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Hull Group / RPI (UVa).

New Methods for Nanoscale Fabrication

Primarily Using Electron and Ion beams

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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Low Energy Electron Microscopy (SPECS P90)

Spatial resolution 5 (2) nm; Spectral resolution 200 meV;Time resolution 100 (1) ms (R. Tromp IBM, J. Thorp, UVa)

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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g ange r ng w ne o s g o samp e:1) Focused ion beam (future); 2)Secondary electron detector (future); 3)Effusion cell x2; 4) Multi-cell e-beam evaporator; 5) PEEM source (Hg); 6)

yrometer; ar a e ocus on gun; as man o system

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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Si (100)

Dark Field

Aug 21

DF 3rd Flash

R10.bmp

Left: Si(100) 2 x1 5m FOV;Right: Ge/Si(100) 10 m FOV

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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In-Situ Transmission Electron Microscopy

Range Capabilities

Heating, ST 30 - 1400 C

g, -

Heating + Electrical, ST 30 - 1400 C Electrical Currents to > 1 A

Heatin + Strainin ST 30 - 1000 C(a)

Strainin Rates 0.04-0.4 m/sHeating + Electrical + Optical,

ST

30 - 500 C(b)

Electrical Currents to > 1A

Optical Fluxes to >10

2

W -cm-2

Heating + Indentationc

30 600 C Indentation, x,y, positioning

~ 10 nm, z ~ 1nm

Piezo motor

Optical fiberfeed through

Electricalcontacts

Furnace for temperaturesup to ~300C

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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NatureMaterials,

2 532

Cu / Cu Cu / Pt

5 m FOV, real time

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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Nanoscale Tomography with the Focused Ion Beam

5 m

Cu-15In Allo sHighest In Conc. Green, Matrix Conc. Blue

w/ Alan Kubis, UVa D. Dunn IBM

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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3D Assembly of Epitaxial Quantum Dots

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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PHI 700Auger Nanoprobe

In-situ growth, reaction,surface modification,FIB-Auger

PHI VersaProbeXPS Microprobe

Acquisition of Instrumentation for Nanoscale In-Situ Studies in Auger Electronand X-Ray Photoelectron Spectroscopy ; NSF-MRI; Oct 09

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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Future Directions: Orion He Ion Microscope

Virtualsourcesize;oneatom Beamdiameter

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Nanoscale Surface Templating

FIB Nucleated Ge/Si QDsModify LocalSurface Diffusion

o y oca

Topography

Modify Surface

Chemistry

, ions / spot

With F. Ross,IBM, J. Floro,UVa, J. Gray,

U. Pittsburgh

o y ur ace tra n

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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Single Object Basis on Each Lattice Point Complex Basis on Each Lattice Point

2.0m

R ~ 30 nm R < 10 nm R ~ 30 nm (R) < 10 nm

D ~ 50 nm L ~ 30 nm

(0) < i < 108

m-1

(0) < n < 107 m-1

D ~ 10 nm L ~ 10 nm

(0) < i < 108

m-1

106 < n < 109 m-1

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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FIB Patterning of CuO2/SrTiO3

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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* 10 pA, 100s

* 1014 ions cm-2

* 104features/s * c. 20 pJ / feature * 1 mm3of Ga 1019features * A: 1 ion assembles103atoms in cluster

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Goal: Delivery of pulses of 1-10n of

Atom-by-Atom Modification of Chemistry / Functionality

resolution/alignment to few tens of nm

Orsay Physics MassSelecting FIB Column

1pA beam, 11B+ ions. (from PdAsB)

nm

w/ J. Graham, UVa

8/14/2019 New Methods for Nanoscale Fabrication and Characterization of Materials Primarily Using Electron and Ion beams

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Towards Single Atom Delivery / Registration:Combinatorial Synthesis at the Nanoscale

()Rx,y

Doping Ion Beam

()Rx,y

Doping Ion Beam

TotalIonDoseperPulsevs.BeamCurrent

10000

100000

lse

Nanostructure

TemplatingIon Beam

Nanostructure

TemplatingIon Beam

10

100

1000

IonDose

perP 100ns

1s10s100s

x,y x,y

STM Tip

x,y x,y

STM Tip

1

1 11 21 31 41 51 61 71 81 91

IonCurrent(pA)Detect secondaryelectron burst from ionarrival:Matsukawa et al, JVST

,

Change in I-V

MOSFETShinada et al,

Nanotechnology 19,345202

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Summary: Main Themes

Three dimensional nanoscale analysis ofmaterials

In-situ TEM imaging of liquid/solid interfaces andof liquid phase reactions

Nanoscale surface templating using focused ion

beams om c sca e mo ca on o ma er a s us ng

focused ion beams