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Scanning Probe Microscopy – the Nanoscience Tool

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Scanning Probe Microscopy the Nanoscience Tool NanoScience & NanoTechnology NanoScience & NanoTechnology Tools that operate in real space with Ångstrom to nanometer spatial resolution, in contrast to scattering techniques, such as for instance the SEM (scanning electron microscope), that operate in the reciprocal space. In principle, SPM systems consist of probes that are nanosized (accomplished microlithographically), scanning and feedback mechanisms that are accurate to the subnanometer level (achieved with piezoelectric material), and highly sophisticated computer controls (obtained with fast Field or Perturba tion Sample Material SPM Probe Piezo Scanner Feedback Signal
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Scanning Probe Microscopy – the Nanoscience Tool

NanoScience & NanoTechnologyNanoScience & NanoTechnology

Tools that operate in real space with Ångstrom to nanometer spatial resolution, in contrast to scattering techniques, such as for instance the SEM (scanning electron microscope), that operate in the reciprocal space.

In principle, SPM systems consist of

probes that are nanosized (accomplished microlithographically),

scanning and feedback mechanisms that are accurate to the subnanometer level (achieved with piezoelectric material), and

highly sophisticated computer controls (obtained with fast DACs (digital analog converters, etc.).

Field orPerturbation

Sample Material

SPM Probe

Piezo Scanner

Feedback Signal

SPM - TreeNanoScience & NanoTechnologyNanoScience & NanoTechnology

Conventional STMTopography of conductive surfaces, I-V spectroscopy (e.g., local band gaps)

Ballistic Electron Emission Microscopy and SpectroscopySubsurface investigations, e.g., of metal/semiconductor interfaces

STM Scanning Tunneling PotentiometryScanning Tunneling Microscopy Surface potential studies (e.g., study of grain boundaries)

Photovoltaic and Photoassisted Tunneling SpectroscopySurface electron-hole pair recombination during photo-excitation

Inelastic Electron TunnelingSTM induced photon emissions (study of heterostructures)

Conventional SFM (atomic force microscopy AFM)Topography of mainly non-conducting surfaces, force spectroscopy

(S)LFM (Lateral force mapping of surfaces)

SFM Friction studies, local material distinction ("Chem. Force Microscopy" )

Scanning Force Microscopy (S)EFM (Electrostatic Force Microscopy)Non-contact electrostatic force mapping, (e.g., study of charge decay)

SPM (S)MFM (Magnetic Force Microscopy)

Scanning Probe Microscopy Contact and non-contact technique used to study magnetic domains

Rheological Force MicroscopyContact sinusoidal modulation (distance or force) methods

(S)UFM (Ultrasonic Force Microscopy)non-linear surface effects (e.g., true non-contact interactions, or rheology)

(S)PFM (Pulsed Force Microscopy); rheology and adhesion force mapping

SCAM (Scanning Capacitance Microscopy); measuring of trapped charges

SECM (Scanning Electrochemical Microscopy); spatial variations of Faradaic currents or potential changes)

SNOM (Scanning Near-field Optical Microscopy); optical properties, luminescence

SMM (Scanning Micropipette Microscopy); local ion concentration (e.g., transport processes in membranes)

SCM (Scanning Calorimetric Microscopy); local heat transfer coefficients and transition temperatures SNOM (Scanning Nearfield Optical Microscopy)

SNAM (Scanning Near-field Acoustic Microscopy); topography and rheology

SPM – Basic Principles

NanoScience & NanoTechnologyNanoScience & NanoTechnology

Scanning Tunneling Microscope (STM)

Tunneling Current, I

Bias Voltage, V

Conductive Sample

STM Tip

Piezo Scanner

Sample

SFM Tip

Piezo Scanner/Feedback

Normal Force: FN = kN*z

Lateral Force: FL = kL*x

Small aperture Evanescent

Field Regime

Illumination

Objective

Detector

Sample

Scanning NearField Microsopye (SNOM)

Scanning Force Microscope (SFM)

STM Background

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In 1981, G. Binnig, H. Rohrer, Ch. Gerber and J. Weibel observed vacuum tunneling of electrons between a sharp tip and a platinum surface. The tunnel current is strongly distance, z, dependent; i.e.,

A=4(2m)1/2/h, with the tip-sample applied bias voltage, Vbias, and the average potential barrier height .

Tunneling occurs in the low bias voltage regime, i.e., ~0.1 V. At high bias voltage, i.e., Vbias>/e, the current flow is due to field emission (FE), i.e.,

(Fowler Nordheim Eq.)

zAexpVI 2/1bias

bias

2biasFE V

constexpVI

STM Modes of Operation

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Constant height imaging or variable current mode (fast scan mode). The scan frequency is fast compared to the feedback response, which keeps the tip in an average (constant) distance from the sample surface. Scanning is possible in real-time video rates that allow, for instance, the study of surface diffusion processes.

Differential tunneling microscopyTip is vibrated parallel to the surface, and the modulated current signal is recorded with lock-in technology.

Tracking tunneling microscopyScanning direction is guided by modulated current signal (e.g., steepest slope).

Scanning noise microscopyUse current noise as feedback signal at zero bias.

Nonlinear alternating-current tunneling microscopyConventionally, STM is restricted to non-conducting surfaces. A high frequency AC driving force causes a small number of electrons to tunnel onto and off the surface that can be measured during alternative half-cycles (third harmonics).

SAMPLE

CANTILEVER

PIEZO

Scanning Force Microscopy (SFM)

Photodiode LASER

Topography

NanoScience ToolNanoScience Tool

AFM

Friction

Material Distinction

100 µm

0 µm

50 µm

100 µm0 µm 50 µm

A

B32.33 µm

0 µm

16.17 µm

32.33 µm0 µm 16.17 µm

ElasticityTg = 374K

Glass Transition

Environmental chamber and heating /cooling stage for scanning probe microscope.

SFM EnvironmentNanoScience ToolNanoScience Tool

SFM Modes of Operation

• Lateral Force Microscopy

• Scanning Modulation Microscopy

• Force Approach Spectroscopy

• Contact Thermal Shear Modulation Analysis

- Imaging (Material Distinction)- Rheological Analysis

- Imaging (Material Distinction)- Rheological Analysis

- Interaction Forces- Material Compliances- Rheological Boundary Layer

- Thermally-Induced Transitions (e.g., glass transition)

Modes of Operation: Provide:

NanoScience ToolNanoScience Tool

SFM Modes of Operation

Lateral Force Microscopy

F

0

Fstatic Fdynamic

x

Scan Hysteresis

FL

Piezo Scanner/Feedback

100 µm

0 µm

50 µm

100 µm0 µm 50 µm

100 µm

0 µm

50 µm

100 µm0 µm 50 µm

SFM Tip

Lateral Force:FL = kL*x

x scan directions

kL

x

Solid Interface

Air orLiquid Environment

Molecular ResolutionTopography/Friction

Molecular Stick Slip

Rheological AnalysisMaterial Distinction

Lateral Force Rate and Thermal Analysis

0.0250

0.0270

0.0290

0.0310

0.0330

0.0350

0.0370

0.0390

0.0410

0.0430

0.0450

-3.0 -2.5 -2.0 -1.5 -1.0 -0.5 0.0 0.5 1.0 1.5 2.0 2.5

ln( [nm/s] / T [K] )

(FC-F

)3/2 /

T

[n

N3/

2 / K

]

300K

310K

320K

330K

340K

350K

365K

(FC-F)3/2 / T = -0.002 ln(/T) + 0.0351

R2 = 0.6055

y = -0.1094x + 6.5373

R2 = 0.9318

0.8

0.9

1

1.1

1.2

1.3

1.4

1.5

1.6

1.7

44 46 48 50 52( T [K] ) 2/ 3

FC = 6.5373 nN

SFM Modes of Operation

Scanning Modulation Microscopy

xresp

x or z modulated piezo

zresp

Measured with two-phase lock-in technique

Compares response signal to input signal

Modulus and Contact Information

Viscosity and Contact Information

Shear Response and Thermal Analysis

Molecular Resolution

Topography Friction "Elasticity"

- at constant applied load- with modulation frequencies exceeding feedback response

PS

Si

0.6

0.8

1

1.2

1.4

1.6

1.8

2

2.2

50.0 60.0 70.0 80.0 90.0 100.0 110.0 120.0Temperature (oC)

S

he

ar

Re

sp

on

se

Tg 95 oC

24oC 94oC 109oC

linearly ramped z-Piezo

xresp

Probing Distance (D)

x-modulation input

Rheological Boundary Regime

SFM Modes of Operation

Force Approach Spectroscopy

Normal Force Response

F(D)

R.M. Overney et al., Phys. Rev. Lett. 76, 1272-1275 (1996).

F(D)

0

xresp(D)

0

Rheological Boundary Regime

F

D 0

xresp

PS grafted Silicon in (a) water (poor solvent)(b) toluene (good solvent)

Entropic Structuring of Simple LiquidsPrinciple

Water no boundary layerOMCTS “monolayer"n-C16H34 ~ 3 layers

M. He et al., Phys. Rev. Lett. 88 p.154302/1-4 (2002).

X - ray study: H. Kim et al., in Dynamics in Small Confining Systems V, edited by J.M. Drake et al., (Mat. Res. Soc. Symp. Proc. 2001) Vol 651, p T2.1

OMCS measurements are in agreement with x-ray reflectivity results (S. Sinha):

xmod

Shear Response

ShearDisplacement

Sample

CantileverTip

xL

Heating/Cooling Stage

250 350 360 370 380 400

0

Tg

xL,

Contact Thermal Shear Modulation Analysis

SFM Modes of Operation

85

90

95

100

105

0 50 100 150 200 250 300FILM THICKNESS, ( nm )

Tg (

oC

)

12.0 kDa PS

FOX-FLORY (BULK)

7

27

87

67

47

127

107

MOLECULAR WEIGHT [Mn]103 104 105 106 107

Tg

( O

C )

C. Buenviaje, et al., ACS symposium series; 781 (2001): 76-92

NanoScience ToolNanoScience Tool

SFM: Other Modes of Operation- Electrostatic Force Microscopy (EFM)

Application: Study of the location and lifetime of surface charges on insulating surfaces.

Procedure: Long-range electrostatic Coulombic forces are measured with a mechanically modulated conductive or clean silicon cantilever tip. An AC voltage is applied between the tip and the sample with a frequency w2 that is smaller than the mechanical modulation frequency w1 but larger than the gain of the feedback response. The AC voltage causes a charge and a mirror charge on the tip and the sample, respectively. The mechanically modulating tip is experiencing a Coulombic force gradient. For an uncharged surface the force gradient will oscillate at 22, whereas for a charged surface, the force gradient will be modulated at 2. A charge signal can be extracted by measuring the f and 2f signal with lock-in technique. The phase of that signal corresponds to the sign of the surface charge.

- Magnetic Force Microscopy (MFM)

Application: Measuring of surface magnetic structures

Procedure: Using the non-contact mode with magnetically coated cantilever tips.

Environmental chamber and heating /cooling stage for scanning probe microscope (SFM).

AFM/SFM Environment

C

FORWARDSCAN

REVERSESCAN

SAMPLE

PHOTODIODE

xREFLECTED LASER BEAM

CANTILEVER WITH LATERAL SPRING

CONSTANT KL

Friction Force Microscopy

F

0

Fstatic Fdynamic

xFL

FORWARD

REVERSE

Molecular Resolution Lateral Force Image (left) with Molecular Stick Slip behavior (below)

Lateral force images on smooth surfaces may be used to distinguished materials displaying different coefficients of friction.

100 µm

0 µm

50 µm

100 µm0 µm 50 µm

100 µm

0 µm

50 µm

100 µm0 µm 50 µm

FORWARD

REVERSE

SFM ModesSFM Modes

D

linearly ramped z-Piezo

xresp

Probing Distance (D)

x-modulation input

Rheological Boundary Regime

Normal Force Response

F(D)

R.M. Overney et al., Phys. Rev. Lett. 76, 1272-1275 (1996).

F(D)

0

xresp(D)

0

Rheological Boundary Regime

F

D 0

xresp

PS grafted Silicon in (a) water (poor solvent)(b) toluene (good solvent)

SFM ModesSFM Modes

Force Approach Spectroscopy

Tomlinson Model Molecular Stick-Slip Model (1920)

R. M. Overney et al., Phys. Rev. Lett. 72, 3546 (1994)

SFM/AFMon bilayer Lipid Film

Fave=24 nN

Fave=32 nN

Molecular Stick-SlipNanoScience & LubricationNanoScience & Lubrication


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