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Fabrication and characterization of nanowire devices

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We fabricated Nanowires of Copper (Cu), CuO, Cu-Se etc. and studied I-V Characteristics
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Fabrication and Characterization of Nanowire Devices Hardev Singh Virk Professor Emeritus, Eternal University, Baru Sahib (HP), India
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Page 1: Fabrication and characterization of nanowire devices

Fabrication and Characterization of Nanowire Devices

Hardev Singh VirkProfessor Emeritus, Eternal

University, Baru Sahib (HP), India

Page 2: Fabrication and characterization of nanowire devices

Birth of Nanotechnology“There's Plenty of Room at the Bottom” • On December 29, 1959, Richard P. Feynman

gave the seminal talk at a meeting at Caltech of the American Physical Society. He presented a vision of the precise manipulation of atoms and molecules so as to achieve amazing advances in information technology, mechanical devices, medical devices, and other areas.

Page 3: Fabrication and characterization of nanowire devices

Changing Idea into Reality

Eric Drexler of MIT, the Chemist, established the modern field of nanotechnology, with a draft of his seminal Ph.D. thesis in the mid 1980s. His 1991 doctoral thesis at MIT was revised and published as the book "Nanosystems, Molecular Machinery Manufacturing and Computation" (1992), which received the Association of American Publishers award for Best Computer Science Book of 1992.

Page 4: Fabrication and characterization of nanowire devices

The Incredible Tininess of Nano

Billions of nanometersA two meter tall male istwo billion nanometers.

The pinhead sized dot is a million nm

Biological cells size isThousands of nm

DNA Molecules are about 2.5 nm in width

Hydrogen atom spans 0.1 nm2 Uranium atoms span 1 nm

Page 5: Fabrication and characterization of nanowire devices

• AFM Imaging of ATOMS of GOLD (Au 111)

Page 6: Fabrication and characterization of nanowire devices

Atomic Lattice Structure of HOPG in 3D Topography using Atomic Force Microscope

Page 7: Fabrication and characterization of nanowire devices

Introduction to Nanowires

Nanowires of metallic and semi-conducting materials have drawn a lot of research interest because of their potential applications in fields like nanoelectronics, opto-electronics and sensors. Nanowires exhibit unique electrical, magnetic, optical, thermoelectric and chemical properties compared to their bulk counterpart. Electronic conduction takes place both by bulk conduction and through tunneling mechanism.

Page 8: Fabrication and characterization of nanowire devices

Special Characteristics

• Nanowires exhibit high density of electronic state.

• They have diameter-dependant band gap.• They show enhanced surface scattering of

electrons and phonons.• They have increased excitation energy, high

surface to volume ratio and large aspect ratio.

Page 9: Fabrication and characterization of nanowire devices

Fundamental Features• One-dimensionality• – Wire diameter: several nm ~ hundreds of nm’s• – Aspect ratio: L:D >10:1• Material integrity• – Single crystalline nanostructure• Availability of numerous materials• – Superconductor, metal, semiconductor, insulator • Unique physical properties• – Large surface-to-volume ratio• – High transport/carrier mobility• – Quantum confinement/tunable band structure

Page 10: Fabrication and characterization of nanowire devices

Quantum Confinement Effects

– Quantum dots (0-D): confined states, and no freely moving ones

– Nanowires (1-D): particles travel only along the wire direction

– Quantum wells (2-D): confines particles within a thin layer

There is no confinement effect in Bulk materials.Refer to energy distribution.

Page 11: Fabrication and characterization of nanowire devices

Chemical Routes of Synthesis• Solution-Based Synthesis• – Solution-Liquid-Solid (SLS) Method• – Solvothermal Chemical Synthesis• – Template-Based Synthesis• Gas-Phase Synthesis• – Vapor-Liquid-Solid (VLS) Method• -- Laser abrasion• -- PVD• -- CVD (LPCVD, MOCVD)• – Vapor-Solid (VS) Method• – Oxide-Assisted Growth (OAG)

Page 12: Fabrication and characterization of nanowire devices

Growth of Semiconductor Nanowiresby VLS method

Laser ablation overcomes thermodynamic equilibrium constraints and enables liquid nanocluster formation.

Page 13: Fabrication and characterization of nanowire devices

GaN Nanowires Grown by VLS method

SEM image of GaN nanowires of diameters 10nm and lengths on the order of 10m (Huang et al., 2002).

Page 14: Fabrication and characterization of nanowire devices

ZnO Nanowires on Sapphire by VLS method

SEM images of ZnO nanowire arrays grown on a sapphire substrate, (a) shows patterned growth, (b) shows a higher resolution image of the parallel alignment of the nanowires, and (c) shows the hexagonal cross-section of the nanowires (Huang et al., 2001).

Page 15: Fabrication and characterization of nanowire devices

Nano-Lasers using ZnO Nanowires

ZnO nanowires grown by VLS method. Emission spectrum from ZnO nanowires.

Page 16: Fabrication and characterization of nanowire devices

Nanowire FabricationTemplate synthesis using polymer and

anodic alumina membranesElectrochemical deposition

Ensures fabrication of electrically continuous wires since only takes place on conductive surfaces

Applicable to a wide range of materialsHigh pressure injection

Limited to elements and heterogeneously-melting compounds with low melting points

Does not ensure continuous wires Does not work well for diameters < 30-40 nm

Chemical Vapor Deposition (CVD) or VLS technique Laser assisted techniques

Page 17: Fabrication and characterization of nanowire devices

Polymer Template Synthesis of Nanowires

Page 18: Fabrication and characterization of nanowire devices

Large Etched Ion TracksLarge Etched Ion Tracks

Page 19: Fabrication and characterization of nanowire devices

Anodization of aluminum Start with uniform layer of ~1m Al Al serves as the anode, Pt may serve as the

cathode, and 0.3M oxalic acid is the electrolytic solution

Low temperature process (2-50C) 40V is applied Anodization time is a function of sample size and

distance between anode and cathode Key Attributes of the process (per M. Sander)

Pore ordering increases with template thickness – pores are more ordered on bottom of template

Process always results in nearly uniform diameter pore, but not always ordered pore arrangement

Aspect ratios are reduced when process is performed when in contact with substrate

Anodic Alumina Template Preparation

Page 20: Fabrication and characterization of nanowire devices

Electrochemical mechanism• The overall reaction that takes place during

anodization is: 2Al + 3H2O => Al2O3 + 3H2

At the anode: 2Al + 3O2- => Al2O3 + 6e-

At the cathode:6H+ + 6e- ==> 3H2

• The Al is oxidized at the metal/oxide interface

• The oxide is etched away by the acid with the applied potential

• The pores are induced by the roughness of the top surface

TEM micrographs

Page 21: Fabrication and characterization of nanowire devices

(T. Sands/ HEMI group http://www.mse.berkeley.edu/groups/Sands/HEMI/nanoTE.html)

Anodic alumina (Al2O3) Template

100nmSi substrate

alumina template

(M. Sander)

Page 22: Fabrication and characterization of nanowire devices

Electrolytic CellElectrolytic Cell

Page 23: Fabrication and characterization of nanowire devices

Replica of Nanowires

Page 24: Fabrication and characterization of nanowire devices

Microtubule Fabrication

Page 25: Fabrication and characterization of nanowire devices

Electrochemical Synthesis

• Electrochemistry has been used to fabricate nanowires of Cu and heterojunctions of Cu-Se and Cd-S. The results of our investigations can be exploited for fabrication of nanodevices for application in opto-electronics and nano- electronics. During failure of our Experiments, exotic patterns ( nanoflowers, nanocrystals, nanobuds) were produced under nature’s self assembly.

Page 26: Fabrication and characterization of nanowire devices

Template Synthesis of Copper Template Synthesis of Copper NanowiresNanowires

The electro-deposition of metals is identical to The electro-deposition of metals is identical to an electroplating process. Polymer ITFs and anodic alumina and anodic alumina can be used as a template. The electrolyte used here is can be used as a template. The electrolyte used here is CuSO4.5H2O acidic solution. The rate of deposition of CuSO4.5H2O acidic solution. The rate of deposition of metallic film depends upon: current density, inter-metallic film depends upon: current density, inter-electrode distance, cell voltage, electrolyte electrode distance, cell voltage, electrolyte concentration, pH value and temperature etc. In our concentration, pH value and temperature etc. In our case, electrode distance was kept 0.5 cm and a current case, electrode distance was kept 0.5 cm and a current of 2mA was applied for 1 hour. The developed of 2mA was applied for 1 hour. The developed nanostructures were scanned under SEM for nanostructures were scanned under SEM for morphological and structural studies.morphological and structural studies.

Page 27: Fabrication and characterization of nanowire devices

Atomic Force Microscope(NT-MDT)

Page 28: Fabrication and characterization of nanowire devices

AFM image of hexagonal pores of AFM image of hexagonal pores of Anodic Alumina Membrane (AAM)Anodic Alumina Membrane (AAM)

Page 29: Fabrication and characterization of nanowire devices

SEM Images of Cu Nanowires using SEM Images of Cu Nanowires using Electrodeposition TechniqueElectrodeposition Technique

Page 30: Fabrication and characterization of nanowire devices

Copper Nanowire Bundles in AAMCopper Nanowire Bundles in AAM

Page 31: Fabrication and characterization of nanowire devices

Cu Nanowires under Constant CurrentCu Nanowires under Constant Current

Page 32: Fabrication and characterization of nanowire devices

Capping Effect of Current VariationCapping Effect of Current Variation

Page 33: Fabrication and characterization of nanowire devices

I-V Characteristics of Copper I-V Characteristics of Copper Nanowires grown in-situ in AAMNanowires grown in-situ in AAM

Page 34: Fabrication and characterization of nanowire devices

Copper Lillies grown due to over- Copper Lillies grown due to over- deposition of Copper in AAM deposition of Copper in AAM

Page 35: Fabrication and characterization of nanowire devices

A Garden of Copper NanoflowersA Garden of Copper NanoflowersA Garden of Copper NanoflowersA Garden of Copper Nanoflowers

Page 36: Fabrication and characterization of nanowire devices

Copper Nanoflowers grown in Polymer Template (100nm pores)

Page 37: Fabrication and characterization of nanowire devices

Copper Marigold Flower

Page 38: Fabrication and characterization of nanowire devices

SiC Crystalline Nanowire Flowers G. W. Ho (Nanotechnology, 2004)

Page 39: Fabrication and characterization of nanowire devices

Crystalline Nano-comb of ZnO NW H. Yan (JACS 2003)

Page 40: Fabrication and characterization of nanowire devices

SEM micrograph of Copper Buds

Page 41: Fabrication and characterization of nanowire devices

SEM micrograph of Nanocrystals of SEM micrograph of Nanocrystals of Polycrystalline CopperPolycrystalline Copper

Page 42: Fabrication and characterization of nanowire devices

XRD Spectrum of polycrystalline XRD Spectrum of polycrystalline Copper nanocrystalsCopper nanocrystals

Position [°2Theta] (Copper (Cu))

10 20 30 40 50 60 70

Counts

0

20000

40000

60000

36.6

37 [°

]38

.283

[°]

43.4

61 [°

]45

.448

[°]

48.9

20 [°

]50

.580

[°]

54.3

04 [°

]54

.956

[°]

64.8

09 [°

]

74.2

99 [°

]

KK1

Page 43: Fabrication and characterization of nanowire devices

XRD spectrum of Cu nanowiresXRD spectrum of Cu nanowires

Position [°2Theta] (Copper (Cu))

30 40 50 60 70 80 90

Counts

0

400

1600

Cu polycrystalline

Page 44: Fabrication and characterization of nanowire devices

SEM Image of CdS NanowiresSEM Image of CdS Nanowires

Page 45: Fabrication and characterization of nanowire devices

HRTEM image showing CdS Nanowire HRTEM image showing CdS Nanowire & Heterojunctions & Heterojunctions

Page 46: Fabrication and characterization of nanowire devices

I-V plot of CdS Nanowire arrays I-V plot of CdS Nanowire arrays showing RTD characteristics showing RTD characteristics

Page 47: Fabrication and characterization of nanowire devices

SEM image of Cu-Se NanowiresSEM image of Cu-Se Nanowires

Page 48: Fabrication and characterization of nanowire devices

Cu-Se nanowires exhibit p-n junction Cu-Se nanowires exhibit p-n junction diode characteristicsdiode characteristics

Page 49: Fabrication and characterization of nanowire devices

A Billion Dollar Question …

• What can nanowires offer for semiconductor nanoelectronics?

• Nonlithographic & extremely cost-effective• Reduced phonon scattering: High carrier

mobility but reduced thermal conductance(?) • Tunable electrical/optical properties• Large surface-to-volume ratio: Sensor

sensitivity & memory programming efficiency

Page 50: Fabrication and characterization of nanowire devices

Advantages of 1-D Nanowires• High-quality single-crystal wires with nearly

perfect surface• Scalable nanostructure with precisely

controlled critical dimensions• Best cross-section for surround-gate CMOS• Very cost-effective materials synthesis• High transport low-dimensionality structure• May use as both device and interconnect for

ultra-compact logic (e.g., SRAM)

Page 51: Fabrication and characterization of nanowire devices

Nanowire Field-Effect Transistor

• Ambipolar transport• Carrier mobility study• Quantum effect

A single device for numerous applications

Device physics study

Page 52: Fabrication and characterization of nanowire devices

Quantum-Wire Device M. Bjork (Nano Letters, Sept. 2004)

1. In-situ control of nanowire synthesis allows design of strongly confined quantum mechanical systems inside nanowires, possibly useful for SET .2. Next-generation nanoelectronic devices with extremely-low power, high performance, and radiation tolerance.

Page 53: Fabrication and characterization of nanowire devices

3-D Nanowire Logic Chip H. Ng (Nano Letters, July 2004)

Page 54: Fabrication and characterization of nanowire devices

Si NW Thermal Conductance D. Li (APL Oct. 2003)

Page 55: Fabrication and characterization of nanowire devices

Thermoelectric (TE) Conversion E.J. Menke (Nano Letters, Oct. 2004)

Bismuth Telluride (Bi2Te3) nanowires

Page 56: Fabrication and characterization of nanowire devices

Role of Nanowires for Next-Generation Electronics

• The chemical and physical characteristics of nanowires, including composition, size,

electronic and optical properties, can be rationally controlled during synthesis in a predictable manner, thus making these materials attractive building blocks for assembling electronic and optoelectronics nanosystems.

Page 57: Fabrication and characterization of nanowire devices

Some Observations & Remarks• Nanotechnology will be the driving force for

next technology revolution.• Nanowires open door to a wonderland where

the next generation electronics would emerge.• Scope for innovating new synthesis method

and complex functional nanostructures.• New device and interconnect concepts will

emerge from horizon, driven by materials synthesis.

Page 58: Fabrication and characterization of nanowire devices

Our Publications

• My website: http:// drhsvirk.weebly.com for list of our published research papers. Go to www.docstoc.com for purchase of

reprints. Free download of Review Paper on Nanowires: visit: ttp://www.intechopen.com/articles/show• Chapter 20 of Book “Nanowires - Implementations and

Applications”, InTech Open, Abbass Hashim (Ed).

Page 59: Fabrication and characterization of nanowire devices

AcknowledgementsAcknowledgements

• Reimer Spohr & Christina Trautman (GSI, Darmstadt)Reimer Spohr & Christina Trautman (GSI, Darmstadt)• Sanjit Amrita Kaur (GND University, Amritsar)Sanjit Amrita Kaur (GND University, Amritsar)• Vishal, Gurmit, Sehdev & KK (DAVIET, Jalandhar)Vishal, Gurmit, Sehdev & KK (DAVIET, Jalandhar)• Dr SK Mehta, Chemistry Deptt. (PU, Chandigarh) Dr SK Mehta, Chemistry Deptt. (PU, Chandigarh) • CSIO Chandigarh & IIT Roorkee for FESEM & TEM facility.CSIO Chandigarh & IIT Roorkee for FESEM & TEM facility.• SEM & TEM facility (SAIF, PU, Chandigarh)SEM & TEM facility (SAIF, PU, Chandigarh)• Rajeev Patnaik (Geology Deptt., PU, Chandigarh)Rajeev Patnaik (Geology Deptt., PU, Chandigarh)• DAV MC, New Delhi for Research Grants.DAV MC, New Delhi for Research Grants.• Dr. MS Atwal, VC, Eternal University, Baru Sahib.Dr. MS Atwal, VC, Eternal University, Baru Sahib.

Page 60: Fabrication and characterization of nanowire devices

Thank You !!!


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