NANOSPEC 4150 STANDARD OPERATING PROCEDURES
Version: 1.0 JAN 2016
Nanotechnology Research Center
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3.2 SELECTING A RECIPE USING F3 AUTO MODE…….…..……. 5
3.3 RUNNING A RECIPE USING F8 OR F9 MANUAL MODES…… 10
4.0 DATABASE………………………………………………………… 13
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provides accurate and repeatable measurement’s for films
ranging from 15nm - 75,000nm in thickness. Two layer films
may also be measured on the 4150, but the lower layer
thickness must be known.
System accepts 75mm to 200mm wafer sizes
Auto focusing
DOCUMENT: NANOSPEC 4150 SYSTEM OPERATING PROCEDURES Version: 1.0
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3.1 Loading a Wafer for Testing
3.1.1 Log into the main system computer by entering NANO as the user
ID. Then tab down to the Password box and enter 4000. The
measurement software should now open.
3.1.2 You will notice two separate wafer loading platforms on the system
(Fig. 1). Load the wafer to be measured onto the left side platform.
Be careful to get the wafer centered on the platform. There are
stops to help center full sized wafers on the stage platform.
Fig. 1
3.1.3 The right side platform is for a bare silicon reference wafer. A
reference is only necessary if it has been longer than 24hrs since
the previous reference was performed by the system. Load your
bare clean silicon reference wafer onto the right hand platform to
run the reference scan. NOTE -This SOP will describe the
process of running both the reference scan and measurement
scans. If it has been < 24hrs since the prior reference scan was
performed then you do not need the reference scan (answer
NO when prompted to run it) and you may just skip the
following steps which refer to it.
DOCUMENT: NANOSPEC 4150 SYSTEM OPERATING PROCEDURES Version: 1.0
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3.2 Selecting a Recipe using F3 Auto Mode
3.2.1 At the top of the computer screen you will see a number of software
tabs numbered F1 – F10 (Fig. 2). These tabs correspond to your
Keyboard F keys. The tabs you’ll use to select a recipe will depend
on the type of measurement you are going to perform. Tab F3 Auto
will run a measurement recipe based on a multi-point
preprogrammed map of the wafer. The total measurement points
are configurable by staff from 1 to 49 points. The 5 and 9 point tests
are the most common on a full sized wafer. Tab F8 User will allow
a custom single point test to be run by the user. The recipes in tab
F9 STD are single point tests that were set up by the vendor.
Pressing the particular F-button will open a second window to allow
viewing of the recipe types available for that particular tab.
Fig. 2
3.2.2 Now press F3 Auto and the system will ask if you want to save the
measurements in the database. Answer YES to store the
measurements for future access.
3.2.3 After this another prompt box will open asking for you to enter
Parameters. Enter a name or ID that you would like to store the
data under.
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3.2.4 Next a recipe selection window will open (Fig. 3). The recipes listed
display the recipe #, the # of measurement points, the film type and
the substrate. Select the appropriate recipe # from this window and
press ENTER.
Fig. 3
3.2.5 Now the system will prompt as to whether it’s been > 24 hours and
if you need to run a reference scan. Answer accordingly. If you
answer NO then skip ahead to step 3.2.6. If you selected YES then
the system will tell you to “Prepare Substrate for Reference” This
is your cue to put the clean bare silicon wafer onto the right hand
stage if you have not already done so, then press enter. The
system will then prompt as to whether or not you would like for the
stage to move to the reference position automatically, answer YES.
The stage will now move to the center of the right hand platform.
Another window will open notifying you that the joystick is active so
that you may manually move to a different reference position if
required. Once the wafer is properly positioned you are ready to
take the reference scan press the “OK” button and the scan will
commence.
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3.2.6 If you selected a two layer measurement recipe in step 3.2.4 then a
window will now open with a prompt to enter the UNDERLAYER
thickness. This is your first layer on the wafer. You must know what
this thickness is as the system cannot measure and identify both
layers. This step will be skipped if a one layer measurement recipe
was selected prior.
3.2.7 Next the system will ask whether the Cassette/Wafer is ready
(Fig. 4). This is referring to the wafer to be measured. If you have
not already done so sit your wafer or sample centered onto the left
hand platform then press OK.
Fig. 4
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3.2.8 The stage will now move to the first measurement point which is
programmed into the system. The Joystick Active prompt will come
up and you may move the stage manually using the joystick to the
correct location if needed. You may also manually focus on the test
area if needed by rotating the large dial under the left hand side of the
stage (Fig. 5). Once you are sure the measurement point is in view of
the camera then select OK.
Fig. 5
3.2.9 A final box will alert you to Place Wafer, Close UV Shutter, Focus,
Etc. Nothing should be needed as this should have all been
completed by now. Do not worry about the UV shutter we are not
using the UV lamp on this system so the UV shutter will always be
closed. Press OK to begin the measurement.
3.2.10 The system will now begin measuring the first test point. This takes
approx. 5 seconds and then the system moves automatically to the
next test point.
3.2.11 The Joystick Active prompt will come on again once the next test point
is under the objective. You may move the stage to a better test
position if needed. The press OK to begin the next measurement.
DOCUMENT: NANOSPEC 4150 SYSTEM OPERATING PROCEDURES Version: 1.0
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3.2.12 Repeat and continue this process until all of the measurement data
points have been collected. Then a final prompt will open asking if you
would like to Continue for Another Wafer Y/N. Answer No to this
and the screen will now display your individual test point
measurements and the Max, Min, Mean, Standard Dev, and
Uniformity (Fig. 6) for the test points you just measured. In addition,
you may view the Fit curve for the measured data by pressing the F2
Graph button on the screen. This will pull up the fit graph in the lower
right hand corner of the screen. Pressing the F2 button again will
remove it from the screen.
Fig. 6
3.2.13 Once you are through you may Press the Alt – F6 buttons to once
again activate the joystick and manually move the stage to a position
which is easy to remove your test sample and the reflectance
substrate.
3.2.14 When you are finished with the System then Press the F5 Logoff
button.
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3.3 Running a Recipe using F8 or F9 Manual Modes
3.3.1 These two modes are primarily for single point tests or users which
are using partial wafers. See step 3.2.1 first then proceed to the next
step.
3.3.2 Press F8 for all User configured recipes or F9 for all Standard recipes
that were loaded by the vendor. The system will Ask if you would like
to store the measurements select Yes.
3.3.3 After this another prompt box will open asking for you to enter
Parameters. Enter a name or ID that you would like to store the data
under. It would be best to use your name and a date code. Once you
enter this another Parameters box for the wafer will open. Enter a
wafer ID if you like.
3.3.4 Next a Program Selection window will open (Fig. 7). The recipes
listed display the recipe #, the # of measurement points, the film type
and the substrate. Select the appropriate recipe # from this window
and press ENTER.
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3.3.5 You will now be prompted to identify which lens you are using (Fig. 8). Look at the lens turret on the microscope and on the side of the objective in use is printed the magnification of the lens. Typically 5X or 10X lenses are used. Make sure the Selected Lens matches and press Enter.
Fig. 8
3.3.6 If you selected a two layer measurement recipe in step 3.3.4 then a
window will now open with a prompt to enter the UNDERLAYER
thickness. This is your first layer on the wafer. You must know what
this thickness is as the system cannot measure and identify both
layers. It will only measure the top layer. This step will be skipped if a
one layer measurement recipe was selected prior.
3.3.7 Now the system will prompt as to whether it’s been > 24 hours and if
you need to run a reference scan. Answer accordingly. If you answer
NO then skip ahead to step 3.2.8. If you selected YES then the
system will tell you to “Prepare Substrate for Reference” This is your
cue to put the clean bare silicon wafer onto the right hand stage if you
have not already done so, then press enter. The system will then
prompt as to whether or not you would like for the stage to move to
the reference position automatically, answer YES. The stage will now
move to the center of the right hand platform. Another window will
open notifying you that the joystick is active so that you may manually
move to a different reference position if required. Once the wafer is
properly positioned you are ready to take the reference scan press the
“OK” button and the reference scan will commence.
DOCUMENT: NANOSPEC 4150 SYSTEM OPERATING PROCEDURES Version: 1.0
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3.3.8 Once you have finished the prior step you will need to Press Alt – F6
simultaneously to activate the joystick. Manually move the right stage
which contains your sample under the measuring objective. Once the
sample is positioned under the objective for measurement press OK.
3.3.9 Now you may adjust the Focus if necessary of the sample image by
manually rotating the stage adjustment (See Fig. 5).
3.3.10 You are now ready to measure, Press F10 to perform a single point
measurement.
3.3.11 A final box will alert you to Place Wafer, Close UV Shutter, Focus,
Etc. Nothing should be needed as this should have all been
completed by now. Do not worry about the UV shutter we are not
using the UV lamp on this system so the UV shutter will always be
closed. Press OK to begin the measurement. The measurement will
take approx. 5 seconds to complete.
3.3.12 If you wish to perform another single point measurement proceed to
Step 3.3.8 and move the stage to a new test point using the joystick.
Continue as needed using steps 3.3.8, 3.3.9 & 3.3.10 until all test
points have been measured then proceed to the next step.
3.3.13 Once you are finished with the testing press button F6 Done to
display the calculated data for the measured test points (See Fig. 6).
A parameters prompt will come on the screen for you to enter or
modify the Wafer ID. Enter information if needed then press OK.
3.3.14 You may now press button F2 to display the Fit Curve graph for your
measurement data in the lower right hand corner. Pressing F2 again
will turn the graph off.
3.3.15 If you are finished measuring samples with the system then press the
F5 Logoff button.
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4.0 Database
4.1.1 To access the stored user database files press the F1 button from the
main software screen (See. Fig. 2).
4.1.2 This will open a new window (Fig. 9)from which you can pick out a
stored data file that you would like to view. Files are listed by date and
the ID information which was entered by the user in the Parameters
box in steps 3.2.3 or 3.3.3.
Fig. 9
4.1.3 Highlight the desired file then click on the Show Measurement Data
button on top of the screen.
DOCUMENT: NANOSPEC 4150 SYSTEM OPERATING PROCEDURES Version: 1.0
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4.1.4 A new window will open displaying the data file. Scroll to the right in
this window and you will see the thickness measurements. Highlight
the column of measurements you wish to view (Fig. 10). Then click on
the MAP button at the bottom right of the data file window.
Fig. 10
4.1.5 A new window will open displaying the map of the wafer and the
measured points (Fig. 11). Along with the wafer map will be the other
statistics for the measured data.
Fig. 11
4.1.6 Once you are finished viewing the Wafer Map click on File from the
header and then Exit. You will now be at the main Data selection
window. To exit this window, once again click on File from the header