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Roadmap for Future Semicnductor Development From Itswjs

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    Fraunhofer IZM, Germany 23.05.2011

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    Fraunhofer IZM

    ITRS Packaging Roadmap

    M. Jrgen Wolf

    Fraunhofer IZM,Berlin, Dresden, Germany

    [email protected]

    Fraunhofer IZM

    M.J. Wolf

    Moores Law

    The observation made in 1965 by Gordon Moore,co-founder of Intel, that the number of transistorsper square inch on integrated circuits haddoubled every year since the integrated circuitwas invented. Moore predicted that this trend

    would continue for the foreseeable future.

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    Interacting with peopleand environmentNon-digital contentSystem-in-Package (SiP)

    Moores Law Scaling can not maintain the Pace of

    Progress and Packaging enables equivalent Scaling

    BeyondCMOS

    InformationProcessingDigital content

    System-on-Chip(SOC)

    Biochips

    Fluidics

    Sensors

    Actuators

    HV

    PowerAnalog/RF Passives

    More than Moore :

    Functional Diversification

    130nm

    90nm

    65nm

    45nm

    32nm

    ..22nm

    More

    Moore:

    Scaling

    Baseline CMOS:CPU, Memory, Logic

    Fraunhofer IZM

    M.J. Wolf

    Technology Scenario Driven by Applications

    DevicesDevices

    RequiredRequired TechnologiesTechnologies 3D integration with stacked Si devices / MPU, Memory Si-interposer with TSV and integrated passive devices High density and capacity memories Electrical /optical interconnect Multi-functional board with embedded components Heterogenous integration of sensors, memory, processors

    and power supply

    Energymanagement

    Efficient powersupplies and

    intelligent stand-by solutions Power IC packaging Digital power

    conversion Lighting

    Ultra-small sensor nodesfor car networks

    Tire Pressure MonitoringSystem (TPMS),

    Driver assistance Car-to-car/road

    communication sensors and actuators for

    air and fuel injection

    Parallel processor, architecture 3D MPUs, GPUs Advanced sensor nodes Distributed Sensor Networks

    Transport &Transport &MobilityMobility

    Energy &Environment

    Security &Safety

    Communication& Consumer

    Electronics

    Healthmonitoringsystems

    Neural implants

    Hearing devices Visual aids

    Image sensors Admission control Biometrical control

    systems

    RFID systems

    Navigation systems Wireless

    communication Localization

    Portable TV

    ApplicationsApplications

    Health &Care

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    ITRS Roadmapping www.itrs.net

    At this time of major shifts in market and technology, ITRS servesthe role of up-to-date knowledge base for industry, academia,and research institutes.

    The ITRS roadmap is a touchstone for industry roadmaps. ITRSwould then be a first stop for people who wish to learn aboutthe directions and roadblocks for both near term and long terminto the future.

    Industry can us the roadmap to build their own companyroadmaps.

    Academia and Research Institutes can us it to validate the

    selection and pacing of new technologies in to the future.

    Fraunhofer IZM

    M.J. Wolf

    Forces of Change

    Global Consumer Market Functions & Cost

    Technology Convergence More Moore & More than Moore

    Packaging has become the crucial link in the supply chain

    Technology Landscape

    Redefining WB & FC

    New Architectures

    WLP going main stream

    Embedded technologies

    SiP + 3D

    ITRS Roadmap Assembly and Packaging

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    SiP - System in Package

    Horizontal Placement

    S tacked

    S tructure

    Interposer Type

    Interposer-less

    Type

    Wire Bonding T ype Flip Chip Type

    Wire Bonding

    Type

    Wire Bonding +

    Flip Chip Type Flip Chip Type

    Terminal Through Via T ype

    Embedded S tructure

    Chip(WLP) Embedded +

    Chip on Surface Type

    3D Chip Embedded

    Type

    WLP E mbedded + Chip on

    S urface Type

    PiP, PoP and more

    Fraunhofer IZM

    M.J. Wolf

    System-in-Package Requirements

    Year of Production 2009 2011 2013 2015 2017

    Number of terminalslow cost handheld 800 900 1000 1000 1000

    Number of terminalshigh performance(digital)

    3350 3684 4053 4458 4904

    Number of terminalsmaximum RF 200 200 200 200 200

    Low cost handheld / #die / stack 9 11 13 14 15

    high performance / die / stack 3 4 5 5 6

    Low cost handheld / #die / SiP 9 12 14 14 15

    high performance / #die / SiP 6 7 8 8 9

    Minimum component size (micron)400x200

    400x200

    200x100

    200x100

    200x100

    Minimum TSV pitch 6 4 3,6 3,3 2,9

    TSV maximum aspect ratio** 10 10 10 10 10

    TSV exit diameter(um) 3 2 1,8 1,6 1,5

    TSV layer thickness for minimum pitch 15 10 10 8 8

    Reflow temperature for Pb free (C) 245 245 220 200 180

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    Packaging Global Changes

    2010Year of Wafer Level Packaging

    WLCSP Shipment Growth - 25%

    WLCSP Fanout High Volume Shipment

    TSV + Silicon InterposersEmbedded Technologies

    Source: W.Chen, ASE

    Fraunhofer IZM

    M.J. Wolf

    Growth of Wafer Level Chip Scale Packages (WLCSP)

    Year 2000 WLCSPs were small, low I/O, expensive, and with limitedmanufacturing infrastructures

    On Semi Analog -ASE

    TI Nanostar Digital - ASE

    Vishays Power MOSFET TechSearch

    Year 2010 Billions shipped, >300 I/Os, Established infrastructure,with high volume manufacturing

    Broadcom 182L 6.5x6.5WLCSP ASE

    Fujitsu Power Management WLCSP308 L 7.7x7.7mm-TechSearch - TPSS

    Qualcomm 169L WLCSP ASE

    361 L WLCSP ASE

    Infineon BAW filters TechSearch

    Source: W.Chen, ASE

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    Form Factor & MiniaturizationReduced volume and weightReduced footprint

    PerformanceImproved integration densityReduced interconnect lengthImproved transmission speedReduced power consumption

    Heterogeneous Integration & FunctionalityMixed functional Integration

    MEMS, Optical, AD SP, Transceiver

    Manufacturing Cost Reduction

    Driving ForcesDriving Forcesfor 3D SiP

    Fraunhofer IZM

    M.J. Wolf

    Generations of 3D Packaging / 3D System Integration

    We are at the doorstep of the largest shift in thesemiconductor industry ever, one that will dwarfthe PC and even the consumer electronics era".

    Dr. Chang-Gyu, Samsung

    Package on Package (POP) Stacked Die 3D ICPackage on Package (POP) Stacked Die 3D IC

    Ref. B Chen

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    3D TSV Roadmap

    Source: Yole

    Fraunhofer IZM

    M.J. Wolf

    Wafer-Level-Package for Optical Applications

    Tapered Vias & Streets

    controlled sidewall angle for sribe line

    controlled sidewall angle for via holes

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    Si TSV Interposer RF Module

    Dimension 7,5mm x 8 mm

    RF Mobile Transceiver (2,4 x 3,6 mmSnAg Solder Bumps (diameter: 50 m)Si Carrier (300 m thickness)TSV (8x8x 300 m)RDL Cu 20 m line /spaceSolder Balls (diam. 250 m /500 m pitch)

    F. Binder, IFX

    Fraunhofer IZM

    M.J. Wolf

    3D TSV Approaches

    Wafer Level (BE)Wafer Level (BE)Circuit Level (FE)Circuit Level (FE)

    Die2Wafer Stacking(w/o TSV)

    W2W Stacking (w TSV)

    - Si Interposer w TSV -

    Thin Chip Integration (TCI)

    Package /Board LevelPackage /Board Level

    Stacked Package

    Folded Substrate

    Die in Board Embedding(CiP)

    Die in Flex Embedding

    Embedded Wafer Level Packaging(eWLP)

    Stacked device layer TSV & Stack formation

    --- IC devices w TSV ---

    Via First

    Via Middle

    Via Last

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    Interposer Technology

    Source:Yole

    Fraunhofer IZM

    M.J. Wolf

    3D System Architectures TSV Interposer

    Interposer with embeddeddevices in RDL

    Interposer with TSV & stackeddevices (w TSV)

    Stacked modular Interposer w. TSV

    Silicon interposer as device carrier

    between devices and package / boardfor high IO count and high

    interconnect density (multi-layer (RDL),

    5-10 m line/space)

    RDL:T.W/CuTop Die(190m)

    Base -Die

    embeddeddie(35m) interconnection:TiW/Cu

    RDL:T.W/CuTop Die(190m)

    Base -Die

    embeddeddie(35m) interconnection:TiW/Cu

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    Through Silicon Via Interposer / HD-Multi Device Carrier

    Cu-TSV (> 10000/cm)

    High density Multi-LayerRedistribution (4 L Cu)

    Flip chip compatible IO-Pads

    Cu-Pillar Bumps

    SnAg Micro Solder Bumps

    Fraunhofer IZM

    M.J. Wolf

    Chip Interconnection

    Technology:

    Solder, IMC, Cu-Cu, Nano-Interconnects

    Bonding (reflow, TC)

    Stacking (D2W, D2W)

    Interconnect structure (Cu, ...)

    Challenges:

    Low temperatur bonding

    fluxfree, self alignment

    Bonding on carrier vs. wafer

    Reliability, test, repair

    Productivity, throughput, yield

    Bottom Device

    Al

    Top-Chip(17 m)

    Cu

    Cu

    Cu3Sn

    AlILD

    12 m

    Bottom Device

    Al

    Top-Chip(17 m)

    Cu

    Cu

    Cu3Sn

    AlILD

    12 m

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    M.J. Wolf

    TSV-Interposer

    Silicon Interposer Apps#1: high TSV count (>10000/vm)high density TSV (5-10m),small pitch (50m -20m)high density Line/Spacemultilayer front/back side (#4)electrical & optical Interconnect

    Silicon Interposer Apps#2: med. TSV countmed. TSV (10-20m), pitch (>100 m)ASR (5-15)multilayer front/back sideMEMS integrationCu pillar interface to board/package

    Potential: passive device integrationoptical interconnectsheterogeneous device integration (e.g. TX, MEMS),e.g. thin chip integrationthermal management (cooling)

    Fraunhofer IZM

    M.J. Wolf

    Tera-scale Computing

    Ref. B Bottems, ITRS

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    M.J. Wolf

    Roadmap - 3D WL System Integration

    Year

    eWLPeWLPeWLPeWLP

    Stacked TCI w TSV

    IPD & RDL

    Controller /Memory Stacks

    3D Interposerw. Cooling

    2006 2007 2010 2012 201420092008

    3DInterconnectComplexity

    2005

    3D CPUs

    3DInterconnectComplexity Functional

    LayeredStack eGrain

    eWLP

    HDI TSV Interposer

    Hetero Integration

    3D TCT/TSV

    eWLPw TMV

    WLP w. TSV

    Stacked Memory onTSV Interposer

    3D Image Sensors

    Fraunhofer IZM 08/2009

    Fraunhofer IZMResearch Center ofMicroperiphericTechnologies

    Photonic Packaging @ ITRS

    Packaging of optoelectronic and MEMS components has beentreated by ITRS in the section ASSEMBLY AND PACKAGINGunder packaging for specialized functions

    Optoelectronics packaging covers an expanding range of newtechnical requirements depending on their applications.

    Examples of optoelectronic packages and their applications arepresented

    There are many difficult challenges remaining for opticalpackaging and they will become increasingly critical as theoptical communication gets ever closer to the chip.

    A list of these challenges, technology requirements, potentialsolutions and the Cross TWG are presented.

    Review of Packaging of Optoelectronic,Photonic, and MEMSComponents IEEE JSTQE (2011)DOI:10.1109/JSTQE.2011.2113171

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    Fraunhofer IZMResearch Center ofMicroperiphericTechnologies

    Silicon Photonics Packaging Concepts by Fraunhofer IZM

    Smart-Pack for (de)multiplexing

    Generic-Pack for multiport electrooptic SOI

    T. Tekin, H. Schroeder, L. Zimmermann, P. Dumon, W. Bogaerts "Fibre-array optical interconnection for silicon photonics" Proc. of ECOC, Vol. 5, pp. 93-94 (2008).L. Zimmermann, T. Tekin, H. Schroeder, P. Dumon, W. Bogaerts. "How to bring nanophotonics to application - silicon photonics packaging". LEOS Newsletter December 2008.

    Fraunhofer IZMResearch Center ofMicroperiphericTechnologies

    Silicon Photonics Packaging Design Rules

    Established Silicon PhotonicsPackaging Design Rules aresummarized in following fields:

    Fiber Pigtailing

    Flip-Chip & Die Bonding

    Wire Bonding

    Available

    www.izm.fraunhofer.de/EN/abteilungen/siit/technology/photonic/spic.jsp

    Hall C1 Booth 312

    uv-curingepoxy

    fiber-array

    SOI chip

    uv-curingepoxy

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    M.J. Wolf

    Summary

    Assembly & Packaging is converting into complex systemIntegration Technology

    ITRS /A&P helps and supports to identify major newdevelopments directions and specifications with respect tothe targets of new product generations

    3D System Integration (A&P) is an key enabler for theHeterogenous Integration of MEMS, MOEMs, MPUs,ASICs, Memories

    Fraunhofer IZM

    M.J. Wolf

    Wafer Level All Silicon System IntegrationWafer Level All Silicon System Integration -- ASSID @ FhG IZMASSID @ FhG IZM

    IZM / ASSID develops leading edge technologies for 3D-WLSystem-Integration and provide solutions ready for productintegration to industrial partners.

    IZM / ASSID offers capacity and support for equipment andmaterial evaluation to semiconductor industry.

    IZM / ASSID offers services by using qualified processcapacities and demonstrate stable processes on a 300mmTSV process line.

    Fraunhofer IZM vision is to integrate heterogeneous chip

    functionalities into one package (SiP) by using enhanced 3D-

    integration, assembly and interconnect technologies.

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    Fraunhofer IZM

    M.J. Wolf

    THANK YOU FOR YOUR ATTENTION

    Acknowledgement:TWG A&P ITRSFraunhofer IZM, TU BerlinIFX, GF, NXP, ASE, Philips,Joule, EMC3D

    Contact:

    M. Juergen [email protected]

    Fraunhofer IZMAll rights:


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