1 DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005

ITRS 2005 - Environmental, Safety and Health Chapter

ITRS Conference, San Francisco, CaliforniaJuly 13, 2005

Jim Jewett, Intel

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ITRS ConferenceESH Chapter Participants

• ESIA – Hans-Peter Bipp (Infineon)

• JSIA – Takayuki Oogoshi (NEC)

– Tetsu Tomine (Epson)

• SIA – Jim Jewett (Intel) – Walter Worth (Sematech)

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Agenda• Difficult Challenges

• ESH Technology Engagement Model

• Key ESH Focus

• Supplemental ESH Tools

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ESH Difficult Challenges(2005 Proposed)

• Chemical and Materials Management

• Process and Equipment Management

• Facilities Energy and Water Optimization

• Sustainability and Product Stewardship

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Chemical and Materials Management

– New chemical assessment– Chemical data collection– Chemical exposure management

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Process and Equipment Management

– Chemical reduction – Environment management– Water and energy conservation– Consumables optimization– By-products management– Chemical exposure management– Equipment ergonomics– Design for maintenance

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Facilities Energy and Water Optimization

– Conservation [energy and water]– Heat removal– Global warming emissions reduction

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Sustainability and Product Stewardship

– End-of-life disposal/reclaim– Product content/material declaration– Design for ESH– Process chemistries– Device power requirements– Supply chain issues

Optimum Time to effect

changes in ESH technology

ESH/Fab Technology Engagement Model

YEARS to High Volume Manufacturing

Ab

ility

to E

ffect

ES

H Im

pro

vem

ent

s

6 4 2 0

Manufacturing RampSupplier R&DExternal Research Process Development

Commercialization Phases Demonstration Ramp to HVMResearchSource: Intel

Equipment/Chemical set defined and

characterized

Minimal flexibility to

develop alternative

material ESH solutions

--

Tools

Universities and Government Labs

Universities and Government Labs

Technology Development/ESH Intersect Model

YEARS to High Volume Manufacturing

Ab

ility

to E

ffect

ES

H Im

pro

vem

ent

s

6 4 2 0

Manufacturing Ramp

Winnow OptionsBgn Mat/Supl Selct

Mat/Supl Selct

Ramp to HVM

Proof of ConceptMaterial Development

Source: Intel

Optimum lead-time to anticipate

impacts & identify ESH improvement

needs

Where we operate today

Supplier R&DExternal Research Process Development

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Key ESH Focus1. Lithography

• PFOS alternatives development• Energy requirements• Immersion Lithography (Types of fluids and additives)

2. Factory Integration• Impact of 450 mm tools• POU abatement • Concentration of pollutants due to water conservation

3. Interconnect• CMP consumables reduction• New deposition process materials

4. Front End Processing• Process Complexity• Increase in aqueous cleaning/stripping requirements• New and novel materials

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Key ESH Focus (Cont’d)

5. Emerging Research Materials• Nanotechnology ESH research needs

6. Yield• Water conservation may impact yield

7. Assembly & Packaging• Product content• PFC use

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Supplemental Files

Two overriding issues regarding chemicals and materials:

• Selection• Utilization

Reference Files• Chemical Restrictions• Materials of Concern• Codes, Standards and Permits

Issues & Characterization

Show Stopper High Restriction Potential Medium Restriction Potential

List of Chemicals or Raw Materials Subject to Actual or Potential Manufacture or Use Restrictions

Asbestos MaterialsCertain glycol ethersPolychlorinated biphenylsFully halogenated chlorofluorocarbons (CFCs)Carbon tetrachloride1,1,1 trichloroethane Halons 1211, 1301, 2402Hydrobromofluorocarbons (HBFCs)HCFC 141bPolybrominated biphenyls (PBBs) and their ethers/oxides (PBDEs)Cadmium compoundsLead compoundsMercury compoundsHexavalent Chromium compoundsPolychlorinated Biphenyls (PCB)/ Terphenyls (PCT) Polychlorinated Naphthalene (PCN)Short Chain Chlorinated Paraffins (C10-13, Cl >50%)Tributyl tin (TBT) and, Triphenyl tin (TPT) compoundsCertain Azo Colorants

Hydrochlorofluorocarbons (HCFCs)Perfluorooctyl sulfonates (PFOS) Cadmium compoundsLead compoundsMercury compoundsHexavalent Chromium compounds

Perfluorocompounds (PFCs) - SF6 - C4F10 - C2F6 - C5F12 - CF4 - C6F14 - NF3 - C4F8 - CHF3 - C3F8Hydrofluorocarbons (HFCs)Perfluorooctanoic acid (PFOA) and its saltsCertain phthalatesPhenolsPerfluoroalkyl sulfonates (PFAS)Ethylene OxideEthylene Chloride

Items are listed in red if the restriction potential applies only if the material is contained in the final product, whereas process use of the material may be acceptable if it is not contained in the final product. Items listed in blue are those which have restrictions if the material is simply used in the process, but a different level of restriction if included in the final product. Items listed in black have the same restriction level regardless of whether its included in the final product.The tool is meant to focus only on the potential for legal limitations on the use of a substance, and is not meant to substitute for the broader risk assessment or for the more thorough EHS review performed as part of chemical use approval.

Items are listed in red if the restriction potential applies only if the material is contained in the final product, whereas process use of the material may be acceptable if it is not contained in the final product. Items listed in blue are those which have restrictions if the material is simply used in the process, but a different level of restriction if included in the final product. Items listed in black have the same restriction level regardless of whether its included in the final product.The tool is meant to focus only on the potential for legal limitations on the use of a substance, and is not meant to substitute for the broader risk assessment or for the more thorough EHS review performed as part of chemical use approval.

Potential Chemical Restrictions TablePotential Chemical Restrictions Table

DRAFT – Work In Progress - NOT FOR PUBLICATION 13 July 2005