The nanoparticle-plasmon resonance

for proteomics

Bongsu, Jung

Jaehun, Seol

Final Project, ME381R

December 2 ,2004

Table of contents

• Proteomics

• Motivation

• Particle surface plasmon resonance

• Fabrication method for nanostructure– Nanosphere lithography– Ultraflat nanosphere lithography

Proteomics

• Completing DNA map is not sufficient to elucidate biological function

• DNA or mRNA can’t encode the arrangement for cell signal pathway or a metabolic cascade

• Poor correlation between protein and mRNA• Post-transcriptional regulation of gene

expression problem

Motivation :Why Surface Plasmon Resonance ?(as non-labeling method)

• Current fluorescent labeling technique for proteomics is complicate and labor intensive job

• Fluorescent labeling method gives interference and photobleaching to data

• SPR is real-time, very sensitive, easy to use non-labeling technique for proteomics

Metal Nanoparticles as SensorsLocalized SPR:

• localized: Localized oscillation of an electron density wave- Probing only a very thin layer around each particle- Each particle acts as its own sensor- High field enhancements at edges- Very easy detection (UV-Vis)

Problems with localized SPR:• Size and shape have strong influence

on the resonance• Shape difficult to control above

40 nm diameter• Non-spherical particles difficult to

preserve

oEakiak

P)4

32

4)(1()2(4

)1(3

3322

Stationary depolarizationDynamic depolarization from phase difference on larger particle

Radiation damping correction

Dipole vs quadrupole resonance

J. Phys. Chem. B 2003, 107, 668-677

Dipole and quadrupole resonance is controlled by size of spheres

Dipole and quadrupole resonance is controlled by size of spheres

J. Phys. Chem. B 2003, 107, 668-677

Particle shape dependent LSPR

JOURNAL OF CHEMICAL PHYSICS VOLUME 116, NUMBER 15, 2002, 6755-6759

Strong field enhancement in non-spherical shape

Journal of cluster science Vol. 10, No2. 1999, 295-317

DDA simulated electric field contours with for various shapes. (a) The innermost contour represents the grid boundaries of a 30nm sphere. The drop in intensity is from 50 to 1. (b) 2:1 spheroid has high field intensity to the high curvature periphery of the particle. The drop in intensity is from 125 to 1. (c) The truncated tetrahedron has high field intensity near the tip. The drop in intensity is from 500 to 1.

(a) (b) (c)

Huge field enhancement at tip of triangle shape when compared to spherical shape

Huge field enhancement at tip of triangle shape when compared to spherical shape

Linear response to environmental changes

J. Am. Chem. Soc. 2001, 123, 1471-1482

Fabrication technique : Nanosphere Lithography

•Spin-coating technique

•Slow vertical withdrawal of a substrate technique

•Tilting a substrate technique

•Horizontal movement of a substrate

Depositing method :

Fabrication technique : Nanosphere Lithography

Slow vertical withdrawal method

Appl. Phys. Lett., Vol. 77, No. 17, 23 October 2000

Fabrication technique : Nanosphere Lithography

Horizontal movement method

H, height of meniscus

R, Humidity ratio

T, temperature

C, Concentration ratio of liquid

W, Width of cuvette

Speed of horizontal movement

S, Shape of meniscus

Substrate, glass

Fabrication technique : Nanosphere Lithography

Main principles for producing monolayer

• Capillary force (Surface tension )due to meniscus formation

• Convective flow due to water evaporation

Particle convective flow

Water convective flow

Water evaporation

Surface tension

Fabrication technique : Nanosphere Lithography

Monolayer masking principle for periodic pattern of nanostructure

J. Vac. Sci. Technol. A, Vol. 13, No. 3, May/Jun 1995J. Phys. Chem. B, Vol. 103, No. 19, 1999

Frey, W., Woods, C. K., Chilkoti, A.:Adv. Mat. 12 (20), 1515 (2000)

1

2

3

4

5

6

7

1

2

3

4

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1 Sphere deposition2 Metal M1 evaporation3 Sphere removal4 Metal M2 evaporation5 Low viscosity epoxy6 Mechanical support7 Dry lift-off

Fabrication technique : Ultraflat Nanosphere Lithography

Fabrication technique : Ultraflat Nanosphere Lithography

Advantages of UNSL

• Sharp corner and edges are well preserved

• Only one side is exposed to surface

• Various choices of substrate

J. Phys. Chem. B 2000, 104, 10549-10556

Conventional NSL

Conventional NSL UNSLUNSL

Adv. Mater. 2000, 12, No. 20, October 16

Future applications

Surface functionalization for proteomics or cancer detection

Protein spotting

glassGold

SiO2 Target

protein

light

Measuring

& monitoring

binding affinity,

enzyme reaction or antibody