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In situ spectroscopic ellipsometry as a versatile tool to study … · 2020. 12. 11. · Al(CH 3) 3...

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1 In situ spectroscopic ellipsometry as a versatile tool to study atomic layer deposition Erik Langereis Department of Applied Physics [email protected] http://www.phys.tue.nl/pmp Ellipsometry Workshop Enschede, 11 th February 2010 / Department of Applied Physics – Erik Langereis 1 / 38 Outline Atomic layer deposition (ALD) - Basics of ALD - Materials deposited by ALD - Applications for ALD In situ spectroscopic ellipsometry as tool to monitor ALD Monitoring the film thickness - ALD growth & growth per cycle - Self-limiting chemistry - Initial film growth & substrate dependence - Nanolaminates Parametrizing the dielectric function - Metallic films: Electrical properties & electron scattering - Ultrahigh-k dielectrics Film composition & microstructure Thin film materials: Al 2 O 3 Ta 2 O 5 Er 2 O 3 TiO 2 TiN TaN Ta 3 N 5 SrTiO 3 Pt Ru
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