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Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

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Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout 11 th LHC Electronics Workshop Heidelberg 13-Sept-2005 E. N. Spencer SCIPP – UCSC. Participants. D.E. Dorfan, A. A. Grillo, J. Metcalfe, M Rogers, H. F.-W. Sadrozinski, A. Seiden, E. N. Spencer, M. Wilder - PowerPoint PPT Presentation
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13-September-05 1 SiGe biCMOS for Next Gen Strip Readout 1 E.N. Spencer SCIPP-UCSC ATLAS ATLAS Evaluation of SiGe biCMOS Evaluation of SiGe biCMOS Technologies for Next Generation Technologies for Next Generation Strip Readout Strip Readout 11 th LHC Electronics Workshop Heidelberg 13-Sept-2005 E. N. Spencer SCIPP – UCSC
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Page 1: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 1

SiGe biCMOS for Next Gen Strip Readout 1E.N. SpencerSCIPP-UCSC

ATLASATLAS

Evaluation of SiGe biCMOS Technologies for Evaluation of SiGe biCMOS Technologies for Next Generation Strip ReadoutNext Generation Strip Readout

11th LHC Electronics Workshop

Heidelberg

13-Sept-2005

E. N. SpencerSCIPP – UCSC

Page 2: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 2

SiGe biCMOS for Next Gen Strip Readout 2E.N. SpencerSCIPP-UCSC

ATLASATLAS

ParticipantsParticipants

D.E. Dorfan, A. A. Grillo, J. Metcalfe, M Rogers, H. F.-W. Sadrozinski, A. Seiden, E. N. Spencer, M. Wilder

SCIPP-UCSC

Collaborators: A. Sutton, J.D. Cressler

Georgia Tech, Atlanta, GA 30332-0250, USAM. Ullan, M. Lozano

CNM, Barcelona

Page 3: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 3

SiGe biCMOS for Next Gen Strip Readout 3E.N. SpencerSCIPP-UCSC

ATLASATLAS

Bipolar for Large C – Fast Bipolar for Large C – Fast ss

We have shown for past experiments that the bipolar technology has advantages over CMOS in power and performance for front-end amplification of silicon strip readout when the capacitive loads are high and the shaping times short.

• ZEUS-LPS Tek-Z IC

• SSC-SDC LBIC IC

• ATLAS-SCT ABCD, CAFE-M, CAFE-P ICs

Since CMOS is the preferred technology for back-end data processing, biCMOS technologies have not been readily available, making it difficult to find a one chip solution.

Experience with the commercial 0.25 m CMOS has shown the great advantage of using a high volume commercial rather than a niche technology.

Page 4: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 4

SiGe biCMOS for Next Gen Strip Readout 4E.N. SpencerSCIPP-UCSC

ATLASATLAS

biCMOS with Enhanced SiGebiCMOS with Enhanced SiGe

The market for wireless communication has now spawned many biCMOS technologies where the bipolar devices have been enhanced with a germanium doped base region (SiGe devices).

We have identified at least the following vendors:

• IBM (at least 3 generations available)

• STm

• IHP, (Frankfurt on Oder, Germany)

• Motorola

• JAZZ

Advanced versions include CMOS with feature sizes of 0.25 m to 0.13 m.

The bipolar devices have DC current gains () of several 100 and fTs up to 100s of GHz. This implies very small geometries that could afford higher current densities and more rad-hardness.

Growing number of fab facilities

Page 5: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 5

SiGe biCMOS for Next Gen Strip Readout 5E.N. SpencerSCIPP-UCSC

ATLASATLAS

Tracker Regions Amenable for SiGeTracker Regions Amenable for SiGe

For the inner tracker layers, pixel detectors will be needed, and their small capacitances allow the use of deep sub-micron CMOS as an efficient readout technology.

Starting at a radius of about 20 cm, at fluence levels of 1015 n/cm2, short strips can be used, with a detector length of about 3 cm and capacitances of the order of 5 pF. At a radius of about 60 cm, the expected fluence is a few times 1014 p/cm2, and longer strips of about 10 cm and capacitance of 15 pF can be used.

It is in these two outer regions with sensors with larger capacitive loads where bipolar SiGe might be used in the front-end readout ASICs with welcome power savings while still maintaining fast shaping times.

Page 6: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 6

SiGe biCMOS for Next Gen Strip Readout 6E.N. SpencerSCIPP-UCSC

ATLASATLAS

Biasing the Analogue CircuitBiasing the Analogue Circuit

The analog section of a readout IC for silicon strips typically has a special front transistor, selected to minimize noise (often requiring a larger current than the other transistors), and a large number of additional transistors used in the shaping sections and for signal-level discrimination.

The current for the front transistor is selected in order to achieve the desired transconductance (minimize noise). For the other bipolar devices, bias levels for the other transistors are determined to achieve the necessary rad-hardness, matching and shaping times.

Depending upon the performance (especially radiation hardness) of the bipolar process, power savings could be realized in both the front transistor and in the other parts of the analogue circuit.

Page 7: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 7

SiGe biCMOS for Next Gen Strip Readout 7E.N. SpencerSCIPP-UCSC

ATLASATLAS

J. Kaplon et al., 2004 IEEE Rome Oct 2004, use 0.25 m CMOS

For CMOS: Input transistor: 300 A, other transistors 330 A (each 20 – 90 A)

Potential CMOS Front-EndPotential CMOS Front-End

Page 8: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 8

SiGe biCMOS for Next Gen Strip Readout 8E.N. SpencerSCIPP-UCSC

ATLASATLAS

Radiation vs. Radius in Upgraded TrackerRadiation vs. Radius in Upgraded Tracker

The usefulness of a SiGe bipolar front-end circuit will depend upon its radiation hardness for the various regions (i.e. radii) where silicon strip detectors might be used.

Outer Radius

Long Strips

Inner

Pixels

Mid-Radius

Short Strips

Page 9: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 9

SiGe biCMOS for Next Gen Strip Readout 9E.N. SpencerSCIPP-UCSC

ATLASATLAS

First SiGe High-rate Radiation Testing First SiGe High-rate Radiation Testing

Radiation testing has been performed on some SiGe devices by our Georgia Tech collaborators up to a fluence of 1x1014 p/cm2 and they have demonstrated acceptable performance. (See for example: http://isde.vanderbilt.edu/Content/muri/2005MURI/Cressler_MURI.ppt)

In order to extend this data to higher fluences, we obtained some arrays of test structures from our collaborator at Georgia Tech. These were from a -enhanced 5HP process from IBM. (i.e. the was ~250 rather than ~100.)

The parts were tested at UCSC and with the help of RD50 collaborators (Michael Moll & Maurice Glaser) they were irradiated in Fall 2004 at the CERN PS and then re-tested at UCSC.

For expediency, all terminals were grounded during the irradiation This gives slightly amplified rad effects than with normal biasing.

Annealing was performed after initial post-rad testing.

Page 10: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 10

SiGe biCMOS for Next Gen Strip Readout 10E.N. SpencerSCIPP-UCSC

ATLASATLAS

Irradiated SamplesIrradiated Samples

Pre-rad

ATLAS-SCT => ATLAS-upgrade

Outer Radius

ATLAS-upgrade

Mid RadiusATLAS-upgrade

Inner Radius

4.15E13 1.15E14 3.50E14 1.34E15 3.58E15 1.05E16

Fluences:

Page 11: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 11

SiGe biCMOS for Next Gen Strip Readout 11E.N. SpencerSCIPP-UCSC

ATLASATLAS

Base Leakage Current Increased by RadiationBase Leakage Current Increased by Radiation

1e15 Irrad Comparison Ic,Ib vs Vbe

1.00E-14

1.00E-13

1.00E-12

1.00E-11

1.00E-10

1.00E-09

1.00E-08

1.00E-07

1.00E-06

1.00E-05

1.00E-04

1.00E-03

1.00E-02

1.00E-01

1.00E+000 0.2 0.4 0.6 0.8 1

Vbe

Ic, non-irrad

Ib, non-irrad

Ic, Irrad

Ib, Irrad

Gummel Plot before and after 1.3x1015 p/cm2

(decreases as base leakage current increases.)

5HP, enhanced 0.5x2.5 m2

Vce=0.75 V

Page 12: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 12

SiGe biCMOS for Next Gen Strip Readout 12E.N. SpencerSCIPP-UCSC

ATLASATLAS

Radiation Damage vs. CurrentsRadiation Damage vs. Currents

1e15 Irrad Comparison of Beta vs Ic

0.01

0.1

1

10

100

1000

1.00E-13 1.00E-12 1.00E-11 1.00E-10 1.00E-09 1.00E-08 1.00E-07 1.00E-06 1.00E-05 1.00E-04 1.00E-03

Ic

Vce=0.75VVce=1.25VIrradiated Vce=0.75VIrradiated Vce=1.25V

We see the typical increase in post-rad at higher currents

Page 13: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 13

SiGe biCMOS for Next Gen Strip Readout 13E.N. SpencerSCIPP-UCSC

ATLASATLAS

Scaling by Current DensityScaling by Current Density

Beta vs Fluence Jc=10 A/m2

1

10

100

1000

1.00E+13 1.00E+14 1.00E+15 1.00E+16 1.00E+17

Fluence (p/cm^2)

bet

a

0.5X1

0.5x2.5

0.5x10

0.5x20

4x5

As expected radiation effects are nearly size independent when scaled by current density.

Page 14: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 14

SiGe biCMOS for Next Gen Strip Readout 14E.N. SpencerSCIPP-UCSC

ATLASATLAS

Annealing EffectsAnnealing Effects

Annealing repairs some of the damage,

especially since all device terminals were grounded during irradiation.

Annealing Effects on Beta for a 0.5x10 m2 SiGe Transistor at 1x1015 p/cm2

0.01

0.1

1

10

100

1000

1.00E-13 1.00E-11 1.00E-09 1.00E-07 1.00E-05 1.00E-03 1.00E-01

Ic (A)

Be

tanon-irrad

irrad

Anneal: 5 days @ roomtemp

Anneal: plus 6 days @roomtemp, 1 day @ 60 deg C

Anneal: plus 1 day @ 100deg C

Anneal: plus 6 days @ 100deg C

Page 15: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 15

SiGe biCMOS for Next Gen Strip Readout 15E.N. SpencerSCIPP-UCSC

ATLASATLAS

Feasibility Estimate for 5HPFeasibility Estimate for 5HP

As a quick estimate of feasibility and power savings, we can find an operating point with > 50.

At 1.3x1015 (radius ~20cm) the minimum size transistor can operate at 100 nA.

For R ~20 cm, bias at Ic = 10 A shows these effective betas:

Fluence: 1.34E15Ic=10A

Transistor Size m2 pre

irrad

anneal

0.5x1 242 35 1110.5x2.5 320 25 630.5x10 302 15 510.5x20 300 9 314x5 372 19 48

Fluence: 1.34E15=50 Required Current

Transistor Size m2 cirrad Ic anneal

0.5x1 3.E-05 1.E-070.5x2.5 7.E-05 4.E-060.5x10 4.E-04 1.E-050.5x20 6.E-054x5 1.E-04 1.E-05

Page 16: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 16

SiGe biCMOS for Next Gen Strip Readout 16E.N. SpencerSCIPP-UCSC

ATLASATLAS

IHP Design to Estimate Power Use of SCT Upgrade Front End

IHP has the SG25H1 200 Ghz Sige process available on Europractice. Beta is ~200. In parallel with radiation testing by Barcelona, UCSC is developing an eight channel amplifier/comparator with similar specifications to the present ABCD.

The x4 minimum transistor has base resistance of 51 m x 3.36 m. 0.25 m CMOS is also included. Extensive use is made of the 2.0 k/ square unsilicided polysilicon resistor structure, since this is expected to be radiation resistant.

The purpose of this FE design is to estimate the low current bias performance of SiGe, and to see whether it can produce significant power savings. The target voltage bias level is 2 V.

Page 17: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

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SiGe biCMOS for Next Gen Strip Readout 17E.N. SpencerSCIPP-UCSC

ATLASATLAS

Design Procedure Details

IHP provides a Cadence Kit, with support for both Diva and Allegro.

The bipolar devices are complete as provided, no editing allowed, with some hidden layers to protect IHP intellectual property.

Radiation hard annular NMOS transistor drawing is well supported. This is done by allowing 135 degree bends of Poly lines on Active in the DRC. There are included Virtuoso utilities that are needed for successful DRC.

Cadence Spectre does not DC converge well. Mentor has Eldo utility “Artist Link” that enables Eldo to run with Cadence schematic Composer. Eldo converges vigorously. Overall, the Cadence Kit is complete enough, and with the help of Eldo, is a good toolset.

Page 18: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 18

SiGe biCMOS for Next Gen Strip Readout 18E.N. SpencerSCIPP-UCSC

ATLASATLAS

SCT-FE Sim Results

Page 19: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 19

SiGe biCMOS for Next Gen Strip Readout 19E.N. SpencerSCIPP-UCSC

ATLASATLAS

First Guess at Potential Power SavingsFirst Guess at Potential Power Savings

CHIP TECHNOLOGY FEATURE

 0.25 m CMOS ABCDS/FE

J. Kaplon et al.,(IEEE Rome Oct 2004)

 IHP SG25H1 SCT-FE Preliminary design

Power: Bias for all but front transistor

330 A 0.8 mW= 30 A(conservative)

.06 mW 

Power: Front bias for 25 pF load 300 A 0.75 mW 

150 A 0.30 mW 

Power: Front bias for 7 pF load 120 A 0.3 mW A 0.10 mW

Total Power (7 pF) 2x1015

  0.36 mWTotal Power (25 pF) 3x1014

1.1 mW

1.5 mW

0.16mW

Using similar estimates of bias settings and transistor counts, an estimate for power can be obtained.

Page 20: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

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SiGe biCMOS for Next Gen Strip Readout 20E.N. SpencerSCIPP-UCSC

ATLASATLAS

ConclusionsConclusions

First tests of one SiGe biCMOS process indicate that the bipolar devices may be sufficiently rad-hard for the upgraded ATLAS tracker, certainly in the outer-radius region and even perhaps in the mid-radius region.

A simulation estimate of power consumption for such a SiGe front-end circuit indicates that significant power savings might be achieved.

More work is needed to both confirm the radiation hardness and arrive at more accurate estimates of power savings.

In particular, with so many potential commercial vendors available, it is important to understand if the post-radiation performance is generic to the SiGe technology or if it is specific to some versions.

Page 21: Evaluation of SiGe biCMOS Technologies for Next Generation Strip Readout

13-September-05 21

SiGe biCMOS for Next Gen Strip Readout 21E.N. SpencerSCIPP-UCSC

ATLASATLAS

Work AheadWork Ahead

Along with our collaborators, we plan two parallel paths of work.

First, we plan more irradiations with several SiGe processes. In particular, we plan to test at least the IBM 5HP, IBM enhanced 5HP, IBM 8HP, IHP SG25H1 and one from STm.

• CNM has obtained a first set of test structures from IHP and is proceeding.

• UCSC has recently received the IBM test structures.

• We have been promised test structures from STm but a schedule is not yet fixed.

To obtain a better handle on the true power savings, we will submit an IHP 8 channel amplifier/comparator early in 2006. This work is in parallel with IHP radiation characterization.


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