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Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and State of Georgia’s Yamacraw Initiative. Monte-Carlo Methods for Chemical-Mechanical Planarization on Multiple-Layer and Dual-Material Models. Y. Chen , A. B. Kahng, G. Robins, A. Zelikovsky - PowerPoint PPT Presentation
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Monte-Carlo Methods for Chemical-Mechanical Planarization on Multiple-Layer and Dual-Material Models Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and State of Georgia’s Yamacraw Initiative Y. Chen Y. Chen , , A. B. Kahng, G. Robins, A. A. B. Kahng, G. Robins, A. Zelikovsky Zelikovsky (UCLA, UCSD, UVA and GSU) (UCLA, UCSD, UVA and GSU) http://vlsicad.ucsd.edu http://vlsicad.ucsd.edu
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Page 1: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Monte-Carlo Methods for Chemical-Mechanical Planarization on

Multiple-Layer and Dual-Material Models

Monte-Carlo Methods for Chemical-Mechanical Planarization on

Multiple-Layer and Dual-Material Models

Supported by Cadence Design Systems, Inc.,NSF, the Packard Foundation, and

State of Georgia’s Yamacraw Initiative

Y. ChenY. Chen,, A. B. Kahng, G. Robins, A. ZelikovskyA. B. Kahng, G. Robins, A. Zelikovsky

(UCLA, UCSD, UVA and GSU)(UCLA, UCSD, UVA and GSU)

http://vlsicad.ucsd.eduhttp://vlsicad.ucsd.edu

Page 2: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

OutlineOutline

Layout Density Control for CMP

Our Contributions

STI Dual-Material Dummy Fill

Multiple-layer Oxide CMP Dummy Fill

Summary and Future Research

Page 3: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

CMP and Interlevel Dielectric ThicknessCMP and Interlevel Dielectric Thickness

Chemical-Mechanical Planarization (CMP) = wafer surface planarization

Uneven features cause polishing pad to deform

Dummyfeatures ILD thickness

Interlevel-dielectric (ILD) thickness feature density Insert dummy features to decrease variation

ILD thicknessFeatures

Page 4: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Layout Density ModelLayout Density Model Effective Density Model

window density weighted sum of tiles' feature area

weights decrease from center tile to neighboring tiles

Page 5: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Filling ProblemFilling Problem

Given rule-correct layout in n n region

upper bound U on tile density

Fill layout subject to the given constraints

Min-Var objective

minimize density variation subject to upper bound

Min-Fill objective

minimize total amount of filling subject to fixed density variation

Page 6: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

LP and Monte-Carlo MethodsLP and Monte-Carlo Methods

Single-layer fill problem linear programming problem

impractical runtime for large layouts

essential rounding error for small tiles

Monte-Carlo method (accurate and efficient) calculate priority of each tile according to its effective

density higher priority of a tile higher probability to be filled pick the tile for next filling randomly if the tile is overfilled, lock all neighboring tiles update priorities of all neighboring tiles

Page 7: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

OutlineOutline

Layout Density Control for CMP

Our Contributions new Monte-Carlo methods for STI Min-Var and Min-Fill

objectives LP formulations for a new multiple-layer fill objective new Monte-Carlo methods for multiple-layer fill problem

STI Dual-Material Dummy Fill

Multiple-layer Oxide CMP Dummy Fill

Summary and Future Research

Page 8: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Our ContributionsOur Contributions

Fill problem in STI dual-material CMP

new Monte-Carlo methods for STI Min-Var objective

new Monte-Carlo/Greedy methods with removal phase

for STI Min-Fill objective

Fill problem in Multiple-layer oxide CMP

a LP formulation for a new multiple-layer fill objective

new Monte-Carlo methods

Page 9: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

OutlineOutline

Layout Density Control for CMP

STI Dual-Material Dummy Fill

new Monte-Carlo methods for Min-Varr and Min-Fill

objectives

Multiple-layer Oxide CMP Dummy Fill

Summary and Future Research

Page 10: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Shallow Trench Isolation ProcessShallow Trench Isolation Process

Nitride

Silicon

nitride deposition on silicon

Oxide

oxide deposition

Uniformity requirement on CMP in STI

under polish

over polish

etch shallow trenches through nitride silicon

remove excess oxide and partially nitride by CMP

nitride stripping

height difference height difference HH

Page 11: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

STI CMP ModelSTI CMP Model

STI post-CMP variation can be controlled by changing the feature density distribution using dummy features insertion

Compressible pad model polishing occurs on both up and down areas after

some step height

Dual-Material polish model two different materials are for top and bottom

surfaces

Page 12: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

STI Fill ProblemSTI Fill Problem

Non-linear programming problem

Min-Var objective: minimize max height variation

Previous method (Motorola) dummy feature is added at the location having the

smallest effective density terminates when there is no feasible fill position left

Min-Fill objective: minimize total number of inserted fill, while keeping the given lower bound

Previous method (Motorola) adds dummy features greedily concludes once the given bound for ΔΗ is satisfied

Drawbacks of previous work can not guarantee to find a global minimum since it

is deterministic for Min-Fill, simple termination when the bound is

first met is not sufficient to yield optimal/sub-optimal solutions.

Page 13: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Monte-Carlo Methods for STI Min-VarMonte-Carlo Methods for STI Min-Var

Monte-Carlo method calculate priority of tile(i,j) as H - H (i, j, i’, j’) pick the tile for next filling randomly if the tile is overfilled, lock all neighboring tiles update tile priority

Iterated Monte-Carlo method repeat forever run Min-Var Monte-Carlo with max height difference H exit if no change in minimum height difference delete as much as possible pre-inserted dummy

features while keeping min height difference M

Page 14: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

MC/Greedy methods for STI Min-FillMC/Greedy methods for STI Min-Fill

Find a solution with Min-Var objective to satisfy the given lower bound

Modify the solution with respect to Min-Fill objective

Algorithm

Run Min-Var Monte-Carlo / Greedy algorithm

Compute removal priority of each tile

WHILE there exist an unlocked tile DO Choose unlock tile Tij randomly according to priority Delete a dummy feature from Tij

Update the tile’s priority

Page 15: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

STI Fill ResultsSTI Fill Results

Methods (Greedy, MC, IGreedy ad IMC) for STI Fill under Min-Var objective

testcase Orig H H CPU H CPU H CPU H CPU

L1/32/4 695.2 305.3 3.2 335 3.2 304.5 3.5 290.2 3.4 L1/32/8 999.6 426.1 3.8 325.8 3.4 407.4 7.1 307.2 4.2 L2/28/4 801.8 487.9 5.1 374 5.2 487.9 5.7 348 5.6 L2/28/8 1124.6 569.8 5.7 536.1 5.2 546.3 10.1 482.7 6.6 L3/28/4 1095.2 577.8 8.5 563.2 8.3 577.8 8.9 563.2 9.1

Igreedy IMCGreedy MC

Methods(GreedyI, MCI, GreedyII and MCII) for STI Fill under Min-Fill objective

testcase Orig H final H Area CPU Area CPU Area CPU Area CPUL1/32/4 695.2 395.1 10336 3.1 12003 3.1 8962 3.2 9141 3.2 L1/32/8 999.6 462.7 22091 3.9 20679 3.4 15615 3.6 14754 3.4 L2/28/4 801.8 526.2 7491 4.8 15164 4.9 7593 5.1 6543 5.1 L2/28/8 1124.6 639.8 16808 5.7 26114 5.5 8367 5.9 7142 5.5 L3/28/4 1095.2 563.2 24274 8.2 27114 8 16628 8.6 16142 8.5

MCIIGreedyI MCI GreedyII

Page 16: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

OutlineOutline

Layout Density Control for CMP

Our Contributions

STI Dual-Material Dummy Fill

Multiple-layer Oxide CMP Dummy Fill LP formulations for a new multiple-layer fill objective new Monte-Carlo methods

Summary and Future Research

Page 17: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Multiple-Layer Oxide CMPMultiple-Layer Oxide CMP

Each layer except the bottom one can’t assume a perfect flat starting surface

Layer 0

Layer 1

Multiple-layer density model

^ : fast Fourier transform operator

:effective local density

: step height

: local density for layer k

Page 18: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Multiple-Layer Oxide Fill ObjectivesMultiple-Layer Oxide Fill Objectives

LP formulation Min M Subject to:

(Min-Var objective) minimize

sum of density variations on all layers can not guarantee the Min-Var objective on each layer A bad polishing result on intermediate layer may cause problems on

upper layers

maximum density variation across all layers

Page 19: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Multiple-Layer Monte-Carlo ApproachMultiple-Layer Monte-Carlo Approach

Tile stack column of tiles having the same positions on all layers

Effective density of tile stack sum of effective densities of all tiles in tile stack

layer 3

layer 2

layer 1

tiles on each layertile stack

Page 20: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Multiple-Layer Monte-Carlo ApproachMultiple-Layer Monte-Carlo Approach

Compute slack area and cumulative effective density for each tile stack

Calculate priority of each tile stack according to its cumulative effective density

WHILE ( sum of priorities > 0 ) DO randomly select a tile stack according to its priority from its bottom layer to top layer, check whether it is

feasible to insert a dummy feature in update slack area and priority of the tile stack if no slack area left, lock the tile stack

Page 21: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Multiple-Layer Fill ResultsMultiple-Layer Fill Results

Performance of LP0, LP1, Greedy, MC, IGreedy and IMC for Min-Var-Sum

testcase SumVar CPU SumVar CPU SumVar CPU SumVar CPU SumVar CPU

L4/16/8 0.6626 33.1 0.642 36.3 0.6285 36.6 0.6285 37.7 0.6285 33.9 L4/16/5 0.5435 30.7 0.5541 32.2 0.5535 33 0.5535 31.1 0.5535 30.5 L4/8/8 0.9031 140.1 0.7794 48.1 0.7766 36.2 0.7762 74.7 0.7762 34.5 L4/8/5 0.8351 33.4 0.7882 35.4 0.7804 32.7 0.7804 39.1 0.7804 30.7 L5/8/8 2.2118 8093 2.0526 102.8 2.0913 65.4 2.0526 111.7 2.0716 67.6 L5/8/5 1.3494 8879 1.345 65 1.3943 54.2 1.3252 79.6 1.3476 59.3

IMCLP0 Greedy MC IGreedy

testcase MaxDen CPU MaxDen CPU MaxDen CPU MaxDen CPU MaxDen CPU

L4/16/8 0.4696 34.8 0.4459 36.3 0.4454 36.6 0.4454 37.7 0.4454 33.9 L4/16/5 0.3638 36.5 0.3638 30.2 0.3635 33 0.3635 31.1 0.3635 32.5 L4/8/8 0.6255 120.8 0.5437 48.1 0.541 36.2 0.5406 74.7 0.5406 34.5 L4/8/5 0.5897 33.2 0.5576 35.4 0.5497 32.7 0.5497 39.1 0.5497 30.7 L5/8/8 1.2174 761.3 1.1081 102.8 1.1089 65.4 1.1081 111.7 1.1081 67.6 L5/8/5 0.6886 524 0.6857 65 0.705 54.2 0.6698 79.6 0.6746 59.3

IMCLP1 Greedy MC IGreedy

Page 22: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

OutlineOutline

Layout Density Control for CMP

Multiple-layer Oxide CMP Dummy Fill

STI Dual-Material Dummy Fill

Summary and Future Research

Page 23: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Summary and Future ResearchSummary and Future Research

STI fill problem Monte-Carlo methods for STI Min-Var Monte-Carlo / Greedy methods for STI Min-Fill

Multiple-layer fill problem LP formulation for a new Min-Var objective efficient multiple-layer Monte-Carlo approaches

Ongoing research further study of multiple-layer fill objectives more powerful Monte-Carlo methods for multiple-

layer fill problem CMP simulation tool

Page 24: Supported by Cadence Design Systems, Inc., NSF, the Packard Foundation, and

Thank you!Thank you!


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