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Lecture #3 2
MOSFET Fundamentals
N-channel Metal Oxide Semiconductor Field-Effect Transistor
NMOS Transistor
Lecture #3 3
The MOS CapacitorLess Positive
n
More Positive Much More Positive
n << Ions
V < VT
n Ions
V VT
n >> Ions
V > VT
VT Minimum Voltage for Inversion
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Lecture #3 8
Regions of Transistor Operation
1. Linear region: VDS < VGS – VT
VT - threshold voltage (Min voltage to form inversion layer)
2. Saturation region: VDS VGS - VT
Read Text (Sections 3.2.2, 3.2.3, 6.2)
Lecture #3 10
2
DSDSTGS'nD V
2
1VVV
L
WkI
L
Wk '
n - Device Transconductance
oxtC
OX
OX'n Ck n
n - Mobility of carriers OXC - Gate Cap / Unit area Permitivity of SiO2
tOX - Gate Oxide Thickness = 2000A=20nm
r0
0 - Permitivity of free space =8.85410-14 F/cm
r - Rel. Permitivity = 3.9
COX = 1.725fF/m2
W/L - Aspect Ratio
- Process Transconductance
Current Equation
Lecture #3 14
At ‘a’
2
DSDSTGS'nD V
2
1VVV
L
WkI
DSDSTGS'nD VV
2
1VV
L
WkI
At ‘b’
DSTGS'n
ONV
21
VVLW
k
1R
TGS'n
ONVV
LW
k
1R
1.5V
a
b
•• •c
At ‘c’ 2TGS
'n
D VVL
W
2
kI
2TGS'n
DSON
VVLW
k
V2R
Lecture #3 20
VDD
VIN VOUT
VoutVin
Vin
Vout
VOH
VOL
Vth
VOHVOL
fV(y)=V(x)
Switching Threshold
Nominal Voltage LevelsVth = ?
Inverter DC Operation Voltage Transfer
Characteristic