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ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
1
2012 ITRS
Emerging Research Materials
[ERM]
July 12, 2012
C. Michael GarnerHiro Akinaga, AIST
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
2
2012 ERM ParticipantsHiro Akinaga AISTTsuneya Ando Tokyo Inst. Tech Nobuo Aoi PanasonicKoyu Asai RenesasYuji Awano Keio UnivDaniel-Camille Bensahel ST MicroBill Bottoms NanonexusGeorge Bourianoff IntelBernard Capraro IntelJohn Carruthers Port. State Univ.
An Chen Global Foundry
Zhihong Chen IBM
Joy Cheng IBM
Byung Jin Cho KAIST
Luigi Colombo TI
G. Dubois IBM Catherine Dubourdieu Inst. Nanotech. de Lyon..
Michael Garner GNS Michael Goldstein IntelDan Herr UNCG
Jim Hutchby SRCBerry Jonker NRLTed Kamins Stanford U.Leo Kenny IntelChoong-Un Kim UT ArlingtonSean King IntelAtsuhiro Kinoshita ToshibaLiew Yun Fook A-StarBlanka Magyari-Kope Stanford U.Prashant Majhi IntelFrancois Martin LETIFumihiro Matsukura Tohoku U.Nobuyuki Matsuzawa SonyJennifer Mckenna IntelYoshiyuki Miyamoto NECKei Noda Kyoto University
Yaw Obeng NISTChris Ober Cornell UnivMatsuto Ogawa Kobe UniversityKatsumi Ohmori. TOKYutaka Ohno Nagoya UniversityEr-Xaun Ping AMATJoel Plawsky RPIDave Roberts NanteroTadashi Sakai ToshibaGurtej Sandhu MicronHideyki Sasaki Toshiba NanoanalysisShintaro Sato AISTAkihito Sawa AISTBarry Schechtman INSECSadasivan Shankar IntelMizuki Sekiya AISTMatt Shaw IntelTakahiro Shinada AISTMichelle Simmons UNSWKaushal Singh AMAT
Naoyuki Sugiyama TorayShin-ichi Takagi U. of TokyoMasahiro Takemura NIMSKoki Tamura TOK AmericaYoshihiro Todokoro NAISTYasuhide Tomioka AISTPeter Trefonas DowWilman Tsai Intel Ken Uchida Tokyo TechYasuo Wada Toyo UKang Wang UCLAH.S. Philip Wong Stanford U.Dirk Wouters IMECWen-Li Wu NISTShigeru Yamada IbidenHiroshi Yamaguchi NTTToru Yamaguchi NTTHiroaki Yoda ToshibaJiro Yugami RenasasVictor Zhirnov SRCPaul Zimmerman Intel
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
3
2012 Key Messages
• 2011 ERM Chapter will not be updated in 2012• ERM is preparing for 2013 ITRS Rewrite• Aligning with iTWG New Requirements• Planning e-Workshops• Identifying potential material transitions• Identifying support capabilities needed• Significant Challenges for all Materials
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
4
Memory Materials
• Ferroelectric Memory• Nanoelectromechanical (NEMM)• Redox RAM• Mott Memory• Macromolecular • Molecular
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
5
Extending CMOS Logic Alternate Channel Materials
Alternate Channel Materials
-n-Ge & p-III-V
-Nanowires
-Graphene
-Carbon Nanotubes
III-V Heterostructures(L. Samuelson, Lund Univ.)
A. Geim, Manchester U.
Assess
Materials Performance
Gate materials
Contacts
Interfaces
MOS
-Identify Novel Metrology & Modeling Needs
D. Zhou, USC
ITRS Summer Conference 2012 San Francisco, CA
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6
Beyond CMOS LogicMaterials & Interfaces
Assess• Ferromagnetic Materials, Dilute Magnetic Semiconductors• Complex Metal Oxides• Strongly Correlated Electron State Materials (FE, FM, FE & FM)• Molecules• Interfaces
Spin StateFerroelectric
Polarization
Negative Capacitance FET•Individual or Collective
Charge Based States Other Than Charge Only
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
7
ERM Device Material e-Workshops
• Redox RAM Materials• Deterministic and Conformal Doping• Nanoscale Contact Resistivity• Carbon Electronics (Nanotubes and Graphene)• Spin Materials & Out of Plane MTJ Materials• Strongly Correlated Electron Materials• Modeling of Complex Transition Metal Oxide
Dielectric Constant
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
8
Lithography Materials
• Continuing evaluation of novel resist for 193i and EUV• LER Rectification to reduce LER and improve line CD control• Contact/Via Rectification to reduce size and improve CD control • Pattern Density Multiplication for high density smaller features
Ruiz, et. al.
Science, 2008
Contact/Via Rectification
Density Multiplication
LER Rectification
Stoykovich, et. al.
Macromolecules, 2010
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
9
Survey on DSA
• Contact rectification and pattern density multiplication had the highest support
• Most industry responders had plans to evaluate DSA
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
10
Interconnect Materials
Via
Wire
Via
Wire
Interconnects
- Graphene, Carbon Nanotubes, Nanocomposites
Ultra-thin Barrier Layers
• Novel sub 2nm materials
• Self Assembled Monolayers (SAM)
Ultra low κ ILD
Novel Interconnects & Vias
Native Interconnect
Workshops
• Ultralow k ILD: Completed
• Ultrathin Cu Barrier Layers
ITRS Summer Conference 2012 San Francisco, CA
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Assembly & Packagee-Workshops
• Residue Free Adhesives• 1D Interconnects
– Nanosolder, Nanocomposites, CNT & NW
• Polymers with Controlled Mechanical, Electrical & Thermal Properties
• Insulating polymers with high in plane thermal conductivity
• <200C Process temperature Dielectric Interposer Low k, High k & Wiring
ITRS Summer Conference 2012 San Francisco, CA
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Hexagon of Assembly Material Requirements
• Highly coupled Material Properties• Apply novel materials to achieve optimal performance
CTE
ModulusFracture
Toughness
Functional
Properties
Moisture
ResistanceAdhesion
Examples
Thermal Interface Mat.
Mold Compound
Underfill
Adhesives
Epoxy
CTE depends on volume fraction
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
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ESH Challenges• Materials needed to overcome significant
technical challenges– Low energy processes and new materials for low
energy integrated circuits– Few materials can meet requirements– Some materials have known hazards or
uncharacterized ESH properties– Stimulate ESH research in uncharacterized materials– Good risk management methods for materials ESH
in Research, Development & Manufacturing – Lifecycle Assessment & Management – Efficient use of materials
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
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Summary
• 2011 ERM Chapter will not be updated in 2012• ERM is preparing for 2013 ITRS Rewrite• Aligning with iTWG New Requirements• Planning e-Workshops• Significant Challenges for all Materials
ITRS Summer Conference 2012 San Francisco, CA
Work in Progress: Not for Distribution
15
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