Ž .Diamond and Related Materials 11 2002 1310�1327
Subject Index of Volume 11
3H centrePhotoluminescence studies of type IIa and nitrogen doped CVD
diamond, 692
60 kW CVD² :Large area deposition of 100 -textured diamond films by a
60-kW microwave plasma CVD reactor, 596
6H�SiCŽ . Ž .Diamond deposition on Si 111 and carbon face 6H�SiC 0001
substrates by positively biased pretreatment, 509
a-CAb initio generation of amorphous carbon structures, 1015Soft X-ray photoelectron microscopy used for the characterization
of diamond, a-C and CN , thin films, 1068x
a-C:N nano-rodsMorphology and characterization of highly nitrogenated, aligned,
amorphous carbon nano-rods formed on an alumina template byECR-CVD, 1193
A-defectDetonation synthesis ultradispersed diamond structural properties
investigation by infrared absorption, 872
AbradingAbrasive stripping voltammetry of silver and tin at boron-doped
diamond electrodes, 646
AcetylenePlasma chemistry during deposition of a-C:H, 989
AdhesionHigh temperature diffusion chromizing as a successful method for
CVD-diamond coating of steel, 757
Adhesion strengthQuantitative comparison of adhesive toughness for various diamond
films on co-cemented tungsten carbide, 716
AdsorbatesRole of adsorbates in field emission from nanotubes, 769
AdsorptionElectron emission from hydrogenated and oxidized heteroepitaxial
diamond doped with boron, 780
AlNReactive DC magnetron sputtering of aluminum nitride films for
surface acoustic wave devices, 413
AmorphousPreparation and properties of amorphous carbon oxy-nitride films
made by the layer-by-layer method, 1210Response time of photoconductivity of amorphous carbon nitride
films prepared by a nitrogen radical sputter method, 1215
High resistivity and low dielectric constant amorphous carbonnitride films: application to low-k materials for ULSI, 1219
Amorphous carbonCharacteristics of hydrogenated amorphous carbon films deposited
by large-area microwave-sustained surface wave plasma, 976Properties of W�a-C nanometric multilayers produced by
RF-pulsed magnetron sputtering, 1000Effects of gas pressure and r.f. power on the growth and
properties of magnetron sputter deposited amorphouscarbon thin films, 1005
Optical strength in UV region of amorphous carbon, 1106Mechanical properties and performance of magnetron-sputtered
graded diamond-like carbon films with and withoutmetal additions, 1139
Ž .Micro-structural analysis of carbon nitride CN film preparedxby ion beam assisted magnetron sputtering, 1205
Amorphous diamondAb initio generation of amorphous carbon structures, 1015
Amorphous hydrogenated carbonGrowth mechanism of amorphous hydrogenated carbon, 969Low energy post-growth irradiation of amorphous hydrogenated
Ž .carbon a-C:H films, 1026IR study of the formation process of polymeric hydrogenated
amorphous carbon film, 1110Multi-band structure of amorphous carbon luminescence, 1115
Amorphous semiconductorsAb initio generation of amorphous carbon structures, 1015
Amorphous-carbonSubstrate bias effect on amorphous nitrogenated carbon films
deposited by filtered arc deposition, 1227
Anisotropic etchingSmooth and high-rate reactive ion etching of diamond, 824
AnnealingNitrogen and phosphorus implanted MESFETs in semi-insulating
4H-SiC, 392Annealing study of the formation of nickel-related paramagnetic
defects in diamond, 623Influence of annealing on reverse current of 4H�SiC Schottky
diodes, 1263Synthesis and characterization of cubic boron nitride films �
investigations of growth and annealing processes, 1272
ApplicationsElectrical properties of graphite�homoepitaxial diamond contact,
451Abrasive stripping voltammetry of silver and tin at boron-doped
diamond electrodes, 646Diamond cantilever with integrated tip for nanomachining, 667
Elsevier Science B.V.Ž .PII: S 0 9 2 5 - 9 6 3 5 0 2 0 0 0 6 5 - 1
Subject Index of Volume 11 1311
Photoelectron spectroscopy of boron-doped homoepitaxial diamondŽ .100 surfaces with several terminations and relatedSchottky barriers, 851
GaN-based heterostructures for sensor applications, 886
Arc dischargeLarge scale synthesis of carbon nanotubes by plasma rotating arc
discharge technique, 914
Atmospheric pressureNew technology for high rate synthesis of PC-diamond coatings in
air with photon plasmatron, 472
Atomic force microscopyDiamond cantilever with integrated tip for nanomachining, 667
Atomic structureAb initio generation of amorphous carbon structures, 1015
B�C�NSynthesis of B�C�N thin films by electron beam excited plasma
CVD, 1290
B-dopingDiffusion of hydrogen from a microwave plasma into diamond and
its interaction with dopants and defects, 316
Backscattering spectrometryInvestigation of ion implantation-induced damage in the carbon
and silicon sublattices of 6H-SiC, 1239
Band structureDetonation synthesis ultradispersed diamond structural properties
investigation by infrared absorption, 872Multi-band structure of amorphous carbon luminescence, 1115
BiasŽ . Ž .Diamond deposition on Si 111 and carbon face 6H�SiC 0001
substrates by positively biased pretreatment, 509Growth of diamond films with bias during microwave plasma
chemical vapor deposition, 523Substrate bias effect on amorphous nitrogenated carbon films
deposited by filtered arc deposition, 1227
Bias assisted growthBias assisted growth on diamond single crystals: the defect
formation due to ion bombardment studied by ion channelling,electron backscatter diffraction, and micro-Raman spectro-scopy, 487
Bias enhanced nucleationAnalysis of the total carbon deposition during the bias enhanced
Ž . 13nucleation of diamond on Ir�SrTiO 001 using C-methane,3493
Bidimensional electron gasGaN-based heterostructures for sensor applications, 886
Black diamondBlack diamond: a new material for active electronic devices, 396
BondingOptical brazing technique for bonding diamond films to zinc
sulfide, 753Determination of bonding in diamond-like carbon by Raman
spectroscopy, 1053
Bonding structureOn the bonding structure of hydrogenated carbon nitrides grown
by electron cyclotron resonance chemical vapour deposition:towards the synthesis of non-graphitic carbon nitrides, 1161
Deposition of amorphous CN by d.c. and rf plasma sputteringxusing a rf radical nitrogen beam source, 1178
BoronInvestigation on boron-doped CVD samples, 338
Boron carbon nitrideCharacterization of boron carbon nitride films with a low
dielectric constant, 985
Boron dopingDetection of CH bonds from micro Raman spectroscopy onx
polycrystalline boron doped diamond electrodes, 662Characterisation of electron irradiated boron-doped diamond, 681Etching of p- and n-type doped monocrystalline diamond using an
ECR oxygen plasma source, 828
Boron nitrideHigh-resolution electron microscopy and electronic structures of
endohedral La@B N clusters, 94036 36Spectroscopic ellipsometry studies on BN films from IR to vacuum
UV energy region, 1281Precursor design in c-BN growth, 1300
Bowing parameterOptical investigation of Al Ga �xN epitaxial films grown onx 1
AlN buffer layers, 892
Brillouin scatteringElastic constants and structural properties of nanometre-thick
diamond-like carbon films, 1062
Buffer layerŽ .Initial stages of GaN buffer layer growth on 0001 sapphire by
metalorganic chemical vapour deposition, 901
C N3 4XPS characterization of the composition and bonding states of
elements in CN layers prepared by ion beam assisted deposition,x1149
Effect of plasma parameters on the structure of CN layersxdeposited by DC magnetron sputtering, 1200
Pulsed laser deposition of CN films: role of r.f. nitrogenxplasma activation for the film structure formation, 1223
C fullerene60Carbon films obtained from a C fullerene ion beam, 96460
CarbideTransmission electron microscopy studies of nanofibers formed on
Fe C -carbide, 9317 3From �-MOSFET with silicon on oxide to �-MOSFET with
silicon carbide on nitride, 1268
CarbidesX-Ray absorption study of the bonding structure of BCN
compounds enriched in carbon by CH ion assistance, 12954
CarbonVery adherent CVD diamond film on modified molybdenum sur-
face, 532Electrochemical activity of boron-doped diamond electrodes grown
on carbon fiber cloths, 657Field emission from carbon films deposited on stainless steel
substrate, 784Defect induced lowering of work function in graphite-like
materials, 813Low temperature plasma chemical vapour deposition of carbon
nanotubes, 918Growth mechanism and properties of the large area well-aligned
carbon nano-structures deposited by microwave plasma electroncyclotron resonance chemical vapor deposition, 922
Atomic and electronic structures of Si-included C cluster74studied by HREM and molecular orbital calculations, 935
Subject Index of Volume 111312
Characteristics of nickel-containing carbon films deposited usingelectron cyclotron resonance CVD, 1031
Preparation and properties of amorphous carbon oxy-nitride filmsmade by the layer-by-layer method, 1210
Response time of photoconductivity of amorphous carbon nitridefilms prepared by a nitrogen radical sputter method, 1215
High resistivity and low dielectric constant amorphous carbonnitride films: application to low-k materials for ULSI, 1219
Carbon nanofiberPulsed laser ablation of graphite in O atmosphere for preparation2
of diamond films and carbon nanotubes, 953
Carbon nanotube growthFrom straight carbon nanotubes to Y-branched and coiled carbon
nanotubes, 1081
Carbon nanotubesA novel CW laser�powder method of carbon single-wall nanotubes
production, 927
Carbon nitrideParamagnetic centres and microstructure of reactively sputtered
amorphous carbon nitride thin films, 1143Ž .Properties of carbon nitride CN films deposited by ax
high-density plasma ion plating method, 1172Deposition of amorphous CN by d.c. and rf plasma sputteringx
using a rf radical nitrogen beam source, 1178Hydrogen concentrations and mass density obtained by X-ray and
neutron reflectivity on hydrogenated amorphous carbon nitridethin films, 1188
Carbon phosphideDeposition and properties of amorphous carbon phosphide films,
1041
Ž .Carbon vapor deposition CVDAtomistic simulation of the bombardment process during the BEN
Ž .phase of chemical vapor deposition CVD of diamond, 513
Catalytic graphitizationA novel CW laser�powder method of carbon single-wall nanotubes
production, 927
Catalytic processesGrowth mechanism and properties of the large area well-aligned
carbon nano-structures deposited by microwave plasma electroncyclotron resonance chemical vapor deposition, 922
The effect of catalysis on the formation of one-dimensional carbonstructured materials, 1019
Characterisation IR� 4Epitaxial growth of phosphorus doped diamond on 111 substrate,
328
CharacterizationGrain boundaries in boron-doped CVD diamond films, 697Deposition of an InN thin film by a r.f. plasma-assisted reactive
Ž .ion-beam sputtering deposition R-IBSD technique, 896Atomic-scale models of interactions between inversion domain
boundaries and intrinsic basal stacking faults in GaN, 905
Chemical vapor depositionFabrication of heteroepitaxial diamond thin films on
Ž . Ž .Ir 001 �MgO 001 substrates using antenna-edge-type micro-wave plasma-assisted chemical vapor deposition, 478
The cavity ring-down spectroscopy of C in a microwave plasma,2608
Surface acoustic waves on nanocrystalline diamond, 677Thermal conductivity enhancement in cutting tools by chemical
vapor deposition diamond coating, 703
Quantitative comparison of adhesive toughness for various diamondfilms on co-cemented tungsten carbide, 716
Effect of substrate grain size and surface treatments on thecutting properties of diamond coated Co-cemented tungstencarbide tools, 726
Field emission, structure, cathodoluminescence and formationstudies of carbon and Si�C�N nanotubes, 793
Characteristics of hydrogenated amorphous carbon films depositedby large-area microwave-sustained surface wave plasma, 976
Ž .Chemical vapor deposition CVDEnhanced low-temperature thermionic field emission from
surface-treated N-doped diamond films, 774Growth mechanism and properties of the large area well-aligned
carbon nano-structures deposited by microwave plasma electroncyclotron resonance chemical vapor deposition, 922
Chemical vapour depositionLow temperature plasma chemical vapour deposition of carbon
nanotubes, 918
Ž .Chemical vapour deposition CVDGrain boundaries in boron-doped CVD diamond films, 697
ChemisorptionCubic boron nitride growth from NH and BBr precursors: a3 3
theoretical study, 1286
Chromium nitrideCVD diamond deposition on steel using arc-plated chromium
nitride interlayers, 536
CNxSoft X-ray photoelectron microscopy used for the characterization
of diamond, a-C and CN , thin films, 1068x
CoatingSoft X-ray photoelectron microscopy used for the characterization
of diamond, a-C and CN , thin films, 1068xEffects of hydrogen incorporation on structural relaxation and
vibrational properties of a-CN:H thin films grown by reactivesputtering, 1166
Coiled nanotubesFrom straight carbon nanotubes to Y-branched and coiled carbon
nanotubes, 1081
Columnar structureSmooth and high-rate reactive ion etching of diamond, 824
CompositeDLC composite thin films by sputter deposition, 1119
Computer simulationAtomistic simulation of the bombardment process during the BEN
Ž .phase of chemical vapor deposition CVD of diamond, 513Diagnostics of plasma ball formed in high pressure microwave
plasma for diamond film synthesis, 562Analysis of the growth process of diamond films by chemical vapor
deposition, 584Atomic and electronic structures of Si-included C cluster74
studied by HREM and molecular orbital calculations, 935High-resolution electron microscopy and electronic structures of
endohedral La@B N clusters, 94036 36Calculation of the charge spreading along a carbon nanotube seen
Ž .in scanning tunnelling microscopy STM , 961Cubic boron nitride growth from NH and BBr precursors: a3 3
theoretical study, 1286
ConductivityLow temperature properties of the p-type surface conductivity of
diamond, 351
Subject Index of Volume 11 1313
CorrosionThe effects of Si incorporation on the electrochemical and
nanomechanical properties of DLC thin films, 1074Evaluation of corrosion performance of ultra-thin Si-DLC
overcoats with electrochemical impedance spectroscopy, 1124
Coulomb oscillationFabrication of diamond single-hole transistors using AFM
anodization process, 387
Cubic boron nitrideSynthesis and characterization of cubic boron nitride films �
investigations of growth and annealing processes, 1272Cubic boron nitride growth from NH and BBr precursors: a3 3
theoretical study, 1286
Ž .Cubic boron nitride CBNStresses in pulsed laser deposited cubic boron nitride films, 1276
Current decreaseDC and RF characteristics of 0.7-�m-gate-length diamond
metal�insulator�semiconductor field effect transistor, 378
Cut-off frequencyDC and RF characteristics of 0.7-�m-gate-length diamond
metal�insulator�semiconductor field effect transistor, 378
CVDFormation of diamond p�n junction and its optical emission
characteristics, 307Effects of light on the ‘primed’ state of CVD diamond nuclear
detectors, 446The CAP-reactor, a novel microwave CVD system for diamond
deposition, 467New technology for high rate synthesis of PC-diamond coatings in
air with photon plasmatron, 472Ž . Ž .Diamond deposition on Si 111 and carbon face 6H�SiC 0001
substrates by positively biased pretreatment, 509Growth of diamond films with bias during microwave plasma
chemical vapor deposition, 523Very adherent CVD diamond film on modified molybdenum sur-
face, 532Analysis of the growth process of diamond films by chemical vapor
deposition, 584Preparation and properties of sub-micron thick and free-standing
diamond membranes, 721Field emission from carbon films deposited on stainless steel
substrate, 784Study of carbon nanoemitters using CO �CH gas mixtures in2 4
triode-type field emission arrays, 788Etching of p- and n-type doped monocrystalline diamond using an
ECR oxygen plasma source, 828Characteristics of nickel-containing carbon films deposited using
electron cyclotron resonance CVD, 1031In situ kinetic analysis of SiC filaments CVD, 1234
Synthesis of B�C�N thin films by electron beam excited plasmaCVD, 1290
CVD diamondImaging of the sensitivity in detector grade polycrystalline
diamonds using micro-focused X-ray beams, 418Influence of nucleation on hydrogen incorporation in CVD
diamond films, 527
CVD diamond growthIn situ characterisation of CVD diamond growth under H S2
addition by optical emission spectroscopy, mass spectro-scopy and laser reflection interferometry, 296
d.c. plasma CVDDefect induced lowering of work function in graphite-like
materials, 813
DC bias measurementsApplication of two- and four-point contact probes to various
monocrystalline diamond surfaces, 332
DC plasma CVDMicrostructure and stress in nano-crystalline diamond films
deposited by DC glow discharge CVD, 601
Deep-level transient spectroscopyThe origin of charge transients in Al�undoped diamond�p-Si
diodes, 400
DefectTheoretical modeling of sulfur�hydrogen complexes in diamond,
323
DefectsDiffusion of hydrogen from a microwave plasma into diamond and
its interaction with dopants and defects, 316Relaxation in undoped polycrystalline CVD diamond films under
red illumination, 635Grain boundaries in boron-doped CVD diamond films, 697From straight carbon nanotubes to Y-branched and coiled carbon
nanotubes, 1081Highest optical gap tetrahedral amorphous carbon, 1086Investigation of ion implantation-induced damage in the carbon
and silicon sublattices of 6H-SiC, 1239
DensityEngineering properties of fully sp3- to sp2-bonded carbon
films and their modifications after post-growth ionirradiation, 1095
Depletion regionFabrication of diamond single-hole transistors using AFM
anodization process, 387
DepositionThe CAP-reactor, a novel microwave CVD system for diamond
deposition, 467
Deposition conditionsPulsed PECVD deposition of diamond-like carbon films, 1047
DetectorsImaging of the sensitivity in detector grade polycrystalline
diamonds using micro-focused X-ray beams, 418Photoconductivity of highly oriented and randomly oriented
diamond films for the detection of fast UV laser pulses, 423Recent progresses of the BOLD investigation towards UV detectors
for the ESA Solar Orbiter, 427
Device modelingOptimization of 2H, 4H and 6H�SiC high speed vertical MESFETs,
1254
Diamondn-Type doping of diamond by sulfur and phosphorus, 289The kinetics of the capture of nitrogen by nickel defects in
diamond, 312� 4Epitaxial growth of phosphorus doped diamond on 111 substrate,
328Application of two- and four-point contact probes to various
monocrystalline diamond surfaces, 332A new acceptor state in CVD-diamond, 347DC and RF characteristics of 0.7-�m-gate-length diamond
metal�insulator�semiconductor field effect transistor, 378
Subject Index of Volume 111314
Preparation of AlN and LiNbO thin films on diamond substrates3by sputtering method, 408
Photoconductivity of highly oriented and randomly orienteddiamond films for the detection of fast UV laser pulses, 423
Recent progresses of the BOLD investigation towards UV detectorsfor the ESA Solar Orbiter, 427
Effects of light on the ‘primed’ state of CVD diamond nucleardetectors, 446
New technology for high rate synthesis of PC-diamond coatings inair with photon plasmatron, 472
Fabrication of heteroepitaxial diamond thin films onŽ . Ž .Ir 001 �MgO 001 substrates using antenna-edge-type micro-
wave plasma-assisted chemical vapor deposition, 478Diamond deposition on hardmetal substrates after pre-treatment
with boron or sulfur compounds, 555Recombination-enhanced diffusion of self-interstitial atoms and
vacancy�interstitial recombination in diamond, 618Annealing study of the formation of nickel-related paramagnetic
defects in diamond, 623On the ion-sensitivity of H-terminated surface channel devices on
diamond, 651Classical approximations for ionised impurity scattering applied
to diamond monocrystals, 686Preparation and properties of sub-micron thick and free-standing
diamond membranes, 721Application of diamond coatings onto small dental tools, 731
Tribological properties of Al� Si� Cu � M g alloy-basedcomposite-dispersing diamond nanocluster, 749
Enhanced low-temperature thermionic field emission fromsurface-treated N-doped diamond films, 774
Field emission from carbon films deposited on stainless steelsubstrate, 784
High pressure diamond and diamond-like carbon deposition usinga microwave CAP reactor, 1036
Soft X-ray photoelectron microscopy used for the characterizationof diamond, a-C and CN , thin films, 1068x
Precursor design in c-BN growth, 1300
Diamond and steelDiamond tools for wire sawing metal components, 742
Diamond coated toolsQuantitative comparison of adhesive toughness for various diamond
films on co-cemented tungsten carbide, 716Effect of substrate grain size and surface treatments on the
cutting properties of diamond coated Co-cemented tungstencarbide tools, 726
Diamond defectsSurface conductivity of nitrogen-doped diamond, 359Implantation-doping of diamond with B�, C�, N� and O� ions
using low temperature annealing, 612Characterisation of electron irradiated boron-doped diamond, 681
Diamond electrodesElectrochemical advanced oxidation process for water treatment
using DiaChem� electrodes, 640
Diamond filmThe radiation hardness properties of �-ray for SOD circuits
fabricated on 4-inch SOD wafer, 405Diagnostics of plasma ball formed in high pressure microwave
plasma for diamond film synthesis, 562
Diamond filmsSynchrotron radiation study of surface versus sub-surface
deuterium in diamond films produced by exposure to deuteriumactivated by hot filament-high vacuum and ex situ microwaveplasma, 371
The origin of charge transients in Al�undoped diamond�p-Sidiodes, 400
Influence of material properties on the performance of diamondphotocathodes, 437
Electrical properties of graphite�homoepitaxial diamond contact,451
Ž . Ž .Diamond deposition on Si 111 and carbon face 6H�SiC 0001substrates by positively biased pretreatment, 509
Growth of diamond films with bias during microwave plasmachemical vapor deposition, 523
Very adherent CVD diamond film on modified molybdenum sur-face, 532
Chemical vapor deposition diamond thin films growth on Ti6AL4Vusing the Surfatron system, 550
Polycrystalline diamond synthesis by means of high power pulsedplasma glow discharge CVD, 573
Analysis of the growth process of diamond films by chemical vapordeposition, 584
The cavity ring-down spectroscopy of C in a microwave plasma,2608
Abrasive stripping voltammetry of silver and tin at boron-dopeddiamond electrodes, 646
Electrochemical activity of boron-doped diamond electrodes grownon carbon fiber cloths, 657
Optical brazing technique for bonding diamond films to zincsulfide, 753
Ion beam etching of CVD diamond film in Ar, Ar�O and Ar�CF2 4gas mixtures, 833
Enhancement of the etch rate of CVD diamond by prior C and Geimplantation, 837
Influence of the environment on the surface conductivity ofchemical vapor deposition diamond, 856
Pulsed laser ablation of graphite in O atmosphere for preparation2of diamond films and carbon nanotubes, 953
Diamond growth² :Large area deposition of 100 -textured diamond films by a
60-kW microwave plasma CVD reactor, 596Diamond microwave micro relay, 672
Diamond growth and characterisationInvestigation on boron-doped CVD samples, 338Bias assisted growth on diamond single crystals: the defect
formation due to ion bombardment studied by ion channelling,electron backscatter diffraction, and micro-Raman spectro-scopy, 487
Analysis of the total carbon deposition during the bias enhancedŽ . 13nucleation of diamond on Ir�SrTiO 001 using C-methane,3
493Microwave plasma CVD diamond layers on three-dimensional
structured Si for protective coating, 519Dependence of the growth rate, quality, and morphology of
diamond coatings on the pressure during the CVD-process in anindustrial hot-filament plant, 589
Diamond growth and characterizationThe large area deposition of diamond by the multi-cathode direct
Ž .current plasma assisted chemical vapor deposition DC PACVDmethod, 463
Ž .The formation of a 111 texture of the diamond film onPt�TiO �SiO �Si substrate by microwave plasma chemical2 xvapor deposition, 499
Growth of high-quality homoepitaxial diamond films by HF-CVD,504
CVD diamond deposition on steel using arc-plated chromiumnitride interlayers, 536
Studies of pulse operation regime of microwave plasma CVDreactor, 579
Subject Index of Volume 11 1315
Diamond latticeStructure of diamond single crystals of different origins studies
by Kossel’s method, 882
Diamond MEMSDiamond microwave micro relay, 672
Diamond on steelHigh temperature diffusion chromizing as a successful method for
CVD-diamond coating of steel, 757
Diamond properties and applicationsSchottky junction properties of the high conductivity layer of
diamond, 355RF performance of surface channel diamond FETs with sub-micron
gate length, 382Fabrication of diamond single-hole transistors using AFM
anodization process, 387UV photodetector from Schottky diode diamond film, 442Optimised contact-structures for metal�diamond�metal
UV-detectors, 458Relaxation in undoped polycrystalline CVD diamond films under
red illumination, 635Effect of substrate grain size and surface treatments on the
cutting properties of diamond coated Co-cemented tungstencarbide tools, 726
Diamond tools for wire sawing metal components, 742Electron field emission properties of microcrystalline and
nanocrystalline carbon thin films deposited by S-assisted hotfilament CVD, 799
Wettability and surface energy of oxidized and hydrogenplasma-treated diamond films, 845
Stimulated desorption of D� from diamond: surfaceversus sub-surface processes via resonance dissociative electronattachment, 867
Engineering properties of fully sp3- to sp2-bonded carbonfilms and their modifications after post-growth ionirradiation, 1095
Diamond thin filmsDirect fusion bonding of silicon to polycrystalline diamond, 482
Diamond toolsDiamond tools in stone and civil engineering industry: cutting
principles, wear and applications, 736
Diamond wearDiamond tools in stone and civil engineering industry: cutting
principles, wear and applications, 736
Diamond-coated tools and filmsThermal conductivity enhancement in cutting tools by chemical
vapor deposition diamond coating, 703
Diamond-like carbonCan we reliably estimate the emission field and field enhancement
factor of carbon nanotube film field emitters?, 763Field emission and Raman spectroscopy studies of atomic hydrogen
etching on boron and nitrogen doped DLC films, 804Effect of nanostructure and back contact material on the field
emission properties of carbon films, 819Characteristics of hydrogenated amorphous carbon films deposited
by large-area microwave-sustained surface wave plasma, 976Structural characterization of hard a-C:H films as a function of
the methane pressure, 980Plasma chemistry during deposition of a-C:H, 989Is stress necessary to stabilise sp3 bonding in diamond-like
carbon?, 994Influence of the energy of sputtered carbon atoms on the
constitution of diamond-like carbon thin films, 1010
High pressure diamond and diamond-like carbon deposition usinga microwave CAP reactor, 1036
Deposition and properties of amorphous carbon phosphide films,1041
Pulsed PECVD deposition of diamond-like carbon films, 1047Determination of bonding in diamond-like carbon by Raman
spectroscopy, 1053Elastic constants and structural properties of nanometre-thick
diamond-like carbon films, 1062Highest optical gap tetrahedral amorphous carbon, 1086Inert gas diffusion in DLC�Si films, 1091DLC composite thin films by sputter deposition, 1119Tribological properties of diamond-like carbon films prepared by
mass-separated ion beam deposition, 1130Friction coefficient measurements By LFM on DLC films as
function of sputtering deposition parameters, 1135Deposition of amorphous CN by d.c. and rf plasma sputteringx
using a rf radical nitrogen beam source, 1178
Ž .Diamond-like carbon DLCTribological properties of Al� Si� Cu � M g alloy-based
composite-dispersing diamond nanocluster, 749
Dielectric constantCharacterization of boron carbon nitride films with a low
dielectric constant, 985
DiffusionRecombination-enhanced diffusion of self-interstitial atoms and
vacancy�interstitial recombination in diamond, 618Inert gas diffusion in DLC�Si films, 1091
Diffusion barrierHigh temperature diffusion chromizing as a successful method for
CVD-diamond coating of steel, 757
DiodeFormation of diamond p�n junction and its optical emission
characteristics, 307The origin of charge transients in Al�undoped diamond�p-Si
diodes, 400
Ž .Direct current DC plasmaThe large area deposition of diamond by the multi-cathode direct
Ž .current plasma assisted chemical vapor deposition DC PACVDmethod, 463
DislocationsThe dislocations of low-angle grain boundaries in GaN epilayers: a
HRTEM quantitative study and finite element stress statecalculation, 910
DLTSIon implantation of sulphur, boron and nitrogen in diamond: a
charge-based deep level transient spectroscopic investigation,342
DopingIon implantation of sulphur, boron and nitrogen in diamond: a
charge-based deep level transient spectroscopic investigation,342
Doping p-typeElectrochemical activity of boron-doped diamond electrodes grown
on carbon fiber cloths, 657
Dose dependencePhotoluminescence studies of type IIa and nitrogen doped CVD
diamond, 692
Electrical conductivityApplication of two- and four-point contact probes to various
monocrystalline diamond surfaces, 332
Subject Index of Volume 111316
Electrical propertiesInfluence of annealing on reverse current of 4H�SiC Schottky
diodes, 1263
Electrochemical impedanceThe effects of Si incorporation on the electrochemical and
nanomechanical properties of DLC thin films, 1074Evaluation of corrosion performance of ultra-thin Si-DLC
overcoats with electrochemical impedance spectroscopy, 1124
ElectrochemistryElectrochemical advanced oxidation process for water treatment
using DiaChem� electrodes, 640Abrasive stripping voltammetry of silver and tin at boron-doped
diamond electrodes, 646
Electrode arrangementElectrochemical activity of boron-doped diamond electrodes grown
on carbon fiber cloths, 657
Ž .Electron cyclotron resonance ECRGrowth mechanism and properties of the large area well-aligned
carbon nano-structures deposited by microwave plasma electroncyclotron resonance chemical vapor deposition, 922
Ž .Electron cyclotron resonance chemical vapor deposition ECR-CVDMorphology and characterization of highly nitrogenated, aligned,
amorphous carbon nano-rods formed on an alumina template byECR-CVD, 1193
Electron cyclotron resonance chemical vapour depositionOn the bonding structure of hydrogenated carbon nitrides grown
by electron cyclotron resonance chemical vapour deposition:towards the synthesis of non-graphitic carbon nitrides, 1161
Electron diffractionCharacterisation of cold electron emitting carbonaceous films
containing Ni metallic nanocrystals, 809
Electron field emissionElectron field emission properties of microcrystalline and
nanocrystalline carbon thin films deposited by S-assisted hotfilament CVD, 799
Electron irradiationPhotoluminescence studies of type IIa and nitrogen doped CVD
diamond, 692
Electron microscopyThe dislocations of low-angle grain boundaries in GaN epilayers: a
HRTEM quantitative study and finite element stress statecalculation, 910
Soft X-ray photoelectron microscopy used for the characterizationof diamond, a-C and CN , thin films, 1068x
Electron spectroscopySynchrotron radiation study of surface versus sub-surface
deuterium in diamond films produced by exposure to deuteriumactivated by hot filament-high vacuum and ex situ microwaveplasma, 371
Soft X-ray photoelectron microscopy used for the characterizationof diamond, a-C and CN , thin films, 1068x
Electron spin resonanceHighest optical gap tetrahedral amorphous carbon, 1086
Electron stimulated desorptionStimulated desorption of D� from diamond: surface
versus sub-surface processes via resonance dissociative electronattachment, 867
Electron-spin-resonanceParamagnetic centres and microstructure of reactively sputtered
amorphous carbon nitride thin films, 1143
Electronic statesSurface conductivity of nitrogen-doped diamond, 359
Electronic structureInvestigation on boron-doped CVD samples, 338
EllipsometryAnalysis of the role of fluorine content on the thermal stability
of a-C:H:F thin films, 1100Spectroscopic ellipsometry studies on BN films from IR to vacuum
UV energy region, 1281
Energy distributionRole of adsorbates in field emission from nanotubes, 769
Epitaxial filmsOptical investigation of Al Ga �xN epitaxial films grown onx 1
AlN buffer layers, 892
EPREPR studies of a nickel�boron centre in synthetic diamond, 627
EtchingPreparation and properties of sub-micron thick and free-standing
diamond membranes, 721Enhancement of the etch rate of CVD diamond by prior C and Ge
implantation, 837Ž .The oxidation of 100 textured diamond, 861
EvaporationOptical brazing technique for bonding diamond films to zinc
sulfide, 753
FETRF performance of surface channel diamond FETs with sub-micron
gate length, 382
FibresIn situ kinetic analysis of SiC filaments CVD, 1234
Fibres, Transmission electron microscopy, sp3-BondingTransmission electron microscopy studies of nanofibers formed on
Fe C -carbide, 9317 3
Field emissionCan we reliably estimate the emission field and field enhancement
factor of carbon nanotube film field emitters?, 763Role of adsorbates in field emission from nanotubes, 769Enhanced low-temperature thermionic field emission from
surface-treated N-doped diamond films, 774Electron emission from hydrogenated and oxidized heteroepitaxial
diamond doped with boron, 780Field emission from carbon films deposited on stainless steel
substrate, 784Study of carbon nanoemitters using CO �CH gas mixtures in2 4
triode-type field emission arrays, 788Field emission, structure, cathodoluminescence and formation
studies of carbon and Si�C�N nanotubes, 793Field emission and Raman spectroscopy studies of atomic hydrogen
etching on boron and nitrogen doped DLC films, 804Defect induced lowering of work function in graphite-like
materials, 813Effect of nanostructure and back contact material on the field
emission properties of carbon films, 819Smooth and high-rate reactive ion etching of diamond, 824Characteristics of hydrogenated amorphous carbon films deposited
by large-area microwave-sustained surface wave plasma, 976
Subject Index of Volume 11 1317
Characteristics of nickel-containing carbon films deposited usingelectron cyclotron resonance CVD, 1031
FilmsLow energy post-growth irradiation of amorphous hydrogenated
Ž .carbon a-C:H films, 1026
Filtered arc depositionSubstrate bias effect on amorphous nitrogenated carbon films
deposited by filtered arc deposition, 1227
FluorineAnalysis of the role of fluorine content on the thermal stability
of a-C:H:F thin films, 1100
Ž .Fourier transform infrared FT-IR spectroscopic ellipsometryVariation of nitrogen incorporation and bonding configuration of
carbon nitride films studied by X-ray photoelectron spectroscopyŽ . Ž .XPS and Fourier transform infrared FT-IR spectroscopicellipsometry, 1183
Free standingPreparation and properties of sub-micron thick and free-standing
diamond membranes, 721
FrictionTribological properties of Al� Si� Cu � M g alloy-based
composite-dispersing diamond nanocluster, 749Effects of gas pressure and r.f. power on the growth and
properties of magnetron sputter deposited amorphous carbonthin films, 1005
Friction coefficientFriction coefficient measurements By LFM on DLC films as
function of sputtering deposition parameters, 1135
FTIRInfluence of nucleation on hydrogen incorporation in CVD
diamond films, 527
FullereneMolecular dynamics calculation of H gas storage in C and2 60
B N clusters, 94536 36
FullerenesCharacterisation of cold electron emitting carbonaceous films
containing Ni metallic nanocrystals, 809
Fusion bondingDirect fusion bonding of silicon to polycrystalline diamond, 482
Gallium nitrideGaN-based heterostructures for sensor applications, 886
Ž .Gallium nitride GaNAtomic-scale models of interactions between inversion domain
boundaries and intrinsic basal stacking faults in GaN, 905
GaNŽ .Initial stages of GaN buffer layer growth on 0001 sapphire by
metalorganic chemical vapour deposition, 901
Grain sizeSurface acoustic waves on nanocrystalline diamond, 677
GraphitePulsed laser ablation of graphite in O atmosphere for preparation2
of diamond films and carbon nanotubes, 953
Growth� 4Epitaxial growth of phosphorus doped diamond on 111 substrate,
328Nanometer rough, sub-micrometer-thick and continuous diamond
chemical vapor deposition film promoted by a synergeticultrasonic effect, 545
Growth mechanism of amorphous hydrogenated carbon, 969IR study of the formation process of polymeric hydrogenated
amorphous carbon film, 1110
Growth rateDependence of the growth rate, quality, and morphology of
diamond coatings on the pressure during the CVD-process in anindustrial hot-filament plant, 589
H�C�N chemistryInvestigations of the gas phase chemistry in a hot filament CVD
reactor operating with CH �N �H and CH �NH �H gas4 2 2 4 3 2
mixtures, 567
H gas storage2
Molecular dynamics calculation of H gas storage in C and2 60B N clusters, 94536 36
Hall effectLow temperature properties of the p-type surface conductivity of
diamond, 351
Hall mobilityClassical approximations for ionised impurity scattering applied
to diamond monocrystals, 686
HardmetalDiamond deposition on hardmetal substrates after pre-treatment
with boron or sulfur compounds, 555
HardnessStructural characterization of hard a-C:H films as a function of
the methane pressure, 980The effects of Si incorporation on the electrochemical and
nanomechanical properties of DLC thin films, 1074Optical strength in UV region of amorphous carbon, 1106Characterisation of silicon carbide and silicon nitride thin films
and Si N �SiC multilayers, 12483 4
Synthesis of B�C�N thin films by electron beam excited plasmaCVD, 1290
HardnesssSubstrate bias effect on amorphous nitrogenated carbon films
deposited by filtered arc deposition, 1227
Heated filamentThe origin of charge transients in Al�undoped diamond�p-Si
diodes, 400
Heteroepitaxial diamondŽ .The formation of a 111 texture of the diamond film on
Pt�TiO �SiO �Si substrate by microwave plasma chemical2 x
vapor deposition, 499
HeteroepitaxyFabrication of heteroepitaxial diamond thin films on
Ž . Ž .Ir 001 �MgO 001 substrates using antenna-edge-type micro-wave plasma-assisted chemical vapor deposition, 478
Analysis of the total carbon deposition during the bias enhancedŽ . 13nucleation of diamond on Ir�SrTiO 001 using C-methane,3
493Electron emission from hydrogenated and oxidized heteroepitaxial
diamond doped with boron, 780
HF-CVDGrowth of high-quality homoepitaxial diamond films by HF-CVD,
504
High pressure crystal growthPolycrystalline diamond synthesis by means of high power pulsed
plasma glow discharge CVD, 573
Subject Index of Volume 111318
High pressure high temperatureModelling transition metals in diamond, 631
High pressure plasmaDiagnostics of plasma ball formed in high pressure microwave
plasma for diamond film synthesis, 562
High resolution electron spectroscopySurface vibrations on clean, deuterated, and hydrogenated single
Ž .crystal diamond 100 surfaces studied by high-resolution electronenergy loss spectroscopy, 365
Highly nitrogenated amorphous carbon nitrideMorphology and characterization of highly nitrogenated, aligned,
amorphous carbon nano-rods formed on an alumina template byECR-CVD, 1193
Homoepitaxyn-Type doping of diamond by sulfur and phosphorus, 289Photoconductivity of highly oriented and randomly oriented
diamond films for the detection of fast UV laser pulses, 423Growth of high-quality homoepitaxial diamond films by HF-CVD,
504Analysis of the growth process of diamond films by chemical vapor
deposition, 584Classical approximations for ionised impurity scattering applied
to diamond monocrystals, 686
Hot filament chemical vapour depositionApplication of diamond coatings onto small dental tools, 731
Hot-filament CVDInvestigations of the gas phase chemistry in a hot filament CVD
reactor operating with CH �N �H and CH �NH �H gas4 2 2 4 3 2mixtures, 567
Electron field emission properties of microcrystalline andnanocrystalline carbon thin films deposited by S-assisted hotfilament CVD, 799
HPHT annealingReport on the influence of HPHT annealing on the 3107
cm�1 hydrogen related absorption peak in natural type Iadiamonds, 714
HREMArc-melting synthesis of BN nanocapsules from B�Al, TiB and2
VB , 9492
HTP diamondEPR studies of a nickel�boron centre in synthetic diamond, 627
HydrogenSurface vibrations on clean, deuterated, and hydrogenated single
Ž .crystal diamond 100 surfaces studied by high-resolution electronenergy loss spectroscopy, 365
Influence of nucleation on hydrogen incorporation in CVDdiamond films, 527
Dependence of the growth rate, quality, and morphology ofdiamond coatings on the pressure during the CVD-process in anindustrial hot-filament plant, 589
Detection of CH bonds from micro Raman spectroscopy onxpolycrystalline boron doped diamond electrodes, 662
Report on the influence of HPHT annealing on the 3107cm�1 hydrogen related absorption peak in natural type Iadiamonds, 714
Influence of the environment on the surface conductivity ofchemical vapor deposition diamond, 856
Ž .Hydrogen deuteriumSynchrotron radiation study of surface versus sub-surface
deuterium in diamond films produced by exposure to deuterium
activated by hot filament-high vacuum and ex situ microwaveplasma, 371
Hydrogen diffusionDiffusion of hydrogen from a microwave plasma into diamond and
its interaction with dopants and defects, 316
Hydrogen etchingField emission and Raman spectroscopy studies of atomic hydrogen
etching on boron and nitrogen doped DLC films, 804
Hydrogen terminated diamondLow temperature properties of the p-type surface conductivity of
diamond, 351
Hydrogen-related shallow acceptorSchottky junction properties of the high conductivity layer of
diamond, 355
Hydrogenated amorphous carbonPlasma chemistry during deposition of a-C:H, 989
Hydrogenated carbon nitrideOn the bonding structure of hydrogenated carbon nitrides grown
by electron cyclotron resonance chemical vapour deposition:towards the synthesis of non-graphitic carbon nitrides, 1161
HydrogenationBlack diamond: a new material for active electronic devices, 396Wettability and surface energy of oxidized and hydrogen
plasma-treated diamond films, 845
Impuritiesn-Type doping of diamond by sulfur and phosphorus, 289Theoretical modeling of sulfur�hydrogen complexes in diamond,
323Surface conductivity of nitrogen-doped diamond, 359
In situIn situ kinetic analysis of SiC filaments CVD, 1234
In situ characterisationIn situ characterisation of CVD diamond growth under H S2
addition by optical emission spectroscopy, mass spectroscopyand laser reflection interferometry, 296
In situ diagnosticsIn situ plasma diagnostics of the chemistry behind sulfur doping
of CVD diamond films, 301
InfraredInvestigation on boron-doped CVD samples, 338Optical brazing technique for bonding diamond films to zinc
sulfide, 753
Ž .Infrared IR spectroscopyAnalysis of the role of fluorine content on the thermal stability
of a-C:H:F thin films, 1100
Ž .Infrared IR transmissionThe large area deposition of diamond by the multi-cathode direct
Ž .current plasma assisted chemical vapor deposition DC PACVDmethod, 463
InsulatorHigh resistivity and low dielectric constant amorphous carbon
nitride films: application to low-k materials for ULSI, 1219
Integrated circuitThe radiation hardness properties of �-ray for SOD circuits
fabricated on 4-inch SOD wafer, 405
InterfaceElectrical properties of graphite�homoepitaxial diamond contact,
451
Subject Index of Volume 11 1319
Photoelectron spectroscopy of boron-doped homoepitaxial diamondŽ .100 surfaces with several terminations and related Schottkybarriers, 851
GaN-based heterostructures for sensor applications, 886Stoichiometry and interface effects on the electronic and optical
properties of SiC nanoparticles, 1243
InterlayerCVD diamond deposition on steel using arc-plated chromium
nitride interlayers, 536
Internal stressŽ .Properties of carbon nitride CN films deposited by ax
high-density plasma ion plating method, 1172
Ion assisted depositionŽ .Micro-structural analysis of carbon nitride CN film preparedx
by ion beam assisted magnetron sputtering, 1205
Ion beam assisted depositionXPS characterization of the composition and bonding states of
elements in CN layers prepared by ion beam assisted deposition,x
1149
Ion beam etchingIon beam etching of CVD diamond film in Ar, Ar�O and Ar�CF2 4
gas mixtures, 833
Ion bombardmentAtomistic simulation of the bombardment process during the BEN
Ž .phase of chemical vapor deposition CVD of diamond, 513
Ion channellingBias assisted growth on diamond single crystals: the defect
formation due to ion bombardment studied by ion channelling,electron backscatter diffraction, and micro-Raman spectro-scopy, 487
Ion implantationIon implantation of sulphur, boron and nitrogen in diamond: a
charge-based deep level transient spectroscopic investigation,342
Implantation-doping of diamond with B�, C�, N� and O� ionsusing low temperature annealing, 612
Enhancement of the etch rate of CVD diamond by prior C and Geimplantation, 837
Investigation of ion implantation-induced damage in the carbonand silicon sublattices of 6H-SiC, 1239
Ion irradiationEngineering properties of fully sp3- to sp2-bonded carbon
films and their modifications after post-growth ionirradiation, 1095
Ion-assisted depositionDeposition of an InN thin film by a r.f. plasma-assisted reactive
Ž .ion-beam sputtering deposition R-IBSD technique, 896
Ion-beam depositionCarbon films obtained from a C fullerene ion beam, 96460
Ion-implantationNitrogen and phosphorus implanted MESFETs in semi-insulating
4H-SiC, 392
IRDetonation synthesis ultradispersed diamond structural properties
investigation by infrared absorption, 872IR study of the formation process of polymeric hydrogenated
amorphous carbon film, 1110
IridiumFabrication of heteroepitaxial diamond thin films on
Ž . Ž .Ir 001 �MgO 001 substrates using antenna-edge-type micro-wave plasma-assisted chemical vapor deposition, 478
Analysis of the total carbon deposition during the bias enhancedŽ . 13nucleation of diamond on Ir�SrTiO 001 using C-methane,3
493
Kossel’s linesStructure of diamond single crystals of different origins studies
by Kossel’s method, 882
LaserNew technology for high rate synthesis of PC-diamond coatings in
air with photon plasmatron, 472Pulsed laser deposition of CN films: role of r.f. nitrogenx
plasma activation for the film structure formation, 1223
Laser evaporationA novel CW laser�powder method of carbon single-wall nanotubes
production, 927
Laser processingOptical strength in UV region of amorphous carbon, 1106
Laser reflection interferometryIn situ characterisation of CVD diamond growth under H S2
addition by optical emission spectroscopy, mass spectroscopyand laser reflection interferometry, 296
Low temperature magneto-transportLow temperature properties of the p-type surface conductivity of
diamond, 351
Low-kHigh resistivity and low dielectric constant amorphous carbon
nitride films: application to low-k materials for ULSI, 1219
LuminescenceFormation of diamond p�n junction and its optical emission
characteristics, 307Growth of high-quality homoepitaxial diamond films by HF-CVD,
504
Magnetron sputteringVariation of nitrogen incorporation and bonding configuration of
carbon nitride films studied by X-ray photoelectron spectroscopyŽ . Ž .XPS and Fourier transform infrared FT-IR spectro-scopic ellipsometry, 1183
Effect of plasma parameters on the structure of CN layersxdeposited by DC magnetron sputtering, 1200
Mass spectrometryIn situ characterisation of CVD diamond growth under H S2
addition by optical emission spectroscopy, mass spectroscopyand laser reflection interferometry, 296
In situ plasma diagnostics of the chemistry behind sulfur dopingof CVD diamond films, 301
Mass-separated ion beam depositionTribological properties of diamond-like carbon films prepared by
mass-separated ion beam deposition, 1130
Mechanical propertiesSurface acoustic waves on nanocrystalline diamond, 677Structural characterization of hard a-C:H films as a function of
the methane pressure, 980Properties of W�a-C nanometric multilayers produced by
RF-pulsed magnetron sputtering, 1000Mechanical properties and performance of magnetron-sputtered
graded diamond-like carbon films with and without metaladditions, 1139
Subject Index of Volume 111320
Mechanical stressStresses in pulsed laser deposited cubic boron nitride films, 1276
MESFETNitrogen and phosphorus implanted MESFETs in semi-insulating
4H-SiC, 392Optimization of 2H, 4H and 6H�SiC high speed vertical MESFETs,
1254
MetalTribological properties of Al� Si� Cu � M g alloy-based
composite-dispersing diamond nanocluster, 749
Micro Raman SpectroscopyPolycrystalline diamond synthesis by means of high power pulsed
plasma glow discharge CVD, 573Detection of CH bonds from micro Raman spectroscopy onx
polycrystalline boron doped diamond electrodes, 662
Micro relayDiamond microwave micro relay, 672
Micro switchDiamond microwave micro relay, 672
Micro-beamImaging of the sensitivity in detector grade polycrystalline
diamonds using micro-focused X-ray beams, 418
MicrodischargeLarge scale synthesis of carbon nanotubes by plasma rotating arc
discharge technique, 914
MicrostructureNanometer rough, sub-micrometer-thick and continuous diamond
chemical vapor deposition film promoted by a synergeticultrasonic effect, 545
Thermal diffusivity in diamond, SiC N and BC N , 708x y x ySoft X-ray photoelectron microscopy used for the characterization
of diamond, a-C and CN , thin films, 1068xŽ .Micro-structural analysis of carbon nitride CN film preparedx
by ion beam assisted magnetron sputtering, 1205
MicrowaveHigh pressure diamond and diamond-like carbon deposition using
a microwave CAP reactor, 1036
Microwave plasmaThe CAP-reactor, a novel microwave CVD system for diamond
deposition, 467Diagnostics of plasma ball formed in high pressure microwave
plasma for diamond film synthesis, 562
Microwave plasma chemical vapor depositionSynthesis and tribological characteristics of nanocrystalline
diamond film using CH �H microwave plasmas, 8774 2
Microwave plasma enhanced chemical vapor depositionThe effect of catalysis on the formation of one-dimensional carbon
structured materials, 1019
MigrationThe kinetics of the capture of nitrogen by nickel defects in
diamond, 312
MISFETDC and RF characteristics of 0.7-�m-gate-length diamond
metal�insulator�semiconductor field effect transistor, 378
MobilityClassical approximations for ionised impurity scattering applied
to diamond monocrystals, 686
ModelingAtomic-scale models of interactions between inversion domain
boundaries and intrinsic basal stacking faults in GaN, 905Calculation of the charge spreading along a carbon nanotube seen
Ž .in scanning tunnelling microscopy STM , 961Influence of the energy of sputtered carbon atoms on the
constitution of diamond-like carbon thin films, 1010From �-MOSFET with silicon on oxide to �-MOSFET with
silicon carbide on nitride, 1268Spectroscopic ellipsometry studies on BN films from IR to vacuum
UV energy region, 1281
ModellingInvestigations of the gas phase chemistry in a hot filament CVD
reactor operating with CH �N �H and CH �NH �H gas4 2 2 4 3 2mixtures, 567
Modelling strainModelling transition metals in diamond, 631
Molecular dynamicsMolecular dynamics calculation of H gas storage in C and2 60
B N clusters, 94536 36
Morphology² :Large area deposition of 100 -textured diamond films by a
60-kW microwave plasma CVD reactor, 596
MPECVDŽ .The formation of a 111 texture of the diamond film on
Pt�TiO �SiO �Si substrate by microwave plasma chemical2 xvapor deposition, 499
N doped CVD diamondPhotoluminescence studies of type IIa and nitrogen doped CVD
diamond, 692
n-Type doping� 4Epitaxial growth of phosphorus doped diamond on 111 substrate,
328
n-Type dopingn-Type doping of diamond by sulfur and phosphorus, 289Formation of diamond p�n junction and its optical emission
characteristics, 307Theoretical modeling of sulfur�hydrogen complexes in diamond,
323Implantation-doping of diamond with B�, C�, N� and O� ions
using low temperature annealing, 612
Nano-indentationEngineering properties of fully sp3- to sp2-bonded carbon
films and their modifications after post-growth ionirradiation, 1095
NanocapsulesArc-melting synthesis of BN nanocapsules from B�Al, TiB and2
VB , 9492
Nanocrystalline carbonElectron field emission properties of microcrystalline and
nanocrystalline carbon thin films deposited by S-assisted hotfilament CVD, 799
Nanocrystalline diamondSynthesis and tribological characteristics of nanocrystalline
diamond film using CH �H microwave plasmas, 8774 2
Nanocrystalline SiCStoichiometry and interface effects on the electronic and optical
properties of SiC nanoparticles, 1243
Subject Index of Volume 11 1321
NanodiamondDetonation synthesis ultradispersed diamond structural properties
investigation by infrared absorption, 872
NanotubeLarge scale synthesis of carbon nanotubes by plasma rotating arc
discharge technique, 914
NanotubesCan we reliably estimate the emission field and field enhancement
factor of carbon nanotube film field emitters?, 763Role of adsorbates in field emission from nanotubes, 769Spectroscopic analysis of single-wall carbon nanotubes and carbon
nanotube peapods, 957
Neutron reflectivityHydrogen concentrations and mass density obtained by X-ray and
neutron reflectivity on hydrogenated amorphous carbon nitridethin films, 1188
Ni nano-crystalsCharacterisation of cold electron emitting carbonaceous films
containing Ni metallic nanocrystals, 809
Ni�Cu alloysThe effect of catalysis on the formation of one-dimensional carbon
structured materials, 1019
NickelThe kinetics of the capture of nitrogen by nickel defects in
diamond, 312Annealing study of the formation of nickel-related paramagnetic
defects in diamond, 623Characteristics of nickel-containing carbon films deposited using
electron cyclotron resonance CVD, 1031
Nickel-boron complexEPR studies of a nickel�boron centre in synthetic diamond, 627
NitrideArc-melting synthesis of BN nanocapsules from B�Al, TiB and2
VB , 9492
NitridesReactive DC magnetron sputtering of aluminum nitride films for
surface acoustic wave devices, 413Recent progresses of the BOLD investigation towards UV detectors
for the ESA Solar Orbiter, 427Thermal conductivity enhancement in cutting tools by chemical
vapor deposition diamond coating, 703Optical investigation of Al Ga �xN epitaxial films grown onx 1
AlN buffer layers, 892Deposition of an InN thin film by a r.f. plasma-assisted reactive
Ž .ion-beam sputtering deposition R-IBSD technique, 896The dislocations of low-angle grain boundaries in GaN epilayers: a
HRTEM quantitative study and finite element stress statecalculation, 910
Molecular dynamics calculation of H gas storage in C and2 60B N clusters, 94536 36
XPS characterization of the composition and bonding states ofelements in CN layers prepared by ion beam assisted deposition,x
1149Correlation between surface oxygen content and microstructure of
carbon nitride films, 1153The effect of process parameters on the chemical structure of
pulsed laser deposited carbon nitride films, 1157Effects of hydrogen incorporation on structural relaxation and
vibrational properties of a-CN:H thin films grown by reactivesputtering, 1166
Variation of nitrogen incorporation and bonding configuration ofcarbon nitride films studied by X-ray photoelectron spectroscopyŽ . Ž .XPS and Fourier transform infrared FT-IR spectro-scopic ellipsometry, 1183
Effect of plasma parameters on the structure of CN layersxdeposited by DC magnetron sputtering, 1200
Preparation and properties of amorphous carbon oxy-nitride filmsmade by the layer-by-layer method, 1210
Response time of photoconductivity of amorphous carbon nitridefilms prepared by a nitrogen radical sputter method, 1215
High resistivity and low dielectric constant amorphous carbonnitride films: application to low-k materials for ULSI, 1219
From �-MOSFET with silicon on oxide to �-MOSFET withsilicon carbide on nitride, 1268
Stresses in pulsed laser deposited cubic boron nitride films, 1276X-Ray absorption study of the bonding structure of BCN
compounds enriched in carbon by CH ion assistance, 12954
NitrogenParamagnetic centres and microstructure of reactively sputtered
amorphous carbon nitride thin films, 1143Ž .Micro-structural analysis of carbon nitride CN film preparedx
by ion beam assisted magnetron sputtering, 1205Substrate bias effect on amorphous nitrogenated carbon films
deposited by filtered arc deposition, 1227
Nitrogen aggregationThe kinetics of the capture of nitrogen by nickel defects in
diamond, 312
NucleationAtomistic simulation of the bombardment process during the BEN
Ž .phase of chemical vapor deposition CVD of diamond, 513Microwave plasma CVD diamond layers on three-dimensional
structured Si for protective coating, 519Influence of nucleation on hydrogen incorporation in CVD
diamond films, 527Nanometer rough, sub-micrometer-thick and continuous diamond
chemical vapor deposition film promoted by a synergeticultrasonic effect, 545
Chemical vapor deposition diamond thin films growth on Ti6AL4Vusing the Surfatron system, 550
Ohmic contactApplication of two- and four-point contact probes to various
monocrystalline diamond surfaces, 332Electrical properties of graphite�homoepitaxial diamond contact,
451
One-dimensional carbon structured materialsThe effect of catalysis on the formation of one-dimensional carbon
structured materials, 1019
Optical bandgapDeposition and properties of amorphous carbon phosphide films,
1041
Optical emission spectrometryIn situ plasma diagnostics of the chemistry behind sulfur doping
of CVD diamond films, 301
Optical emission spectroscopyIn situ characterisation of CVD diamond growth under H S2
addition by optical emission spectroscopy, mass spectroscopyand laser reflection interferometry, 296
Ž .Properties of carbon nitride CN films deposited by axhigh-density plasma ion plating method, 1172
Optical propertiesHighest optical gap tetrahedral amorphous carbon, 1086
Subject Index of Volume 111322
Optical studyOptical investigation of Al Ga �xN epitaxial films grown onx 1
AlN buffer layers, 892
Optoelectronic propertiesEffects of light on the ‘primed’ state of CVD diamond nuclear
detectors, 446
OxidationElectrochemical advanced oxidation process for water treatment
using DiaChem� electrodes, 640Preparation and properties of amorphous carbon oxy-nitride films
made by the layer-by-layer method, 1210
p-type conductivityBlack diamond: a new material for active electronic devices, 396
p-Type dopingInfluence of the environment on the surface conductivity of
chemical vapor deposition diamond, 856
Paramagnetic defectsAnnealing study of the formation of nickel-related paramagnetic
defects in diamond, 623
ParamagnetismParamagnetic centres and microstructure of reactively sputtered
amorphous carbon nitride thin films, 1143
PassivationDiffusion of hydrogen from a microwave plasma into diamond and
its interaction with dopants and defects, 316
PeapodsSpectroscopic analysis of single-wall carbon nanotubes and carbon
nanotube peapods, 957
pHOn the ion-sensitivity of H-terminated surface channel devices on
diamond, 651
Phase stabilisationPrecursor design in c-BN growth, 1300
PhononSurface vibrations on clean, deuterated, and hydrogenated single
Ž .crystal diamond 100 surfaces studied by high-resolution electronenergy loss spectroscopy, 365
Phosphorus dopingEtching of p- and n-type doped monocrystalline diamond using an
ECR oxygen plasma source, 828Deposition and properties of amorphous carbon phosphide films,
1041
PhotoconductivityImaging deep UV light with diamond-based systems, 433Response time of photoconductivity of amorphous carbon nitride
films prepared by a nitrogen radical sputter method, 1215
PhotodetectorUV photodetector from Schottky diode diamond film, 442
PhotodetectorsImaging deep UV light with diamond-based systems, 433
PhotoelectricalInfluence of material properties on the performance of diamond
photocathodes, 437
Photoelectron spectroscopyThermal diffusivity in diamond, SiC N and BC N , 708x y x y
Ž .The oxidation of 100 textured diamond, 861
PhotoluminescenceCharacterisation of electron irradiated boron-doped diamond, 681Photoluminescence studies of type IIa and nitrogen doped CVD
diamond, 692Multi-band structure of amorphous carbon luminescence, 1115
Photon stimulated ion desorptionSynchrotron radiation study of surface versus sub-surface
deuterium in diamond films produced by exposure to deuteriumactivated by hot filament-high vacuum and ex situ microwaveplasma, 371
Photonelectron spectroscopyAnalysis of the role of fluorine content on the thermal stability
of a-C:H:F thin films, 1100
PhotoresponseRelaxation in undoped polycrystalline CVD diamond films under
red illumination, 635
Physical vapor depositionPulsed laser ablation of graphite in O atmosphere for preparation2
of diamond films and carbon nanotubes, 953Mechanical properties and performance of magnetron-sputtered
graded diamond-like carbon films with and without metaladditions, 1139
Physical vapour depositionThermal diffusivity in diamond, SiC N and BC N , 708x y x y
PiezoresistanceReactive ion etching of CVD-diamond for piezoresistive pressure
sensors, 841
PinholesThe effects of Si incorporation on the electrochemical and
nanomechanical properties of DLC thin films, 1074Evaluation of corrosion performance of ultra-thin Si-DLC
overcoats with electrochemical impedance spectroscopy, 1124
Planar contact geometryOptimised contact-structures for metal�diamond�metal UV-
detectors, 458
Planar defectsAtomic-scale models of interactions between inversion domain
boundaries and intrinsic basal stacking faults in GaN, 905
PlasmaNew technology for high rate synthesis of PC-diamond coatings in
air with photon plasmatron, 472Chemical vapor deposition diamond thin films growth on Ti6AL4V
using the Surfatron system, 550The cavity ring-down spectroscopy of C in a microwave plasma,2
608Large scale synthesis of carbon nanotubes by plasma rotating arc
discharge technique, 914Low temperature plasma chemical vapour deposition of carbon
nanotubes, 918Growth mechanism of amorphous hydrogenated carbon, 969High pressure diamond and diamond-like carbon deposition using
a microwave CAP reactor, 1036Synthesis of B�C�N thin films by electron beam excited plasma
CVD, 1290
Plasma-assisted chemical vapor depositionCharacterization of boron carbon nitride films with a low
dielectric constant, 985
PolycrystallineSurface acoustic waves on nanocrystalline diamond, 677
Subject Index of Volume 11 1323
Polycrystalline diamond filmUV photodetector from Schottky diode diamond film, 442
Polycrystalline diamond filmsDetection of CH bonds from micro Raman spectroscopy onx
polycrystalline boron doped diamond electrodes, 662
Post-growthLow energy post-growth irradiation of amorphous hydrogenated
Ž .carbon a-C:H films, 1026
Potentiodynamic curvesEvaluation of corrosion performance of ultra-thin Si-DLC
overcoats with electrochemical impedance spectroscopy, 1124
Powder technologyA novel CW laser�powder method of carbon single-wall nanotubes
production, 927
Pre-treated substrateApplication of diamond coatings onto small dental tools, 731
Preferential orientationPreparation of AlN and LiNbO thin films on diamond substrates3
by sputtering method, 408
PressureDependence of the growth rate, quality, and morphology of
diamond coatings on the pressure during the CVD-process in anindustrial hot-filament plant, 589
Pressure sensorReactive ion etching of CVD-diamond for piezoresistive pressure
sensors, 841
Pretreated substratesNanometer rough, sub-micrometer-thick and continuous diamond
chemical vapor deposition film promoted by a synergeticultrasonic effect, 545
ProcessingSilicon carbide Schottky and ohmic contact process dependence,
1258
Pt�TiO �SiO �Si2 xŽ .The formation of a 111 texture of the diamond film on
Pt�TiO �SiO �Si substrate by microwave plasma chemical2 xvapor deposition, 499
Pulsed glow discharge CVDPolycrystalline diamond synthesis by means of high power pulsed
plasma glow discharge CVD, 573
Pulsed laser ablationEffect of nanostructure and back contact material on the field
emission properties of carbon films, 819
Pulsed laser depositionCorrelation between surface oxygen content and microstructure of
carbon nitride films, 1153The effect of process parameters on the chemical structure of
pulsed laser deposited carbon nitride films, 1157Stresses in pulsed laser deposited cubic boron nitride films, 1276
Pulsed MPACVD reactorStudies of pulse operation regime of microwave plasma CVD
reactor, 579
Pulsed PECVDPulsed PECVD deposition of diamond-like carbon films, 1047
Pulsed RF biasPulsed PECVD deposition of diamond-like carbon films, 1047
Radiation damageRecombination-enhanced diffusion of self-interstitial atoms and
vacancy�interstitial recombination in diamond, 618
Radiation hardnessThe radiation hardness properties of �-ray for SOD circuits
fabricated on 4-inch SOD wafer, 405
Radiation induced defectsEffects of light on the ‘primed’ state of CVD diamond nuclear
detectors, 446Implantation-doping of diamond with B�, C�, N� and O� ions
using low temperature annealing, 612
Ž .Radio frequency r.f.Pulsed laser deposition of CN films: role of r.f. nitrogenx
plasma activation for the film structure formation, 1223
RamanŽ .Properties of carbon nitride CN films deposited by ax
high-density plasma ion plating method, 1172Stoichiometry and interface effects on the electronic and optical
properties of SiC nanoparticles, 1243
Raman and IR spectroscopyEffects of hydrogen incorporation on structural relaxation and
vibrational properties of a-CN:H thin films grown by reactivesputtering, 1166
Raman scatteringEffect of nanostructure and back contact material on the field
emission properties of carbon films, 819
Raman spectraCarbon films obtained from a C fullerene ion beam, 96460
Raman spectroscopyInfluence of material properties on the performance of diamond
photocathodes, 437Bias assisted growth on diamond single crystals: the defect
formation due to ion bombardment studied by ion channelling,electron backscatter diffraction, and micro-Raman spectro-scopy, 487
Growth of diamond films with bias during microwave plasmachemical vapor deposition, 523
Microstructure and stress in nano-crystalline diamond filmsdeposited by DC glow discharge CVD, 601
Study of carbon nanoemitters using CO �CH gas mixtures in2 4triode-type field emission arrays, 788
Field emission and Raman spectroscopy studies of atomic hydrogenetching on boron and nitrogen doped DLC films, 804
Enhancement of the etch rate of CVD diamond by prior C and Geimplantation, 837
Spectroscopic analysis of single-wall carbon nanotubes and carbonnanotube peapods, 957
Effects of gas pressure and r.f. power on the growth andproperties of magnetron sputter deposited amorphous carbonthin films, 1005
Determination of bonding in diamond-like carbon by Ramanspectroscopy, 1053
Elastic constants and structural properties of nanometre-thickdiamond-like carbon films, 1062
The effects of Si incorporation on the electrochemical andnanomechanical properties of DLC thin films, 1074
Hydrogen concentrations and mass density obtained by X-ray andneutron reflectivity on hydrogenated amorphous carbon nitridethin films, 1188
Reactive ion etchingSmooth and high-rate reactive ion etching of diamond, 824
Subject Index of Volume 111324
Reactive ion etching of CVD-diamond for piezoresistive pressuresensors, 841
Reactive ion etching etchingEtching of p- and n-type doped monocrystalline diamond using an
ECR oxygen plasma source, 828
Reactor designThe CAP-reactor, a novel microwave CVD system for diamond
deposition, 467
RelaxationRelaxation in undoped polycrystalline CVD diamond films under
red illumination, 635
REMPI measurementsInvestigations of the gas phase chemistry in a hot filament CVD
reactor operating with CH �N �H and CH �NH �H gas4 2 2 4 3 2mixtures, 567
RF performanceRF performance of surface channel diamond FETs with sub-micron
gate length, 382
Rf radical beamDeposition of amorphous CN by d.c. and rf plasma sputteringx
using a rf radical nitrogen beam source, 1178
RIEReactive ion etching of CVD-diamond for piezoresistive pressure
sensors, 841
Scanning electron microscopyInfluence of material properties on the performance of diamond
photocathodes, 437Correlation between surface oxygen content and microstructure of
carbon nitride films, 1153
Ž .Scanning tunnelling microscopy STMCalculation of the charge spreading along a carbon nanotube seen
Ž .in scanning tunnelling microscopy STM , 961
Schottky diodeUV photodetector from Schottky diode diamond film, 442Photoelectron spectroscopy of boron-doped homoepitaxial diamondŽ .100 surfaces with several terminations and related Schottkybarriers, 851
Silicon carbide Schottky and ohmic contact process dependence,1258
Influence of annealing on reverse current of 4H�SiC Schottkydiodes, 1263
Schottky junctionsSchottky junction properties of the high conductivity layer of
diamond, 355
SEMStudy of carbon nanoemitters using CO �CH gas mixtures in2 4
triode-type field emission arrays, 788
Sensitivity mapImaging of the sensitivity in detector grade polycrystalline
diamonds using micro-focused X-ray beams, 418
SensorsMicrowave plasma CVD diamond layers on three-dimensional
structured Si for protective coating, 519On the ion-sensitivity of H-terminated surface channel devices on
diamond, 651
Si doped DLCEvaluation of corrosion performance of ultra-thin Si-DLC
overcoats with electrochemical impedance spectroscopy, 1124
Ž .Si-doped diamond-like carbon DLCThe effects of Si incorporation on the electrochemical and
nanomechanical properties of DLC thin films, 1074
SiCNitrogen and phosphorus implanted MESFETs in semi-insulating
4H-SiC, 392Optimization of 2H, 4H and 6H�SiC high speed vertical MESFETs,
1254Influence of annealing on reverse current of 4H�SiC Schottky
diodes, 1263
SiliconAtomic and electronic structures of Si-included C cluster74
studied by HREM and molecular orbital calculations, 935
Silicon carbideInert gas diffusion in DLC�Si films, 1091In situ kinetic analysis of SiC filaments CVD, 1234Investigation of ion implantation-induced damage in the carbon
and silicon sublattices of 6H-SiC, 1239Characterisation of silicon carbide and silicon nitride thin films
and Si N �SiC multilayers, 12483 4
Ž .Silicon carbide SiCSilicon carbide Schottky and ohmic contact process dependence,
1258
Silicon nitrideCharacterisation of silicon carbide and silicon nitride thin films
and Si N �SiC multilayers, 12483 4
Silicon-on-diamondThe radiation hardness properties of �-ray for SOD circuits
fabricated on 4-inch SOD wafer, 405Direct fusion bonding of silicon to polycrystalline diamond, 482
Single-hole transistorFabrication of diamond single-hole transistors using AFM
anodization process, 387
SOIFrom �-MOSFET with silicon on oxide to �-MOSFET with
silicon carbide on nitride, 1268
Solid lubricantFriction coefficient measurements By LFM on DLC films as
function of sputtering deposition parameters, 1135
sp2 BondingCalculation of the charge spreading along a carbon nanotube seen
Ž .in scanning tunnelling microscopy STM , 961
sp2�sp3 bondingDefect induced lowering of work function in graphite-like
materials, 813
sp3 BondTribological properties of diamond-like carbon films prepared by
mass-separated ion beam deposition, 1130
sp3 bondingIs stress necessary to stabilise sp3 bonding in diamond-like
carbon?, 994Influence of the energy of sputtered carbon atoms on the
constitution of diamond-like carbon thin films, 1010
sp3-BondingCubic boron nitride growth from NH and BBr precursors: a3 3
theoretical study, 1286
SpectroscopyThe cavity ring-down spectroscopy of C in a microwave plasma,2
608
Subject Index of Volume 11 1325
Low temperature plasma chemical vapour deposition of carbonnanotubes, 918
Pulsed laser ablation of graphite in O atmosphere for preparation2of diamond films and carbon nanotubes, 953
Plasma chemistry during deposition of a-C:H, 989IR study of the formation process of polymeric hydrogenated
amorphous carbon film, 1110Pulsed laser deposition of CN films: role of r.f. nitrogenx
plasma activation for the film structure formation, 1223
Sputter depositionDLC composite thin films by sputter deposition, 1119
SputteringReactive DC magnetron sputtering of aluminum nitride films for
surface acoustic wave devices, 413Properties of W�a-C nanometric multilayers produced by
RF-pulsed magnetron sputtering, 1000Effects of gas pressure and r.f. power on the growth and
properties of magnetron sputter deposited amorphous carbonthin films, 1005
Influence of the energy of sputtered carbon atoms on theconstitution of diamond-like carbon thin films, 1010
Effects of hydrogen incorporation on structural relaxation andvibrational properties of a-CN:H thin films grown by reactivesputtering, 1166
Synthesis and characterization of cubic boron nitride films �
investigations of growth and annealing processes, 1272
SQUIDArc-melting synthesis of BN nanocapsules from B�Al, TiB and2
VB , 9492
SteelCVD diamond deposition on steel using arc-plated chromium
nitride interlayers, 536
Stone cuttingDiamond tools in stone and civil engineering industry: cutting
principles, wear and applications, 736
Stone processingDiamond tools in stone and civil engineering industry: cutting
principles, wear and applications, 736
StrainŽ .Initial stages of GaN buffer layer growth on 0001 sapphire by
metalorganic chemical vapour deposition, 901
StressThe dislocations of low-angle grain boundaries in GaN epilayers: a
HRTEM quantitative study and finite element stress statecalculation, 910
Structural characterization of hard a-C:H films as a function ofthe methane pressure, 980
Is stress necessary to stabilise sp3 bonding in diamond-likecarbon?, 994
Influence of the energy of sputtered carbon atoms on theconstitution of diamond-like carbon thin films, 1010
Characterisation of silicon carbide and silicon nitride thin filmsand Si N �SiC multilayers, 12483 4
Synthesis and characterization of cubic boron nitride films �
investigations of growth and annealing processes, 1272
Stress relaxationMicrostructure and stress in nano-crystalline diamond films
deposited by DC glow discharge CVD, 601
StructureHigh-resolution electron microscopy and electronic structures of
endohedral La@B N clusters, 94036 36
Determination of bonding in diamond-like carbon by Ramanspectroscopy, 1053
Inert gas diffusion in DLC�Si films, 1091
Structure perfectionStructure of diamond single crystals of different origins studies
by Kossel’s method, 882
Sub-micronPreparation and properties of sub-micron thick and free-standing
diamond membranes, 721
Sulfochromic treatmentOptimised contact-structures for metal�diamond�metal
UV-detectors, 458
Sulfur dopingIn situ characterisation of CVD diamond growth under H S2
addition by optical emission spectroscopy, mass spectroscopyand laser reflection interferometry, 296
In situ plasma diagnostics of the chemistry behind sulfur dopingof CVD diamond films, 301
Sulfur effectsElectron field emission properties of microcrystalline and
nanocrystalline carbon thin films deposited by S-assisted hotfilament CVD, 799
Sulfur-dopingA new acceptor state in CVD-diamond, 347
SulphurIon implantation of sulphur, boron and nitrogen in diamond: a
charge-based deep level transient spectroscopic investigation,342
SurfaceTheoretical modeling of sulfur�hydrogen complexes in diamond,
323Surface conductivity of nitrogen-doped diamond, 359Surface vibrations on clean, deuterated, and hydrogenated single
Ž .crystal diamond 100 surfaces studied by high-resolution electronenergy loss spectroscopy, 365
Very adherent CVD diamond film on modified molybdenum sur-face, 532
Photoelectron spectroscopy of boron-doped homoepitaxial diamondŽ .100 surfaces with several terminations and related Schottkybarriers, 851
Influence of the environment on the surface conductivity ofchemical vapor deposition diamond, 856
Ž .The oxidation of 100 textured diamond, 861Stimulated desorption of D� from diamond: surface
versus sub-surface processes via resonance dissociative electronattachment, 867
Surface acoustic waveReactive DC magnetron sputtering of aluminum nitride films for
surface acoustic wave devices, 413
Surface acoustic wave devicePreparation of AlN and LiNbO thin films on diamond substrates3
by sputtering method, 408
Surface conductivityLow temperature properties of the p-type surface conductivity of
diamond, 351Schottky junction properties of the high conductivity layer of
diamond, 355
Surface energyWettability and surface energy of oxidized and hydrogen
plasma-treated diamond films, 845
Subject Index of Volume 111326
Surface potential barrierElectron emission from hydrogenated and oxidized heteroepitaxial
diamond doped with boron, 780
Surface roughnessPreparation of AlN and LiNbO thin films on diamond substrates3
by sputtering method, 408
Surface terminationOn the ion-sensitivity of H-terminated surface channel devices on
diamond, 651
Surface treatmentsDiamond deposition on hardmetal substrates after pre-treatment
with boron or sulfur compounds, 555
Surface-channelRF performance of surface channel diamond FETs with sub-micron
gate length, 382
SynchrotronImaging of the sensitivity in detector grade polycrystalline
diamonds using micro-focused X-ray beams, 418
Synthetic diamondModelling transition metals in diamond, 631
TEMField emission, structure, cathodoluminescence and formation
studies of carbon and Si�C�N nanotubes, 793
Ternary BCNX-Ray absorption study of the bonding structure of BCN
compounds enriched in carbon by CH ion assistance, 12954
Tetrahedral amorphous carbonIs stress necessary to stabilise sp3 bonding in diamond-like
carbon?, 994Influence of the energy of sputtered carbon atoms on the
constitution of diamond-like carbon thin films, 1010
Textured film² :Large area deposition of 100 -textured diamond films by a
60-kW microwave plasma CVD reactor, 596
TheoryPrecursor design in c-BN growth, 1300
Thermal conductivityThe large area deposition of diamond by the multi-cathode direct
Ž .current plasma assisted chemical vapor deposition DC PACVDmethod, 463
Thermal conductivity enhancement in cutting tools by chemicalvapor deposition diamond coating, 703
Thermal diffusivity in diamond, SiC N and BC N , 708x y x y
Thermal-oxidationŽ .The oxidation of 100 textured diamond, 861
Thin filmCarbon films obtained from a C fullerene ion beam, 96460DLC composite thin films by sputter deposition, 1119
Thin filmsCharacterisation of cold electron emitting carbonaceous films
containing Ni metallic nanocrystals, 809
Titanium carbideChemical vapor deposition diamond thin films growth on Ti6AL4V
using the Surfatron system, 550
Ž .Titanium carbide TiCMechanical properties and performance of magnetron-sputtered
graded diamond-like carbon films with and without metaladditions, 1139
Tool designDiamond tools for wire sawing metal components, 742
Transmission electron diffractionCharacterization of boron carbon nitride films with a low
dielectric constant, 985
Transmission electron microscopyGrain boundaries in boron-doped CVD diamond films, 697Synthesis and tribological characteristics of nanocrystalline
diamond film using CH �H microwave plasmas, 8774 2Ž .Initial stages of GaN buffer layer growth on 0001 sapphire by
metalorganic chemical vapour deposition, 901Atomic and electronic structures of Si-included C cluster74
studied by HREM and molecular orbital calculations, 935Characterization of boron carbon nitride films with a low
dielectric constant, 985
Ž .Transmission electron microscopy TEMHigh-resolution electron microscopy and electronic structures of
endohedral La@B N clusters, 94036 36Morphology and characterization of highly nitrogenated, aligned,
amorphous carbon nano-rods formed on an alumina template byECR-CVD, 1193
TribiologyFriction coefficient measurements By LFM on DLC films as
function of sputtering deposition parameters, 1135
Tribological propertyTribological properties of diamond-like carbon films prepared by
mass-separated ion beam deposition, 1130
Tungsten carbideQuantitative comparison of adhesive toughness for various diamond
films on co-cemented tungsten carbide, 716Effect of substrate grain size and surface treatments on the
cutting properties of diamond coated Co-cemented tungstencarbide tools, 726
Application of diamond coatings onto small dental tools, 731
UV imagingImaging deep UV light with diamond-based systems, 433
UV Raman spectroscopySynthesis and tribological characteristics of nanocrystalline
diamond film using CH �H microwave plasmas, 8774 2
UV rangePhotoconductivity of highly oriented and randomly oriented
diamond films for the detection of fast UV laser pulses, 423Recent progresses of the BOLD investigation towards UV detectors
for the ESA Solar Orbiter, 427Multi-band structure of amorphous carbon luminescence, 1115
UV range illuminationOptical strength in UV region of amorphous carbon, 1106
UV-photodetectorsOptimised contact-structures for metal�diamond�metal UV-
detectors, 458
VacanciesStoichiometry and interface effects on the electronic and optical
properties of SiC nanoparticles, 1243
Vacancy complexesCharacterisation of electron irradiated boron-doped diamond, 681
Vacancy-interstitial recombinationRecombination-enhanced diffusion of self-interstitial atoms and
vacancy�interstitial recombination in diamond, 618
Subject Index of Volume 11 1327
VUV ellipsometrySpectroscopic ellipsometry studies on BN films from IR to vacuum
UV energy region, 1281
Water treatmentElectrochemical advanced oxidation process for water treatment
using DiaChem� electrodes, 640
WearDiamond cantilever with integrated tip for nanomachining, 667
WettabilityWettability and surface energy of oxidized and hydrogen
plasma-treated diamond films, 845
Wire sawingDiamond tools for wire sawing metal components, 742
X-Ray absorption near edge spectroscopyX-Ray absorption study of the bonding structure of BCNcompounds enriched in carbon by CH ion assistance, 12954
X-Ray absorption spectroscopyOn the bonding structure of hydrogenated carbon nitrides grown
by electron cyclotron resonance chemical vapour deposition:towards the synthesis of non-graphitic carbon nitrides, 1161
X-Ray diffractionDeposition of an InN thin film by a r.f. plasma-assisted reactive
Ž .ion-beam sputtering deposition R-IBSD technique, 896Properties of W�a-C nanometric multilayers produced by
RF-pulsed magnetron sputtering, 1000
Ž .X-Ray diffraction XRDMicrostructure and stress in nano-crystalline diamond films
deposited by DC glow discharge CVD, 601
X-ray photoelectron spectroscopyCharacterization of boron carbon nitride films with a low
dielectric constant, 985XPS characterization of the composition and bonding states of
elements in CN layers prepared by ion beam assisted deposition,x
1149Correlation between surface oxygen content and microstructure of
carbon nitride films, 1153
Ž .X-Ray photoelectron spectroscopy XPSVariation of nitrogen incorporation and bonding configuration of
carbon nitride films studied by X-ray photoelectron spectroscopyŽ . Ž .XPS and Fourier transform infrared FT-IR spectro-scopic ellipsometry, 1183
X-Ray reflectivityElastic constants and structural properties of nanometre-thick
diamond-like carbon films, 1062Hydrogen concentrations and mass density obtained by X-ray and
neutron reflectivity on hydrogenated amorphous carbon nitridethin films, 1188
XPSThe effect of process parameters on the chemical structure of
pulsed laser deposited carbon nitride films, 1157Effect of plasma parameters on the structure of CN layersx
deposited by DC magnetron sputtering, 1200
Y-branched nanotubesFrom straight carbon nanotubes to Y-branched and coiled carbon
nanotubes, 1081