VLSI Design Lecture PPTs
INSTITUTE OF AERONAUTICAL ENGINEERING
Dundigal, Hyderabad -500 043
1 6/3/2015
Department : ELECTRONICS AND COMMUNICATION ENGINEERING
Course Code : 57035
Course Title : VLSI DESIGN
Course Coordinator : VR. Sheshagiri Rao, Professor
Team of Instructors B. Kiran Kumar, Assistant Professor
Course Structure : Lectures Tutorials Practicals Credits
4 1 - 4
Unit I Introduction to IC technology
Topics
• MOS, PMOS, NMOS, CMOS and BiCMOS Technologies:
• Oxidation • Lithography • Diffusion • Ion implantation • Metallization • Encapsulation • Probe testing • Integrated Resistors and Capacitors
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Acronym of VLSI
• V -> Very • L -> Large • S -> Scale • I -> Integration
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Types of Field Effect Transistors (The Classification)
» JFET
MOSFET (IGFET)
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n-Channel JFET
p-Channel JFET
n-Channel EMOSFET
p-Channel EMOSFET
Enhancement MOSFET
Depletion MOSFET
n-Channel DMOSFET
p-Channel DMOSFET
FET
MOSFET (Metal-Oxide Semiconductor Field-Effect Transistor) Primary component in high-density VLSI chips such as memories and microprocessors
JFET (Junction Field-Effect Transistor) Finds application especially in analog and RF circuit design
Metal Oxide Semiconductor(MOS)
• Advantages of FET over conventional Transistors
• Unipolar device i. e. operation depends on only one type of charge carriers (h or e)
• Voltage controlled Device (gate voltage controls drain current)
• Very high input impedance (109-1012 )
• Source and drain are interchangeable in most Low-frequency applications
• Low Voltage Low Current Operation is possible (Low-power consumption)
• Less Noisy as Compared to BJT
• No minority carrier storage (Turn off is faster)
• Very small in size, occupies very small space in ICs
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Switch Model of NMOS Transistor
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Gate
Source (of carriers)
Drain (of carriers)
| VGS |
| VGS | < | VT | | VGS | > | VT |
Open (off) (Gate = Closed (on) (Gate = )
Ron
Switch Model of PMOS Transistor
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Gate
Source (of carriers)
Drain (of carriers)
| VGS |
| VGS | > | VDD – | VT | | | VGS | < | VDD – |VT| |
Open (off) (Gate = ) Closed (on) (Gate = ) Ron
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MOS transistors Symbols
D
S
G
D
S
G
G
S
D D
S
G
NMOS Enhancement NMOS
PMOS
Depletion
Enhancement
B
NMOS with Bulk Contact
Channel
MOSFET Circuit Symbols
• (g) and (i) are the most commonly used symbols in VLSI logic design.
• MOS devices are symmetric.
• In NMOS, n+ region at higher voltage is the drain.
• In PMOS p+ region at lower voltage is the drain
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The NMOS Transistor Cross Section
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n areas have been doped with donor ions (arsenic) of concentration ND - electrons are the majority carriers
p areas have been doped with acceptor ions (boron) of concentration NA - holes are the majority carriers
Gate oxide
n+
Source Drain
p substrate
Bulk (Body)
p+ stopper
Field-Oxide (SiO2) n+
Polysilicon Gate
L
W
Carriers and Current
• Carriers always flow from the Source to Drain • NMOS: Free electrons move from Source to
Drain.
– Current direction is from Drain to Source. • PMOS: Free holes move from Source to Drain.
– Current direction is from Source to Drain. –
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The MOSFET Channel
• Under certain conditions, a thin channel can be formed right underneath the Silicon-Dioxide insulating layer, electrically connecting the Drain to the Source. The depth of the channel (and hence its resistance) can be o t olled the Gate s oltage. The le gth of
the channel (shown in the figures above as L) a d the ha el s idth W, a e i po ta t design parameters.
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REGION OF OPERATION CASE-1 (No Gate Voltage)
• Two diodes back to back exist in series. • One diode is formed by the pn junction
between the n+ drain region and the p-type substrate
• Second is formed by the pn junction between the n+ source region and the p-type substrate
• These diodes prevent any flow of the current. • There exist a very high resistance.
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NMos Cut View
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REGION OF OPERATION Creating a channel
• Apply some positive voltage on the gate terminal.
• This positive voltage pushes the holes downward in the substrate region.
• This causes the electrons to accumulate under the gate terminal.
• At the same time the positive voltage on the gate also attracts the electrons from the n+ region to accumulate under the gate terminal.
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REGION OF OPERATION Creating a channel
• When sufficient electrons are accumulated under the gate an n-region is created, connecting the drain and the source
• This causes the current to flow from the drain to source
• The channel is formed by inverting the substrate surface from p to n, thus induced channel is also called as the inversion layer.
• The voltage between gate and source called vgs at which there are sufficient electron under the gate to form a conducting channel is called threshold voltage Vth.
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Formation of Channel
• First, the holes are repelled by the positive gate voltage, leaving behind negative ions and forming a depletion region. Next, electrons are attracted to the interface, creating a channel
i e sio la e .
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MOS Transistor Current direction
• The source terminal of an n-channel(p-channel) transistor is defined as whichever of the two terminals has a lower(higher) voltage.
• When a transistor is turned ON, current flows from the drain to source in an n-channel device and from source to drain in a p-channel transistor.
• In both cases, the actual carriers travel from the source to drain.
• The current directions are different because n-channel carriers are negative, whereas p-channel carriers are positive.
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MOS I/V
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For a NMOS, a necessary condition for the channel to exist is:
THGS VV
REGION OF OPERATION Applying small Vds
• Now we applying some small voltage between source and drain
• The voltage Vds causes a current to flow from drain to gate.
• Now as we increase the gate voltage, more current will flow.
• Increasing the gate voltage above the threshold voltage enhances the channel, hence this mode is called as enhancement mode operation.
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Operation – nMOS Transistor
• Accumulation Mode - If Vgs < 0, then an electric field is established across the substrate.
• Depletion Mode -If 0 Vtn, the region below the gate will be inverted.
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Operation – nMOS Transistor
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V =0
Operation – nMOS Transistor
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Operation – nMOS Transistor
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Operation – nMOS Transistor
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Operation – nMOS Transistor
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Operation – nMOS Transistor
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Voltage-Dependent Resistor
• The inversion channel of a MOSFET can be seen as a resistor.
• Since the charge density inside the channel depends on the gate voltage, this resistance is also voltage-dependent.
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Channel Potential Variation
• “i e the e s a channel resistance between drain and source, and if drain is biased higher than the source, then the potential between gate and channel will decrease from source to drain.
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Channel Pinch-Off
• As the potential difference between drain and gate becomes more positive, the inversion layer beneath the interface starts to pinch off around drain.
• When VD s> VGs - Vth, the channel at drain totally pinches off, and when VD s< VGs - Vth, the channel length starts to decrease.
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Transistor in Saturation Mode
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S
D
B
G VGS VDS > VGS - VT
ID
VGS - VT - + n+ n+
Pinch-off
Assuming VGS > VT
VDS
The current remains constant (saturates).
Du i g pi hoff
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Does this mean that the current i =0 ? Actually, it does not. A MOSFET that is pinched off at the drain end of the channel still conducts current:
The large E in the depletion region surrounding the drain will sweep electrons across the end of the pinched off channel to the drain.
This is very similar to the operation of the BJT. For an npn BJT, the electric field of the reversed biased CBJ swept electrons from the base to the
collector regions.
N-Channel MOSFET characteristics
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Enhancement-Mode PMOS Transistors: Structure
• p-type source and drain regions in n-type substrate.
• vGS < 0 required to create p-type inversion layer in channel region
• For current flow, vGS < vTP • To maintain reverse bias on
source-substrate and drain-substrate junctions, vSB < 0 and vDB < 0
• Positive bulk-source potential causes VTP to become more negative
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P-channel MOSFET characteristics
linear saturation
p transistor
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Depletion-Mode MOSFETS
• NMOS transistors with • Ion implantation process
is used to form a built-in n-type channel in the device to connect source and drain by a resistive channel
• Non-zero drain current for vGS = 0; negative vGS required to turn device off.
VTN0
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pMOS are 2.5 time slower than
nMOS due to electron and hole
mobilities
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Basic processes involved in fabricating Monolithic ICs
1. Silicon wafer (substrate) preparation
2. Epitaxial growth
3. Oxidation
4. Photolithography
5. Diffusion
6. Ion implantation
7. Metallization
8. Testing
9. Assembly processing & packaging
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Oxidation
1. SiO2 is an extremely hard protective coating & is unaffected by almost all reagents except by hydrochloric acid. Thus it stands against any contamination.
2. By selective etching of SiO2, diffusion of impurities through carefully defined through windows in the SiO2 can be accomplished to fabricate various components.
Formation of silicon dioxide layer on the surface of Si wafer 1. protects surface from contaminants 2. forms insulating layer between conductors 3. form barrier to dopants during diffusion or ion implantation 4. grows above and into silicon surface
Dry oxidation: lower rate and higher quality Wet oxidation: higher rate and lower quality
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Oxidation The silicon wafers are stacked up in a quartz boat & then
inserted into quartz furnace tube. The Si wafers are raised to a high temperature in the range of 950 to 1150oC & at the same time, exposed to a gas containing O2 or H2O or both. The chemical action is
Si + 2H2O-----------> Si O2+ 2H2 (Wet )
Si + O2 -------------> SiO2 (Dry )
54
Photolithography
• Coat wafer with photoresist (PR)
• Shine UV light through mask to selectively expose PR
• Use acid to dissolve exposed PR
• Now use exposed areas for – Selective doping – Selective removal of material
under exposed PR
Wafer
Photoresist
Mask
UV Light
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Adding Materials
• Add materials on top of silicon – Polysilicon – Metal – Oxide (SiO2) - Insulator
• Methods – Chemical deposition – Sputtering (Metal ions) – Oxidation
Silicon
Added Material (e.g. Polysilicon)
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Oxide (Si02) - The Key Insulator
• Thin Oxide – Add using chemical deposition – Used to form gate insulator & block active areas
• Field Oxide (FOX) - formed by oxidation – Wet (H20 at 900oC - 1000oC) or Dry (O2 at 1200oC) – Used to insulate non-active areas
Silicon Wafer Silicon Wafer
SiN / SiO2 FOX FOX SiO2 Thin Oxide
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Patterning Materials using Photolithography
• Add material to wafer • Coat with photoresist • Selectively remove
photoresist
• Remove exposed material • Remove remaining PR
Silicon
Added Material (e.g. Polysilicon)
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Diffusion
• Introduce dopant via epitaxy or ion implant e.g. Arsenic (N), Boron (P)
• Allow dopants to diffuse at high temperature
• Block diffusion in selective areas using oxide or PR
• Diffusion spreads both vertically, horizontally Silicon
Diffusion
Blocking Material (Oxide)
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Slide 59
Ion Implantation
180 kV
Resolving Aperture
Ion Source
Equipment Ground
Acceleration Tube
90° Analyzing Magnet
Terminal Ground
20 kV
Focus Neutral beam and beam path gated
Beam trap and gate plate
Wafer in wafer process chamber
X - axis scanner
Y - axis scanner
Neutral beam trap and beam gate
Gases
Ar
AsH3
B11F3 *
He
N2
PH3
SiH4
SiF4 GeH4
Solids
Ga
In
Sb
Liquids
Al(CH3)3
Process Conditions
Flow Rate: 5 sccm
Pressure: 10-5 Torr
Accelerating Voltage: 5
to 200 keV
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Slide 60
Metallization
• Sputter on aluminum over whole wafer • Pattern to remove excess metal, leaving wires
p substrate
Metal
Thick field oxide
n well
n+n+ n+p+p+p+
Metal
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nMOS fabrication steps 1. Processing is carried out on a thin wafer cut from a single crystal of silicon of high purity into which the required p-impurities are introduced as the crystal is grown.
2. A layer of silicon dioxide (Si02) is grown all over the surface of the wafer to protect the surface, act as a barrier to dopants during processing, and provide a generally insulating substrate on to which other layers may be deposited and patterned.
3. The surface is now covered with a photoresist which is deposited onto the wafer and spun to achieve an even distribution of the required thickness.
4. The photoresist layer is then exposed to ultraviolet light through a mask which defines those regions into which diffusion is to take place together with transistor channels.
5. These areas are subsequently readily etched away together with the underlying silicon dioxide so that the wafer surface is exposed in the window defined by the mask.
6. The remaining photoresist is removed and a thin layer of Si02 is grown over the entire chip surface and then polysilicon is deposited on top of this to form the gate structure.
7. Further photoresist coating and masking allows the polysilicon to be patterned (as shown in Step 6) and then the thin oxide is removed to expose areas into which
8. Thick oxide (Si02) is grown over all again and is then masked with photoresist and etched to expose selected areas of the polysilicon gate and the drain and source areas where connections (i.e. contact cuts) are to be made.
9. The whole chip then has metal (aluminium) deposited over its surface. This metal layer is then masked and etched to form the required interconnection pattern.
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1.
2.
3.
……………………………………… ………………………………………
……………………………………… ………………………………………
Substrate
Thick oxide
(1m)
Photoresist
p
p
p
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4.
5. ……………………………………… ………………………………………
……………………………………… ………………………………………
Window in
oxide
Mask
UV light
p
p
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6.
7. ……………………………………… ………………………………………
……………………………………… ……………………………………… Patterned Poly. (1-2 m)
On thin oxide
( 800-1000A0 )
……………………………………… ………………………………………
…… ……
…… ……
………… ………… n+ diffusion (1 m deep)
p
p
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8.
……………………………………… ……………………………………… …… …… ……. …… …… ………… ………… Contact holes
(cuts)
………… ………… ………… ………… ………… ………… ……
……
……
……
9.
……………………………………… ……………………………………… …… …… ……. …… …… ………… …………
Patterned
Metallization
(aluminum
1 m)
………… ………… ………… ………… ………… ………… ……
……
……
……
p
p
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CMOS FABRICATION
• There are a number of approaches to CMOS fabrication, including the p-well, the n-well, the twin-tub, and the silicon-on-insulator processes.
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The p-well Process
In primitive terms, the structure consists of an n-type substrate in which p-devices may
be formed by suitable masking and diffusion and, in order to accommodate n-type devices,
a deep p-well is diffused into the n-type substrate as shown.
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The p-well CMOS fabrication
In all other respects-masking, patterning, and diffusion-the process is similar to nMOS fabrication. In summary, typical processing steps are: • Mask 1 - defines the areas in which the deep p-well diffusions are to take place. • Mask 2 - defines the thinox regions, namely those areas where the thick oxide is to be stripped and thin oxide grown to accommodate p- and n-transistors and wires. • Mask 3 - used to pattern the polysilicon layer which is deposited after the thin oxide. • Mask 4 - A p-plus mask is now used (to be in effect "Anded" with Mask 2) to define all areas where p-diffusion is to take place. • Mask 5 - This is usually performed using the negative form of the p-plus mask and defines those areas where n-type diffusion is to take place. • Mask 6 - Contact cuts are now defined. • Mask 7 - The metal layer pattern is defined by this mask. Mask 8 - An overall passivation (overglass) layer is now applied and Mask 8 ts needed to define the openings for access to bonding pads.
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……………………………………… … … 1. p-well
(4-5 m)
SiO2
………… …… …… 2. Thin oxide
and
polysilicon
Polysilicon
p
p
n
n
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………… …… …… 3.
p-diffusion
P+ mask
(positive)
………… …… …… 4.
n-diffusion P+ mask
(negative)
p
n
p
n
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Vin
n
p
Vout VSS VDD
CMOS p-well inverter showing VDD and VSS substrate connections
Polysilicon
Oxide
n-diffusion
P-diffusion
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Vin
p
n
Vout VSS VDD
CMOS n-well inverter showing VDD and VSS substrate connections
Polysilicon
Oxide
n-diffusion
P-diffusion
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The n-well Process • As indicated earlier, although the p-well process is widely used, n-well fabrication
has also gained wide acceptance, initially as a retrofit to nMOS lines.
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The twin-tub-Tub Process
A logical extension of the p-well and n-well approaches is the twin-tub fabrication process.
Here we start with a substrate of high resistivity n-type material and then create both .. n-well and p-well regions. Through this process it is possible to preserve the performance of n-transistors without compromising the p-transistors. Doping control is more readily achieved
and some relaxation in manufacturing tolerances results. This is particularly important as far
as latch-up is concerned.
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Vin
n
Vout VSS VDD
Twin-tub structure
( A logical extension of the p-well and n-well)
Polysilicon
Oxide
n-diffusion
P-diffusion
p
n substrate
well well
Epitaxial
layer
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Bipolar compatible CMOS(Bi-CMOS) technology:
Introduced in early 1980s
Combines Bipolar and CMOS logic
Low power dissipation High speed High packing density High output
drive
High Noise Margin High transconductance
(gm)
High input impedance
Bi-CMOS
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The objective of the Bi-CMOS is to combine bipolar and CMOS so as to exploit the advantages of both the technologies. Today Bi-CMOS has become one of the dominant technologies used for high speed, low power and highly functional VLSI circuits.
The process step required for both CMOS and bipolar are almost similar The primary approach to realize high performance Bi-CMOS devices is the addition of bipolar process steps to a baseline CMOS process. The Bi-CMOS gates could be used as an effective way of speeding up the VLSI circuits. The applications of Bi-CMOS are vast. Advantages of bipolar and CMOS circuits can be retained in Bi-CMOS chips.
Bi-CMOS technology enables high performance integrated circuits IC’s but increases process complexity.
Features
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Higher switching speed Higher current drive per unit area, higher gain
Generally better noise performance and better high frequency characteristics Improved I/O speed (particularly significant with the growing importance of package limitations in high speed systems). high power dissipation
lower input impedance (high drive current) low packing density low delay sensitivity to load It is essentially unidirectional.
Characteristics of Bipolar Technology
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Lower static power dissipation
Higher noise margins
Higher packing density
High yield with large integrated complex functions
High input impedance (low drive current)
Scalable threshold voltage
High delay load sensitivity
Low output drive current (issue when driving large capacitive loads)
Bi-directional capability (drain & source are interchangeable)
A near ideal switching device,
Low gain
Characteristics of CMOS
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CMOS process BI-POLAR process 1 . N-well 1. n+ sub-collector
2. P base doping(extra step)
3. PMOS source and drain 3. p+ base contact
4. NMOS source and drain 4. n+ emitter
Bi-CMOS FABRICATION PROCESS
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npn-BJT Fabrication
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BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening
p-substrate
n+ buried layer
p-base layer
n+ layer n+ layer p+ layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
n epi layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
p+ isola
tion layer
p+ isola
tion layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
p+ isola
tion layer
p+ isola
tion layer
p-base layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
p+ isola
tion layer
p+ isola
tion layer
p-base layer
n+ layer n+ layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
p+ isola
tion layer
p+ isola
tion layer
p-base layer
n+ layer n+ layer p+ layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
p+ isolation layer
p-base layer
n+ layer n+ layer p+ layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
p+ isolation layer
p-base layer
n+ layer n+ layer p+ layer
BJT Processing
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1. Implantation of the buried n+ layer
2. Growth of the epitaxial layer
3. p+ isolation diffusion
4. Base p-type diffusion
5. Emitter n+ diffusion
8. Metal deposition and etching
6. p+ ohmic contact
7. Contact etching
9. Passivation and bond pad opening p-substrate
n+ buried layer
p+ isolation layer
p-base layer
n+ layer n+ layer p+ layer
Lateral view of npn BJT
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Lateral PNP BJT
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Doping Profiles in a BJT
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NMOS PMOS
G
D S G
D S
NPN-BJT
C B E
N Plus Buried Layer
N-Well (Collector)
N-
Diff
N-
Diff
P-Diff P-Diff N-Plus
Emitter
P-SUBSTRATE
P-EPITAXY
BICMOS STRUCTURE
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P-SUBSTRATE
P-SUBSTRATE
P-SUBSTRATE IS TAKEN
P-TYPE SUBSTRATE IS COVERED WITH OXIDE LAYER
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N Plus Buried Layer
P-SUBSTRATE
P-SUBSTRATE
A WINDOW IS OPENED THROUGH OXIDE LAYER
THROUGH THE WINDOW N TYPE IMPURITIES IS HEAVILY DOPED
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N Plus Buried Layer P-SUBSTRATE
P-EPITAXY
P-EPITAXY LAYER IS GROWN ON THE ENTIRE SURFACE
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N Plus Buried Layer P-SUBSTRATE
P-EPITAXY
THE ENTIRE SURFACE IS COVERED WITH OXIDE LAYER AND TWO WINDOWS
ARE OPENED THROUGH THE OXIDE LAYER
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N Plus Buried Layer
N-Well (Collector)
N-Well
P-SUBSTRATE
P-EPITAXY
THROUGH THE TWO WINDOWS N-TYPE IMPURITIES ARE DIFFUSED TO
FORM N-WELLS
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N Plus Buried Layer
N-Well (Collector)
N-Well
P-SUBSTRATE
P-EPITAXY
THREE WINDOWS ARE OPENED THROUGH THE OXIDE LAYER , IN THESE
THREE WINDOWS THREE ACTIVE DEVICES NMOS,PMOS AND NPN BJT
ARE FORMED
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N Plus Buried Layer
N-Well (Collector)
N-Well
P-SUBSTRATE
P-EPITAXY
THE ENTIRE SURFACE IS COVERED WITH THINOX AND POLYSILICON
AND ARE PATTERNED TO FORM THE GATE TERMINALS OF THE NMOS
AND PMOS
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N Plus Buried Layer
N-Well (Collector)
N-Well P-Base
P-SUBSTRATE
P-EPITAXY
THROUGH THE 3RD WINDOW THE P-IMPURITIES ARE MODERATELY
DOPED TO FORM THE BASE TERMINAL OF BJT
N-WELL ACTS LIKE THE COLLECTOR TERMINAL
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N Plus Buried Layer
N-Well (Collector)
N-Well P-Base
P-SUBSTRATE
P-EPITAXY
N-
Diff
N-
Diff
N-Plus
Emitter
THE N-TYPE IMPURITES ARE HEAVILY DOPED TO FORM
1.SOURCE AND DRAIN REGION OF NMOS
2.EMITTER TERMINAL OF BJT
3.AND INTO NWELL COLLECTOR REGION FOR CONTACT PURPOSE
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N Plus Buried Layer
N-Well (Collector)
N-Well
N-
Diff
N-
Diff
P-Diff P-Diff
P-Base
N-Plus
Emitter
P-SUBSTRATE
P-EPITAXY
THE P-TYPE IMPURITES ARE HEAVILY DOPED TO FORM
1.SOURCE AND DRAIN REGION OF PMOS
2.AND INTO P-BASE REGION FOR CONTACT PURPOSE
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N Plus Buried Layer
N-Well (Collector)
N-Well
N-
Diff
N-
Diff
P-Diff P-Diff
P-Base
N-Plus
Emitter
P-SUBSTRATE
P-EPITAXY
THE ENTIRE SURFACE IS COVERED WITH THICK OXIDE LAYER
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N Plus Buried Layer
N-Well (Collector)
N-Well
N-
Diff
N-
Diff
P-Diff P-Diff
P-Base
N-Plus
Emitter
P-SUBSTRATE
P-EPITAXY
THE ENTIRE SURFACE IS COVERED WITH THICK OXIDE LAYER AND IS
PATTERNED FOR CONTACT CUTS
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NMOS PMOS
G
D S G
D S
NPN-BJT
C B E
N Plus Buried Layer
N-Well (Collector)
N-
Diff
N-
Diff
P-Diff P-Diff N-Plus
Emitter
P-SUBSTRATE
P-EPITAXY
METAL CONTACTS ARE FORMED
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Resistors & Capacitors fabrication
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Oh s La • Current I in terms of Jn • Voltage V in terms of electric field
– Result for R
IRV
JtWJAI
LVE /
EWtJtWJAI
VL
WtJtWJAI
tW
LR
1
tW
LR
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Sheet Resistance (Rs)
• IC resistors have a specified thickness – not under the control of the circuit designer
• Eliminate t by absorbing it into a new parameter: the sheet resistance (Rs)
W
LR
W
L
tWt
LR sq
Nu e of “ ua es
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ELECTRON AND HOLE MOBILITY
Carrier Mobilities versus Doping Concentration
0.00E+00
2.00E+02
4.00E+02
6.00E+02
8.00E+02
1.00E+03
1.20E+03
1.40E+03
1.60E+03
1.00E+14 1.00E+15 1.00E+16 1.00E+17 1.00E+18 1.00E+19
Doping Concentration (Na or Nd)
Carr
ier
Mo
bilit
y (
cm
2/V
-sec)
mu_n
mu_p
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DIFFUSED RESISTOR
Aluminum contacts
The n-type wafer is always biased positive with respect to the p-type diffused region. This ensures that the pn junction that is formed is in reverse bias, and there is no current leaking to the substrate. Current will flow through the diffused resistor from one contact to the other. The I-V characteristic follows Ohm’s Law: I = V/R
n-wafer Diffused p-type region
Silicon dioxide
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Layout/Mask Layer 1 - Diffusion (green)
L
W
L/W is the number of ‘squares’ long the resistor is said to be.
The sheet resistance rhos, is the resistance of each square
5 squares in this case
If rhos is 100 ohms per square, R = 500 ohms
The resistance, R = rhos (L/W)
Top View
Side View
P type Diffusion N wafer
Resistor termination
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IC Fabrication: Ion Implantation
• Si substrate (p-type) • Grow oxide (thermally) • Add photoresist • Expose (visible or UV source) • Etch (chemical such as HF) • Ion implantation (inject dopants) • Diffuse (increase temperature and allow
dopants to diffuse)
P-type Si Substrate
oxide
N-type diffusion region
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Using Sheet Resistance (Rs)
• Ion-i pla ted o diffused IC esisto
P-type Si Substrate
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Poly Film Resistor
• To lower the capacitive parasitics, we should build the resistor further away from substrate
• We a deposit a thi fil of pol “i hea il doped) material on top of the oxide
• The poly will have a certain resistance (say 10 Ohms/sq)
Oxide Polysilicon Film (N+ or P+ type)
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Diffused Resistor -Dope a region of the silicon (n-type or p-type) to an acceptable NA or ND. -Then place a contact at each end of the diffusion region. -The diffusion region will have a given resistivity specified in "Oh s / “ ua e -Then alter the geometry (L/W ration) to get the desired resistance - typically these have a sheet resistance between 100 to 200 ohms/sq - to save space -These are laid out using a serpentine geometry
-The interesting thing about the l/W ratio is that if l=W, then the shape is a square and R=Rs, this is true no matter how big the square is. -In fact, the l/W ratio is actually the number of squares in a given trace geometry - We typically just count the squares and use:
R= Rs*(no.of.squares)
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Polysilicon Resistor -Another way to fabricate a resistor is to use Polysilicon. -Polysilicon has a high resistivity prior to Ion Implantation -Use undoped Polysilicon to create a high value resistor Before Ion Implantation : Rs = 10M Ohms/Square After Ion Implantation : Rs = 20 to 40 Ohms/Square - Typically don't even need 1 square to get our resistively so we don't need to do a serpentine layout - One drawback is that the resistance can vary widely with process when using less than 1 square to get a resistor in the k-Ohms range. - These are typically used when we just want a BIG resistor and don't care about the exact value
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Metal Resistor -Metal can also be used for very small resistors
-The M1 layer typically has sheet resistance on the order of mohms/sq. - Use a serpentine layout to get a small resistor (1-10 ohms)
Cross sections of resistors of various types available from a typical n-well CMOS process.
-n-well process is used for medium value of resistors, while the n+ and p+ diffusions are useful for low value resistors.
-The resistance value depends on the length and width of the diffused regions, the tolerance of the resistor value is very poor (i.e., 20 to 50 %)
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Capacitors
• Composed of two conductive plates separated by an insulator (or dielectric). – Commonly illustrated as two parallel metal plates
separated by a distance, d.
– C = e A/d – where e = er eo – er is the relative dielectric constant – eo is the vacuum permittivity
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CMOS Capacitors -There are 3 common ways to make a capacitor
1) MOS Capacitor: -simply create a MOS structure where the Gate (Metal) terminal is one terminal and the Body (Semiconductor) terminal is Ground - while this is easy to implement, the capacitance changes with the bias voltage (i.e., VG) due to the depletion and inversion which occurs
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MIM Capacitor -"Metal Insulator Metal"-this is simply a parallel plate capacitor using two metals and an insulator -This type of capacitor is created using an extra process step that puts in an additional metal layer that can be very close to one of the other metal layers to get a smaller plate-to-plate separation -Since the plates are made of metal, the capacitance doesn't change with bias voltage-these capacitors are not as large as MOS capacitors
Interpoly and MOS capacitors in an n-well CMOS process.
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UNIT 2 BASIC ELECTRICAL PROPERTIES
Topics • Basic electrical properties of MOS and BiCMOS
circuits: • Ids-Vds relationships • MOS transistor threshold voltage, gm, gds • figure of merit wo • pass transistor • NMOS inverter • Various pull-ups • CMOS inverter analysis and design • BiCMOS inverters
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MOSFET I-V Characteristics I-V Plots, Channel Length Modulation
– Saturation equation yields curves independent of VDS. Not sure! So we consider the effect of channel length modulation.
130
Quadratic Relationship
0 0.5 1 1.5 2 2.5 0
1
2
3
4
5
6 x 10
-4
V DS (V)
I D (A
)
VGS= 2.5 V
VGS= 2.0 V
VGS= 1.5 V
VGS= 1.0 V
Resistive Saturation
VDS = VGS - VT
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MOSFET I-V Characteristics Channel Length Modulation
• Channel Length Modulation
– With pinch-off the channel at the point y such that Vc(y)=VGS - VT0, The effective channel length is e ual to L = L – ΔL
– ΔL is the length of channel segment over which QI=0.
– Pla e L i the ID(SAT) equation:
20)( )(
2VV
L
WCI TGS
oxnSATD
ΔL Drain
n+ Source
n+
Substrate (p-Si)
(p+) (p+)
Oxide 0 y L’ L
Channel Pinch-off point (QI=0)
Depletion region
VB=0
VS=0 VGS>VT0
VDS>VDSAT
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MOSFET I-V Characteristics Channel Length Modulation
– ΔL increases with an increase in VDS. We can use
– λ: channel length modulation coefficient
– ID(SAT) can be rewritten as
– The above form produces a discontinuity of current at VDS=VGS-VT0. We can include the term in ID(lin) with little error since λ is typically less than 0.1. We will usually ignore λ in manual calculations.
VLVL
L
ΔLLL
ΔLLLΔLLL DSDS
1
1
1
11
1
11111
'
1
)1()(2
20)( VVV
L
WCI DSTGS
oxnSATD
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MOSFET I-V Characteristics Substrate Bias Effect
– So far, VSB=0 and thus VT0 used in the equations. – Clearly not always true – must consider body effect – Two MOSFETs in series:
– – – V“B M = VD“ M ≠ . Thus, VT i the M e uatio is epla ed
by VT = VT(VSB) as developed in the threshold voltage section.
D
S G
D
G
M1
M2 VSB
S
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MOSFET I-V Characteristics Substrate Bias Effect (Cont.)
• The general form of ID can be written as • ID = f (VGS,VDS,VSB) • which due to the body effect term is non-
linear and more difficult to handle in manual calculations
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MOSFET I-V Characteristics Summary of Analytical Equations
– The voltage directions and relationships for the three modes of pMOS are in contrast to those of nMOS.
nMOS
Mode ID Voltage Range
Cut-off 0 VGSVT
Linear ( nCox/2)(W/L)[2(VGS-
VT)VDS-VDS2]
VGS VT,VDS> VGS -VT
Saturatio
n
( nCox/2)(W/L)(VGS-
VT)2(1+ VDS)
VGS VT,VDS VGS -VT
G
D
B
S
VDS VSB VGS ID
G
S
B
D
VDS
VSB VGS
ID
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Pass-Transistor Logic Circuits (1)
A simple approach for implementing logic functions utilizes series and parallel combinations of switches that are controlled by input variables to
connect the input and output nodes.
Each of the switches can be implemented either by a single NMOS transistor or by a pair of CMOS
transistors connected in CMOS transmission gate
configuration. CMOS transmission gate Y=AC
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Pass-Transistor Logic Circuits (2)
An essential requirement in the design of pass-transistor logic is ensuring that every circuit node has at all times a low-resistance path to
VDD or to ground.
If B is high, S1 closes and Y=A.
Y will be VDD if A is high or ground if A is low.
If B is low, S1 opens and Y becomes a high-impedance node.
If voltage of Y is initially zero, it will remain so.
If voltage of Y is initially high at VDD, then the inevitable leakage current will
discharge the C and can no longer be considered a static circuit.
A basic design requirement of PTL circuits is that every node have, at all times, a low resistance path to either ground or VDD. Such a path does not exist in (a) when B is low and S1 is open. It is provided
in (b) through switch S2.
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Pass-Transistor Logic Circuits (3)
The problem can be easily solved by establishing for node Y a low-resistance path that is activated when B goes low.
Another switch, S2, controlled by B is connected between Y and ground. When B goes low, S2 closes and establishes a low-resistance path
between Y and ground.
A basic design requirement of PTL circuits is that every node have, at all times, a low resistance path to either ground or VDD. Such a path does not exist in (a) when B is low and S1 is open. It is provided in
(b) through switch S2.
MOSFET Ids-Vds
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Terminal Voltages
• Mode of operation depends on Vg, Vd, Vs – Vgs = Vg – Vs – Vgd = Vg – Vd – Vds = Vd – Vs = Vgs - Vgd
• Source and drain are symmetric diffusion terminals – By convention, source is terminal at lower voltage – Hence Vds 0
• nMOS body is grounded. • Three regions of operation
– Cutoff – Linear – Saturation
Vg
Vs
Vd
Vgd
Vgs
Vds
+-
+
-
+
-
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nMOS Cutoff
• No channel • Ids = 0
+-
Vgs
= 0
n+ n+
+-
Vgd
p-type body
b
g
s d
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nMOS Linear
• Channel forms • Current flows from d to s
– e- from s to d • Ids increases with Vds • Similar to linear resistor
+-
Vgs
> Vt
n+ n+
+-
Vgd
= Vgs
+-
Vgs
> Vt
n+ n+
+-
Vgs
> Vgd
> Vt
Vds
= 0
0 < Vds
< Vgs
-Vt
p-type body
p-type body
b
g
s d
b
g
s dIds
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nMOS Saturation
• Channel pinches off • Ids independent of Vds • We say current saturates • Similar to current source
+-
Vgs
> Vt
n+ n+
+-
Vgd
< Vt
Vds
> Vgs
-Vt
p-type body
b
g
s d Ids
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I-V Characteristics
• In Linear region, Ids depends on – How much charge is in the channel? – How fast is the charge moving?
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Channel Charge
• MOS structure looks like parallel plate capacitor while operating in inversion
– Gate – oxide – channel • Qchannel =
n+ n+
p-type body
+
Vgd
gate
+ +
source
-
Vgs
-drain
Vds
channel-
Vg
Vs
Vd
Cg
n+ n+
p-type body
W
L
tox
SiO2 gate oxide
(good insulator, ox
= 3.9)
polysilicongate
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Channel Charge
• MOS structure looks like parallel plate capacitor while operating in inversion
– Gate – oxide – channel • Qchannel = CV • C =
n+ n+
p-type body
+
Vgd
gate
+ +
source
-
Vgs
-drain
Vds
channel-
Vg
Vs
Vd
Cg
n+ n+
p-type body
W
L
tox
SiO2 gate oxide
(good insulator, ox
= 3.9)
polysilicongate
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Channel Charge
• MOS structure looks like parallel plate capacitor while operating in inversion
– Gate – oxide – channel • Qchannel = CV • C = Cg = eoxWL/tox = CoxWL • V =
n+ n+
p-type body
+
Vgd
gate
+ +
source
-
Vgs
-drain
Vds
channel-
Vg
Vs
Vd
Cg
n+ n+
p-type body
W
L
tox
SiO2 gate oxide
(good insulator, ox
= 3.9)
polysilicongate
Cox = ox / tox
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Channel Charge • MOS structure looks like parallel plate
capacitor while operating in inversion
– Gate – oxide – channel • Qchannel = CV • C = Cg = eoxWL/tox = CoxWL • V = Vgc – Vt = (Vgs – Vds/2) – Vt
n+ n+
p-type body
+
Vgd
gate
+ +
source
-
Vgs
-drain
Vds
channel-
Vg
Vs
Vd
Cg
n+ n+
p-type body
W
L
tox
SiO2 gate oxide
(good insulator, ox
= 3.9)
polysilicongate
Cox = ox / tox
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Carrier velocity
• Charge is carried by e- • Carrier velocity v proportional to lateral E-field
between source and drain
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Carrier velocity
• Charge is carried by e- • Carrier velocity v proportional to lateral E-field
between source and drain
• v = mE m called mobility • E =energy
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Carrier velocity
• Charge is carried by e- • Carrier velocity v proportional to lateral E-field
between source and drain
• v = mE m called mobility • E = Vds/L • Time for carrier to cross channel:
– t =
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Carrier velocity
• Charge is carried by e- • Carrier velocity v proportional to lateral E-field
between source and drain
• v = mE m called mobility • E = Vds/L • Time for carrier to cross channel:
– t = L / v
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nMOS Linear I-V
• Now we know – How much charge Qchannel is in the channel – How much time t each carrier takes to cross ds
I
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nMOS Linear I-V
• Now we know – How much charge Qchannel is in the channel – How much time t each carrier takes to cross
channelds
QI
t
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nMOS Linear I-V
• Now we know – How much charge Qchannel is in the channel – How much time t each carrier takes to cross
channel
ox 2
2
ds
dsgs t ds
dsgs t ds
QI
t
W VC V V V
L
VV V V
ox = W
CL
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nMOS Saturation I-V
• If Vgd < Vt, channel pinches off near drain – When Vds > Vdsat = Vgs – Vt
• Now drain voltage no longer increases current
dsI
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nMOS Saturation I-V
• If Vgd < Vt, channel pinches off near drain – When Vds > Vdsat = Vgs – Vt
• Now drain voltage no longer increases current
2dsat
ds gs t dsat
VI V V V
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nMOS Saturation I-V
• If Vgd < Vt, channel pinches off near drain – When Vds > Vdsat = Vgs – Vt
• Now drain voltage no longer increases current
22
2
dsatds gs t dsat
gs t
VI V V V
V V
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nMOS I-V Summary
• Shockley 1st order transistor models
2
cutoff
linear
saturatio
0
2
2n
gs t
dsds gs t ds ds dsat
gs t ds dsat
V V
VI V V V V V
V V V V
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Example
• Example: a 0.6 mm process from AMI semiconductor
– tox = 100 Å – m = 350 cm2/V*s – Vt = 0.7 V
• Plot Ids vs. Vds – Vgs = 0, 1, 2, 3, 4, 5 – Use W/L = 4/2 l
14
2
8
3.9 8.85 10350 120 /
100 10ox
W W WC A V
L L L
0 1 2 3 4 50
0.5
1
1.5
2
2.5
Vds
I ds (m
A)
Vgs
= 5
Vgs
= 4
Vgs
= 3
Vgs
= 2
Vgs
= 1
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MOS Transistor Basics Two Terminal Structure
• Two terminal structure (p-substrate): The MOS capacitor
• Important derived parameters. With VG = VB = 0: – F – Buck Fermi Potential (Substrate) – S – Surface Potential (Substrate)
161
A D I
VG
VB
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MOS Transistor Basics Two Terminal Structure (Continued)
– VSB – Flat Band Voltage (applied external voltage to G-B to flatten bands of substrate – equal to built-in potential difference of MOS – equal to work function difference GB between the substrate (channel) and gate.
• Operation – With VG0, but small, VB=0, Depletion – Holes repelled from substrate-oxide interface due to positive bias leaving negatively charged fixed acceptors ions behind. The result is a region below the interface that is depleted of mobile carriers.
• Depletion region thickness
Nq A
FS
d
Si
x 2
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MOS Transistor Basics Two Terminal Structure (Continued)
• Depletion region charge density
– Note that this density is per unit of area. – With VG>0 and larger, VB=0, Inversion –
A n-type inversion layer forms, a condition known as surface inversion. The surface is inverted when the density of electrons at the surface equals the density of holes in the bulk. This implies that s has the same magnitude but opposite sign to F. At the point depletion depth fixed and the maximum depletion region depth is at s = -F. This depth is:
Nq A
FS
dm
i
x 22
FsSAdA iNqxNqQ 2
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MOS Transistor Basics Two Terminal Structure (Continued) – The corresponding
depletion charge density (per unit area) at surface inversion is
– The inversion phenomena is the mechanism that forms the n-channel. The depletion depth and the depletion region charge are critical in determining properties of MOSFET.
FSAdA iNqxNqQ 220
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MOS Transistor Basics Four Terminal Structure
• p-Substrate • The MOS n-channel
transistor structure:
L
G(ate) D(rain)
n+
B(Body, Bulk or Substrate)
S(ource)
n+
p
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MOS Transistor Basics Four Terminal Structure (Continued)
• Symbols: n-channel - p-substrate; p-channel – n-substrate
• N-channel (for P-channel, reverse arrow or add bubbles)
• P-channel
• Enhancement mode: no conducting channel exists at VGS = 0
• Depletion mode: a conducting channel exists at VGS = 0
G
D
B
S
G
D
S
G
D
S
G G
D
S
S
D
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MOS Transistor Basics Four Terminal Structure (Continued)
• Source and drain identification
G
D
B
S
VDS
VSB
VGS
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Threshold Voltage Components
• Consider the prior 3-D drawing: Set VS=0, VDS=0, and VSB=0. – Increase VGS until the channel is inverted. Then a
conducting channel is formed and the depletion region thickness (depth) is maximum as is the surface potential.
– The value of VGS needed to cause surface inversion (channel creation) is the threshold voltage VT0. The 0 refers to VSB=0.
– VGS< VT0: no channel implies no current flow possible. With VGS> VT0, existence the channel implies possible current flow.
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Threshold Voltage Components (Cont.)
• GC work function difference between gate and channel material which is the built-in voltage that must be offset by voltage applied to flatten the bands at the surface.
• Apply voltage to achieve surface inversion -2F • Additional voltage must be applied to offset the
depletion region charge due to the acceptor ions. At inversion, this charge with VSB=0 is QB0= Q0.
• For VSB non-zero,
• The voltage required to offset the depletion region charge is defined by –QB/Cox where Cox = εox/tox with tox, the oxide thickness, and Cox, the gate oxide capacitance per unit area.
• 4) The final component is a fixed positive charge density that appears at the interface between the oxide and the substrate, Qox. The voltage to offset this charge is:
VNqQ SBFSA i 22
C
Q
ox
ox
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Threshold Voltage Components (Cont.)
• These components together give:
• For VSB=0, VT0 has QB replaced by QB0. This gives a relationship between VT and VT0 which is:
• Thus the actual threshold voltage VT differs from VT0 by the term given. Going back to the definition of QB, this term is equal to:
• In which γ is the substrate-bias (or body effect) coefficient.
ox
BBTT
C
QQVV 00
FSBF V 22
ox
ox
ox
BFGCT
C
Q
C
QV 2
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Threshold Voltage Components (Cont.) • The final expression for VT0 and VT
are
• and
– The threshold voltage depends on the source-to-bulk voltage which is clearly separated out. The component is referred to as body effect. If the source to body voltage VSB is non-zero, the corrective term must be applied to VT0.
C
Nq
ox
SA i2
FSBFTT VVV 220
ox
ox
ox
BFGCT
C
Q
C
QV 00 2
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Threshold Voltage Components (Cont.)
• • Those parameters in the VT
equation are signed. The following table gives their signs for nMOS and pMOS transistor.
• For real designs, the threshold voltage, due to variation in oxide thickness, impurity concentrations, etc., VT0 and γ should be measured from the actual process.
Parameter nMOS pMOS
F QB, QB0 γ
VSB
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R
Vss
R
1 0
0 1
Vo
•Inverter : basic requirement for producing a complete range of Logic circuits
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Vdd
Vss
Vo
Vin
R Pull-Up
Pull Down
Basic Inverter: Transistor with source connected to ground and a load resistor connected from the drain to the positive Supply rail
Output is taken from the drain and control input connected between gate and ground
Resistors are not easily formed in silicon - they occupy too much area
Transistors can be used as the pull-up device
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Vdd
Vss
Vo
Vin
D
S
D
S
• Pull-Up is always on – Vgs = 0; depletion
• Pull-Down turns on when Vin > Vt
NMOS Depletion Mode Transistor Pull - Up
Vt V0 Vdd
Vi
• With no current drawn from outputs, Ids for both transistors is equal
Non-zero output
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Vgs=0.2VDD
Vgs=0.4 VDD
Vgs=0.6 VDD
Vgs=0.8VDD
Vgs=VDD
Ids
Vds VDD
Vo VDD
VDD
Vin
Ids
VDD –Vds
Ids
Vds
Vgs=-0.6VDD
Vgs=-0.4 VDD
Vgs=-0.2 VDD
Vgs=0
Vgs=0.2VDD
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Vo VDD
VDD
Vin
Vinv
• Point where Vo = Vin is called Vinv
Decreasing Zpu/Zpd
Increasing Zpu/Zpd
• Transfer Characteristics and Vinv can be shifted by altering ratio of pull-up to Pull down impedances
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NMOS Depletion Mode Inverter Characteristics
• Dissipation is high since rail to rail current flows when Vin = Logical 1
• Switching of Output from 1 to 0 begins when Vin exceeds Vt of pull down device
• When switching the output from 1 to 0, the pull up device is non-saturated initially and this presents a lower resistance through which to charge capacitors (Vds < Vgs – Vt)
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Vss
Vo
Vin
D
S
D
S
NMOS Enhancement Mode Transistor Pull - Up
Vdd
Vgg
Vt (pull down)
V0 Vdd
Vt (pull up)
Non zero output
Vin
• Dissipation is high since current flows when Vin = 1 • Vout can never reach Vdd (effect of channel) • Vgg can be derived from a switching source (i.e. one phase of a clock, so that dissipation can be significantly reduced • If Vgg is higher than Vdd, and extra supply rail is required
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When cascading logic devices care must be taken to preserve integrity of logic levels i.e. design circuit so that Vin = Vout = Vinv
Cascading NMOS Inverters
Determine pull – up to pull-down ratio for driven inverter
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Assume equal margins around inverter; Vinv = 0.5 Vdd
Assume both transistors in saturation, therefore: Ids = K (W/L) (Vgs – Vt)2/2
Depletion mode transistor has gate connected to source, i.e. Vgs = 0 Ids = K (Wpu/Lpu) (-Vtd)
2/2
Ids = K (Wpd/Lpd) (Vinv – Vt)2/2 Enhancement mode device Vgs = Vinv, therefore
Assume currents are equal through both channels (no current drawn by load) (Wpd/Lpd) (Vinv – Vt)2 = (Wpu/Lpu) (-Vtd)2 Convention Z = L/W Vinv = Vt – Vtd / (Zpu/Zpd)1/2 Substitute in typical values Vt = 0.2 Vdd ; Vtd = -0.6 Vdd ; Vinv = 0.5 Vdd
This gives Zpu / Zpd = 4:1 for an nmos inverter directly driven by another inverter
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Vdd Vdd
A B C
Inverter 1 Inverter 2
Vin1 Vout2
Pull-Up to Pull-Down Ratio for an nMOS inverter driven through 1 or more pass transistors
It is often the case that two inverters are connected via a series of switches (Pass Transistors) We are concerned that connection of transistors in series will degrade the logic levels into Inverter 2. The driven inverter can be designed to deal with this. (Zpu/Zpd >= 8/1)
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Complimentary Transistor Pull – Up (CMOS)
Vdd
Vss
Vo Vin
Vout
Vin
Vdd Vss
Vtn Vtp
Logic 0 Logic 1
P on N off
Both On
N on P off
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Vout
Vin
Vdd Vss
Vtn Vtp
P on N off
Both On
N on P off
1 2 3 4 5
1: Logic 0 : p on ; n off 5: Logic 1: p off ; n on 2: Vin > Vtn. Vdsn large – n in saturation Vdsp small – p in resistive Small current from Vdd to Vss 4: same as 2 except reversed p and n 3: Both transistors are in saturation Large instantaneous current flows
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CMOS INVERTER CHARACTERISTICS
Current through n-channel pull-down transistor 2
2tnin
nn VVI
Current through p-channel pull-up transistor
22
tpDDinp
p VVVI
At logic threshold, In = I
p
tpDDtnp
n
p
nin
tpDDintninp
n
tpDDinp
tninn
tpDDinp
tninn
VVVV
VVVVV
VVVVV
VVVVV
1
22
22
22
p
n
p
ntntpDD
in
VVV
V
1
If n =
p and V
tp = –V
tn
2DD
inV
V
n
nn
p
pp
L
W
L
W
Mobilities are unequal : µn = 2.5 µp
Z = L/W
Zpu/Zpd = 2.5:1 for a symmetrical CMOS inverter
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CMOS Inverter Characteristics
• No current flow for either logical 1 or logical 0 inputs
• Full logical 1 and 0 levels are presented at the output
• For devices of similar dimensions the p – channel is slower than the n – channel device
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CMOS Inverter VTC
00.51
1.522.5
0 0.5 1 1.5 2 2.5
Vin (V)
Vo
ut (
V)
NMOS off
PMOS res
NMOS sat
PMOS res
NMOS sat
PMOS sat
NMOS res
PMOS sat NMOS res
PMOS off
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Cutoff Linear Saturation
pMOS Vin -VDD= VGS> VT Vin -VDD=VGS< VT Vin -Vout=VGD< VT
Vin -VDD=VGS> VT
Vin -Vout=VGD>VT
nMOS Vin = VGS< VT
Vin =VGS> VT
Vin -Vout =VGD> VT
Vin =VGS> VT
Vin -Vout =VGD< VT
VDD
Vin Vout
CL
G S
D
D
G
S
Regions of operations For nMOS and pMOS In CMOS inverter
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Impact of Process Variation
00.51
1.522.5
0 0.5 1 1.5 2 2.5
Vin (V)
Vo
ut (
V)
Nominal
Good PMOS
Bad NMOS
Bad PMOS
Good NMOS
Pprocess variations (mostly) cause a shift in the switching threshold
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Cmos Inverter
• Look at why our NMOS and PMOS inverters might not be the best inverter designs
• Introduce the CMOS inverter • Analyze how the CMOS inverter works
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NMOS Inverter
• When VIN changes to logic 0, transistor gets cutoff. ID goes to 0.
• ‘esisto oltage goes to ze o. VOUT pulled up to 5 V. D ID = 5/R
+
VDS _
R
5 V
VOUT
VIN
5 V
0 V
D ID = 0
+ VDS _
R
5 V
VOUT
VIN
0 V
5 V
When VIN is logic 1, VOUT is
logic 0.
Constant nonzero current
flows through transistor.
Power is used even though
no new computation is being
performed.
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PMOS Inverter
• When VIN changes to logic 1, transistor gets cutoff. ID goes to 0.
• ‘esisto oltage goes to ze o. VOUT pulled do to V.
5 V
VOUT
ID = -5/R
- VDS +
R
5 V
When VIN is logic 0, VOUT is
logic 1.
Constant nonzero current
flows through transistor.
Power is used even though
no new computation is being
performed.
VIN
0 V
5 V
VOUT
ID = 0
- VDS +
R
0 V
VIN
5 V
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Analysis of CMOS Inverter
• We can follow the same procedure to solve for currents and voltages in the CMOS inverter as we did for the single NMOS and PMOS circuits.
• Remember, now we have two transistors so we write two I-V relationships and have twice the number of variables.
• We can roughly analyze the CMOS inverter graphically.
D
S
VDD (Logic1)
D
S
VOUT
VIN
NMOS is “pull-down device” PMOS is “pull-up device” Each shuts off when not pulling
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D
S
VDD (Logic 1)
D
S
VOUT
VIN
VGS(n) = VIN
VGS(p) = VIN – VDD
VGS(p) = VDS(n) - VDD
ID(p) = -ID(n)
VDS(n) = VOUT
VDS(p) = VOUT – VDD
VDS(p) = VDS(n) - VDD
+
VDS(n) _
Use these equations
to write both I-V equations in terms of
VDS(n) and ID(n)
Linear KVL and KCL Equations
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VDS(n)
ID(n)
VDD
NMOS I-V curve
PMOS I-V curve (written in terms of NMOS variables)
CMOS Analysis
VIN = VGS(n) =
0.9 V
As VIN goes up, VGS(n) gets bigger and VGS(p) gets less negative.
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VDS(n)
ID(n)
VDD
NMOS I-V curve
PMOS I-V curve (written in terms of NMOS variables)
CMOS Analysis
VIN = VGS(n) =
1.5 V
As VIN goes up, VGS(n) gets bigger and VGS(p) gets less negative.
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VDS(n)
ID(n)
VDD
NMOS I-V curve
PMOS I-V curve (written in terms of NMOS variables)
CMOS Analysis
VIN = VGS(n) =
2.0 V
As VIN goes up, VGS(n) gets bigger and VGS(p) gets less negative.
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VDS(n)
ID(n)
VDD
NMOS I-V curve
PMOS I-V curve (written in terms of NMOS variables)
CMOS Analysis
VIN = VGS(n) =
2.5 V
As VIN goes up, VGS(n) gets bigger and VGS(p) gets less negative.
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VDS(n)
ID(n)
VDD
NMOS I-V curve
PMOS I-V curve (written in terms of NMOS variables)
CMOS Analysis
VIN = VGS(n) =
3.0 V
As VIN goes up, VGS(n) gets bigger and VGS(p) gets less negative.
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VDS(n)
ID(n)
VDD
NMOS I-V curve
PMOS I-V curve (written in terms of NMOS variables)
CMOS Analysis
VIN = VGS(n) =
3.5 V
As VIN goes up, VGS(n) gets bigger and VGS(p) gets less negative.
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VDS(n)
ID(n)
VDD
NMOS I-V curve
PMOS I-V curve (written in terms of NMOS variables)
CMOS Analysis
VIN = VGS(n) =
4.1 V
As VIN goes up, VGS(n) gets bigger and VGS(p) gets less negative.
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VOUT
VIN C B A E D VDD
VDD
CMOS Inverter VOUT vs. VIN
NMOS: cutoff
PMOS: triode
NMOS: saturation
PMOS: triode
NMOS: triode
PMOS: saturation
NMOS: triode
PMOS: cutoff
both sat.
curve very steep here; only in “C” for small interval of VIN
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ID
VIN C B A E D VDD
CMOS Inverter ID
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D
S
VDD
D
S
VOUT1
VIN D
S
VDD
D
S
VOUT2
Important Points
• No ID current flow in Regions A and E if nothing attached to output; current flows only during logic transition
• If another inverter (or other CMOS logic) attached to output, transistor gate terminals of attached stage do not permit current: current still flows only during logic transition
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Impact of Process Variation
00.51
1.522.5
0 0.5 1 1.5 2 2.5
Vin (V)
Vo
ut (
V)
Nominal
Good PMOS
Bad NMOS
Bad PMOS
Good NMOS
Pprocess variations (mostly) cause a shift in the switching threshold
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Beta Ratio
• If bp / bn 1, switching point will move from VDD/2
Vout
0
Vin
VDD
VDD
0.5
12
10p
n
0.1p
n
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Unit III VLSI CIRCUIT DESIGN PROCESSES
Topics • VLSI design flow • MOS layers • Stick diagrams • Design Rules and Layout • 2 um CMOS design rules for wires • Contacts and Transistors • Layout diagrams for NMOS and • CMOS inverters and gates, Scaling of MOS circuits
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VLSI Design of approach of IC
208 6/3/2015
Layer Types
• p-substrate • n-well • n+ • p+ • Gate oxide (thin oxide) • Gate (polycilicon) • Field Oxide
– Insulated glass – Provide electrical isolation
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Stick diagram
Encodings for a simple single metal nMOS process
COLOR STICK ENCODING LAYERS MASK LAYOUT ENCODING CIF LAYER
MONOCROME MONOCROME
GREEN
RED
BLUE
BLACK
GRAY
n-
diffusion
n+active
Thniox
Polysilicon
Metal 1
Contact cut
Overglass NOT
APPLICABLE nMOS
ONLY
YELLO
W
Implant
Buried
contact
nMOS
ONLY
BROWN
N
D
NP
N
M
N
C
N
G
NI
NB
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Stick Diagrams
Metal
poly
ndiff
pdiff
Can also draw
in shades of
gray/line style. Buried Contact
Contact Cut
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Stick Diagrams
• VLSI design aims to translate circuit concepts onto silicon.
• Stick diagrams are a means of capturing topography and layer information using simple diagrams.
• Stick diagrams convey layer information through colour codes (or monochrome encoding).
• Acts as an interface between symbolic circuit and the actual layout.
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Stick Diagrams
• Does show all components/vias. • It shows relative placement of
components.
• Goes one step closer to the layout • Helps plan the layout and routing
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Stick Diagrams
• Does not show – Exact placement of components – Transistor sizes – Wire lengths, wire widths, tub
boundaries.
– Any other low level details such as parasitics..
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Stick Diagrams – Some rules
• Rule 1. • Whe t o o o e sti ks of the sa e t pe
cross or touch each other that represents electrical contact.
Stick Diagrams
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Stick Diagrams – Some rules
• Rule 2. • Whe t o o o e sti ks of diffe e t t pe
cross or touch each other there is no electrical contact. (If electrical contact is needed we have to show the connection explicitly).
Stick Diagrams
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Stick Diagrams – Some rules
• Rule 3. • When a poly crosses diffusion it represents
a transistor.
Note: If a contact is shown then it is not a transistor.
Stick Diagrams
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Stick Diagrams – Some rules
• Rule 4. • In CMOS a demarcation line is drawn to
avoid touching of p-diff with n-diff. All pMOS must lie on one side of the line and all nMOS will have to be on the other side.
Stick Diagrams
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5 V
Dep
Vout
Enh
0V
Vin
5 v
0 V
Vin
5 v
NMOS INVERTER
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NMOS-NAND
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NMOS-NOR
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NMOS EX-OR
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NMOS EX-NOR
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PMOS-INVERTER
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PMOS NAND
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PMOS-NOR
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Sticks design CMOS NAND:
• Start with NAND gate:
6/3/2015 228
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NAND sticks
VDD
a
VSS
out
b
Stick Diagram - Example
NOR Gate
OUT
B
A
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Stick Diagram - Example
Power
Ground
B
C
Out A
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2 I/P OR GATE
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2 I/P AND
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Y= AB+CD
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Y= AB+CD “TICK
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Design Rules
• Design rules are a set of geometrical specifications that dictate the design of the layout masks
• A design rule set provides numerical values – For minimum dimensions – For minimum line spacings
• Design rules must be followed to insure functional structures on the fabricated chip
• Design rules change with technological advances (www.mosis.org)
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Silicon Foundry
• A standard • A foundry allows designers to submit designs
using a state-of-the-art process
• Each foundry state simpler set of design rules called lambda design rules
• All widths, spacings, and distances are written in the form – Value = – TSMC (Thailand Semiconductor Manufacturing
Corporation)
m
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Design Rules Classification
• Minimum width • Minimum spacing • Surround • Extension
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Physical Limitations
• Line width limitation of an imaging system – The reticle shadow projected on the photoresist
does not have sharp edges due to optical diffraction
• Etching process problem – Undercutting of the resist due to lateral etching
decreases the resolution
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Etching Process Problem
Substrate
Vertical etching
Lateral
Etching
Substrate
Isotropic etch
Depletion Region
• If depletion regions of adjacent pn junctions touch, then
– The current blocking characteristics are altered – Current can flow between the two
Substrate
n+ n+
Limits on n+ spacing
Spacing
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Electrical Capacitive Coupling
• This occurs between closely spaced conducting lines
• This leads to a problem called crosstalk – A portion of the electrical energy is coupled to
another causing noise
– This is a major problem in high-density design
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Electrical Rules
• An example of an electrical rule is the allowed width of a metal interconnect line
– To avoid electromigration effects – The design rule set will stipulate the maximum
current flow level permitted
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3D Perspective
Polysilicon Aluminum
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Design rules and Layout
• Why we use design rules? – Interface between designer and process engineer – Guidelines for constructing process masks
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Design Rules
Minimum length or width of a feature on a layer is 2
Why?
To allow for shape contraction
Minimum separation of features on a layer is 2
Why?
To ensure adequate continuity of the intervening
materials.
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Design Rules
Minimum width of PolySi and diffusion line 2 Minimum width of Metal line 3 as metal lines run over a more uneven
surface than other conducting layers to ensure their continuity
2
Metal
Diffusion
Polysilicon
3
2
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Design Rules
PolySi – PolySi space 2 Metal - Metal space 2 Diffusion – Diffusion 3 To avoid the possibility of their associated
regions overlapping and conducting current
2
Metal
Diffusion
Polysilicon
2
3
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Design Rules
Diffusion – PolySi To prevent the lines overlapping to form unwanted capacitor
Metal lines can pass over both diffusion and polySi without
electrical effect. Where no separation is specified, metal lines
can overlap or cross
Metal
Diffusion
Polysilicon
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Metal Vs PolySi/Diffusion
• Metal lines can pass over both diffusion and polySi without electrical effect
• It is recommended practice to leave between a metal edge and a polySi or diffusion line to which it is not electrically connected
Metal
Polysilicon
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poly-poly spacing 2
diff-diff spacing 3 (depletion regions tend to spread outward)
metal-metal spacing 2
diff-poly spacing
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Review:
Note
• Two Features on different mask layers can be misaligned by a maximum of 2l on the wafer.
• If the overlap of these two different mask layers can be catastrophic to the design, they must be separated by at least 2l
• If the overlap is just undesirable, they must be separated by at least l
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When a transistor is formed?
Gate is formed where polySi crosses diffusion with
thin oxide between these layers.
Design rules
min. line width of polySi and diffusion 2
drain and source have min. length and width of 2
And
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The polySi of the gate extends 2 beyond the gate area on to the field oxide to prevent the drain and source from shorting.
no overlap overlap
diffusion short
• Diffusion Problems
PolySi extends in the gate region…
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Depletion Transistor We need depletion implant
An implant surrounding the Transistor by 2
Ensures that no part of the transistor remains
in the enhancement mode
A separation of 2 from the gate of an
enhancement transistor avoids affecting
the device.
2
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Depletion Transistor
Implants are separated by 2to prevent them from merging
2
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Butting Contact
The gate and source of a depletion device can be connected
by a method known as butting contact. Here metal makes
contact to both the diffusion forming the source of the
depletion transistor and to the polySi forming this device’s gate.
Advantage:
No buried contact mask required and avoids
associated processing.
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Butting Contact
n+ n+
Insulating
Oxide
Metal
Gate Oxide PolySi
Problem: Metal descending the hole has a tendency to
fracture at the polySi corner, causing an open circuit.
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Buried Contact
It is a preferred method. The buried contact window
defines the area where oxide is to be removed so that
polySi connects directly to diffusion.
Contact Area must be a min. of 2*2to ensure adequate contact area.
2
2
Contact Area
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Buried Contact
The buried contact window surrounds this contact by in all directions to avoid any part of this area forming a transistor.
Separated from its related transistor gate by to prevent gate
area from being reduced.
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Buried Contact
Here gate length is depend upon the alignment of the
buried contact mask relative to the polySi and therefore
vary by .
2
2
Channel length PolySi
Buried contact
Diffusion 6/3/2015 263
Contact Cut Metal connects to polySi/diffusion by contact cut.
Contact area: 2*2
Metal and polySi or diffusion must overlap this contact area
by so that the two desired conductors encompass the contact area despite any mis-alignment between conducting layers
and the contact hole
4
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Contact Cut Contact cut – any gate: 2apart
Why? No contact to any part of the gate.
4
2
6/3/2015 265
Contact Cut
Contact cut – contact cut: 2apart
Why? To prevent holes from merging.
2
6/3/2015 266
Rules for CMOS layout
Similar to those for NMOS except No
1. Depletion implant
2. Buried contact
Additional rules
1. Definition of n-well area
2. Threshold implant of two types of transistor
3. Definition of source and drains regions for the
NMOS and PMOS.
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Rules for CMOS layout
To ensure the separation of the PMOS and NMOS devices,
n-well supporting PMOS is 6away from the active area of NMOS transistor.
Why?
Avoids overlap
of the associated
regions
n-well n+ 6
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Rules for CMOS layout
2
2
N-well must completely
surround the PMOS
device’s active area by 2
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Rules for CMOS layout
2
2
The threshold implant
mask covers all n-well
and surrounds the n-well
by
6/3/2015 270
Rules for CMOS layout
2
2
The p+ diffusion mask
defines the areas to
receive a p+ diffusion.
It is coincident with the
threshold mask
surrounding the PMOS
transistor but excludes
the n-well region to be
connected to the supply.
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Rules for CMOS layout A p+ diffusion is required to effect the ground connection
to the substrate. Thus mask also defines this substrate
region. It surrounds the conducting material of this
contact by .
4
6/3/2015 272
Rules for CMOS layout
Total contact area = 2*4
Neither NMOS nor CMOS usually allow contact cuts
to the gate of a transistor, because of the danger of
etching away part of the gate
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UNIT-IV GATE LEVEL DESIGN
Topics
• Logic gates and other complex g