B.A.Bryce
Brian A. Bryce, Jason J. Gorman, Sergiy Krylyuk, and Albert Davydov
Silicon nanowire mass sensors
B.A.Bryce
Outline• Introductiontovapor-liquid-solidnanowiregrowth• Literaturenanomechanical measurementofmass• Ouridea• ExperimentalResults• Questions
B.A.Bryce
In1964,R.S.WagnerandW.C.Ellisfirstobserved thegrowthof siliconcrystalsfromAuparticlesduetothepresenceofasiliconvapor.
Thewiresweresolid, theparticlewasaliquideutecticandtheprecursorwasavaporsotheycalledthemethod:vapor-liquid-solid (VLS)growth.
Itdependsontheeutecticpointofabinaryphasediagram.
VLSgrowthwasoriginallycalledwhiskergrowth inthe1970sfollowingWagnerandEllis’sworkbuteventuallyevolvedinthe1990sintonanowiregrowth,capableofcreatingrodsatnanoscaledimensions.
Vapor-liquid-solidnanowiregrowth
B.A.Bryce
Attogram detectionusingnanoelectromechanicaloscillators
B.Ilic,H.G.Craighead,S.Krylov,W.Senaratne,C.Ober,andP.Neuzil,J.Appl.Phys.95,3694(2004).
𝑓" =𝛽𝑙 &
2𝜋𝑡𝑙&
𝐸12𝜌(1 + 4𝛾)
�
𝛾 =𝑚𝜌𝐴𝑙
Resolvablemass=0.39ag
B.A.Bryce
Nanowirecantileversformassbasedsensing
Idea:Usesitecontrolled growthofSivapor-liquid-solidwirestocreatehighsensitivitymasssensingplatform
𝑓" =𝛽𝑙 &
12𝜋𝑡𝑙&
5𝐸2𝜌
�
𝛽𝑙 ⇒ 𝑠𝑜𝑙𝑢𝑡𝑖𝑜𝑛𝑡𝑜𝑡𝑟𝑎𝑛𝑠𝑖𝑑𝑒𝑛𝑡𝑖𝑎𝑙
Taperedregularhexagonwithendmass:
B.A.Bryce
Phase1:Sitecontrolledgrowthandsensitivity
Idea Reality
𝑄 > 13000
Estimatedresolvablemass=0.07-0.14ag
𝜎F = 0.5 − 1𝐻𝑧
B.A.Bryce
SiliconnanowiremasssensorsBrianA.Bryce,JasonJ.Gorman,SergiyKrylyuk,andAlbertDavydov
20µm
Idea Reality
Betterthan0.14attogramsensitivity
(0.00000000000000000014 g)
B.A.Bryce
Attogram detectionusingnanoelectromechanicaloscillators
B.Ilic,H.G.Craighead,S.Krylov,W.Senaratne,C.Ober,andP.Neuzil,J.Appl.Phys.95,3694(2004).
2µm
𝑓" =𝛽𝑙 &
2𝜋𝑡𝑙&
𝐸12𝜌(1 + 4𝛾)
�
𝛾 =𝑚𝜌𝐴𝑙
𝑄 = 8500
Resolvablemass=0.39ag
B.A.Bryce
Measurementprinciple- Fabry–Pérot interferometer
𝑑LFF
𝑎 = 𝛼N cos 𝜔𝑡
𝑏 = 𝛼&cos(𝜔𝑡 +4𝜋𝑑LFF𝜆 )
Cantilever
Substrate
B.A.Bryce
Nanowirecantileversformassbasedsensing
Idea:Usesitecontrolled growthofSivapor-liquid-solidwirestocreatehighsensitivitymasssensingplatform
Motivation:
• Likelyhigh-Qaswiresaredamagefreeandsinglecrystal
• Auontipcanbefunctionalized andismostsensitivelocationformassloading
• CanbeintegratedwithotherSibasedtechnologytoallowformultiplexing
• Canbescaledtonanoscopic dimensions withoutelectronbeamlithography
• Highly integratedsensor isaninterestingmetrologysystem-on-a-moduleproblem
𝑓" =𝛽𝑙 &
12𝜋𝑡𝑙&
5𝐸2𝜌
�
Goal:OnechipandPCBwithsamemeasurementqualityasentirelabofequipment
𝛽𝑙 ⇒ 𝑠𝑜𝑙𝑢𝑡𝑖𝑜𝑛𝑡𝑜𝑡𝑟𝑎𝑛𝑠𝑖𝑑𝑒𝑛𝑡𝑖𝑎𝑙
Taperedregularhexagonwithendmass:
B.A.Bryce
Phase1:Showsitecontrolledgrowthonsidewallsofhigh-QVLScantilevers,andestimatemasssensitivity
Phase2:Integratephotodetector, andthermaldrivertoallowforpartialmultiplexing
Phase3:Integratelightsourceforfullmultiplexing
Phase4:Integratevacuumpumptocompletehigh resolutionmassdetectionsystem
B.A.Bryce
Phase1:Showsitecontrolledgrowthonsidewallsofhigh-QVLScantilevers,andestimatemasssensitivity
B.A.Bryce
4µm
1) Growawirewherewewant
2) Growitinaparticulardirection
3) Growone wire
Controlisneeded
B.A.Bryce
Nanowirereactor
SystemFeatures:q 4-zonefurnace;quartzreactorfor2”wafersq Variablepressure(3mTorr – 760Torr)withN2/H2 carriergasq SiH4 andSiCl4 precursorsq Insitu dopingforn- (PH3)and p- (BCl3)types
Exhaust
I II III IVInlet
SiNWsgrowthconditions:
Tgrowth =500-- 1050Cà 900C
P=10-- 760Torrà 600Torr
Growthrate=0.1-- 10um/min
SiH4v Sis400-650C
10-600 torr
SiCl4v Sis900C
B.A.Bryce
Theinstrument(Phase1)He
NeLaser
Polarizer Polarizer
BS
BS
LED
Köhler
illum
inatior
Objective Dichroicmirror
TubeLens CameraPhotodiode
He/Arinlet
Todrypump
VacuumChamber
OnXYZstage
ToElectronics
B.A.Bryce
Phase1:Sitecontrolledgrowthandsensitivity
Idea Reality
𝑄 > 13000
Estimatedresolvablemass=0.07-0.14ag
𝜎F = 0.5 − 1𝐻𝑧
B.A.Bryce
Phase2devicerealityHeaterPhotodiode
NanowireSensor
Metal1
Metal2
Au
p-Si
n-Si
SiO2
10layersoflithography!1. Markdefinition(L+RIE)2. Oxidize(RCA+tube)3. Trenchdefinition(L+RIE+KOH)4. Oxidize(RCA+tube)5. VIAfordiode (L+RIE+HF)6. n+ poly-Sigrowth7. PolySelect1(L+RIE)8. PolySelect2(L+RIE)9. M0Liftoff(L+evaporation)10. PECVDSiO2+SiNx11. VIAthroughSiNx (L+RIE)12. Windowopen(L+HF)13. Audeposition (L+HF+evaporation)14. Wiregrowth15. Contacts(L+HF+evaporation)
20µm
B.A.Bryce
Brian A. Bryce, Jason J. Gorman, Sergiy Krylyuk, and Albert Davydov
Silicon nanowire mass sensors
B.A.Bryce
SiliconnanowiremasssensorsBrianA.Bryce,JasonJ.Gorman,SergiyKrylyuk,andAlbertDavydov
20µm
Idea Reality
Betterthan0.14attogramsensitivity
(0.00000000000000000014 g)
B.A.Bryce
Outline• Introductiontovapor-liquid-solidnanowiregrowth• Literaturenanomechanical measurementofmass• Ouridea• ExperimentalResults• Questions
B.A.Bryce
In1964,R.S.WagnerandW.C.Ellisfirstobserved thegrowthof siliconcrystalsfromAuparticlesduetothepresenceofasiliconvapor.
Thewiresweresolid, theparticlewasaliquideutecticandtheprecursorwasavaporsotheycalledthemethod:vapor-liquid-solid (VLS)growth.
Itdependsontheeutecticpointofabinaryphasediagram.
VLSgrowthwasoriginallycalledwhiskergrowth inthe1970sfollowingWagnerandEllis’sworkbuteventuallyevolvedinthe1990sintonanowiregrowth,capableofcreatingrodsatnanoscaledimensions.
Vapor-liquid-solidnanowiregrowth
B.A.Bryce
Attogram detectionusingnanoelectromechanicaloscillators
B.Ilic,H.G.Craighead,S.Krylov,W.Senaratne,C.Ober,andP.Neuzil,J.Appl.Phys.95,3694(2004).
Resolvablemass=0.39agNoscale
Toosmall
B.A.Bryce
Attogram detectionusingnanoelectromechanicaloscillators
B.Ilic,H.G.Craighead,S.Krylov,W.Senaratne,C.Ober,andP.Neuzil,J.Appl.Phys.95,3694(2004).
2µm
𝑓" =𝛽𝑙 &
2𝜋𝑡𝑙&
𝐸12𝜌(1 + 4𝛾)
�
𝛾 =𝑚𝜌𝐴𝑙
𝑄 = 8500
Resolvablemass=0.39ag
B.A.Bryce
Nanowirecantileversformassbasedsensing
Idea:Usesitecontrolled growthofSivapor-liquid-solidwirestocreatehighsensitivitymasssensingplatform
𝑓" =𝛽𝑙 &
12𝜋𝑡𝑙&
5𝐸2𝜌
�
𝛽𝑙 ⇒ 𝑠𝑜𝑙𝑢𝑡𝑖𝑜𝑛𝑡𝑜𝑡𝑟𝑎𝑛𝑠𝑖𝑑𝑒𝑛𝑡𝑖𝑎𝑙
Taperedregularhexagonwithendmass:
B.A.Bryce
Nanowirecantileversformassbasedsensing
Idea:Usesitecontrolled growthofSivapor-liquid-solidwirestocreatehighsensitivitymasssensingplatform
Motivation:
• Likelyhigh-Qaswiresaredamagefreeandsinglecrystal
• Auontipcanbefunctionalized andismostsensitivelocationformassloading
• CanbeintegratedwithotherSibasedtechnologytoallowformultiplexing
• Canbescaledtonanoscopic dimensions withoutelectronbeamlithography
• Highly integratedsensor isaninterestingmetrologysystem-on-a-moduleproblem
𝑓" =𝛽𝑙 &
12𝜋𝑡𝑙&
5𝐸2𝜌
�
Goal:OnechipandPCBwithsamemeasurementqualityasentirelabofequipment
𝛽𝑙 ⇒ 𝑠𝑜𝑙𝑢𝑡𝑖𝑜𝑛𝑡𝑜𝑡𝑟𝑎𝑛𝑠𝑖𝑑𝑒𝑛𝑡𝑖𝑎𝑙
Taperedregularhexagonwithendmass:
B.A.Bryce
Phase2devicerealityHeaterPhotodiode
NanowireSensor
Metal1
Metal2
Au
p-Si
n-Si
SiO2
10layersoflithography!1. Markdefinition(L+RIE)2. Oxidize(RCA+tube)3. Trenchdefinition(L+RIE+KOH)4. Oxidize(RCA+tube)5. VIAfordiode (L+RIE+HF)6. n+ poly-Sigrowth7. PolySelect1(L+RIE)8. PolySelect2(L+RIE)9. M0Liftoff(L+evaporation)10. PECVDSiO2+SiNx11. VIAthroughSiNx (L+RIE)12. Windowopen(L+HF)13. Audeposition (L+HF+evaporation)14. Wiregrowth15. Contacts(L+HF+evaporation)
20µm