Physics, Applied Physics, Electronics & Materials Science Department
Welcome to Grenoble INP - Phelma
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Physics, Applied Physics, Electronics & Materials Science Department
French style, food, life...
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Physics, Applied Physics, Electronics & Materials Science Department
Agenda
9h00 Opening
9h15 Practical information about Phelma semester
9h45 Internships & Enterprise Relation Office of Phelma
10h00 IR office
10h15 Presentation Labs & Project
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Physics, Applied Physics, Electronics & Materials Science Department
Director of Phelma
Anne VILCOT
Edwige BANOInternship
Master thesis
Liliana PREJBEANUPanagiota MORFOULI
Nanotech Coordination
Director of Academic Programs
Patrice PETITCLAIR
Director of International Office
Valérie PARRY
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Physics, Applied Physics, Electronics & Materials Science Department
Eliane ZAMMIT
Secretary/ Admissions
room M403
Anne-Marie BONA
room M404
Eva MYLY
room M427
InternshipMaster thesis
International Office
Administrative Staff
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Physics, Applied Physics, Electronics & Materials Science Department
Phelma Campus
Phelma Minatec
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Physics, Applied Physics, Electronics & Materials Science Department 7
Physics, Applied Physics, Electronics & Materials Science Department
Nanotech17
42 students 11 nationalities
Gender Parity : 30%
India (Australia?) 1
China 1
Egypt 1
France 12
Guatemala 1
Italy 17
Malaysia 1
Morocco 5
Russia 1
Switzerland 1
Tunisia 2
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Physics, Applied Physics, Electronics & Materials Science Department
2004 2008 2012 2020
N1 N5 N16 N12N2 N3 N4 N6 N7 N8 N9 N10 N11 N13 N14 N15 N17
Nb. Nationalities/year: ~ 9 (min 6 , max 13)
Nb students/ year : ~ 42
630 graduates / 35 countries / 4 continents
Parity: ~ 16% W, 84% M
A short history of Nanotech…
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Physics, Applied Physics, Electronics & Materials Science Department
Practical informationhttp://phelma.grenoble-inp.fr/
Intranet & webmail login+password
Online documentslogin+password
Items available only on the French page !
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Physics, Applied Physics, Electronics & Materials Science Department
Emploi du temps
Practical informationhttp://phelma.grenoble-inp.fr/
Timetable
Items available only on the French page !11
Physics, Applied Physics, Electronics & Materials Science Department
Practical information
A,M,Z Phelma-MinatecC Phelma-Campus
You are2ANANO
Emploi du tempsTimetable
day
week
http://phelma.grenoble-inp.fr/
1h30, 2h, 4h,… pay attention and check the room often!
Can be transferred
to smartphones
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Physics, Applied Physics, Electronics & Materials Science Department
Practical informationhttp://nanotech.grenoble-inp.fr/
Academic calendar
2nd semester (Spring) February→Mai
Holydays:• Winter : 15th - 19th February• Spring : 19th - 23th April
Days Off:• Easter Monday : 5th April• Labor Day: 1th May• Victory 1945: 8th May• Ascension Thursday: 13rd May• Whit Monday : 24th May
Labels / Vocabulary
CM→”Cours Magistraux” normal lectures
TD→”Travaux Dirigés” session of exercises
CTD →”Cours & TD”
TP→”Travaux Pratiques” session of labs
Courses descriptions available :https://refens.grenoble-inp.fr/Phelma
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Physics, Applied Physics, Electronics & Materials Science Department
Labs schedule
Practical informationhttp://nanotech.grenoble-inp.fr/
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Physics, Applied Physics, Electronics & Materials Science Department
Practical informationhttp://nanotech.grenoble-inp.fr/
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Physics, Applied Physics, Electronics & Materials Science Department
Validation (5 modules) each module >10/20
2nd February - 21st May 2021Phelma semester (2 nd)
Jury Mid of June
Bloc 1 12 84 6 30 120
Physics of Technological Processes Matteo Cocuzza 6 60
Design of Microsystems Danilo Demarchi 6 24 6 30
Bloc 2 12 96 24 120
Solid state physics Giancarlo Cicero 6 51 9
Electronic devices Federica Cappelluti 6 45 15
Bloc 3 10 84 16 100
Materials and Characterizations for micro and Nanotechnologies Fabrizio Giorgis 10 84 16
Total: 34 264 6 70 340
Bloc1 UE Microtechnologies (mandatory) 6 44 14 58
Microsystèmes II Matteo Cocuzza 2 20
Circuits optiques planaires Jean-Emmanuel Broquin 2 14 4
Optoelectronique Jean-Emmanuel Broquin 2 10 10
Bloc 2 UE Microélectronique (mandatory) 6 12 16 32 60
Conception de circuits analogiques I Davide Bucci 2 12 8
Travaux pratiques : Micro et Nanosystèmes various instructors 4 8 32
Bloc 3 UE Nanophysique et Nanostructures (mandatory) 6 40 24 64
Physique des nanostructures et transport électronique Thierry Ouisee 2,5 22 6
Nanostructures pour les applications optiques et magnétiques Prejbeanu/Montes 2 10 10
Dispositifs de CMOS Avancés Quentin Rafhay 1,5 8 8
Bloc 4 UE Cours de spécialisation (mandatory) 6 38 14 52
Physique et applications de la microscopie avancée Sellier/ Winckemann 2 16 4
Lithographie avancée Bertrand Le Gratiet 2 6 6
Conception de circuits numériques Lorena Anghel 2 16 4
Bloc 5 UE SHS/SME (mandatory) 6 20 26 20 66
Strategy & Finance (in English) Alexandre Etuy 2 10 10
Projet de groupe
Lean R &D
various instructors
Pierre Chevrier
3 10 7 20
Projet d'insertion professionnelle Laurence Pierret 1 16
UE REX (mandatory only Phelma students) 1 4
1 4
Total: 31 154 98 32 20 300
PoliTO
Phelma
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Physics, Applied Physics, Electronics & Materials Science Department
Phelma’s rules concerning the examination
1. 1st session of examination (February –June 2021)any absence should be justified by a certificate
2. 2nd session (there one single possibility to pass a fai led exam) (remake exams end of August-beginning of September 2021) anticipate the end of the internship to be able to attend the remake exams
(the employer should let you attend the exams, mentioned by the placement agreement)
Complementary information
If the 1 st and 2nd semesters are both of them not validated before destarting date of the EPFL semester (~ 15 September 2021) you must start again the semester in Italy.
ATTENTION: plagiarism / cheating (exams, reports,…) e.g. 0/20 for the fake examdisciplinary Board of Grenoble InP
French grading system scores : 0 and 20 (max)
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Physics, Applied Physics, Electronics & Materials Science Department
Calculator for the exams
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Physics, Applied Physics, Electronics & Materials Science Department
According to the Merriam-Webster online dictionary, to "plagiarize" means:
to steal and pass off (the ideas or words of another) as one's own
to use (another's production) without crediting the source
to commit literary theft
to present as new and original an idea or product derived from an existing
source
In other words, plagiarism is an act of fraud.
It involves both stealing someone else's work and lying about it afterward.
Plagiarism
Disciplinary Committee of Grenoble InP- from 1 to 2 years of exclusion from the School (even any French School)
- plagiarism is a crime that can be punished up to 2 years of imprisonment and 50keuros fine
French laws
French Education law
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Physics, Applied Physics, Electronics & Materials Science Department
Regulation documents
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Physics, Applied Physics, Electronics & Materials Science Department
1) Validation of 1 st, 2nd and 3 rd semester
2) Internship of 1 st year minimum 10 weeks/ End May-August 2021provide a report 4 ECTS the coordination is done by Phelma for all the students (contact Eva Myly)
3) Master thesis of 2 nd year minimum 20 weeks/ February-August 2022provide a report + defense 26 ECTS the coordination is done by the main registration institution of each student
4) Validation of B2 level in English + “ soft skill”
Conditions to have the Phelma engineering degree
Registration each year in
each university!
Few pages report on the international experience
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Physics, Applied Physics, Electronics & Materials Science Department
EPFL (0-6) Phelma (0-20)
6 18.
5.5 16.
5. 14.
4.5 13.
4./3.75 12.
3.5 10.
3. 8.
2.5 6.
2. 4.
1.5 2.
1. 0.
Polito (0-30L) Phelma (0-20)
30L 17
30 16.5
29 16
28 15.5
27 15
26 14.5
25 14
24 13.5
23 13
22 12.5
21 12
20 11.5
19 11
18 10.5
15 10
Conversion scale used by Phelma(voted by the Grenoble InP Conseil)
Polito (0-8) Phelma (0-20)
8 17
7,5 16
7 15
6,5 14
6 13
5,5 12
Master thesis1st semester 3rd semester
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Physics, Applied Physics, Electronics & Materials Science Department
Information for internships
Administrative point contact: [email protected]
Office : room M 427 (4th floor Minatec)
- In charge with all things concerning the internship (for all of you) and master thesis (only for
Phelma main registration students) : agreement, report, defense,…
- The description of the subject is mandatory (pdf to upload) on the e-stages
- The French labs can not be « établissement d'accueil ».You should indicate the name of the
institution paying the salary. Ask carefully the administrative contact from the lab.
- You will have soon emails for starting the internship procedure
The international Phelma students :
need to open a French bank-account to receive the EXPLORA scholarship (compulsory)
- for the application form or EXPLORA scholarship all the documents must be in French
(ask help from the French colleagues)
About EXPLORA Scholarship
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Physics, Applied Physics, Electronics & Materials Science Department
EVENTS announcement
5th February pm
&
12th February pm
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Physics, Applied Physics, Electronics & Materials Science Department
EVENTS announcement
Thomas ERNSTScientific Director LETIAbout the LETI activities
6 May21 May One day visit ESRF Dr. Ennio CapriaAbout the ESRF activities
Visit of the Showroom
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Physics, Applied Physics, Electronics & Materials Science Department
Very important event
Last day of school in May
Nanotech Barbecue…Organized by the students with the professors participation …
Team spirit …. Facebook
Nanotech Alumni
LinkedIn Master Nanotech
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Physics, Applied Physics, Electronics & Materials Science Department
Short presentations of the professors
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Physics, Applied Physics, Electronics & Materials Science Department
Lorena ANGHEL
• Professor Grenoble INP
• Phelma and Ensimag teacherVP at Grenoble INP in charge of Industrial Relation ships
• TIMA LaboratoryKeywords: design, test, reliability of digital circ uits and architectures
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Integrated Digital Circuit Design in VLSINanotech2A
Description: Understand basicprinciples of VLSI design applied tosynchronous, digital circuits, designflow and circuit optimization
Why this course in the Nanotech training?
Learn how to build digital gates,combinational and sequential circuits,memories, control machines,…
cuit is VLSI?Nvidia
er
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Physics, Applied Physics, Electronics & Materials Science Department
Davide BUCCI
• Associate Professor Grenoble INP
• Teacher at Phelma Courses on analog electronics, microelectronics, integrated optics,measuring systems
• Researcher at IMEP-LAHC (http://imep-lahc.grenoble- inp.fr)Keywords: integrated optics, microelectronics, optofluidics sensors
• Contact [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Analog Integrated Circuit DesignNanotech 2A
Description:• EKV model for MOSFET• Analog building blocks• Amplifiers• Differential circuits• Layout
Why this course in the Nanotech training?•Introduction to analog CMOS circuits•Develop a “feeling” for analog circuits•Preparation for advanced course
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Physics, Applied Physics, Electronics & Materials Science Department
Liliana BUDA -PREJBEANU
• Associate Professor Grenoble INP
• Phelma’s teacherco-coordinator Nanotech program
• SPINTEC-lab’s researcher (http://www.spintec.fr/)Keywords: magnetism, spintronics, modelling
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Nanostructures for magnetic applicationsNanotech2A
Magnetic media
Description: Introduce the magneticmaterials. Understand how theirmagnetization can be controlled byfield or current.
Why this course in the Nanotech training?
Use the proprieties of the magneticnanostructures to build applications:sensors, memories, storage media,…
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Physics, Applied Physics, Electronics & Materials Science Department
Clemens WINKELMANN
• Associate Professor Grenoble INP
• Scanning Probe Microscopy Practicals
• Researcher at Institut NéelKeywords: quantum nanoelectronics, low temperature scanning tunneling microscopy
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Advanced microscopies, part INanotech2A
Objective: Learn the physical principles in STM and general instrumentation for SPMs, review STM applications in various scientific fields.
Why this course in the Nanotech training?Scanning probe microscopies (SPMs) are essential in nanotechnologies for characterizing and investigating matter and devices at small scale
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Physics, Applied Physics, Electronics & Materials Science Department
Scanning Probe Microscopy PracticalsNanotech2A
AFM single molecule mapping
Description: Learn and understanddifferent scanning probe micro-scopy methods for local inspectionof surfaces and devices
Why this course in the Nanotech training?
SPM is an essential ingredient inNanotechnology and Nanoscience, forvisualizing nano-objects, but also formanipulating them.
CNT SQUID
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Physics, Applied Physics, Electronics & Materials Science Department
Anne KAMINSKI-CACHOPO
• Professor Grenoble INP
• Phelma’s teacher
• IMEP-LAHC-lab’s researcher (imep-lahc.grenoble-inp. fr/)Keywords: solar cells, optical and electrical simul ation and characterization
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
TCAD simulation - MOSFET ModelingNanotech2A
Description of the labwork: Technological and electrical simulation of a MOSFET.
Why this course in the Nanotech training?
To use TCAD tools and define a processflow; to design a device which will befabricated during the clean room labworkand characterized,…
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Physics, Applied Physics, Electronics & Materials Science Department
Bertrand Le GRATIET
• Phelma’s teacher
“Lithography and Patterning in Silicon Manufacturing”
• STMICROELECTRONICS (www.st.com )
Digital Front End Manufacturing & TechnologySenior Member of technical staff | Lithography metrology department
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Lithography and Patterning in Silicon Manufacturing Nanotech2A
Description: Introduction to
Lithography process for semiconductor manufacturing
Role of Lithography within the Silicon Manufacturing cycle
How Lithography engineers managed to print sub-wavelength features
Impact of sub-wavelength imaging on manufacturing complexity
Why this course in the Nanotech training?
Photolithography is at the heart of silicon chip manufacturing
and is one of the main enabler of Moore’s law.
It is at the cross road of design and real structured materials
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Physics, Applied Physics, Electronics & Materials Science Department
Aurélien KUHN
• Full time teacher at Phelma(Physics, Electronics, Clean Room, …)
• Coordinator of Clean Room sessions at Phelma
• Former researcher on Quantum Micro- and Nano-Opto-Me chanics
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Panagiota MORFOULI
• Full Professor Grenoble INP
• Phelma’s teacherco-coordinator Nanotech program
• IMEP-LAHC-lab’s researcher ( http://imep-lahc.grenoble-inp.fr/)Keywords: microelectronics, photonics, radiofrequen cies
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Thierry OUISSE
• Full Professor Grenoble INP
• Phelma’s teacher
• LMGP-lab researcher ( http://www.lmgp.grenoble-inp.fr )Keywords: nanophysics, nanomaterials, solid state p hysics,
crystal growth
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Nanostructure physics and quantum transportNanotech2A
Description: Introduce nanostructurephysics, quantum coherent andconfinement effects (conductancequantization, resonant tunneling,Coulomb blockade in single electrontransistors, carbon nanotubes...).
Why this course in the Nanotech training?
Quantum or confinement effects alreadyappear in existing industrial devices, andwill be key for future breakthroughinnovations.
Aharonov-Bohm electron wave interferences in a quantum ring.
Keyser et al.2002
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Physics, Applied Physics, Electronics & Materials Science Department
Laurence PIERRETT
• English Teacher, DET- Grenoble INP
• Phelma second language co-ordinator
• Area of concentration: Special Needs and Inter-cultural communication
• Contact:[email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Quentin RAFHAY
• Associate Professor Grenoble INP
• Phelma’s teacher
• IMEP-LAHC-lab’s researcher (http://imep-lahc.grenob le-inp.fr/)Keywords: semiconductor device, electrical characte risationand modelling
• Contact: [email protected]
There’s no good picture of me,
so here’s a cat in a slice of pizza
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Physics, Applied Physics, Electronics & Materials Science Department
Advanced CMOS deviceNanotech2A
Description: Introduce the advancedconcepts and effects on a specific andsignificant semiconductor device :
the MOSFET
Why this course in the Nanotech training?Presents the detailed study of a verycomplex device, which is eithercompulsory to know if working in the fieldof CMOS, or a very good source ofinspiration when studying electronicdevices
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Physics, Applied Physics, Electronics & Materials Science Department
Hermann SELLIER
• Assistant Professor at Université Grenoble Alpes
• Teacher in physics at UGA / Phitem and at G-INP / Phelma (Master Nanotech)
• Researcher at CNRS / Institut Néelhttp://neel.cnrs.fr/spip.php?rubrique202Keywords: quantum nano electronics, scanning probe microscopy
• Contact: [email protected]
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Physics, Applied Physics, Electronics & Materials Science Department
Advanced microscopies, part IINanotech2A
Objective: Learn the physicalprinciples of the atomic forcemicroscopy (AFM) and how thistechnique can be employed tomeasure topography, probemechanical properties, imagecharge distributions or magneticdomains.
Why this course in the Nanotech training ?Scanning probe microscopies (SPMs) are essential in nanotechnologies for characterizing and investigating matter and devices at small scale.
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