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創創創創創創創創 The Basic Concept of the Photo filtration/Dispense 創創創 : 創創創 創創創創創創 技技技技
創新需求需求再造
The Basic Concept of the Photo filtration/Dispense
主講人 : 龍仁生
鼎岳科技公司技術研討
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Content
• The concept of liquid filtration• What is an ideal dispense operation?• Two-stage vs. single-stage • Oring• Conclusion
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The key to filter in photo • The Filter pore size / Retention
– How much ? 0.1um, 0.2um…– Lower filtration rate, Higher retention
• The Chemical Compatibility / Pre-wetting – PTFE– UPE– PP– Nylon
• Cleanness• Low Hold Volume
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Capture by Size Exclusion / Interception ---
Hard Particle--- Bridge/ Cake effectSoft GelMicro-bubble
Particles captured by sievingParticles captured by filter cake
Filtration Retention Mechanisms:
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Retention Mechanisms:
Very small particles in liquids have a negative charge and can be captured by attraction to a positive charge in a filter
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Capture by Adhesion / Adsorption
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Hydrophobic Vs Hydrophilic
Hydrophilic: Wetting smoothly with, water.". No pre-wetting
Hydrophobic: Fear of water; Tending not to combine with water. Requires pre-wetting.
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Hydrophobic Vs Hydrophilic
Contact Angle is the measure of Wettability
Hydrophobic
< 90?
Hydrophilic
No contact angle 90? > 90?
Low contact angle = HydrophobicHigh contact angle = Hydrophilic
i.e.
創新需求需求再造
創新需求需求再造
PTFE membrane surface energy is 18 dynes/cm; PTFE has a higher affinity for air than water. Gas bubbles stick to the membrane surface, forming nucleation sites.
As more gas bubbles pass through the pore, these nucleation sites grow and begin to block the pore.
Finally, the pore completely fills with gas, effectively blocking the pore and rendering it unusable. As more pores in the filter dewet, the flow through the filter dramatically decreases.
What is Dewetting and how can it impact a process?
SC1SC2H2O2
NH4FPiranha
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Key for Photo resist filtration / Dispense
Consistent performanceMicrobubble free dispenseMinimize Photoresist consumptionMaximize OEE (Overall Equipment Efficiency)
– Minimize downtime– Reduce time to steady-state process– Improved equipment reliability (Utilization)
創新需求需求再造 General Problem with Coating Process
• Contamination, High defects density– Soft particles– Hard particles
• Bad Coating / Spin, poor uniformity, thickness drifted– Poor suckback– Insufficient photo-chemical– Inconsistent dispense rate– Operator error, using the wrong recipe– Back splash / Other hardware issues
• Miss coating / High rework rate
創新需求需求再造Photoresist Coating Defects
Particles Microbubble
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Photo-resist
Reservoir PumpFilter Suck-back
Valve
Nozzle
vent
Conventional Dispense Systems
Filtration RateDispenseRate
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Single-Stage Dispense SystemFiltration rate = Dispense rate
*High filtration rate -shorter filter life time -Poor contamination control
*Dispense rate is affected by filter condition -Inaccurate dispense rate / volume
Dispense rate
Time
2.53.0
Single-stage needs to raise the D.R.to keepat least 2.5cc/sec
Two-stage’s dispenserate can keep constant
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Single-Stage Dispense SystemFiltration rate = Dispense rate
*High filtration rate -shorter filter life time -Poor contamination control
*Dispense rate is affected by filter condition -Inaccurate dispense rate / volume
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NozzleStepper motor-driven pump
Vent
Pneumatic-drivenpump
Photo-resist
Purge and recalculation line
Dispense Rate
Filtration Rate
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Two-Stage Dispense Systems
• Filtration , Dispense are separated• Longer filter life time • Reduce contamination (gels,micro-bubbles and particles)• Provide precise and repeatable dispense of photo- chemical
-Stable coating process -Save photo-chemicals
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Pure Performance
• Consistent Reduction in Particles–Two stage design allows for a slower filtration rate–Low filtration allows for lower filtration pressures
• More efficient removal of gel slugs and hard particles–Filtration rate is independent of dispense rate
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Outstanding retention of gels, particle-on-wafer
performance.
Minichem 0.1um
Impact LHVD
Wafergard 0.1um
Pleated PTFE 0.05um
0 1 2 3 4 5
Log Reduction Value
Soft Gel Particles > 0.1 um
Hard Particles > 0.1um
(1 LRV = 90% Removal)
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EASY
TO-USE
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filter changeout in less than 1 minute
0
5
10
15
20
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Tim
e (
Min
utes
)
IntelliGen withImpact LHVD
Pump I Pump C GEN-2 WCDS-2
Times Required to Change Dispense System Filters
Clean-up
Replace Filter
Drain Housing
Prepare Area
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如何選擇 O-RING
• 物理 / 機械性質 --- 用途• 熱性質 --- 操作環境溫度• 物質抵抗 --- 操作環境接觸物質
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O-ring 的選擇及應用基本指南
VITON(FK) VITON(FKM) EP(EPM) EP(EPDM) 全氟化 (FFKM) Silicone(HVMQ)
硬度範圍 40-80 60-90 30-90 30-90 65-95( 優 ) 28-80
摩擦抵抗 平平 尚可 好 好 好 尚可
彈性 尚可 平平 尚可 良好 好 良好
使用溫度 200 250 125 125 290 380
酸鹼抵抗 好 尚可 最好 最好 最好 不宜採用
溶劑 好 不宜採用 良好 良好 最好 無化學品環境
Remark Except of O2,03
無化學品環境
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可得之優點 -----
1. 極佳的可靠性2. 較長之使用壽命3. 更高的安全性與可靠性4. 標準化與減少現貨存量的契機5. 最佳化之密封解決之道
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結論 • UPE filter is the optimal choice
– No need pre-wetting– Better retention
• Limited Micro-bubble issue
• Two-stage technology pumps show far superior performance than conventional one-stage pumps.
– No need to adjust pump - Repeatable, reliable dispense– Easy changeout guarantees fewer mistakes– COST Saving
• 選擇 O-ring 的重點– 用途– 溫度– 接觸物質
