EFDS members (legal persons) 690,00 EUR 490,00 EUR 290,00 EUR
Students 395,00 EUR 250,00 EUR 180,00 EUR
Workshop fees are free of VAT according to §4 (22a) UStG (German value-added tax law).
Fee Covers:The registration fee includes the participation of the choosen event, conference proceedings, coffee and lunch breaks and the social evening. Please note, that the number of participants is limited, so please register early.
Online Registration:Please use the online registration. The registration form you can find here: http://goo.gl/FhxJlc
Accompanying Exhibition:Increase your visibility and present your company in our accompanying exhibition.The registration form for the accompanying exhibition you can find here:http://goo.gl/WZxqV7
Sponsoring Opportunity - Gold Sponsor (1.500 EUR plus VAT):• Logo and web link on Workshop page• Logo listed in program• Half page advertisement within program booklet• 1 table in Exhibition• 1 person free of charge in the workshop & tutorial
Terms:The general terms and conditions of sale of the EFDS apply (www.efds.org/agb). Cancellations must be made in written form. In case of the cancellation of your registration before January 4, 2017, a cancella-tion fee of 50,00 EUR will be charged. After this date, a refund is not possible.
Organization: Contact:European Society of Thin Films Grit Kotschenreuther Gostritzer Straße 63 Phone: +49 351 8718372 01217 Dresden Fax: +49 351 8718431 Germany Email: [email protected] Web: www.efds.org
Location:January 17, 2017: January 18, 2017:TU Dresden, Werner-Hartmann-Bau Swissôtel Dresden Am Schloss Nöthnitzer Str. 66, 01187 Dresden Schlossstrasse 16, 01067 Dresden
Get-Together - Tuesday, January 17, 201719:30 Restaurant „Freiberger Schankhaus“ am Neumarkt 8, 01067 Dresden www.freiberger-schankhaus.de
Workshop - Wednesday, January 18, 2017Swissôtel Dresden Am Schloss, Schlossstrasse 16, 01067 Dresden
09:00 Welcome to ALD for Industry Dr. Sven Richter, Dr. Jonas Sundqvist, Dr. Christoph Hossbach EFDS & ALD Lab Saxony
09:20 ALD/MLD of flexible inoganic-organic hybrid thin films towards future energy harvesting and storage technologies Prof. Maarit Karppinen; Department of Chemistry, School of Chemical Technology, Aalto University, Finland
10:00 ALD technology for the continuation of Moore’s law Dr. Harald Profijt; Corporate R&D, ASM International, Netherlands
10:30 ALD for Life Science Applications Dr. Ganesh Sundaram; Ultratech, Cambridge Nanotech, USA
10:50 Coffee Break
11:20 Solid precursors for ALD: challenges and opportunities Dr. Nicolas Blasco; Air Liquide, France
11:40 ALD for optics Dr. Adriana Szeghalmi; Friedrich-Schiller-Universität Jena, Institute of Applied Physics, Germany
12:00 Opportunities, challenges and solutions for ALD thin-film encapsulation in flexible electronics applications Dr. Mikko Söderlund; Beneq Oy., Finland
„ALD for Industry“a topical workshop with focus on industrialization and
commercialization of ALD for current and emerging marketsAtomic Layer Deposition (ALD) is used to deposit ultrathin and highly conformal thin films. ALD is unique in the sense that it employs sequential self-limiting sur-face reactions for growth in the monolayer thickness regime. According to market estimates the equipment market alone is currently at an annual revenue of US$ 750 million (2016) and it is expected to reach US$1.2 billion in the next 2-3 years. Today the markets for ALD, besides the leading edge semiconductor industry, are mainly:
In an European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony is a unique ALD hotspot due to a strong semiconductor and equipment industry.
The event will start with a tutorial for attendees with special interests or less previ-ous experience in ALD.
After the tutorials there will be an opportunity to visit ALD labs and cleanrooms at the Technical University Dresden and Fraunhofer Institute for Ceramic Technologies and Systems IKTS.
The 2nd day will be the main workshop day with invited talks from leading research-ers and industry experts on the broad range of topics. The workshop will focus on non-Semiconductor industrial applications of today and the emerging markets with an expected industrialization in the next 5 years. Presentations will focus on the lat-est topics and the state of the art in the field of Atomic Layer Deposition.
In parallel there will be an exhibition, giving great opportunities for face to face meetings and to share product information. The workshop will provide an excellent platform for discussions and networking during the program as well as during the social events.
PROGRAM COMMITEE
Dr. Jonas SundquistFraunhofer IKTS, Dresden
Dr. Uwe SchröderNaMLab gGmbH, Dresden
Dr. Sabine KolodinskiGLOBALFOUNDRIES Management Services Limited Liability Company & Co. KG, Dresden
Dr. Christoph HossbachIHM, TU Dresden
Dr. Jörg NeidhardtVON ARDENNE GmbH, Dresden
Dr. Katrin FerseEFDS, Dresden
Workshop - Wednesday, January 18, 2017Swissôtel Dresden Am Schloss, Schlossstrasse 16, 01067 Dresden
12:20 Lunch Break
13:20 Industrial deployment of nano-engineered ultrabarriers for encapsulation of organic electronics Dr. Jacques Kools; Encapsulix S.A., France
13:40 ALD applications in MEMS manufacturing Dr. Florian Schön; Robert Bosch GmbH, Germany
14:00 ALD and 3D coatings Dr. Tero Pilvi; Picosun Oy., Finland
14:20 Thin films in 3D structures: metrology with microscopic lateral high-aspect-ratio structures Mikko Utriainen; VTT Technical Research Centre of Finland Ltd., Finland
14:40 Coffee Break
15:00 Where no man has gone before - unique equipment enables unique research Dr. Hannes Klumbies; FHR Anlagenbau, Germany
15:20 ALD systems for no damage, high uniformity and stability of multilayer deposition Dr. Hassan Gargouri; SENTECH Instruments GmbH, Germany
15:40 ALD process optimization by equipment simulation Dr. Jörg Schuster; Fraunhofer ENAS, Germany
16:00 Closing remarks and discussion Dr. Sven Richter, Dr. Jonas Sundqvist, Dr. Christoph Hossbach EFDS & ALD Lab Saxony
16:20 End of Workshop Day
Program is subject to change!
Tutorial - Tuesday, January 17, 2017TU Dresden, Werner-Hartmann-Bau, Nöthnitzer Str. 66, 01187 Dresden
12:30 Introduction and fundamentals of ALD Prof. Johann W. Bartha; IHM, TU Dresden, Germany
13:00 ALD of metals Dr. Colin Georgi; Fraunhofer ENAS, Germany
13:30 Overview of ALD equipment and technologies Dr. Christoph Hossbach; IHM, TU Dresden, Germany
14:00 Coffee Break
14:30 Speeding up the unique assets of ALD Dr. David Muñoz-Rojas; LMGP-CNRS, Grenoble
15:00 In situ metrology techniques in ALD Marcel Junige; IHM, TU Dresden, Germany
15:30 ALD applications, equipment and precursor market outlook 2017 to 2020 Dr. Jonas Sundqvist; Fraunhofer IKTS, Germany / Techcet LLC, USA
