. Wolf
Technology Scenario Driven by Applications
DevicesDevices
RequiredRequired TechnologiesTechnologies 3D integration with stacked Si devices / MPU, Memory Si-interposer with TSV and integrated passive devices High density and capacity memories Electrical /optical interconnect Multi-functional board with embedded components Heterogenous integration of sensors, memory, processors
and power supply
Energymanagement
Efficient powersupplies and
intelligent stand-by solutions Power IC packaging Digital power
conversion Lighting
Ultra-small sensor nodesfor car networks
Tire Pressure MonitoringSystem (TPMS),
Driver assistance Car-to-car/road
communication sensors and actuators for
air and fuel injection
Parallel processor, architecture 3D MPUs, GPUs Advanced sensor nodes Distributed Sensor Networks
Transport &Transport &MobilityMobility
Energy &Environment
Security &Safety
Communication& Consumer
Electronics
Healthmonitoringsystems
Neural implants
Hearing devices Visual aids
Image sensors Admission control Biometrical control
systems
RFID systems
Navigation systems Wireless
communication Localization
Portable TV
ApplicationsApplications
Health &Care
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ITRS Roadmapping www.itrs.net
At this time of major shifts in market and technology, ITRS servesthe role of up-to-date knowledge base for industry, academia,and research institutes.
The ITRS roadmap is a touchstone for industry roadmaps. ITRSwould then be a first stop for people who wish to learn aboutthe directions and roadblocks for both near term and long terminto the future.
Industry can us the roadmap to build their own companyroadmaps.
Academia and Research Institutes can us it to validate the
selection and pacing of new technologies in to the future.
Fraunhofer IZM
M.J. Wolf
Forces of Change
Global Consumer Market Functions & Cost
Technology Convergence More Moore & More than Moore
Packaging has become the crucial link in the supply chain
Technology Landscape
Redefining WB & FC
New Architectures
WLP going main stream
Embedded technologies
SiP + 3D
ITRS Roadmap Assembly and Packaging
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SiP - System in Package
Horizontal Placement
S tacked
S tructure
Interposer Type
Interposer-less
Type
Wire Bonding T ype Flip Chip Type
Wire Bonding
Type
Wire Bonding +
Flip Chip Type Flip Chip Type
Terminal Through Via T ype
Embedded S tructure
Chip(WLP) Embedded +
Chip on Surface Type
3D Chip Embedded
Type
WLP E mbedded + Chip on
S urface Type
PiP, PoP and more
Fraunhofer IZM
M.J. Wolf
System-in-Package Requirements
Year of Production 2009 2011 2013 2015 2017
Number of terminalslow cost handheld 800 900 1000 1000 1000
Number of terminalshigh performance(digital)
3350 3684 4053 4458 4904
Number of terminalsmaximum RF 200 200 200 200 200
Low cost handheld / #die / stack 9 11 13 14 15
high performance / die / stack 3 4 5 5 6
Low cost handheld / #die / SiP 9 12 14 14 15
high performance / #die / SiP 6 7 8 8 9
Minimum component size (micron)400x200
400x200
200x100
200x100
200x100
Minimum TSV pitch 6 4 3,6 3,3 2,9
TSV maximum aspect ratio** 10 10 10 10 10
TSV exit diameter(um) 3 2 1,8 1,6 1,5
TSV layer thickness for minimum pitch 15 10 10 8 8
Reflow temperature for Pb free (C) 245 245 220 200 180
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Packaging Global Changes
2010Year of Wafer Level Packaging
WLCSP Shipment Growth - 25%
WLCSP Fanout High Volume Shipment
TSV + Silicon InterposersEmbedded Technologies
Source: W.Chen, ASE
Fraunhofer IZM
M.J. Wolf
Growth of Wafer Level Chip Scale Packages (WLCSP)
Year 2000 WLCSPs were small, low I/O, expensive, and with limitedmanufacturing infrastructures
On Semi Analog -ASE
TI Nanostar Digital - ASE
Vishays Power MOSFET TechSearch
Year 2010 Billions shipped, >300 I/Os, Established infrastructure,with high volume manufacturing
Broadcom 182L 6.5x6.5WLCSP ASE
Fujitsu Power Management WLCSP308 L 7.7x7.7mm-TechSearch - TPSS
Qualcomm 169L WLCSP ASE
361 L WLCSP ASE
Infineon BAW filters TechSearch
Source: W.Chen, ASE
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Form Factor & MiniaturizationReduced volume and weightReduced footprint
PerformanceImproved integration densityReduced interconnect lengthImproved transmission speedReduced power consumption
Heterogeneous Integration & FunctionalityMixed functional Integration
MEMS, Optical, AD SP, Transceiver
Manufacturing Cost Reduction
Driving ForcesDriving Forcesfor 3D SiP
Fraunhofer IZM
M.J. Wolf
Generations of 3D Packaging / 3D System Integration
We are at the doorstep of the largest shift in thesemiconductor industry ever, one that will dwarfthe PC and even the consumer electronics era".
Dr. Chang-Gyu, Samsung
Package on Package (POP) Stacked Die 3D ICPackage on Package (POP) Stacked Die 3D IC
Ref. B Chen
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3D TSV Roadmap
Source: Yole
Fraunhofer IZM
M.J. Wolf
Wafer-Level-Package for Optical Applications
Tapered Vias & Streets
controlled sidewall angle for sribe line
controlled sidewall angle for via holes
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Si TSV Interposer RF Module
Dimension 7,5mm x 8 mm
RF Mobile Transceiver (2,4 x 3,6 mmSnAg Solder Bumps (diameter: 50 m)Si Carrier (300 m thickness)TSV (8x8x 300 m)RDL Cu 20 m line /spaceSolder Balls (diam. 250 m /500 m pitch)
F. Binder, IFX
Fraunhofer IZM
M.J. Wolf
3D TSV Approaches
Wafer Level (BE)Wafer Level (BE)Circuit Level (FE)Circuit Level (FE)
Die2Wafer Stacking(w/o TSV)
W2W Stacking (w TSV)
- Si Interposer w TSV -
Thin Chip Integration (TCI)
Package /Board LevelPackage /Board Level
Stacked Package
Folded Substrate
Die in Board Embedding(CiP)
Die in Flex Embedding
Embedded Wafer Level Packaging(eWLP)
Stacked device layer TSV & Stack formation
--- IC devices w TSV ---
Via First
Via Middle
Via Last
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Interposer Technology
Source:Yole
Fraunhofer IZM
M.J. Wolf
3D System Architectures TSV Interposer
Interposer with embeddeddevices in RDL
Interposer with TSV & stackeddevices (w TSV)
Stacked modular Interposer w. TSV
Silicon interposer as device carrier
between devices and package / boardfor high IO count and high
interconnect density (multi-layer (RDL),
5-10 m line/space)
RDL:T.W/CuTop Die(190m)
Base -Die
embeddeddie(35m) interconnection:TiW/Cu
RDL:T.W/CuTop Die(190m)
Base -Die
embeddeddie(35m) interconnection:TiW/Cu
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Through Silicon Via Interposer / HD-Multi Device Carrier
Cu-TSV (> 10000/cm)
High density Multi-LayerRedistribution (4 L Cu)
Flip chip compatible IO-Pads
Cu-Pillar Bumps
SnAg Micro Solder Bumps
Fraunhofer IZM
M.J. Wolf
Chip Interconnection
Technology:
Solder, IMC, Cu-Cu, Nano-Interconnects
Bonding (reflow, TC)
Stacking (D2W, D2W)
Interconnect structure (Cu, ...)
Challenges:
Low temperatur bonding
fluxfree, self alignment
Bonding on carrier vs. wafer
Reliability, test, repair
Productivity, throughput, yield
Bottom Device
Al
Top-Chip(17 m)
Cu
Cu
Cu3Sn
AlILD
12 m
Bottom Device
Al
Top-Chip(17 m)
Cu
Cu
Cu3Sn
AlILD
12 m
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TSV-Interposer
Silicon Interposer Apps#1: high TSV count (>10000/vm)high density TSV (5-10m),small pitch (50m -20m)high density Line/Spacemultilayer front/back side (#4)electrical & optical Interconnect
Silicon Interposer Apps#2: med. TSV countmed. TSV (10-20m), pitch (>100 m)ASR (5-15)multilayer front/back sideMEMS integrationCu pillar interface to board/package
Potential: passive device integrationoptical interconnectsheterogeneous device integration (e.g. TX, MEMS),e.g. thin chip integrationthermal management (cooling)
Fraunhofer IZM
M.J. Wolf
Tera-scale Computing
Ref. B Bottems, ITRS
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Roadmap - 3D WL System Integration
Year
eWLPeWLPeWLPeWLP
Stacked TCI w TSV
IPD & RDL
Controller /Memory Stacks
3D Interposerw. Cooling
2006 2007 2010 2012 201420092008
3DInterconnectComplexity
2005
3D CPUs
3DInterconnectComplexity Functional
LayeredStack eGrain
eWLP
HDI TSV Interposer
Hetero Integration
3D TCT/TSV
eWLPw TMV
WLP w. TSV
Stacked Memory onTSV Interposer
3D Image Sensors
Fraunhofer IZM 08/2009
Fraunhofer IZMResearch Center ofMicroperiphericTechnologies
Photonic Packaging @ ITRS
Packaging of optoelectronic and MEMS components has beentreated by ITRS in the section ASSEMBLY AND PACKAGINGunder packaging for specialized functions
Optoelectronics packaging covers an expanding range of newtechnical requirements depending on their applications.
Examples of optoelectronic packages and their applications arepresented
There are many difficult challenges remaining for opticalpackaging and they will become increasingly critical as theoptical communication gets ever closer to the chip.
A list of these challenges, technology requirements, potentialsolutions and the Cross TWG are presented.
Review of Packaging of Optoelectronic,Photonic, and MEMSComponents IEEE JSTQE (2011)DOI:10.1109/JSTQE.2011.2113171
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Fraunhofer IZMResearch Center ofMicroperiphericTechnologies
Silicon Photonics Packaging Concepts by Fraunhofer IZM
Smart-Pack for (de)multiplexing
Generic-Pack for multiport electrooptic SOI
T. Tekin, H. Schroeder, L. Zimmermann, P. Dumon, W. Bogaerts "Fibre-array optical interconnection for silicon photonics" Proc. of ECOC, Vol. 5, pp. 93-94 (2008).L. Zimmermann, T. Tekin, H. Schroeder, P. Dumon, W. Bogaerts. "How to bring nanophotonics to application - silicon photonics packaging". LEOS Newsletter December 2008.
Fraunhofer IZMResearch Center ofMicroperiphericTechnologies
Silicon Photonics Packaging Design Rules
Established Silicon PhotonicsPackaging Design Rules aresummarized in following fields:
Fiber Pigtailing
Flip-Chip & Die Bonding
Wire Bonding
Available
www.izm.fraunhofer.de/EN/abteilungen/siit/technology/photonic/spic.jsp
Hall C1 Booth 312
uv-curingepoxy
fiber-array
SOI chip
uv-curingepoxy
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Summary
Assembly & Packaging is converting into complex systemIntegration Technology
ITRS /A&P helps and supports to identify major newdevelopments directions and specifications with respect tothe targets of new product generations
3D System Integration (A&P) is an key enabler for theHeterogenous Integration of MEMS, MOEMs, MPUs,ASICs, Memories
Fraunhofer IZM
M.J. Wolf
Wafer Level All Silicon System IntegrationWafer Level All Silicon System Integration -- ASSID @ FhG IZMASSID @ FhG IZM
IZM / ASSID develops leading edge technologies for 3D-WLSystem-Integration and provide solutions ready for productintegration to industrial partners.
IZM / ASSID offers capacity and support for equipment andmaterial evaluation to semiconductor industry.
IZM / ASSID offers services by using qualified processcapacities and demonstrate stable processes on a 300mmTSV process line.
Fraunhofer IZM vision is to integrate heterogeneous chip
functionalities into one package (SiP) by using enhanced 3D-
integration, assembly and interconnect technologies.
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Fraunhofer IZM
M.J. Wolf
THANK YOU FOR YOUR ATTENTION
Acknowledgement:TWG A&P ITRSFraunhofer IZM, TU BerlinIFX, GF, NXP, ASE, Philips,Joule, EMC3D
Contact:
M. Juergen [email protected]
Fraunhofer IZMAll rights: