INDUSTRIAL PVD POWER-DELIVERY SOLUTIONSProcess Control and Film Quality for Reactive Sputtering, Metallic Sputtering, and Cathodic Arc Deposition
Precise Film-Property Control
Select the ideal power supply and features for your film-property and cost requirements
from AE’s wide product portfolio. Tight performance parameters, customizable power
delivery, precision pulsing, and multi-level arc management enable the process stability
and control required to create customized film density, uniformity, refraction, transmission,
and morphology.
Pulsed DC units, including the Ascent® DMS, Solvix by AE, and Pinnacle® Plus+ series, reduce
arcing, while improving deposition rate, film flatness, and film density. Ascent DMS units
also offer unique power-delivery options, including selectable frequency; power, current, or
voltage regulation; independent power-ratio regulation for each magnetron;
and unipolar and bipolar operation.
Solvix by AE bias units enable advanced control of ion energy, for even greater precision
of film characteristics such as stress, packing density, and degree of implantation.
20 kHz
Ascent® DMS Series
Ascent® AMS Series
Optimized power delivery for dual-
magnetron sputtering
A controlled voltage overshoot at the beginning of each pulse enables faster current
rise time and greater control of ion energy compared to conventional systems.
The optimized waveform of Ascent® power supplies enables precise control
of film properties such as stress, refraction, density, uniformity, and morphology.
ASCENT® DMS and AMS SERIES
CONTROLLED PULSE RISE PRECISE FILM PROPERTY CONTROL
2 kHz
DC
End Boost
Turn-O�
ProcessVoltage
Current:Fast slew rate and higher startup threshold are desired
V Boost
Turn-On
v (V)l (A)
T (µs)
Benefits
• Precise film-property control
• Higher yield and film quality
• Cost savings
• Worldwide support network
Features
• Complete coverage of DC, pulsed DC, and low-frequency AC
• Best-in-class arc management
• Arc synch
• Pulse synch
• Set point compensation
• Unipolar and bipolar pulsing
• Controlled pulse rise
• Voltage reversal
• High-frequency operation
• Bias and process-power solutions
PROCESS CONTROL FOR REACTIVE SPUTTERING, METALLIC SPUTTERING, AND CATHODIC ARC DEPOSITION
Durable coatings and customizable film properties are key benefits of today’s
PVD processes. From advanced devices, such as cell phones, solar panels,
and flat-panel T.V.s, to more traditional products, such as watches and drill bits,
Advanced Energy® delivers product performance, variety, and value
to meet the needs of any application.
We offer complete coverage of DC, pulsed DC, and low-frequency AC, with
field-proven performance, unique control of power-delivery parameters, and
a range of options to optimize cost over the lifetime of your product. With the
most comprehensive, high-performing power-supply portfolio in the industry,
decades of expertise, and a vast network of support sites across the globe,
Advanced Energy® heightens the possibilities for PVD process control and
product quality.
2
Precise Film-Property Control
Select the ideal power supply and features for your film-property and cost requirements
from AE’s wide product portfolio. Tight performance parameters, customizable power
delivery, precision pulsing, and multi-level arc management enable the process stability
and control required to create customized film density, uniformity, refraction, transmission,
and morphology.
Pulsed DC units, including the Ascent® DMS, Solvix by AE, and Pinnacle® Plus+ series, reduce
arcing, while improving deposition rate, film flatness, and film density. Ascent DMS units
also offer unique power-delivery options, including selectable frequency; power, current, or
voltage regulation; independent power-ratio regulation for each magnetron;
and unipolar and bipolar operation.
Solvix by AE bias units enable advanced control of ion energy, for even greater precision
of film characteristics such as stress, packing density, and degree of implantation.
20 kHz
Ascent® DMS Series
Ascent® AMS Series
Optimized power delivery for dual-
magnetron sputtering
A controlled voltage overshoot at the beginning of each pulse enables faster current
rise time and greater control of ion energy compared to conventional systems.
The optimized waveform of Ascent® power supplies enables precise control
of film properties such as stress, refraction, density, uniformity, and morphology.
ASCENT® DMS and AMS SERIES
CONTROLLED PULSE RISE PRECISE FILM PROPERTY CONTROL
2 kHz
DC
End Boost
Turn-O�
ProcessVoltage
Current:Fast slew rate and higher startup threshold are desired
V Boost
Turn-On
v (V)l (A)
T (µs)
Benefits
• Precise film-property control
• Higher yield and film quality
• Cost savings
• Worldwide support network
Features
• Complete coverage of DC, pulsed DC, and low-frequency AC
• Best-in-class arc management
• Arc synch
• Pulse synch
• Set point compensation
• Unipolar and bipolar pulsing
• Controlled pulse rise
• Voltage reversal
• High-frequency operation
• Bias and process-power solutions
PROCESS CONTROL FOR REACTIVE SPUTTERING, METALLIC SPUTTERING, AND CATHODIC ARC DEPOSITION
Durable coatings and customizable film properties are key benefits of today’s
PVD processes. From advanced devices, such as cell phones, solar panels,
and flat-panel T.V.s, to more traditional products, such as watches and drill bits,
Advanced Energy® delivers product performance, variety, and value
to meet the needs of any application.
We offer complete coverage of DC, pulsed DC, and low-frequency AC, with
field-proven performance, unique control of power-delivery parameters, and
a range of options to optimize cost over the lifetime of your product. With the
most comprehensive, high-performing power-supply portfolio in the industry,
decades of expertise, and a vast network of support sites across the globe,
Advanced Energy® heightens the possibilities for PVD process control and
product quality.
2 43 5
With the most comprehensive PVD product portfolio in the industry, AE provides your ideal power-delivery solution, backed by a vast network of support sites across the globe.
DC AC Pulsed DC RF Pulsed DC with RF DC with RF
Sputtering Type Magnetron only Magnetron only Magnetron only Magnetron or Diode Magnetron only Magnetron only
Appropriate Target Materials Conductive only Conductive only Conductive only All targets Conductive only Conductive only
Typical Sputtering Rate (% of DC) 100% 70 to 85% 70 to 85% 20% 70 to 90% 70 to 95%
Cost and Complexity
Campaign Length
Film Quality
Optical Transmission
Resistivity
Pinholes
Packing Density
* No loss of anode even when using only one cathode LEGEND Best Excellent Very Good Good
Process Type Applications AE Solutions
Low and Mid Power High Power
Reactive Sputtering
Single Cathode Anti-reflective coating Passivation layers
Pinnacle® Series Pinnacle® Plus+ Series
Solvix by AE Series
Dual Cathode Functional, decorative, and hard coatings TCO layers
PEII Series Crystal® Series Ascent® DMS Series
Metallic Sputtering, Single Cathode Functional, decorative, and hard coatings TCO layers
Pinnacle® Series Ascent® AMS Series
Cathodic Arc Deposition Functional, decorative, and hard coatings (TiN, TiCN, ALTiN, ALCrSiN, TiB
2, CrN, and more)
Solvix by AE Series Solvix by AE Series
MaterialCathode Configuration
Process Requirements
AE SolutionArc Management Arc Synch
Set Point Compensation
Unipolar Pulsing Pulse Synch Voltage Reversal Bipolar Operation High Frequency
Metal
SingleAscent® AMS Series
Pinnacle Series
Dual
Ascent® DMS Series
PEII Series Crystal® Series
TCO
Single
Ascent® AMS Series
Pinnacle Series
Pinnacle® Plus+ Series
Dual
Ascent® DMS Series
PEII Series
Crystal® Series
Insulator
Single Pinnacle® Plus+ Series
Dual
PEII Series
Crystal® Series
Ascent® DMS Series
Required Possibly required
Higher Yield and Film Quality
AE arc management maintains process
stability and throughput even with the
most arc-prone materials, such as AZO,
IGZO, IZO, Al2O
3, and SiO
2. Sophisticated
arc inhibition, detection, and response
reduce arc rate and quickly extinguish arcs.
Engineered to remove power quickly, store
extremely low energy, dissipate energy
stored in output cabling, and gradually ramp
power after an arc event, AE power supplies
reduce arc-caused film defects and process
interruptions.
In any PVD sputtering process, arcing forms near insulative regions that are either inclusions in the target or debris on the target surface. These insulative regions will develop a charge buildup until sufficient to cause an electrical breakdown.
Reduced Defects and Higher Throughput for the Most Arc-Prone Processes
Available Feature Description
Low stored energy AE power supplies reduce arc energy and resulting film defects by offering the lowest stored-energy levels in the industry.
Voltage reversal Power supplies inhibit arc formation, quench arcs that do occur, and dissipate energy stored in output cabling by reversing voltage periodically or in response to an arc event.
User-selectable arc handling parameters Customize arc handling to suit your target material and film-property requirements by adjusting voltage trip level, delay to shutdown, and shutdown time.
Progressive off-time Actual arc rate and energy determines off time, reducing persistent arcs, preserving power levels, and increasing throughput.
Controlled arc-response recovery Power supplies minimize arc re-ignition and persistent arcs by gradually ramping power after arc handling.
Set point compensation To maintain set point over time and increase throughput, power supplies regulate delivered power to compensate for cumulative arc-response off-time.
Arc Synch Achieve higher power levels and throughput by connecting multiple units and synchronizing their arc responses.
Reduced Arc Rate and Energy: Voltage Reversal
Inhibits arc formation
+ + +
–––
Discharging the dielectric surfaces
0
Trev T
onT
cycle
Time
Vo
ltag
e
Sputter-deposition of dielectric layers and charging up dielectric surfaces
The first technology that proactively inhibits arc formation, quenches arcs that do occur, and dissipates energy stored in output cabling, voltage reversal is field-proven over two decades of use in AE power supplies. It clears charge buildup periodically or in response to an arc event. With pulsed power, a reversal occurs during each pulse.
Quenches existing arcs
Dissipates energy stored in output cabling
Voltage reversal reduces arc rate by periodically clearing charge buildup.
It reduces arc energy to less than 1 mJ/kW by dissipating energy stored
in output cabling.
5
Higher Yield and Film Quality
AE arc management maintains process
stability and throughput even with the
most arc-prone materials, such as AZO,
IGZO, IZO, Al2O
3, and SiO
2. Sophisticated
arc inhibition, detection, and response
reduce arc rate and quickly extinguish arcs.
Engineered to remove power quickly, store
extremely low energy, dissipate energy
stored in output cabling, and gradually ramp
power after an arc event, AE power supplies
reduce arc-caused film defects and process
interruptions.
In any PVD sputtering process, arcing forms near insulative regions that are either inclusions in the target or debris on the target surface. These insulative regions will develop a charge buildup until sufficient to cause an electrical breakdown.
Reduced Defects and Higher Throughput for the Most Arc-Prone Processes
Available Feature Description
Low stored energy AE power supplies reduce arc energy and resulting film defects by offering the lowest stored-energy levels in the industry.
Voltage reversal Power supplies inhibit arc formation, quench arcs that do occur, and dissipate energy stored in output cabling by reversing voltage periodically or in response to an arc event.
User-selectable arc handling parameters Customize arc handling to suit your target material and film-property requirements by adjusting voltage trip level, delay to shutdown, and shutdown time.
Progressive off-time Actual arc rate and energy determines off time, reducing persistent arcs, preserving power levels, and increasing throughput.
Controlled arc-response recovery Power supplies minimize arc re-ignition and persistent arcs by gradually ramping power after arc handling.
Set point compensation To maintain set point over time and increase throughput, power supplies regulate delivered power to compensate for cumulative arc-response off-time.
Arc Synch Achieve higher power levels and throughput by connecting multiple units and synchronizing their arc responses.
Reduced Arc Rate and Energy: Voltage Reversal
Inhibits arc formation
+ + +
–––
Discharging the dielectric surfaces
0
Trev T
onT
cycle
Time
Vo
ltag
e
Sputter-deposition of dielectric layers and charging up dielectric surfaces
The first technology that proactively inhibits arc formation, quenches arcs that do occur, and dissipates energy stored in output cabling, voltage reversal is field-proven over two decades of use in AE power supplies. It clears charge buildup periodically or in response to an arc event. With pulsed power, a reversal occurs during each pulse.
Quenches existing arcs
Dissipates energy stored in output cabling
Voltage reversal reduces arc rate by periodically clearing charge buildup.
It reduces arc energy to less than 1 mJ/kW by dissipating energy stored
in output cabling.
The Pulsed-DC Advantage
AE pulsed-DC power supplies reduce arcing while improving deposition rate, film flatness, and packing density. Pulsing lowers the effective
electronic voltage of the whole plasma while maintaining the actual delivered voltage of individual electrons. AE units enable you to create
a customized pulse profile, and to coordinate bias with process-power pulsing.
Film quality produced by straight-DC power (left) vs. pulsed-DC power (right) Source: Centre for Advanced Materials and Surface Engineering, University of Salford, U.K.
Comparison of the impact of arcs using a power supply with pulsing and without pulsing
2500
2250
2000
1750
1500
1250
1000
750
500
250
00 10 20 30 40 50 60 70 80
Time (sec)
Pulsed DC - Hard Arcs
Pulsed DC - Total Arcs
DC - Hard Arcs
DC - Total Arcs
Arc
Co
un
ts
Unipolar Pulsed DC
Ascent® DMS Series
Ascent® AMS Series
Solvix by AE Series
Pinnacle® Plus+ Series
Solvix by AE Series
Bipolar Pulsed DC
Ascent® DMS Series
Ascent® AMS Series
C3
MeasureValueStatus
P1:rpwr(C1,C) P2:rpwr(C3,C)14.81 KV2
P3:mean(C1) P4:mean(C2) P5:max(C3) P6:rms(C4) P7:freq(C3)20.00102kHz
P8:max(C4)
6
Cost Savings
Target Utilization—Excellent arc management reduces target damage, extends target lifetime, and minimizes process interruption for target
replacement. The Ascent DMS series’ individual control of the power delivered to each magnetron allows duty cycle to be customized to the wear
profile of any target material. This enables increased target-wear uniformity and better utilization. Fixed-frequency output also decreases target
damage and nodule formation, further extending target lifetime. Longer runs between maintenance also increase yield and overall profit.
Reliability and Serviceability—Field-proven reliability and compact, streamlined designs lower maintenance costs and enable easy service.
Enhanced Film-Property Control: Solvix by AE Bias Systems
Solvix byAE
Bias Unit
-
-
+
+Solvix by
AEArc Unit
Solvix by AE process power and bias units enable a remarkable degree of process and film-
property control by modulating ion energy as it impacts the substrate. They easily integrate
and allow users to determine film stress, packing density, and degree of implantation,
with high precision.
The Solvix by AE arc-bias solution brings
a new level of precision and productivity
to cathodic arc processes. Powerful arc
discharges, rapid vaporization of target
material, and high-energy ions make cathodic
arc deposition both powerful and potentially
unstable. Available at a range of current levels
up to 400 A, Solvix by AE arc supplies deliver
excellent plasma ionization, ion energy, and
throughput—with remarkable power and
process control. Solvix by AE bias supplies
add an even greater degree of control over
film properties, for remarkably hard, dense,
durable, adherent films. Backed by Advanced
Energy, the world leader in power conversion
technology, the Solvix by AE arc-bias solution
is high-performing, rugged, and cost effective
for your advanced cathodic arc processes.
Proven Reliability
The Solvix by AE arc-bias system features
highly developed DC and pulsed-DC
technology. Units are streamlined to eliminate
potential points of failure. Constructed at a
world-class manufacturing facility that has
received the highest scores from the most
discerning OEM auditors, these rugged power
supplies are highly reliable, with > 10 years of
proven field operation.
7
2013 Advanced Energy Industries, Inc. All rights reserved. Advanced Energy®, A Powerful Advantage™, Ascent®, Crystal®,
and Pinnacle® are U.S. trademarks of Advanced Energy Industries, Inc
ENG-PVD-230-01 0M 4.13
Advanced Energy Industries, Inc. 1625 Sharp Point Drive Fort Collins, Colorado 80525 U.S.A.
T: 800.446.9167F: +1.970.221.4670 www.advanced-energy.com
For more information on AE’s complete product portfolio, visit www.advanced-energy.com/en/Products.html
Specifications are subject to change without notice.
Worldwide Support Network
More than 200 professionals are available around the clock—in dozens of locations around the world—to provide highly responsive sales,
service, and technical support. Our comprehensive network of AE offices and regional partners provides insight into your product, process,
and application, from a location near you.
Thermal Product Manufacturing:Vancouver, WA, USA
Design, Sales, and Service:San Jose, CA, USA
World Headquarters:Fort Collins, CO, USA
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Sales, Service, and Regional Manufacturing:Seoul, Korea
Sales and Service:Fujisawa, Japan
Sales and Service:Filderstadt, Germany
Sales, Service, and Regional Manufacturing:Shanghai, China
Design Center:Villaz-St-Pierre, Switzerland
High-Volume Manufacturing: Shenzhen, China
Sales and Service:Hsinchu, Taiwan
Sales and Service:SingaporeDesign and launch
Manufacturing
Sales and service
World Headquarters